| Patents for C23C 16 - Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition (cvd) processes (71,892) |
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| 03/21/2007 | EP1638700A4 Ultraviolet (uv) and plasma assisted metalorganic chemical vapor deposition (mocvd) system |
| 03/21/2007 | EP1436442A4 Amorphous hydrogenated carbon film |
| 03/21/2007 | CN1934913A Plasma generating equipment |
| 03/21/2007 | CN1934720A Semiconductor light-emitting device and illuminating device |
| 03/21/2007 | CN1934685A Stabilization method of high-k dielectric materials |
| 03/21/2007 | CN1934684A Substrate processing apparatus |
| 03/21/2007 | CN1934679A Method and apparatus for forming silicon dots |
| 03/21/2007 | CN1934678A Method for depositing high-quality microcrystalline semiconductor materials |
| 03/21/2007 | CN1934288A Plasma CVD equipment |
| 03/21/2007 | CN1934287A Apparatuses and methods for atomic layer deposition of hafnium-containing high-k dielectric materials |
| 03/21/2007 | CN1933099A Method for manufacturing semiconductor device |
| 03/21/2007 | CN1933097A Dry device and dry method for semiconductor equipment |
| 03/21/2007 | CN1933067A Transparent epitaxial ferroelectric film capacitor and producing method thereof |
| 03/21/2007 | CN1932081A Method for restoring portion of turbine component |
| 03/21/2007 | CN1932077A Apparatus and methods for using high frequency chokes in a substrate deposition apparatus |
| 03/21/2007 | CN1932076A Heat radiator making process |
| 03/21/2007 | CN1932075A Substrate processing device, cor processing modular and substrate lifting device |
| 03/21/2007 | CN1932074A Electrostatic chuck, thin film manufacturing apparatus having the same, thin film manufacturing method, and substrate surface treatment method |
| 03/21/2007 | CN1932073A Efficient lining heat resisting active oxygen corrosion |
| 03/21/2007 | CN1306566C Plasma Processing device |
| 03/21/2007 | CN1306062C Atomic layer deposition apparatus and process |
| 03/20/2007 | US7194199 Stacked annealing system |
| 03/20/2007 | US7192892 Atomic layer deposited dielectric layers |
| 03/20/2007 | US7192889 Methods for forming a high dielectric film |
| 03/20/2007 | US7192888 Low selectivity deposition methods |
| 03/20/2007 | US7192866 Source alternating MOCVD processes to deposit tungsten nitride thin films as barrier layers for MOCVD copper interconnects |
| 03/20/2007 | US7192849 Methods of growing nitride-based film using varying pulses |
| 03/20/2007 | US7192824 Lanthanide oxide / hafnium oxide dielectric layers |
| 03/20/2007 | US7192660 Layer with controlled grain size and morphology for enhanced wear resistance |
| 03/20/2007 | US7192645 Uniform pore distribution thus retain high rigidity thus are suitable for manufacturing of integrated circuits |
| 03/20/2007 | US7192637 Coated cutting tool for turning of steel |
| 03/20/2007 | US7192626 Methods for producing silicon nitride films and silicon oxynitride films by thermal chemical vapor deposition |
| 03/20/2007 | US7192625 Manufacturing method of barrier-forming film |
| 03/20/2007 | US7192624 Overcoating metals using tunnel furnace; transportation passageways; rotation; surface treatment; corrosion resistant zinc protective coating |
| 03/20/2007 | US7192623 Thin layer of hafnium oxide and deposit process |
| 03/20/2007 | US7192622 Process of masking cooling holes of a gas turbine component |
| 03/20/2007 | US7192505 Wafer probe for measuring plasma and surface characteristics in plasma processing environments |
| 03/20/2007 | US7192487 Semiconductor substrate processing chamber and accessory attachment interfacial structure |
| 03/20/2007 | US7192486 Clog-resistant gas delivery system |
| 03/20/2007 | US7192483 substrate in a vacuum atmosphere is exposed to a reactive gas mixture which is excited by means of a plasma discharge. |
| 03/20/2007 | CA2188235C Metalized polyolefin film |
| 03/15/2007 | WO2007030673A2 Vapor deposition of hafnium silicate materials with tris(dimethylamido)silane |
| 03/15/2007 | WO2007030495A1 Methods for fabricating sub-resolution line space patterns |
| 03/15/2007 | WO2007030258A2 Post deposition plasma treatment to increase tensile stress of a hdp-cvd si 02 layer |
| 03/15/2007 | WO2007030225A2 A method of forming a tantalum-containing layer from a metalorganic precursor |
| 03/15/2007 | WO2007030218A2 A method of forming a tantalum-containing layer from a metalorganic precursor |
| 03/15/2007 | WO2007029726A1 Method for the vaporization of liquid raw material which enables low-temperature vaporization of liquid raw material and vaporizer for the method |
| 03/15/2007 | WO2007029637A1 Thin film manufacturing apparatus and thin film manufacturing method |
| 03/15/2007 | WO2007029580A1 Magnetron control method, magnetron service life judgment method, microwave generation device, magnetron service life judgment device, processing device, computer program, and storage medium |
| 03/15/2007 | WO2007029482A1 Semiconductor structure |
| 03/15/2007 | WO2007029050A1 Barrier layer |
| 03/15/2007 | WO2007029014A1 Deposition process |
| 03/15/2007 | WO2007028798A1 Method for producing a metal powder and an electrically insulating polymer composite material, polymer composite material and electronic device |
| 03/15/2007 | WO2007028791A2 Wear-resistant coating and a method for the production thereof |
| 03/15/2007 | WO2007028234A1 Process for producing metal foams having uniform cell structure |
| 03/15/2007 | WO2007028178A1 Method for producing cutting tip with a colored surface |
| 03/15/2007 | WO2006136929A3 High colour diamond layer |
| 03/15/2007 | WO2006099392A3 Microwave induced functionalization of single wall carbon nanotubes and composites prepared therefrom |
| 03/15/2007 | WO2006020134A3 Method and system for characterizing porous materials |
| 03/15/2007 | US20070061006 Methods of making shape memory films by chemical vapor deposition and shape memory devices made thereby |
| 03/15/2007 | US20070060695 Paint composition, coating structure and method for using the paint composition |
| 03/15/2007 | US20070059948 Atomic layer deposition (ALD); tetrakis(diethylamido)hafnium; hafium oxides/nitrides; capacitors |
| 03/15/2007 | US20070059928 Methods for synthesis of metal nanowires |
| 03/15/2007 | US20070059896 Nitrous oxide anneal of teos/ozone cvd for improved gapfill |
| 03/15/2007 | US20070059881 Atomic layer deposited zirconium aluminum oxide |
| 03/15/2007 | US20070059529 Wear-resistant coating and process for producing it |
| 03/15/2007 | US20070059502 Integrated process for sputter deposition of a conductive barrier layer, especially an alloy of ruthenium and tantalum, underlying copper or copper alloy seed layer |
| 03/15/2007 | US20070059454 Products for treating and preventing chronic diseases: eliminating the autoimmune triggers that underly chronic disease |
| 03/15/2007 | US20070059449 Plating method of metal film on the surface of polymer |
| 03/15/2007 | US20070059447 Method of fabricating lanthanum oxide layer and method of fabricating MOSFET and capacitor using the same |
| 03/15/2007 | US20070059438 Thin alignment layers for liquid crystal displays |
| 03/15/2007 | US20070057276 Nitride semiconductor growth method, nitride semiconductor substrate, and nitride semiconductor device |
| 03/15/2007 | US20070056515 High density plasma reactor |
| 03/15/2007 | US20070056514 Coating and developing apparatus |
| 03/15/2007 | US20070056513 System for situ photoresist thickness characterizaton |
| 03/15/2007 | US20070056150 Apparatus and methods for preventing rotational slippage between a vertical shaft and a support structure for a semiconductor wafer holder |
| 03/15/2007 | DE19802131B4 Verfahren zur Herstellung einer monokristallinen Schicht aus einem leitenden oder halbleitenden Material A process for preparing a monocrystalline layer of a conductive or semi-conductive material |
| 03/15/2007 | DE112005000292T5 Metallorganische Verbindungen mit hoher Keimbildungsdichte Organometallic compounds with high nucleation density |
| 03/15/2007 | DE10393956T5 Diamantbeschichtetes Silizium und Elektrode A diamond-coated silicon and electrode |
| 03/15/2007 | CA2621305A1 Deposition process |
| 03/15/2007 | CA2619013A1 Process for producing metal foams having uniform cell structure |
| 03/15/2007 | CA2520442A1 Vacuum metalized pigment patterns and method of making same |
| 03/14/2007 | EP1761945A1 Fabrication of crystalline materials over substrates |
| 03/14/2007 | EP1761942A1 Device for coating optical glass by means of plasma-supported chemical vapour deposition (cvd) |
| 03/14/2007 | EP1761656A1 Method for applying hot-gas anticorrosive coatings |
| 03/14/2007 | EP1761655A1 Method for manufacturing ultra-hydrophilic thin film coated metal product, and ultra-hydrophilic thin film coated metal product |
| 03/14/2007 | EP1501964B1 Method and apparatus for preparing vaporized reactants for chemical vapor deposition |
| 03/14/2007 | EP1287188B1 Epitaxial silicon wafer free from autodoping and backside halo |
| 03/14/2007 | EP1243017B1 Linear drive system for use in a plasma processing system |
| 03/14/2007 | EP1218113B1 Nanostructure coatings |
| 03/14/2007 | CN1930675A Limited thermal budget formation of PMD layers |
| 03/14/2007 | CN1930669A Plasma treatment to improve adhesion of low k dielectrics |
| 03/14/2007 | CN1930322A Hardware development to reduce bevel deposition |
| 03/14/2007 | CN1930321A Alumina coating, coated product and method of making the same |
| 03/14/2007 | CN1930320A Liquid precursors for the CVD deposition of amorphous carbon films |
| 03/14/2007 | CN1930234A Polypropylene modification for improved adhesion of polypropylene-based multilayer packaging film structure to vacuum deposited aluminum |
| 03/14/2007 | CN1930099A Method for depositing gallium oxide coatings on flat glass |
| 03/14/2007 | CN1930079A Elongated nano-structures and related devices |
| 03/14/2007 | CN1929940A 被覆切削工具 Coated cutting tool |
| 03/14/2007 | CN1928166A Method for growing diamond membrane in discontinuous cycling process |