Patents
Sitemap › C23 - Coating metallic material; Coating material with metallic material; Chemical surface treatment; Diffusion treatment of metallic material; Coating by vacuum evaporation, by sputtering, by ion implantation or by chemical vapour deposition, in general; Inhibiting corrosion of metallic material or incrustation in general › C23C - Coating metallic material; Coating material with metallic material; Surface treatment of metallic material by diffusion into the surface, by chemical conversion or substitution; Coating by vacuum evaporation, by sputtering, by ion implantation or by chemical vapour deposition, in general › C23C 16 - Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition (cvd) processes
Patents for C23C 16 - Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition (cvd) processes (71,892)
03/2007
03/28/2007CN1938822A Susceptor
03/28/2007CN1938791A Transparent conductive film, process for producing the same, transparent conductive base material and luminescent device
03/28/2007CN1938450A A method for processing a substrate
03/28/2007CN1938448A Method for gettering oxygen and water during vacuum deposition of sulfide films
03/28/2007CN1938447A Film-forming apparatus and film-forming method
03/28/2007CN1938446A Method for manufacturing ultra-hydrophilic thin film coated metal product, and ultra-hydrophilic thin film coated metal product
03/28/2007CN1938445A Method for manufacturing ultra-hydrophilic thin film coated metal product, and ultra-hydrophilic thin film coated metal product
03/28/2007CN1938444A Method for manufacturing ultra-hydrophilic thin film coated metal product, and ultra-hydrophilic thin film coated metal product
03/28/2007CN1938224A Method for treating surface of base, surface-treated base, material and instrument for medical use
03/28/2007CN1937280A Method for removing organic electroluminescent residues from a substrate
03/28/2007CN1937279A Method for preparingorganic electroluminescent device electronic injection layer
03/28/2007CN1937253A Systems and methods for forming zirconium and/or hafnium-containing layers
03/28/2007CN1937201A Substrate processing system and method
03/28/2007CN1937175A Method for depositing material atomic layer for semiconductor device by using atmosphere
03/28/2007CN1936073A Method of coating a substrate for adhesive bonding
03/28/2007CN1936068A Article having patterned decorative coating
03/28/2007CN1935819A Organic-metal precursor material and method of manufacturing metal thin film using the same
03/28/2007CN1307693C Upper pipe treating apparatus applied for silicon oxide layer homogenization technology
03/28/2007CN1307687C Method for catalytic synthetic growth InN nano point using In metal nano point
03/28/2007CN1307679C Apparatus and method for improving plasma distribution and performance in inductively coupled plasma
03/28/2007CN1307322C Metal organic chemical vapor deposition for ferroelectric film and annealing treatment
03/28/2007CN1307185C Copper complexes and process for formatiom of copper-containing thin films by using the same
03/28/2007CN1307045C Honeycomb-shaped carbon element
03/27/2007US7197108 Method of fabricating X-ray mask and method of fabricating semiconductor device using the X-ray mask
03/27/2007US7196896 Dechucking method and apparatus for workpieces in vacuum processors
03/27/2007US7196211 A dialkylnitrogenhafnium material including 50-650 ppm of zirconium to produce by metal organic chemical vapor deposition/oxidation a barrier film of hafnium oxide on a semiconductor substrate; vaporization stability/higher film formation rate; excellent step coverage; dielectrics; optics; electrolytes
03/27/2007US7196021 HDP-CVD deposition process for filling high aspect ratio gaps
03/27/2007US7196020 Method for PECVD deposition of selected material films
03/27/2007US7196007 Systems and methods of forming refractory metal nitride layers using disilazanes
03/27/2007US7195936 Thin film processing method and system
03/27/2007US7195930 Cleaning method for use in an apparatus for manufacturing a semiconductor device
03/27/2007US7195817 Cutting tool, having a either steel or cemented carbide substrate, interior layer disposed between the diamond coating and the substrate inhibits the diffusion of carbon and other species
03/27/2007US7195801 High purity evaporation; reuse
03/27/2007US7195798 Method of manufacturing a low temperature polysilicon film
03/27/2007US7195797 Using a high-yield fixture assembly and a moving electron gun assembly which allows symmetry between the substrates and deposition source to be maintained
03/27/2007US7195795 Material for forming insulation film and film-forming method with the use of the material
03/27/2007US7195693 Lateral temperature equalizing system for large area surfaces during processing
03/27/2007US7195673 Plasma CVD apparatus, and method for forming film and method for forming semiconductor device using the same
03/27/2007US7195022 Subjecting gallium chloride gas generated through the circulation of hydrogen chloride gas over metallic gallium to vapor phase deposition through the reaction with ammonia gas; moving exhaust gas through piping made of a grounded electroconductive corrosion-resistant material
03/27/2007US7194801 Thin-film battery having ultra-thin electrolyte and associated method
03/22/2007WO2007033282A2 Methods of making shape memory films by chemical vapor deposition and shape memory devices made thereby
03/22/2007WO2007033019A1 Creating a dielectric layer using ald to deposit multiple components
03/22/2007WO2007033009A1 Method of and apparatus for treating particulate materials for improving the surface characteristics thereof
03/22/2007WO2007033003A1 Atomic layer deposition with nitridation and oxidation
03/22/2007WO2007032218A1 Thin-film producing apparatus and method of producing thin film
03/22/2007WO2007032180A1 Process for producing epitaxial wafer and epitaxial wafer produced therefrom
03/22/2007WO2007032166A1 Deposition preventing plate for film forming apparatus, and film forming apparatus
03/22/2007WO2007032053A1 Reaction gas supply apparatus and semiconductor production apparatus
03/22/2007WO2007011581A8 Improved support structure for radiative heat transfer
03/22/2007WO2007006977A3 Apparatus for the pecvd deposition of an inner barrier layer on a container, comprising an optical plasma analysis device
03/22/2007WO2006127463A3 Method to increase tensile stress of silicon nitride films by using a post pecvd deposition uv cure
03/22/2007WO2006116411A3 System and method for depositing a material on a substrate
03/22/2007WO2006101902A3 Deposition of polymeric materials and precursors therefor
03/22/2007WO2006065740A3 Self-cooling gas delivery apparatus under high vacuum for high density plasma applications
03/22/2007WO2006063855A3 Fine-laminar barrier protection layer
03/22/2007WO2005013331A3 Supercritical fluid-assisted deposition of materials on semiconductor substrates
03/22/2007US20070066038 Fast gas switching plasma processing apparatus
03/22/2007US20070065680 Object with readily cleanable surface and process for the production thereof
03/22/2007US20070065679 Hard, ductile coating system
03/22/2007US20070065678 Electro-static chuck with non-sintered aln and a method of preparing the same
03/22/2007US20070065657 Method and apparatus for preparing alpha-al2o3 nanotemplates
03/22/2007US20070065635 Object with a stratified composite material
03/22/2007US20070065599 Method and apparatus for chemical vapor deposition capable of preventing contamination and enhancing film growth rate
03/22/2007US20070065598 Plasma processing device
03/22/2007US20070065597 Plasma CVD film formation apparatus provided with mask
03/22/2007US20070065596 Plasma thin-film deposition method
03/22/2007US20070065594 System for depositing a film by modulated ion-induced atomic layer deposition (MII-ALD)
03/22/2007US20070065582 Method of coating a substrate for adhesive bonding
03/22/2007US20070065581 Substrate processing system and method
03/22/2007US20070065580 Method for forming transparent thin film, transparent thin film formed by the method and transparent substrate with transparent thin film
03/22/2007US20070065578 Treatment processes for a batch ALD reactor
03/22/2007US20070065577 Directed reagents to improve material uniformity
03/22/2007US20070065576 Technique for atomic layer deposition
03/22/2007US20070065575 Method for in situ photoresist thickness characterization
03/22/2007US20070065571 Method and apparatus for manufacturing a pixel matrix of a color filter for a flat panel display
03/22/2007US20070063590 Process system and device for transporting substrates
03/22/2007US20070063387 Coated cutting tool for turning of steel
03/22/2007US20070063245 Metal plating using seed film
03/22/2007US20070062911 Method and device for supplying at least one machining station for a workpiece
03/22/2007US20070062648 Electrostatic chuck, thin film manufacturing apparatus having the same, thin film manufacturing method, and substrate surface treatment method
03/22/2007US20070062645 Processing apparatus
03/22/2007US20070062465 Methods of operating a liquid vaporizer
03/22/2007US20070062455 Gas driven rotation apparatus and method for forming crystalline layers
03/22/2007US20070062454 Method for dechucking a substrate
03/22/2007US20070062453 Substrate processing method, computer readable recording medium and substrate processing apparatus
03/22/2007US20070062452 Coil and coil support for generating a plasma
03/22/2007US20070062451 Stabilizing system for film deposition
03/22/2007US20070062450 Production apparatus for magnetic recording medium
03/22/2007US20070062449 Enhanced magnetic shielding for plasma-based semiconductor processing tool
03/22/2007US20070062448 CVD apparatus of improved in-plane uniformity
03/22/2007US20070062408 Composition comprising source of deposition ions selected from cobalt and nickel ions, reducing agent for reducing deposition ions onto substrate, and stabilizer comprising molybdenum oxide; for electrolessly depositing cobalt, nickel or alloys thereof onto substrate in manufacture of microelectronics
03/22/2007DE10229642B4 Verfahren zum lokalen Erhitzen eines in einem Halbleitersubstrat angeordneten vergrabenen Bereichs A method for locally heating an object arranged in a semiconductor substrate buried region
03/22/2007DE102006044347A1 Verfahren zum Beschichten eines Substrats zum Kleben A method for coating a substrate for bonding
03/22/2007DE102006027502A1 Verschleißfeste Beschichtung und Verfahren zur Herstellung derselben Wear-resistant coating and method of producing same
03/22/2007DE10151724B4 Verfahren und Vorrichtung zum Korrigieren eines Musterfilms auf einem Halbleitersubstrat Method and apparatus for correcting a pattern film on a semiconductor substrate
03/22/2007CA2622366A1 Method of and apparatus for treating particulate materials for improving the surface characteristics thereof
03/22/2007CA2622273A1 Methods of making shape memory films by chemical vapor deposition and shape memory devices made thereby
03/21/2007EP1764822A2 RF powered plasma enhanced chemical vapour deposition reactor and methods of effecting plasma enhanced chemical vapour deposition
03/21/2007EP1764354A1 Process for preparing high purity zirconium-, hafnium-, tantalum olkoxides
03/21/2007EP1644558A4 High purity electrolytic sulfonic acid solutions
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