| Patents for C23C 16 - Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition (cvd) processes (71,892) |
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| 04/05/2007 | US20070074738 Cleaning method of semiconductor manufacturing apparatus and semiconductor manufacturing apparatus |
| 04/05/2007 | US20070074665 Apparatus temperature control and pattern compensation |
| 04/05/2007 | US20070074664 Plasma CVD apparatus and plasma surface treatment method |
| 04/05/2007 | US20070074663 Batch wafer handling system |
| 04/05/2007 | US20070074662 Plasma processing apparatus for forming film containing carbons on object to be deposited |
| 04/05/2007 | US20070074661 CVD reactor with stabilized process chamber height |
| 04/05/2007 | US20070074660 Thermal processing appratus and thermal processing method |
| 04/05/2007 | US20070074541 Synthesis of germanium sulphide and related compounds |
| 04/05/2007 | DE4430120B4 Verfahren zur Erzeugung eines Dielektrikums A method for producing a dielectric |
| 04/05/2007 | DE19703848B4 Beschichteter Schneideinsatz oder Schneideinsatzrohling und Verfahren zur Herstellung von beschichteten Schneideinsätzen zum Zerspanen Coated cutting insert or cutting insert blank and method for producing coated cutting inserts for machining |
| 04/05/2007 | DE102005046703A1 Hydrogenation of chlorosilane comprises contacting silicon-containing compound and hydrogen with surface of reaction chamber and surface of heater such that silicon carbide coating is formed in situ on the surfaces in first process step |
| 04/05/2007 | DE102005045718A1 Träger für ein Substrat Support for a substrate |
| 04/05/2007 | CA2623650A1 Plasma boriding method |
| 04/04/2007 | EP1770753A2 Actively-cooled distribution plate for reducing reactive gas temperature in a plasma processing system |
| 04/04/2007 | EP1770187A1 Thin film-forming material and method for producing thin film |
| 04/04/2007 | EP1769158A1 Gas abatement |
| 04/04/2007 | EP1769100A1 Dlc hard material coatings on bearing materials containing copper |
| 04/04/2007 | EP1768911A2 Container-treatment machine comprising controlled gripping means for seizing containers by the neck |
| 04/04/2007 | EP1768807A1 Cutting insert provided with structured surfaces |
| 04/04/2007 | EP1691606B1 Antimicrobial composite material |
| 04/04/2007 | EP1444717B1 Tunable multi-zone gas injection system |
| 04/04/2007 | EP1415017B1 Rotating susceptor and method of processing substrates |
| 04/04/2007 | EP1175695A4 Plasma polymerizing apparatus having an electrode with a lot of uniform edges |
| 04/04/2007 | EP0957511B1 Chemical vapor deposition method |
| 04/04/2007 | CN1943019A Substrate processing equipment and semiconductor device manufacturing method |
| 04/04/2007 | CN1943014A Self-cleaning catalyst chemical vapor deposition device and cleaning method therefor |
| 04/04/2007 | CN1943008A Method and apparatus for temperature control |
| 04/04/2007 | CN1942610A Ultrahard diamonds and method of making thereof |
| 04/04/2007 | CN1942604A Inlet system for an MOCVD reactor |
| 04/04/2007 | CN1942603A Method and processing system for controlling a chamber cleaning process |
| 04/04/2007 | CN1942415A Tantalum carbide-covered carbon material and process for producing the same |
| 04/04/2007 | CN1941287A Heat-proof wall, heater keeper tectosome, heating arrangement and substrate processing unit |
| 04/04/2007 | CN1941284A 等离子体处理室 Plasma processing chamber |
| 04/04/2007 | CN1941278A Retainer tectosome, insulation tectosome and heating arrangement of heater |
| 04/04/2007 | CN1940132A Preparation of silicon nitride from aminosilane by PECVD process |
| 04/04/2007 | CN1940131A Production of thin film by chemical gas-phase deposition |
| 04/04/2007 | CN1940130A Production of silicon-nitride layer and self-aligning metal silicide layer |
| 04/04/2007 | CN1940129A High aspect ratio gap fill application using high density plasma chemical vapor deposition |
| 04/04/2007 | CN1939715A Alumina layer with enhanced texture |
| 04/04/2007 | CN1309028C Vertical heat treatment device |
| 04/04/2007 | CN1308483C Thin film-forming apparatus |
| 04/04/2007 | CN1308333C Stabilizers to inhibit the polymerization of substituted cyclotetrasiloxane |
| 04/03/2007 | US7200460 Method of depositing low dielectric constant silicon carbide layers |
| 04/03/2007 | US7199023 Atomic layer deposited HfSiON dielectric films wherein each precursor is independendently pulsed |
| 04/03/2007 | US7198997 Method for producing semiconductor substrate, method for producing field effect transistor, semiconductor substrate, and field effect transistor |
| 04/03/2007 | US7198820 Deposition of carbon- and transition metal-containing thin films |
| 04/03/2007 | US7198815 Tantalum amide complexes for depositing tantalum-containing films, and method of making same |
| 04/03/2007 | US7198699 For coating a substrate (e.g., glass substrate) on both major surfaces/sides |
| 04/03/2007 | US7198678 Apparatus for performing at least one process on a substrate |
| 04/03/2007 | US7198677 Low temperature wafer backside cleaning |
| 04/03/2007 | US7198671 Layered substrates for epitaxial processing, and device |
| 04/03/2007 | US7198580 Playing field obstacle device |
| 04/03/2007 | US7198447 Semiconductor device producing apparatus and producing method of semiconductor device |
| 03/29/2007 | WO2007035460A1 Apparatus and process for surface treatment of substrate using an activated reactive gas |
| 03/29/2007 | WO2007035199A2 Deposition apparatus for the formation of polycrystalline materials on mobile substrates |
| 03/29/2007 | WO2007035182A2 Field enhanced electrodes for additive-injection non-thermal plasma (ntp) processor |
| 03/29/2007 | WO2007034775A1 Clay thin film substrate, clay thin film substrate with electrode, and display using those |
| 03/29/2007 | WO2007034747A1 Plasma processing device |
| 03/29/2007 | WO2007034665A1 Diamond covered substrate, filtration filter, and electrode |
| 03/29/2007 | WO2007034624A1 Method for treating substrate and recording medium |
| 03/29/2007 | WO2007034623A1 Raw material feeding device and film formation system |
| 03/29/2007 | WO2006130298A3 Deposition methods, and deposition apparatuses |
| 03/29/2007 | WO2006085994A3 Multi-component substances and apparatus for preparation thereof |
| 03/29/2007 | WO2005111267A3 Gas distribution member supplying process gas and rf power for plasma processing |
| 03/29/2007 | US20070071908 high-density plasma-chemical vapor deposition of silicon dioxide films over substrates having grooves on the surfaces; concurrent deposition and sputtering by controlling gas flow rates; films having excellent gap-filling; semiconductors |
| 03/29/2007 | US20070071896 Alkyl push flow for vertical flow rotating disk reactors |
| 03/29/2007 | US20070071895 Method for making carbon nanotube-based device |
| 03/29/2007 | US20070071894 Method for atomic layer deposition of materials using a pre-treatment for semiconductor devices |
| 03/29/2007 | US20070071893 Organic aluminum precursor and method of manufacturing a metal wiring using the same |
| 03/29/2007 | US20070071889 Lithographic apparatus and method for conditioning an interior space of a device manufacturing apparatus |
| 03/29/2007 | US20070071883 Method of fabricating organic light emitting display device with passivation structure |
| 03/29/2007 | US20070071880 Radiation resistant silicone formulations and medical devices formed of same |
| 03/29/2007 | US20070071655 Variable exhaust static pressure management apparatus |
| 03/29/2007 | US20070068921 Heater Module for Semiconductor Manufacturing Equipment |
| 03/29/2007 | US20070068628 Vacuum processing apparatus |
| 03/29/2007 | US20070068627 Electrical Open/Short Contact Alignment Structure for Active Region vs. Gate Region |
| 03/29/2007 | US20070068625 Method and system for controlling radical distribution |
| 03/29/2007 | US20070068458 Rapid thermal processing tool |
| 03/29/2007 | US20070068457 Plasma accelerator |
| 03/29/2007 | US20070068456 Monitoring processing of a substrate in a processing chamber |
| 03/29/2007 | US20070068455 Adjustable electrode assembly for use in processing substrates of differing widths in a plasma processing system |
| 03/29/2007 | US20070068454 Jig for manufacturing semiconductor devices and method for manufacturing the jig |
| 03/29/2007 | DE102006040593A1 Einstellbare Elektrodenanordnung zur Verwendung bei der Behandlung von Substraten unterschiedlicher Breite in einem Plasma-Behandlungssystem Adjustable electrode assembly for use in the treatment of substrates of different widths in a plasma treatment system |
| 03/29/2007 | DE102006027501A1 Wear-resistant, electrically insulating coating for machine parts subject to frictional wear, e.g. roller bearings, comprises metal-free amorphous hydrocarbon layer(s) |
| 03/29/2007 | DE102005045582B3 Vorrichtung und Verfahren zur kontinuierlichen Gasphasenabscheidung unter Atmosphärendruck und deren Verwendung Apparatus and process for continuous gas-phase deposition at atmospheric pressure and the use thereof |
| 03/29/2007 | DE102005042754A1 Selective plasma treatment of semiconductor substrate, as pre-treatment prior to of coating or prior to bonding process useful for semiconductor involves dielectric, e.g. glass mask having surface coated with electrically conductive layer |
| 03/29/2007 | DE102004051578B4 Verfahren und Vorrichtung zum Beschichten einer Folie Method and apparatus for coating a film |
| 03/29/2007 | CA2622512A1 Apparatus and process for surface treatment of substrate using an activated reactive gas |
| 03/29/2007 | CA2622429A1 Process for plasma assisted coating a nanocomposite object |
| 03/28/2007 | EP1768184A2 Organic light emitting full color display panel |
| 03/28/2007 | EP1767662A2 Wear resistant coating and process of its manufacture |
| 03/28/2007 | EP1767071A2 Expanded thermal plasma apparatus |
| 03/28/2007 | EP1765834A1 Copper (i) compounds useful as deposition precursors of copper thin films |
| 03/28/2007 | EP1604049B1 Method and apparatus for treating a substrate |
| 03/28/2007 | EP1364076B1 Device and method for supplying a cvd reactor with a liquid starting material entering into a gaseous phase |
| 03/28/2007 | EP1352417B1 Device for the plasma-mediated working of surfaces on planar substrates |
| 03/28/2007 | CN2883399Y Appts. for producing super abrasive durable alloyed layer enriched rare-earth element on metal surface |
| 03/28/2007 | CN1938834A Unit layer posttreating catalytic chemical vapor deposition apparatus and method of film formation therewith |
| 03/28/2007 | CN1938833A Techniques promoting adhesion of porous low k film to underlying barrier layer |
| 03/28/2007 | CN1938832A Method and apparatus for forming metal silicate film, and method for manufacturing semiconductor device |