| Patents for C23C 16 - Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition (cvd) processes (71,892) |
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| 04/12/2007 | WO2006118851A3 Method of making scratch resistant coated glass article including layer(s) resistant to fluoride-based etchant(s) |
| 04/12/2007 | WO2006083363A3 Pentaborane(9) storage and delivery |
| 04/12/2007 | WO2006047207A3 Formation of selenide, sulfide or mixed selenide-sulfide films on metal or metal coated substrates |
| 04/12/2007 | WO2005102019A3 Treatment of fluids and/or sludge with electro plasma |
| 04/12/2007 | US20070082466 High density plasma chemical vapor deposition apparatus, operating method thereof, and method of manufacturing semiconductor device |
| 04/12/2007 | US20070082465 Method of fabricating GaN substrate |
| 04/12/2007 | US20070082132 Method for forming metal wiring structure |
| 04/12/2007 | US20070082130 Method for foming metal wiring structure |
| 04/12/2007 | US20070082129 Metal composite diamond-like carbon (DLC) film, method and apparatus for forming the same, and slide member |
| 04/12/2007 | US20070082128 Method for coating a substrate |
| 04/12/2007 | US20070082124 Methods and equipment for depositing high quality reflective coatings |
| 04/12/2007 | US20070082122 Method of controlling chemical solution applying apparatus, chemical solution applying apparatus, and method of manufacturing semiconductor device |
| 04/12/2007 | US20070080141 Low-voltage inductively coupled source for plasma processing |
| 04/12/2007 | US20070079936 Bonded multi-layer RF window |
| 04/12/2007 | US20070079934 Gas dispersion plate and manufacturing method therefor |
| 04/12/2007 | US20070079849 Integrated chamber cleaning system |
| 04/12/2007 | US20070079761 Heat transfer assembly |
| 04/12/2007 | US20070079760 Vaporizer and semiconductor processing system |
| 04/12/2007 | US20070079759 Ampoule splash guard apparatus |
| 04/12/2007 | US20070079758 Wide range pressure control using turbo pump |
| 04/12/2007 | DE102005048482A1 Method for coating electrically insulating surfaces by CVD or PVD e.g. for materials research, involves forming micro-heating elements on ceramic substrate |
| 04/12/2007 | DE102005042317B3 Layer arrangement production, for use in microelectronic devices, comprises bonding together partial layer systems contacted with oxide layer interfacing with additional nitride layer to ensure high energy bonding |
| 04/12/2007 | CA2622924A1 Corrosion resistant coating based on silicon, carbon, hydrogen and nitrogen |
| 04/11/2007 | EP1772534A2 Tungsten-containing and hafnium-containing precursors for vapor deposition |
| 04/11/2007 | EP1772533A1 Apparatus for coating inner surfaces, retort and method therefor |
| 04/11/2007 | EP1772531A1 Method and apparatus for internal coating. |
| 04/11/2007 | EP1772529A1 Dry chemical composition, use thereof to form a layer system and method for coating |
| 04/11/2007 | EP1772512A2 Sliding structure and sliding method |
| 04/11/2007 | EP1772460A1 Ti, Ta, Hf, Zr and related metal silicon amides for ALD/CVD of metal-silicon nitrides, oxides, oxides or oxynitrides |
| 04/11/2007 | EP1772217A1 Surface coated cutting tool |
| 04/11/2007 | EP1771685A2 System and method for increasing the emissivity of a material |
| 04/11/2007 | EP1771600A2 Vacuum-coating installation and method |
| 04/11/2007 | EP1771599A1 Epitaxial reactor with susceptor controlled positioning |
| 04/11/2007 | EP1771598A2 Vapor deposition systems and methods |
| 04/11/2007 | EP1771597A2 Synthesis of a self assembled hybrid of ultrananocrystalline diamond and carbon nanotubes |
| 04/11/2007 | EP1771596A1 CONDUCTIVE MATERIAL COMPRISING AN Me-DLC HARD MATERIAL COATING |
| 04/11/2007 | EP1771595A1 Copper (ii) complexes for deposition of copper films by atomic layer deposition |
| 04/11/2007 | EP1771594A1 Copper (i) complexes for deposition of copper films by atomic layer deposition |
| 04/11/2007 | EP1771593A1 Machine for the treatment of bottles that are equipped with an interchangeable connection cartridge |
| 04/11/2007 | EP1771258A1 Plasma coating system for coating of substrates |
| 04/11/2007 | CN2888786Y Novel planar linear array radiation heater which can resist active oxygen corrosion |
| 04/11/2007 | CN1947221A Apparatus for controlling gas flow in a semiconductor substrate processing chamber |
| 04/11/2007 | CN1947215A Method and system for control of processing conditions in plasma processing systems |
| 04/11/2007 | CN1946874A Plasma coating system for non-planar substrates |
| 04/11/2007 | CN1946466A Exhaust gas collection device |
| 04/11/2007 | CN1945858A Preparing high conductivity suede non-blended ZnO film by MOCVD method |
| 04/11/2007 | CN1945807A Apparatus for controlling temperature of a substrate |
| 04/11/2007 | CN1945800A Microwave plasma process device, plasma ignition method, plasma forming method, and plasma process method |
| 04/11/2007 | CN1945793A Apparatus and method for treating a substrate with plasma, and facility for manufacturing semiconductor devices |
| 04/11/2007 | CN1944714A Process for the metallic coating of fibres by liquid means |
| 04/11/2007 | CN1310321C Distribution-containing structure and forming method thereof |
| 04/11/2007 | CN1310292C Vacuum processing device |
| 04/11/2007 | CN1310290C Upper electrode and plasma processing device |
| 04/11/2007 | CN1310287C Doped silicon deposition process in resistively heated single wafer chamber |
| 04/11/2007 | CN1309861C Device for supplying gas for epitaxial growth |
| 04/11/2007 | CN1309860C Low-pressure chemical gas phase sedimentation apparatus and thin film producing method |
| 04/11/2007 | CN1309859C Cylinder-based plasma processing system |
| 04/11/2007 | CN1309524C Apparatus and method for controlling temperature uniformity of substrates |
| 04/10/2007 | US7202423 Apparatus for weighing out the remaining quantity of a substance in a storage vessel |
| 04/10/2007 | US7202186 Method of forming uniform ultra-thin oxynitride layers |
| 04/10/2007 | US7202183 Method of filling gaps and methods of depositing materials using high density plasma chemical vapor deposition |
| 04/10/2007 | US7202167 Method of forming a diffusion barrier |
| 04/10/2007 | US7202007 Method of forming patterned films |
| 04/10/2007 | US7201956 cutters composed of tungsten carbide or titanium carbonitride cermets, having hard undercoating layers including titanium or zirconium carbides, nitrides, carbonitride, oxycarbides or oxycarbonitrides and alumina overcoatings |
| 04/10/2007 | US7201943 Methods of forming atomic layers of a material on a substrate by sequentially introducing precursors of the material |
| 04/10/2007 | US7201942 Vapor deposition; controlling temperature |
| 04/10/2007 | US7201937 Methods for forming composite coatings on MEMS devices |
| 04/10/2007 | US7201936 Method of feedback control of sub-atmospheric chemical vapor deposition processes |
| 04/10/2007 | US7201823 High throughput plasma treatment system |
| 04/10/2007 | US7201807 Reacting a metal with one gas; forming oxides; decompsoition with second gas |
| 04/10/2007 | US7201803 Valve control system for atomic layer deposition chamber |
| 04/10/2007 | US7201551 Vacuum processing apparatus and semiconductor manufacturing line using the same |
| 04/10/2007 | US7201174 Silicon oxyfluoride film is formed on a wafer using a plasma vapor deposition method; film remaining inside chamber is cleaned up using a gas containing nitrogen trifluoride |
| 04/05/2007 | WO2007038710A2 Intra-cavity gettering of nitrogen in sic crystal growth |
| 04/05/2007 | WO2007038050A2 Treatment processes for a batch ald reactor |
| 04/05/2007 | WO2007037906A2 Methods for synthesis of metal nanowires |
| 04/05/2007 | WO2007037504A1 Method for producing group 3-5 nitride semiconductor and method for manufacturing light-emitting device |
| 04/05/2007 | WO2007037094A1 Method for manufacturing a semiconductor device with nitride and oxide layers |
| 04/05/2007 | WO2007036997A1 Liquid-material feeder and control method for liquid-material feeder |
| 04/05/2007 | WO2007036544A1 Novel chips for surface plasmon (spr) detection |
| 04/05/2007 | WO2007019435A3 Atomic layer deposition of metal-containing films using surface-activating agents |
| 04/05/2007 | WO2007005832A3 Reliant thermal barrier coating system and related methods and apparatus of making the same |
| 04/05/2007 | WO2006127462A9 Method to increase the compressive stress of pecvd silicon nitride films |
| 04/05/2007 | WO2006118837A3 Method for feeding powdered or granular material |
| 04/05/2007 | WO2006070130A3 Method for preparing nanoparticles of a metal or a metal alloy, dispersed on a substrate, by chemical vapour deposition |
| 04/05/2007 | WO2006060134A3 Restricted radiated heating assembly for high temperature processing |
| 04/05/2007 | US20070078213 Fine particle hard molded bodies for abrasion-resistant polymer matrices |
| 04/05/2007 | US20070077775 Deposition of TiN films in a batch reactor |
| 04/05/2007 | US20070077737 Plasma processing method and plasma processing apparatus |
| 04/05/2007 | US20070077733 Germanium compound delivery device |
| 04/05/2007 | US20070077441 Metal plating using seed film |
| 04/05/2007 | US20070077365 Thin-film forming method, magnetic recording medium manufacturing method, and thin-film forming apparatus |
| 04/05/2007 | US20070077358 Apparatus for depositing an organic layer and method for controlling a heating unit thereof |
| 04/05/2007 | US20070077357 Source for inorganic layer and method for controlling heating source thereof |
| 04/05/2007 | US20070077356 Method for atomic layer deposition of materials using an atmospheric pressure for semiconductor devices |
| 04/05/2007 | US20070077355 Film formation apparatus and methods including temperature and emissivity/pattern compensation |
| 04/05/2007 | US20070077354 Thermal conditioning plate with gas gap leak |
| 04/05/2007 | US20070077353 Plasma-assisted vapor phase treatment of low dielectric constant films using a batch processing system |
| 04/05/2007 | US20070074743 H2 conditioning of chamber following cleaning cycle |
| 04/05/2007 | US20070074739 Cleaning method of treatment equipment and treatment equipment |