| Patents for C23C 16 - Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition (cvd) processes (71,892) |
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| 05/01/2007 | US7211144 Pulsed nucleation deposition of tungsten layers |
| 05/01/2007 | US7210864 Coating and developing apparatus |
| 05/01/2007 | US7210424 High-density plasma processing apparatus |
| 04/26/2007 | WO2007048098A2 Erosion resistant coatings |
| 04/26/2007 | WO2007047888A2 Method and apparatus for converting precursor layers into photovoltaic absorbers |
| 04/26/2007 | WO2007047095A2 Integrated chamber cleaning system |
| 04/26/2007 | WO2007047055A2 Reaction chamber with opposing pockets for gas injection and exhaust |
| 04/26/2007 | WO2007046853A2 Systems for discretized processing of substrate regions |
| 04/26/2007 | WO2007046432A1 Method of forming metal oxide film, metal oxide film and optical electronic device |
| 04/26/2007 | WO2007046414A1 Processing apparatus |
| 04/26/2007 | WO2007046204A1 Substrate treating apparatus, method of substrate treatment, program, and recording medium in which program is recorded |
| 04/26/2007 | WO2007046165A1 Process for producing diamond having structure of acicular projection array disposed on surface thereof, diamond material, electrode and electronic device |
| 04/26/2007 | WO2007045479A1 Hollow sphere with a coating and method and device for the production thereof |
| 04/26/2007 | WO2007045209A1 Method for producing a coated substrate body, substrate body comprising a coating and use of the coated substrate body |
| 04/26/2007 | WO2007022976A3 Method and device for the plasma treatment of the interior of hollow bodies |
| 04/26/2007 | WO2007000255A3 Method for treating plasma and/or covering plasma of workpieces under continuous atmospheric pressure, in particular material plates or strips |
| 04/26/2007 | WO2006101856A3 A plasma enhanced atomic layer deposition system and method |
| 04/26/2007 | WO2006019565A3 Method and system for coating internal surfaces of prefabricated process piping in the field |
| 04/26/2007 | US20070093078 Porous insulating film, method for producing the same, and semiconductor device using the same |
| 04/26/2007 | US20070093018 Dielectric material forming methods and enhanced dielectric materials |
| 04/26/2007 | US20070092751 Plate for housing and/or lids for button cells and process for manufacturing such a plate |
| 04/26/2007 | US20070092740 Metal coatings |
| 04/26/2007 | US20070092734 Method for deposition of titanium oxide by a plasma source |
| 04/26/2007 | US20070092732 Low k dielectric inorganic/organic hybrid films and method of making |
| 04/26/2007 | US20070092657 Spray booth |
| 04/26/2007 | US20070092651 Substrate processing apparatus and substrate processing method |
| 04/26/2007 | US20070092650 Apparatus, method and system for fabricating servo patterns on high density patterned media |
| 04/26/2007 | US20070092649 Functional film and method of pattern formation |
| 04/26/2007 | US20070092648 Chalcogenide solar cells |
| 04/26/2007 | US20070092647 Boron doped diamond |
| 04/26/2007 | US20070092646 Substrate processing apparatus and substrate processing method |
| 04/26/2007 | US20070092645 Delivering particulate material to a vaporization zone |
| 04/26/2007 | US20070092635 Apparatus and method for depositing thin films |
| 04/26/2007 | US20070092431 On a flat surface such as silicon wafer; transferring to polymer film to harvest |
| 04/26/2007 | US20070091535 Temperature controlled semiconductor processing chamber liner |
| 04/26/2007 | US20070090091 chemical, plasma vapor deposition; atomic layer deposition |
| 04/26/2007 | US20070090032 Plasma treatment apparatus |
| 04/26/2007 | US20070089857 Systems for discretized processing of regions of a substrate |
| 04/26/2007 | US20070089852 Heating and cooling apparatus, and vacuum processing apparatus equipped with this apparatus |
| 04/26/2007 | US20070089836 Semiconductor process chamber |
| 04/26/2007 | US20070089835 Method and apparatus for measuring electron density of plasma and plasma processing apparatus |
| 04/26/2007 | US20070089834 Plasma reactor with a multiple zone thermal control feed forward control apparatus |
| 04/26/2007 | US20070089817 Method for providing gas to a processing chamber |
| 04/26/2007 | US20070089676 Arrangement for the vapor deposition on substrates |
| 04/26/2007 | US20070089675 Device for a coating process, a retort, and a process for internal coating |
| 04/26/2007 | US20070089674 Precursor material delivery system with thermal enhancements for atomic layer deposition |
| 04/26/2007 | US20070089670 Substrate-supporting device |
| 04/26/2007 | US20070089669 Apparatus and method for growth of a thin film |
| 04/26/2007 | DE102005060883A1 Vacuum process and assembly to manufacture diamond-coated spheres for ball bearing assembly |
| 04/26/2007 | DE102005051685A1 Werkstück aus einem Siliciumnitridsubstrat sowie Verfahren zu seiner Herstellung Workpiece made of a silicon nitride substrate, and methods for its preparation |
| 04/25/2007 | EP1777731A1 Corrosion resistant multilayer member |
| 04/25/2007 | EP1777325A2 Single crystalline a-plane nitride semiconductor wafer having orientation flat |
| 04/25/2007 | EP1777203A1 Ceramic film and method of manufacturing the same, ferroelectric capacitor, semiconductor device, and other element |
| 04/25/2007 | CN2893917Y Structural component with residues adhering treatment surface and substrate treatment chamber including the same |
| 04/25/2007 | CN1954415A Microcontamination abatement method in semiconductor processing |
| 04/25/2007 | CN1954095A Treating device and heater unit |
| 04/25/2007 | CN1954094A Bubbler for constant vapor delivery of a solid chemical |
| 04/25/2007 | CN1954093A Methods and apparatuses for transferring articles through a load lock chamber under vacuum |
| 04/25/2007 | CN1953953A Metal complex comprising beta-diketonato as ligand |
| 04/25/2007 | CN1953259A Fuel cell component having a durable conductive and hydrophilic coating |
| 04/25/2007 | CN1953229A Germanium-titanium base memory material for phase transition memory and its manufacture method |
| 04/25/2007 | CN1953154A Semiconductor processing |
| 04/25/2007 | CN1953065A Apparatus, method and system for fabricating servo patterns on high density patterned media |
| 04/25/2007 | CN1952211A Heated substrate support and method of fabricating same |
| 04/25/2007 | CN1952210A High-density plasma reinforced chemical vapour deposition and etching device |
| 04/25/2007 | CN1312757C Method for forming film using atomic layer deposition |
| 04/25/2007 | CN1312743C Dielectric film, its formation method, semiconductor device using the dielectric film and its production method |
| 04/25/2007 | CN1312326C Epitaxial silicon wafer free from autodoping and backside halo |
| 04/25/2007 | CN1312319C Transparent conductive film forming method |
| 04/25/2007 | CN1312318C Method of manufacturing inorganic nanotube |
| 04/25/2007 | CN1312033C Method for large-batch preparing overlength carbon nano pipe array and its apparatus |
| 04/24/2007 | US7208787 Semiconductor device and a process for manufacturing a complex oxide film |
| 04/24/2007 | US7208427 Precursor compositions and processes for MOCVD of barrier materials in semiconductor manufacturing |
| 04/24/2007 | US7208425 Method using TEOS ramp-up during TEOS/ozone CVD for improved gap-fill |
| 04/24/2007 | US7208421 Method and apparatus for production of metal film or the like |
| 04/24/2007 | US7208413 Formation of boride barrier layers using chemisorption techniques |
| 04/24/2007 | US7208411 A transfer module, a supercritical processing module, a vacuum module, and a metal deposition module; electrodeposition of metals for semiconductors with a desorb step at nonexcessive temperatures, and a preclean method that uses a chelation compound and an acid or amine |
| 04/24/2007 | US7208198 The barium and strontium are provided during all of the deposit at a constant atomic ratio of Ba and Sr while the flow rate of the oxidizer to the reactor is changed to effect a change in relative atomic concentration of Ba and Sr within the barium strontium titanate dielectric layer produced |
| 04/24/2007 | US7208197 Bringing a copper precursor, in the vapor phase, into contact with a heated support, optionally in the presence of hydrogen, wherein the copper precursor is in the form of copper salt in a liquid organic solvent |
| 04/24/2007 | US7208196 Oxidation of silicon nitride; overcoating metal substrate; high temperature superconductivity |
| 04/24/2007 | US7208195 Providing a vapor including at least one selected vapor phase component into evacuated chamber; condensing vapor onto a heated substrate to form a liquid phase deposit, cooling liquid deposit to form a solid phase film |
| 04/24/2007 | US7208191 Substrate with fullerenes coating |
| 04/24/2007 | US7208067 Method and system for monitoring RF impedance to determine conditions of a wafer on an electrostatic chuck |
| 04/24/2007 | US7208047 Apparatus and method for thermally isolating a heat chamber |
| 04/24/2007 | US7207777 Methods of handling wind turbine blades and mounting said blades on a wind turbine, system and gripping unit for handling a wind turbine blade |
| 04/24/2007 | US7207763 Semiconductor manufacturing system and wafer holder for semiconductor manufacturing system |
| 04/24/2007 | US7207339 Method for cleaning a plasma enhanced CVD chamber |
| 04/19/2007 | WO2007044298A2 Wide range pressure control using turbo pump |
| 04/19/2007 | WO2007044248A2 Low-voltage inductively coupled source for plasma processing |
| 04/19/2007 | WO2007044208A2 Ampoule splash guard apparatus |
| 04/19/2007 | WO2007044205A2 H2 conditioning of chamber following cleaning cycle |
| 04/19/2007 | WO2007043801A1 Partition-type heating apparatus |
| 04/19/2007 | WO2007043528A1 Plasma processing apparatus, plasma processing method and tray |
| 04/19/2007 | WO2007043478A1 Substrate processing apparatus and substrate processing method |
| 04/19/2007 | WO2007042797A1 Positive displacement pumping chamber |
| 04/19/2007 | WO2007042396A1 Device for internal coating, retorts and method of internal coating |
| 04/19/2007 | WO2007042392A1 Dry composition, use of its layer system and coating process |
| 04/19/2007 | WO2007042017A1 Process and device for the plasma treatment of objects |
| 04/19/2007 | WO2007016592A9 Gas manifold valve cluster |
| 04/19/2007 | WO2006096659B1 Method and system for coating sections of internal surfaces |