| Patents for C23C 16 - Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition (cvd) processes (71,892) |
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| 05/16/2007 | EP1784369A1 Selective doping of a material |
| 05/16/2007 | EP1470264A4 Methods for silicon oxide and oxynitride deposition using single wafer low pressure cvd |
| 05/16/2007 | EP1456436B1 Method for producing particles with diamond structure |
| 05/16/2007 | EP1374286B1 Diffuser and rapid cycle chamber |
| 05/16/2007 | CN1965390A Epitaxially growing equipment |
| 05/16/2007 | CN1965104A Expanding thermal plasma deposition system |
| 05/16/2007 | CN1965103A Ultra hydrophilic Ti-O-C based nano film and preparation method thereof |
| 05/16/2007 | CN1965102A Methods for coating a substrate and forming a coloured film and related device |
| 05/16/2007 | CN1964620A Control of steam from solid subliming |
| 05/16/2007 | CN1962936A Method of direct deposition of polycrystalline silicon |
| 05/16/2007 | CN1962935A Process for preparing high-purity compact profile tungsten products |
| 05/16/2007 | CN1962934A Method of fabricating a silicon nitride stack |
| 05/16/2007 | CN1962933A Carbon film coating method and device for quartz crucible for use in crystal growth |
| 05/16/2007 | CN1316567C Preparation of green light gallium nitride base LED epitaxial wafer by adopting multiquantum well |
| 05/16/2007 | CN1316566C Interconnects with improved barrier layer adhesion |
| 05/16/2007 | CN1316546C Method for fault identification in plasma process |
| 05/15/2007 | US7217970 Devices containing platinum-iridium films and methods of preparing such films and devices |
| 05/15/2007 | US7217942 Plasma leak monitoring method, plasma processing apparatus and plasma processing method |
| 05/15/2007 | US7217669 Method of forming a metal oxide film |
| 05/15/2007 | US7217659 Process for producing materials for electronic device |
| 05/15/2007 | US7217617 Methods of forming a capacitor |
| 05/15/2007 | US7217614 Methods to form electronic devices and methods to form a material over a semiconductive substrate |
| 05/15/2007 | US7217398 Deposition reactor with precursor recycle |
| 05/15/2007 | US7217337 Plasma process chamber and system |
| 05/15/2007 | US7217336 Directed gas injection apparatus for semiconductor processing |
| 05/15/2007 | US7217326 Chemical vapor deposition apparatus |
| 05/15/2007 | US7217322 Method of fabricating an epitaxial silicon-germanium layer and an integrated semiconductor device comprising an epitaxial arsenic in-situ doped silicon-germanium layer |
| 05/15/2007 | US7217306 Trap apparatus |
| 05/15/2007 | US7216496 Heating medium circulating device and thermal, treatment equipment using the device |
| 05/10/2007 | WO2007053607A2 Pumping system for atomic layer deposition |
| 05/10/2007 | WO2007053553A2 Method and system for forming a nitrided germanium-containing layer using plasma processing |
| 05/10/2007 | WO2007052860A1 Hollow diamond shells filled compostte materials |
| 05/10/2007 | WO2007051994A2 Nanoparticle and nanocomposite films |
| 05/10/2007 | WO2007051752A1 Dry composition, its use, layer system and coating process |
| 05/10/2007 | WO2007051340A1 Method and device for coating a polymer film with an oxide layer |
| 05/10/2007 | WO2007030258A3 Post deposition plasma treatment to increase tensile stress of a hdp-cvd si 02 layer |
| 05/10/2007 | WO2007019467A3 Semiconductor substrate process using a low temperature-deposited carbon-containing hard mask |
| 05/10/2007 | WO2007016453A3 Systems and methods for capture substrates |
| 05/10/2007 | WO2007001301A3 Atomic layer deposition (ald) system and method |
| 05/10/2007 | US20070105997 Method for improving heat stability of polyparaxylylene and derivative film thereof and polyparaxylylene derivative |
| 05/10/2007 | US20070105402 Film-forming method, method of manufacturing semiconductor device, semiconductor device, method of manufacturing display device, and display device |
| 05/10/2007 | US20070105398 Method of producing insulator thin film, insulator thin film, method of manufacturing semiconductor device, and semiconductor device |
| 05/10/2007 | US20070105377 Fabrication of semiconductor interconnect structure |
| 05/10/2007 | US20070104945 Alumina layer with enhanced texture |
| 05/10/2007 | US20070104891 Process for coating an optical article with an anti-fouling surface coating by vacuum evaporation |
| 05/10/2007 | US20070104890 by evaporation; forming an OLED display device; improves device performance through decrease in contamination and increase the purity |
| 05/10/2007 | US20070104888 Method for the organised growth of nanostructures |
| 05/10/2007 | US20070104871 Apparatus and method for masking and coating tool blades |
| 05/10/2007 | US20070104868 Method and apparatus for manufacturing semiconductor device |
| 05/10/2007 | US20070104867 Apparatus and method for producing carbon film using plasm cvd and carbon film |
| 05/10/2007 | US20070104864 Deposition system using sealed replenishment container |
| 05/10/2007 | US20070104860 Initiated chemical vapor deposition of vinyl polymers for the encapsulation of particles |
| 05/10/2007 | US20070104587 Evacuation apparatus |
| 05/10/2007 | US20070104399 Fabrication of diamond shells |
| 05/10/2007 | US20070102790 Process for deposition of semiconductor films |
| 05/10/2007 | US20070102291 Plasma-enhanced film deposition |
| 05/10/2007 | US20070102290 Novel material development apparatus and novel material development method using arc plasma |
| 05/10/2007 | US20070102119 Plasma processing system and plasma processing method |
| 05/10/2007 | US20070102118 Method and apparatus for controlling temperature of a substrate |
| 05/10/2007 | US20070101940 Vaporizer and semiconductor processing apparatus |
| 05/10/2007 | US20070101939 Deposition systems and susceptor assemblies for depositing a film on a substrate |
| 05/10/2007 | US20070101938 Inductively coupled plasma processing apparatus having internal linear antenna for large area processing |
| 05/10/2007 | US20070101929 Methods for atomic-layer deposition |
| 05/10/2007 | CA2627664A1 Method and device for coating a polymer film with an oxide layer |
| 05/10/2007 | CA2627557A1 Nanoparticle and nanocomposite films |
| 05/09/2007 | EP1783813A1 Frequency based controlling of microwave plasma process |
| 05/09/2007 | EP1783349A1 Piston ring, piston, cylinder and piston pin having amorphous and hard carbon film |
| 05/09/2007 | EP1783243A1 Dry composition, use thereof, coating system and process of coating |
| 05/09/2007 | EP1783234A2 Method for manufacturing products by plastic deformation at high temperatures |
| 05/09/2007 | EP1781837A2 Plasma arc coating system |
| 05/09/2007 | EP1781836A2 Plasma enhanced chemical vapor deposition system for forming carbon nanotubes |
| 05/09/2007 | EP1781835A1 Wear-resistant coating and method for producing the same |
| 05/09/2007 | EP1417158B1 Photoactive coating, coated article, and method of making same |
| 05/09/2007 | CN2898057Y Microwave plasma device for preparing diamond thin-film and etching carbon film |
| 05/09/2007 | CN1961432A Nitride semiconductor element and process for producing the same |
| 05/09/2007 | CN1961418A Method of adhesion improvement for low K dielectrics to conductive materials |
| 05/09/2007 | CN1961405A Method of operating a system for chemical oxide removal |
| 05/09/2007 | CN1961097A Deposition apparatus for providing uniform low-K dielectric |
| 05/09/2007 | CN1961096A Forming high-K dielectric layers on smooth substrates |
| 05/09/2007 | CN1961095A Method and apparatus of depositing low temperature inorganic films on large plastic substrates |
| 05/09/2007 | CN1961093A Method for the production of an ultra barrier layer system |
| 05/09/2007 | CN1958887A Single crystalline A-plane nitride semiconductor wafer having orientation flat |
| 05/09/2007 | CN1958878A Method of using film formation apparatus |
| 05/09/2007 | CN1958846A Method for protecting magnesium alloy |
| 05/09/2007 | CN1958843A System and method for power function ramping of microwave linear discharge sources |
| 05/09/2007 | CN1958842A Method for preparing bilaminar composite film of aluminum / hydrogenized amorphous silicon carbon alloy |
| 05/09/2007 | CN1958841A Growth of very uniform silicon carbide epitaxial layers |
| 05/09/2007 | CN1958840A System and method for modulating power of PECVD discharge source and related function |
| 05/09/2007 | CN1958170A Gas supplying unit and substrate processing apparatus |
| 05/09/2007 | CN1315164C Method for manufacturing semiconductor device |
| 05/09/2007 | CN1314834C Processing system, processing method and mounting member |
| 05/09/2007 | CN1314833C Method for monitoring the course of a process using a reactive gas containing one or several hydrocarbons |
| 05/08/2007 | US7214618 Technique for high efficiency metalorganic chemical vapor deposition |
| 05/08/2007 | US7214408 Producing a hollow or solid carbon fiber with an active surface in a solution or in an atmosphere of a saturated vapor of a solution by heating the solution or a vapor of carbon, oxygen, hydrogen, and sulfur as components |
| 05/08/2007 | US7214406 Low-temperature plasma deposited hydrogenated amorphous germanium carbon abrasion-resistant coatings |
| 05/08/2007 | US7214349 Effluent gas stream treatment system having utility for oxidation treatment of semiconductor manufacturing effluent gases |
| 05/08/2007 | US7214295 Depositing a non-tantalum metal film resistive layer on a thin film resistor substrate; attaching a thin film resistor termination on each end of the metal film resistive layer; and depositing an outer moisture barrier consisting of tantalum pentoxide directly overlaying and contacting the metal film |
| 05/08/2007 | US7214274 Method and apparatus for thermally insulating adjacent temperature controlled processing chambers |
| 05/08/2007 | US7214271 Silicon single crystal wafer process apparatus, silicon single crystal wafer, and manufacturing method of silicon epitaxial wafer |
| 05/08/2007 | CA2303897C Dual face shower head electrode for a magnetron plasma generating apparatus |