Patents for C23C 16 - Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition (cvd) processes (71,892)
05/2007
05/24/2007US20070113779 Nanorods, nanoarrays
05/24/2007DE102005055468A1 Coating one or more substrates comprises supplying gases to process chamber via chambers with gas outlet openings
05/24/2007DE102005055252A1 CVD-Reaktor mit gleitgelagerten Suszeptorhalter CVD reactor with plain bearing susceptor
05/24/2007DE102005055093A1 CVD-Vorrichtung mit elektrostatischem Substratschutz CVD apparatus with electrostatic protection substrate
05/24/2007CA2640777A1 Metal carbonitride layer and method for the production of a metal carbonitride layer
05/23/2007EP1788126A1 Method of manufacturing single crystalline gallium nitride thick film
05/23/2007EP1788124A1 Surface coated cutting tool made of cermet having property-modified alpha type Al2O3 layer of hard coating layer
05/23/2007EP1788123A1 Coated cutting tool insert
05/23/2007EP1788121A2 Barrier coating system for refractory metal core
05/23/2007EP1788120A1 Removal of titanium nitride with xenon difluoride
05/23/2007EP1788119A1 Method for depositing zinc oxide at low temperatures and products formed thereby
05/23/2007EP1788118A2 Thermal chemical vapor deposition of silicon nitride
05/23/2007EP1788117A1 Multilayered boron nitride/silicon nitride coatings
05/23/2007EP1788116A1 A method for thin film vapor deposition of dialkyl amido dihydro aluminium compound
05/23/2007EP1788115A1 Method for enhancing adhesion of thin film
05/23/2007EP1788109A1 Selective aluminide coating process
05/23/2007EP1787796A1 Gas barrier multilayer film and method for producing same
05/23/2007EP1786950A2 Device for introducing precursors into an enclosure, in a pulsed mode with measurement and control of the flow rate
05/23/2007EP1786949A1 Cleaning process and operating process for a cvd reactor
05/23/2007EP1786740A1 Nanostructured coatings and related methods
05/23/2007EP1297396B1 Flow control of process gas in semiconductor manufacturing
05/23/2007CN2903096Y Geseous phase penetration/deposition apparatus of carbonyl metal compound
05/23/2007CN2903095Y Carbon tube type multiple material post large gas phase deposition furnace for mfg. airplane carbon braking disc
05/23/2007CN1969378A Plasma processing system
05/23/2007CN1969375A Film forming apparatus and gasifier
05/23/2007CN1969059A Substrate processing method and substrate processing apparatus
05/23/2007CN1969058A 碳膜 Carbon
05/23/2007CN1968905A Photocatalytic substrate active under a visible light
05/23/2007CN1966762A Carburetor, various types of devices using the carburetor, and method of vaporization
05/23/2007CN1966761A Method for adding rare earth into rare earth modified coating in ion plating
05/23/2007CN1966760A Surface treating process for heat radiator
05/23/2007CN1966397A Gas phase self-assembled growth silicon quantum torus nano structure preparation method
05/23/2007CN1317423C Method and device for atmospheric plasma processing
05/23/2007CN1317422C Plasma reinforced chemical vapor deposition apparatus for transparent conductive film
05/23/2007CN1317421C Coatings with low permeation of gases and vapors
05/23/2007CN1317286C Novel organometallic iridium compound, process of producing the same, and process of producing thin film
05/22/2007US7220687 Method to improve water-barrier performance by changing film surface morphology
05/22/2007US7220673 Method for depositing tungsten-containing layers by vapor deposition techniques
05/22/2007US7220670 Method of producing rough polysilicon by the use of pulsed plasma chemical vapor deposition and products produced by same
05/22/2007US7220669 Thin films for magnetic device
05/22/2007US7220609 Method of manufacturing a semiconductor structure comprising clusters and/or nanocrystal of silicon and a semiconductor structure of this kind
05/22/2007US7220604 Method and apparatus for repairing shape, and method for manufacturing semiconductor device using those
05/22/2007US7220497 plasma-exposed components of such apparatuses are erosion and corrosion resistant to such gases and plasma
05/22/2007US7220462 a plasma medium is injected between barrier electrodes to prevent the ingress of air during treatment of the substrate; motion of the substrate tends to entrain air into the electrode assembly
05/22/2007US7220461 forming by chemical vapor deposition; reforming film using oxidizing gases and reducing gases
05/22/2007US7220460 Thin film forming method, optical film, polarizing film and image display method
05/22/2007US7220451 Process for producing metal thin films by ALD
05/22/2007US7220450 Process for coating substrates using vapour deposition
05/22/2007US7220347 Electrolytic copper plating bath and plating process therewith
05/22/2007US7220320 Systems for producing semiconductors and members therefor
05/22/2007US7220319 Electrostatic chucking stage and substrate processing apparatus
05/22/2007US7220318 Semiconductor device manufacturing apparatus and semiconductor device manufacturing method
05/22/2007US7220312 Methods for treating semiconductor substrates
05/22/2007US7219692 Apparatus for conditioning the atmosphere in a chamber
05/22/2007CA2294715C Apparatus and method for nucleation and deposition of diamond using hot-filament dc plasma
05/18/2007WO2007056249A1 Dual mode ion source for ion implantation
05/18/2007WO2007055744A2 Methods for growing and harvesting carbon nanotubes
05/18/2007WO2007055185A1 Shower plate and plasma treatment apparatus using shower plate
05/18/2007WO2007055140A1 Titanium complexes, process for production thereof, titanium -containing thin films, and method for formation thereof
05/18/2007WO2007055138A1 Substrate processing apparatus
05/18/2007WO2007055031A1 Method of forming film with use of cvd apparatus and mask for masking
05/18/2007WO2007055030A1 Method of forming film with use of cvd apparatus and mask for masking
05/18/2007WO2007053913A1 Protective coating for casting moulds
05/18/2007WO2007021385A3 SEQUENTIAL DEPOSITION PROCESS FOR FORMING Si-CONTAINING FILMS
05/18/2007WO2007005088A3 Vaporizable metalorganic compounds for deposition of metals and metal-containing thin films
05/18/2007WO2006130298B1 Deposition methods, and deposition apparatuses
05/18/2007WO2006117630A3 Method for manufacturing a leaflet for heart valve prostheses
05/17/2007US20070111806 Counter track joint with track turning point
05/17/2007US20070111618 Method of rational large volume CVD production
05/17/2007US20070111549 Laser irradiation apparatus
05/17/2007US20070111367 Method and apparatus for converting precursor layers into photovoltaic absorbers
05/17/2007US20070111339 Apparatus for processing a substrate
05/17/2007US20070110975 Carrier for receiving an object and method for the production of a carrier
05/17/2007US20070110971 Carbon nanotube growth method
05/17/2007US20070110920 Method of forming vertical inorganic alignment layer and liquid crystal display apparatus having the same
05/17/2007US20070110918 improved chemical vapor deposition process which can suppress the backward flow of the deposition material gas, such as monosilane gas
05/17/2007US20070110913 coating fiber with barrier-forming material that creates diffusion barrier with metal; coating barrier-forming material with first compound that is wettable by metal; coating first compound with second compound that is wettable by metal, and coating second compound with metal through liquid metal bath
05/17/2007US20070110899 Evaporating cesium, rubinium, tungsten or gallium through a shadow mask onto a surface to define an area of coverage, then depositing a covering material greater than the area of the reactive material, to enclose the reactive material coated on the substrate
05/17/2007US20070110898 Method and apparatus for providing precursor gas to a processing chamber
05/17/2007US20070110897 Layer with controlled grain size and morphology for enhanced wear resistance
05/17/2007US20070110895 Rotor receives semiconductor wafers; tilting rim; centrifuging; microelectronics
05/17/2007US20070110892 Method of operating vacuum deposition apparatus and vacuum deposition apparatus
05/17/2007US20070108593 Zeolite sol and method for preparing the same, composition for forming porous film, porous film and method for forming the same, interlevel insulator film, and semiconductor device
05/17/2007US20070108166 Thermal flux processing by scanning a focused line beam
05/17/2007US20070108161 Chamber components with polymer coatings and methods of manufacture
05/17/2007US20070108063 Layer forming method, layer forming apparatus, workpiece processing apparatus, interconnect forming method, and substrate interconnect structure
05/17/2007US20070107846 Method and apparatus for an improved baffle plate in a plasma processing system
05/17/2007US20070107845 Semiconductor processing system
05/17/2007US20070107843 Plasma processing apparatus
05/17/2007US20070107750 Method of using NF3 for removing surface deposits from the interior of chemical vapor deposition chambers
05/17/2007US20070107661 Methods, systems, and apparatus for uniform chemical-vapor depositions
05/17/2007US20070107660 Heated gas box for PECVD applications
05/17/2007US20070107654 High-purity crystal growth
05/17/2007US20070107653 Vapor phase growth apparatus and method of fabricating epitaxial wafer
05/16/2007EP1786029A1 Plasma film-forming method and apparatus therefor
05/16/2007EP1785512A1 Silicon carbide single crystal wafer and method for manufacturing the same
05/16/2007EP1785506A1 Protective coating for casting moulds
05/16/2007EP1785449A2 Aliphatic polyester film and gas barrier film
05/16/2007EP1785266A1 Gas barrier multilayer body and method for producing same
05/16/2007EP1784524A2 Layered composite comprising cubic boron nitride