| Patents for C23C 16 - Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition (cvd) processes (71,892) |
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| 05/31/2007 | DE102005056536A1 Chemical vapor deposition reactor for production of semiconductor devices has encapsulated electrical resistance heater |
| 05/31/2007 | DE102005056323A1 Device for simultaneously depositing layers on a number of substrates comprises process chambers arranged in a modular manner in a reactor housing |
| 05/31/2007 | DE102004028369B4 Verfahren und Vorrichtung zum Behandeln von Substraten in einer Rundläuferanlage Method and apparatus for treating substrates in a rotary system |
| 05/30/2007 | EP1790759A1 NITRIDE SEMICONDUCTOR SINGLE CRYSTAL INCLUDING Ga, METHOD FOR MANUFACTURING THE SAME, AND SUBSTRATE AND DEVICE USING THE CRYSTAL |
| 05/30/2007 | EP1790758A1 Atomic layer deposition (ald) method for producing a high quality layer |
| 05/30/2007 | EP1790757A1 Susceptor |
| 05/30/2007 | EP1790224A1 Antimicrobial layered material |
| 05/30/2007 | EP1789689A2 Carbon and metal nanomaterial composition and synthesis |
| 05/30/2007 | EP1789607A2 Cutting tool with oxide coating |
| 05/30/2007 | EP1789605A2 Plasma uniformity control by gas diffuser curvature |
| 05/30/2007 | EP1789604A2 Adhesion layer for thin film transistors |
| 05/30/2007 | EP1789603A1 Metal product, method of manufacturing a metal product and use thereof |
| 05/30/2007 | EP1660238A4 Metalorganic chemical vapor deposition (mocvd) process and apparatus to produce multi-layer high-temperature superconducting (hts) coated tape |
| 05/30/2007 | EP1593147B1 Purged heater-susceptor for an ald/cvd reactor |
| 05/30/2007 | EP1309733B1 Chromium-containing cemented carbide body having a surface zone of binder enrichment |
| 05/30/2007 | EP1307340A4 Reduced grain boundary crystalline thin films |
| 05/30/2007 | EP1214732B1 Semiconductor processing equipment having radiant heated ceramic liner |
| 05/30/2007 | EP1073779A4 Reduced impedance chamber |
| 05/30/2007 | CN1973356A Use of an active wafer temperature control independent from wafer emissivity |
| 05/30/2007 | CN1973061A Improvement of water-barrier performance of an encapsulating film |
| 05/30/2007 | CN1973060A Machine for the treatment of bottles that are equipped with an interchangeable connection cartridge |
| 05/30/2007 | CN1973059A Vacuum film forming apparatus |
| 05/30/2007 | CN1972879A Selective doping of a material |
| 05/30/2007 | CN1971840A Film formation apparatus and method of using the same |
| 05/30/2007 | CN1970834A Film structure, its removing method, and method for testing semiconductor machine |
| 05/30/2007 | CN1970833A Method for deposition of CIGS solar battery window layer |
| 05/30/2007 | CN1970832A Selective aluminide coating process |
| 05/30/2007 | CN1970831A Chemical vapour deposition device |
| 05/30/2007 | CN1970564A Precursor, thin layer prepared including the precursor, method of preparing the thin layer and phase-change memory device |
| 05/30/2007 | CN1319355C Inner noise immunizing data communication scheme |
| 05/30/2007 | CN1319146C Integration of ald tantalum nitride and alpha-phase tantalum for copper metallization application |
| 05/30/2007 | CN1319134C Method of selective deposition of a barrier layer on a dielectric material |
| 05/30/2007 | CN1319126C Nozzle of CVD equipment for mfg of semiconductor device |
| 05/30/2007 | CN1319125C Deposition method of insulating layers having low dielectric constant of semiconductor device |
| 05/30/2007 | CN1318780C Chain driving system |
| 05/30/2007 | CN1318643C Deposited film forming method and apparatus |
| 05/29/2007 | US7224532 Comprising tetramantane, pentamantane, hexamantane, heptamantane, octamantane, nonamantane, decamantane, undecamantane, and/or heterodiamondoid; nucleated vapor deposited films; solid state dye or semiconductor lasers, light emitting diodes, solar cells, lenses, mirrors, antireflection coatings, windows |
| 05/29/2007 | US7223702 Method of and apparatus for performing sequential processes requiring different amounts of time in the manufacturing of semiconductor devices |
| 05/29/2007 | US7223701 In-situ sequential high density plasma deposition and etch processing for gap fill |
| 05/29/2007 | US7223676 Very low temperature CVD process with independently variable conformality, stress and composition of the CVD layer |
| 05/29/2007 | US7223627 Memory element and its method of formation |
| 05/29/2007 | US7223448 Methods for providing uniformity in plasma-assisted material processes |
| 05/29/2007 | US7223446 Plasma CVD apparatus and dry cleaning method of the same |
| 05/29/2007 | US7223442 Method for producing a conducting doped diamond-like nanocomposite film and a conducting doped diamond-like nanocomposite film |
| 05/29/2007 | US7223441 Method for depositing gallium oxide coatings on flat glass |
| 05/29/2007 | US7223321 Faraday shield disposed within an inductively coupled plasma etching apparatus |
| 05/29/2007 | US7223308 Apparatus to improve wafer temperature uniformity for face-up wet processing |
| 05/28/2007 | CA2568449A1 Duplex gas phase coating |
| 05/24/2007 | WO2007059140A1 Method of removing surface deposits from reaction chambers using nf3 |
| 05/24/2007 | WO2007058720A1 Method for fabricating controlled stress silicon nitride films |
| 05/24/2007 | WO2007058365A1 Composition for chemical vapor deposition film-formation and method for production of low dielectric constant film |
| 05/24/2007 | WO2007058120A1 Process for producing semiconductor device and substrate treatment apparatus |
| 05/24/2007 | WO2007057631A2 Improved bubbler for the transportation of substances by a carrier gas |
| 05/24/2007 | WO2007057519A1 Ald reactor |
| 05/24/2007 | WO2007057518A1 Arrangement in connection with ald reactor |
| 05/24/2007 | WO2007057478A1 Part having an outer polymer surface with a metallic finish, production method thereof and use of same |
| 05/24/2007 | WO2007057443A1 Cvd reactor with slidingly mounted susceptor holder |
| 05/24/2007 | WO2007056785A1 Metal carbonitride layer and method for the production of a metal carbonitride layer |
| 05/24/2007 | WO2007056779A1 Coated hard metal member |
| 05/24/2007 | WO2007037504A9 Method for producing group 3-5 nitride semiconductor and method for manufacturing light-emitting device |
| 05/24/2007 | WO2007036639A3 Method for preparing an oriented and nanostructured surface of a polymer |
| 05/24/2007 | WO2007035741A3 Process for plasma assisted coating a nanocomposite object |
| 05/24/2007 | WO2007018757A3 Glazing system for vehicle tops and windows |
| 05/24/2007 | WO2007008726A3 Use of surfactants to control unintentional dopant in semiconductors |
| 05/24/2007 | WO2007005832A9 Reliant thermal barrier coating system and related methods and apparatus of making the same |
| 05/24/2007 | WO2007000556A3 Composite films based on metal and on oxide for antimicrobial applications and method for protecting or decontaminating a substrate by using films of this type |
| 05/24/2007 | WO2006060134A8 Restricted radiated heating assembly for high temperature processing |
| 05/24/2007 | WO2005067423A3 Disposition source using pellets for making oleds |
| 05/24/2007 | US20070117385 Tantalum amide complexes for depositing tantalum-containing films, and method of making same |
| 05/24/2007 | US20070117384 Chemical vapor deposition metallization processes and chemical vapor deposition apparatus used therein |
| 05/24/2007 | US20070117383 Precursor material delivery system with staging volume for atomic layer deposition |
| 05/24/2007 | US20070117363 Barrier metal film production apparatus, barrier metal film production method, metal film production method, and metal film production apparatus |
| 05/24/2007 | US20070117356 Method of manufacturing single crystalline gallium nitride thick film |
| 05/24/2007 | US20070117309 Method for fabricating capacitor in semiconductor device |
| 05/24/2007 | US20070117290 Method of manufacturing a low temperature polysilicon film |
| 05/24/2007 | US20070116986 Method for depositing zinc oxide at low temperatures and products formed thereby |
| 05/24/2007 | US20070116893 Low-hydrogen photovoltaic cell |
| 05/24/2007 | US20070116892 treating a photovoltaic precursor with a vaporous element, for example, selenium or sulfur, to produce thin film CIGS or CIGSS solar cells |
| 05/24/2007 | US20070116891 Plasma brush apparatus and method |
| 05/24/2007 | US20070116888 Method and system for performing different deposition processes within a single chamber |
| 05/24/2007 | US20070116887 Method and system for performing plasma enhanced atomic layer deposition |
| 05/24/2007 | US20070116877 Using a droplet discharge method; useful for formation of fine wiring patterns, such as those used in semiconductor integrated circuits |
| 05/24/2007 | US20070116876 Copper (i) compounds useful as deposition precursors of copper thin films |
| 05/24/2007 | US20070116875 Strip process for superalloys |
| 05/24/2007 | US20070116874 Flowing an aluminide gas into the interior passages of turbine engine component to coat and exiting openings to external surfaces; flowing a gas selected from argon, hydrogen,and/or inert gases, over the external surfaces to minimize build-up of an aluminide coating on the exterior |
| 05/24/2007 | US20070116873 Apparatus for thermal and plasma enhanced vapor deposition and method of operating |
| 05/24/2007 | US20070116872 Apparatus for thermal and plasma enhanced vapor deposition and method of operating |
| 05/24/2007 | US20070116622 Increased stability low concentration gases, products comprising same, and methods of making same |
| 05/24/2007 | US20070116443 Led heat lamp arrays for cvd heating |
| 05/24/2007 | US20070114214 Scanning laser light source |
| 05/24/2007 | US20070113981 Etch system with integrated inductive coupling |
| 05/24/2007 | US20070113979 Slotted Electrostatic Shield Modification for Improved Etch and CVD Process Uniformity |
| 05/24/2007 | US20070113978 Plasma processing apparatus and method |
| 05/24/2007 | US20070113975 Plasma reaction chamber assemblies |
| 05/24/2007 | US20070113789 Method and system for depositing material on a substrate using a solid precursor |
| 05/24/2007 | US20070113788 Plasma processing equipment |
| 05/24/2007 | US20070113787 Plasma process apparatus |
| 05/24/2007 | US20070113786 Radio frequency grounding rod |
| 05/24/2007 | US20070113785 Radio frequency grounding apparatus |
| 05/24/2007 | US20070113784 Vacuum metallization device with means to create metal-free areas |