| Patents for C23C 16 - Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition (cvd) processes (71,892) |
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| 06/07/2007 | WO2006055937A3 Systems and methods for achieving isothermal batch processing of substrates used for the production of micro-electro-mechanical systems |
| 06/07/2007 | US20070128885 Method for fabricating a semiconductor device |
| 06/07/2007 | US20070128880 Process and apparatus for forming oxide film, and electronic device material |
| 06/07/2007 | US20070128878 Substrate processing apparatus and method for producing a semiconductor device |
| 06/07/2007 | US20070128866 Apparatus for fabricating tungsten contacts with tungsten nitride barrier layers in semiconductor devices |
| 06/07/2007 | US20070128863 Apparatus and process for plasma-enhanced atomic layer deposition |
| 06/07/2007 | US20070128861 CVD apparatus for depositing polysilicon |
| 06/07/2007 | US20070128860 Method and apparatus for improving breakdown voltage of integrated circuits formed using a dielectric layer process |
| 06/07/2007 | US20070128859 Combined Stepper And Deposition Tool |
| 06/07/2007 | US20070128458 Protection of metallic surfaces against thermally-inducted wrinkling (rumpling) |
| 06/07/2007 | US20070128441 Process for the production of strongly adherent coatings |
| 06/07/2007 | US20070128375 Method and device for continuously treating the surface of an elongate object |
| 06/07/2007 | US20070128361 Cd1-xZnxS high performance TCR material for uncooled microbolometers used in infrared sensors and method of making same |
| 06/07/2007 | US20070128360 Bond coat with low deposited aluminum level and method therefore |
| 06/07/2007 | US20070128359 Production apparatus for producing gallium nitride film semiconductor and cleaning apparatus for exhaust gas |
| 06/07/2007 | US20070128358 Chemical vapour deposition apparatus |
| 06/07/2007 | US20070128357 Lift-off patterning processes employing energetically-stimulated local removal of solid-condensed-gas layers |
| 06/07/2007 | US20070128345 Method and apparatus for manufacturing a display, such as, for instance, a polymer oled display, a display and a substrate for use in the method |
| 06/07/2007 | US20070128344 Monitor system for coating apparatus |
| 06/07/2007 | US20070125494 Method and apparatus for an improved bellows shield in a plasma processing system |
| 06/07/2007 | US20070125304 Transport rollers |
| 06/07/2007 | US20070125303 High-throughput deposition system for oxide thin film growth by reactive coevaportation |
| 06/07/2007 | CA2631248A1 Uniform surfaces for hybrid material substrates and methods for making and using same |
| 06/06/2007 | EP1792907A1 Volatile metal beta-ketoiminate complexes |
| 06/06/2007 | EP1792906A1 Volatile metal beta-ketoiminate complexes |
| 06/06/2007 | EP1792726A1 Transparent gas barrier film |
| 06/06/2007 | EP1792691A1 Method for manufacturing surface-coated cutting insert |
| 06/06/2007 | EP1792334A1 A method of evaluating characteristics of and forming of an insulating film for a semiconductor device |
| 06/06/2007 | EP1791988A2 Atomic layer deposition of copper using surface-activating agents |
| 06/06/2007 | DE10348281B4 Vakuum-Behandlungsanlage für ebene rechteckige oder quadratische Substrate Vacuum treatment installation for flat rectangular or square substrates |
| 06/06/2007 | DE102005056324A1 CVD-Reaktor mit auswechselbarer Prozesskammerdecke CVD reactor with exchangeable process chamber ceiling |
| 06/06/2007 | DE102005056322A1 Apparatus for depositing a film on a substrate, especially for semiconductor production, comprises a process chamber that contains a substrate holder and is supplied with process gases through coaxial inlet ports |
| 06/06/2007 | DE102005056320A1 CVD-Reaktor mit einem Gaseinlassorgan CVD reactor with a gas inlet member |
| 06/06/2007 | DE102005052408B3 Coating method for coating of surface, involves application of low-energy undercoating on surface which is to be coated and subsequently applying of layer containing or consisting of cross-linkable substance |
| 06/06/2007 | CN1977068A Showerhead electrode assembly for plasma processing apparatuses |
| 06/06/2007 | CN1976880A Method for producing a hydrophobic coating, device for implementing said method and support provided with a hydrophobic coating |
| 06/06/2007 | CN1975986A Filming method and device |
| 06/06/2007 | CN1975214A Sliding member and production process thereof |
| 06/06/2007 | CN1974839A Prepn process of porous SiO2 film |
| 06/06/2007 | CN1974664A Metallically coated light-reflecting components based on thermoplastic molding compounds |
| 06/06/2007 | CN1320604C Boat for heat treatment and vertical heat treatment equipment |
| 06/06/2007 | CN1320523C Formation of a corrosion resistant layer on metallic thin films by nitrogen exposure |
| 06/06/2007 | CN1320174C Susceptor with epitaxial growth control devices and epitaxial reactor using the same |
| 06/06/2007 | CN1320158C Process for high concentration plasma chemical vapour phase deposition by multi-step deposition |
| 06/06/2007 | CN1320157C Chemical vapor deposition method of integrating heating and depositing of silicon slices |
| 06/06/2007 | CN1319711C Honeycomb structural body forming ferrule, and method of manufacturing ferrule |
| 06/06/2007 | CN1319689C Surface-coated cutting tool |
| 06/05/2007 | US7227244 Integrated low k dielectrics and etch stops |
| 06/05/2007 | US7226876 Method of modifying interlayer adhesion |
| 06/05/2007 | US7226861 Methods and apparatus for forming rhodium-containing layers |
| 06/05/2007 | US7226795 Semiconductor-ferroelectric storage devices and processes for producing the same |
| 06/05/2007 | US7226670 Uniform thickness; milling tools; injection molding dies |
| 06/05/2007 | US7226640 Decomposing an iridium precursor, especially a Lewis base stabilized Ir(I) B-diketonates, in an oxidizing atmosphere |
| 06/05/2007 | US7226524 Plasma processing apparatus |
| 06/05/2007 | US7225820 High-pressure processing chamber for a semiconductor wafer |
| 06/05/2007 | US7225754 Plasma processing apparatus including a plurality of plasma processing units having reduced variation |
| 06/05/2007 | CA2378915C Method for fabricating ceramic matrix composite |
| 06/05/2007 | CA2258080C Nitride semiconductor growth method, nitride semiconductor substrate, and nitride semiconductor device |
| 05/31/2007 | WO2007062242A2 High stability and high capacity precursor vapor generation for thin film deposition |
| 05/31/2007 | WO2007061980A1 Deposition of ruthenium oxide coatings on a substrate |
| 05/31/2007 | WO2007061633A2 Method and system for performing plasma enhanced atomic layer deposition |
| 05/31/2007 | WO2007061579A2 Chamber components with polymer coatings and methods of manufacture |
| 05/31/2007 | WO2007060876A1 Plasma processing apparatus and plasma processing method |
| 05/31/2007 | WO2007060807A1 Diamond electrode, method for producing same, and electrolytic bath |
| 05/31/2007 | WO2007060806A1 Method for producing epitaxial wafer and epitaxial wafer |
| 05/31/2007 | WO2007060295A1 Method for preventing metal leaching from copper and its alloys |
| 05/31/2007 | WO2007060179A1 Method of manufacturing porous dielectric films having a very low permittivity |
| 05/31/2007 | WO2007060161A1 Cvd reactor with a gas inlet member |
| 05/31/2007 | WO2007060159A1 Method for depositing layers in a cvd reactor and gas inlet element for a cvd reactor |
| 05/31/2007 | WO2007060143A1 Cvd reactor with replaceable process chamber cover |
| 05/31/2007 | WO2007019495A3 Chemical vapor deposition of hydrogel films |
| 05/31/2007 | WO2006127894A3 Deposition of tensile and compressive stressed materials |
| 05/31/2007 | WO2006057709A8 Method for deposition of metal layers from metal carbonyl precursors |
| 05/31/2007 | WO2006047305A3 Substrate-to-mask alignment and securing system |
| 05/31/2007 | WO2006001818A3 System and method for increasing the emissivity of a material |
| 05/31/2007 | WO2005112101A3 Organometallic precursor compounds |
| 05/31/2007 | US20070123060 Method for the deposition of a film by CVD or ALD |
| 05/31/2007 | US20070123041 Apparatus and method for surface processing such as plasma processing |
| 05/31/2007 | US20070123007 Film-forming method and film-forming equipment |
| 05/31/2007 | US20070123005 Film formation apparatus, method for forming film, and method for manufacturing photoelectric conversion device |
| 05/31/2007 | US20070122989 Epitaxial and polycrystalline growth of si1-x-ygexcy and si1-ycy alloy layers on si by uhv-cvd |
| 05/31/2007 | US20070122947 Metal compound, material for thin film formation, and process of forming thin film |
| 05/31/2007 | US20070122621 Method of producing a layer arrangement, method of producing an electrical component, layer arrangement, and electrical component |
| 05/31/2007 | US20070122564 Method and apparatus for growing a composite metal sulphide photocatalyst thin film |
| 05/31/2007 | US20070122544 Method of stabilizing storage phosphor panels |
| 05/31/2007 | US20070122541 Method for preparation of bioactive ceramic-coated composite |
| 05/31/2007 | US20070122323 Vapor phase growth apparatus and method of fabricating epitaxial wafer |
| 05/31/2007 | US20070120275 High stability and high capacity precursor vapor generation for thin film deposition |
| 05/31/2007 | US20070119849 Heater and vapor deposition source having the same |
| 05/31/2007 | US20070119377 Barrier coating for vitreous materials |
| 05/31/2007 | US20070119376 Matching device and plasma processing apparatus |
| 05/31/2007 | US20070119375 Dual large area plasma processing system |
| 05/31/2007 | US20070119374 Device for the zonal surface treatment of an article by dielectric barrier discharge |
| 05/31/2007 | US20070119373 Chemical vapor deposition chamber with dual frequency bias and method for manufacturing a photomask using the same |
| 05/31/2007 | US20070119372 Method and apparatus for controlling the length of a carbon nanotube |
| 05/31/2007 | US20070119371 Apparatus and process for plasma-enhanced atomic layer deposition |
| 05/31/2007 | US20070119370 Apparatus and process for plasma-enhanced atomic layer deposition |
| 05/31/2007 | US20070119369 Method for producing reactive intermediates for transport polymerization |
| 05/31/2007 | US20070119367 Method for producing silicon epitaxial wafer and silicon epitaxial wafer |
| 05/31/2007 | US20070119343 Complex metal oxide raw material composition |