Patents for C23C 16 - Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition (cvd) processes (71,892)
06/2007
06/19/2007US7232689 Adding a calibrant to an extraction phase prior to contact of extraction phase with sample, making contact between extraction phase and said sample for a predetermined extraction time, terminating contact and determining concentration of component using amounts of calibrant lost from extraction phase
06/19/2007US7232603 Cemented carbide body and a coating of WC and a highly W-alloyed binder phase; milling rolled low alloyed steel at low and at moderate cutting speeds
06/19/2007US7232591 Method of using an adhesive for temperature control during plasma processing
06/19/2007US7232588 Device and method for vaporizing temperature sensitive materials
06/19/2007US7232506 System and method for feedforward control in thin film coating processes
06/19/2007US7232502 Sheet-fed treating device
06/19/2007US7232492 Method of forming thin film for improved productivity
06/19/2007US7232286 Seal device and method for operating the same and substrate processing apparatus comprising a vacuum chamber
06/14/2007WO2007066546A1 Hafnium compound, hafnium thin film-forming material and method for forming hafnium thin film
06/14/2007WO2007066472A1 Gas head and thin-film production apparatus
06/14/2007WO2007065951A1 Sealing device
06/14/2007WO2007033832A3 Device and method for continuous chemical vapour deposition under atmospheric pressure and use thereof
06/14/2007WO2006100260A3 Surface treatment
06/14/2007WO2006025968A3 Multiple gas injection system for charged particle beam instruments
06/14/2007US20070134932 Methods of forming metal layers in the fabrication of semiconductor devices
06/14/2007US20070134895 Nitriding method of gate oxide film
06/14/2007US20070134821 Cluster tool for advanced front-end processing
06/14/2007US20070134816 Atomic layer deposition using electron bombardment
06/14/2007US20070134517 Coated cutting tool insert
06/14/2007US20070134435 Method to improve the ashing/wet etch damage resistance and integration stability of low dielectric constant films
06/14/2007US20070134433 Methods for producing silicon nitride films and silicon oxynitride films by thermal chemical vapor deposition
06/14/2007US20070134426 Vacuum evaporation deposition method of the winding type and vacuum evaporation deposition apparatus of the same
06/14/2007US20070134419 Density-matching alkyl push flow for vertical flow rotating disk reactors
06/14/2007US20070134418 Method for depositing an aluminum-containing layer onto an article
06/14/2007US20070134417 decomposing the precursor of indium, and chemical vapor depositing iridium on the substrate in an oxidizing ambient environment which contain an oxidizing gas such as oxygen, ozone, air, and nitrogen oxide; precursors include Lewis base stabilized Ir(I) beta -diketonates
06/14/2007US20070134416 Cleaning method used in removing contaminants from the surface of an oxide or fluoride comprising a group III B metal
06/14/2007US20070134415 Oxidation Treatment Apparatus and Method
06/14/2007US20070134414 Surface-treatment method and equipment
06/14/2007US20070134413 Vapor deposition method and vapor deposition apparatus
06/14/2007US20070134405 Method of manufacturing organic light emitting device and vapor deposition system
06/14/2007US20070131173 Wafer support system
06/14/2007US20070131172 Low pressure vapor phase deposition of organic thin films
06/14/2007US20070131171 Plasma process device and plasma process method
06/14/2007US20070131170 Plasma CVD apparatus, and method for forming film and method for forming semiconductor device using the same
06/14/2007US20070131169 Methods, systems, and apparatus for uniform chemical-vapor depositions
06/14/2007US20070131168 Gas Supplying unit and substrate processing apparatus
06/14/2007US20070131167 Substrate processing apparatus and lid supporting apparatus for the substrate processing apparatus
06/14/2007US20070131142 Barium Titanate Thin Films with Titanium Partially Substituted by Zirconium, Tin or Hafnium
06/14/2007US20070130996 Method of reducing stress-induced mechanical problems in optical components
06/14/2007DE10248728B4 Heizaggregat für die Herstellung einer Halbleitervorrichtung und dessen Verwendung The heater assembly for the production of a semiconductor device and its use
06/14/2007DE102005059706A1 Preparing a plasma-polymer separation layer on a substrate surface, useful particularly on molding tools, by polymerization at atmospheric pressure under constant conditions
06/14/2007DE102005058869A1 Verfahren und Vorrichtung zur Beschichtung von Bändern Method and apparatus for coating of strips
06/13/2007EP1796442A1 Plasma processing system
06/13/2007EP1796154A1 Plasma treatment apparatus and method of plasma treatment
06/13/2007EP1796150A1 METHOD OF VAPOR-PHASE GROWING, AND VAPOR-PHASE GROWING APPARATUS, FOR AlGaN
06/13/2007EP1796149A1 Quartz jig and semiconductor manufacturing equipment
06/13/2007EP1796108A1 Transparent conductive film
06/13/2007EP1795627A1 CVD method for forming a porous low dielectric constant SiOCH film
06/13/2007EP1795626A1 Chemical vapor deposition of fluorocarbon polymer thin films
06/13/2007EP1795623A1 Coating process of an article with modified platinum aluminide and component
06/13/2007EP1794784A1 Method to deposit functionally graded dielectric films via chemical vapor deposition using viscous precursors
06/13/2007EP1794780A1 Method for fabrication of group iii nitride semiconductor
06/13/2007EP1794348A2 Method for transferring a functional organic molecule onto a transparent substrate
06/13/2007EP1794347A1 Method of modifying a metal substrate to improve surface coverage of a coating
06/13/2007EP1794346A2 Apparatus and method for depositing a material on a substrate
06/13/2007EP1665323B1 Voltage non-uniformity compensation method for high frequency plasma reactor for the treatment of rectangular large area substrates
06/13/2007EP1435106B1 Lifting and supporting device
06/13/2007EP1340245B1 Method for incorporating silicon into cvd metal films
06/13/2007EP1266043B8 Cemented carbide tool and method of making
06/13/2007CN2911757Y Intelligent optical membrane full automatic monitoring system
06/13/2007CN1981069A Composition containing siloxane compound and phenol compound
06/13/2007CN1981068A Thin film-forming material and method for producing thin film
06/13/2007CN1979775A Method for using alpha polycrystal silicon in integrated circuit
06/13/2007CN1978701A Method and device for improving dielectric layer formed breakdown voltage of integrated circuit
06/13/2007CN1978700A Method for preparing sub-atmosphere pressure film
06/13/2007CN1978699A Method and apparatus for modifyig polymer high-molecular material surface
06/13/2007CN1321227C Boron doped diamond
06/13/2007CN1321223C Method for disposing carbon nanometer tube film surface appearance using multiple plasm in order
06/13/2007CN1321160C Pigment having metallic lustre
06/12/2007US7231141 High temperature drop-off of a substrate
06/12/2007US7230337 Semiconductor device including ladder-shaped siloxane hydride and method for manufacturing same
06/12/2007US7229935 Method of forming a thin film by plasma CVD of a silicon-containing source gas
06/12/2007US7229931 Oxygen plasma treatment for enhanced HDP-CVD gapfill
06/12/2007US7229917 Film formation method and apparatus for semiconductor process
06/12/2007US7229911 Adhesion improvement for low k dielectrics to conductive materials
06/12/2007US7229910 Method of producing a semiconductor device having a multi-layered insulation film
06/12/2007US7229888 Capacitor with hafnium oxide and aluminum oxide alloyed dielectric layer and method for fabricating the same
06/12/2007US7229843 Device and method for monitoring process exhaust gas, semiconductor manufacturing device, and system and method for controlling semiconductor manufacturing device
06/12/2007US7229669 Evaporating cesium, rubinium, tungsten or gallium through a shadow mask onto a surface to define an area of coverage, then depositing a covering material greater than the area of the reactive material, to enclose the reactive material coated on the substrate
06/12/2007US7229667 Reduced moisture compositions comprising an acid gas and a matrix gas, articles of manufacture comprising said compositions, and processes for manufacturing same
06/12/2007US7229666 Deposition method of positioning a substrate in a chamber defined by a wall material and a chamber surface with purge gas inlets of pores in the wall to emit purge gas to form an inert gas curtain over the chamber surface
06/12/2007US7229661 Methods for preparing and testing a thermal-spray coated substrate
06/12/2007US7229502 Method of forming a silicon nitride layer
06/12/2007CA2360619C Composition for vapor deposition, method for forming antireflection film using it, and optical element
06/12/2007CA2258999C Method for densifying and refurbishing brakes
06/07/2007WO2007065096A2 Chalcogenide solar cells
06/07/2007WO2007064376A2 Organometallic precursors and related intermediates for deposition processes, their production and methods of use
06/07/2007WO2007063938A1 Method and purification of unsaturated fluorinated carbon compound, method for formation of fluorocarbon film, and method for manufacture of semiconductor device
06/07/2007WO2007063841A1 Method of heat treatment and heat treatment apparatus
06/07/2007WO2007063838A1 Substrate processing apparatus and method for manufacturing semiconductor device
06/07/2007WO2007063708A1 Plasma treatment device
06/07/2007WO2007063679A1 Intermediate transfer member, process for producing the same and image forming apparatus
06/07/2007WO2007063644A1 Photoelectric-conversion device, method of manufacturing the same and photoelectric-conversion device manufacturing apparatus
06/07/2007WO2007063015A1 Gas feed installation for machines depositing a barrier layer on containers
06/07/2007WO2007062665A1 A method of producing a gas barrier polymer foil and a gas barrier polymer foil
06/07/2007WO2007041089A3 Organometallic compounds and methods of use thereof
06/07/2007WO2007040701A3 Method for controlling the step coverage
06/07/2007WO2007028791A3 Wear-resistant coating and a method for the production thereof
06/07/2007WO2006104582A3 Method and system for increasing tensile stress in a thin film using collimated electromagnetic radiation
06/07/2007WO2006071341A3 Method and apparatus to determine consumable part condition