Patents for C23C 16 - Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition (cvd) processes (71,892)
06/2007
06/27/2007CN1989069A Hydrogen-containing carbon film
06/27/2007CN1989046A Container-treatment machine comprising controlled gripping means for seizing containers by the neck
06/27/2007CN1986888A Method of coating internal passages of gas turbine components
06/27/2007CN1986879A Double heater and chemical vapor deposition process for preparing super conductive film therein
06/27/2007CN1986878A Active atom beam spraying DC discharging process for preparing nano carbon nitride film
06/27/2007CN1986877A Organometallic composition
06/27/2007CN1986876A Improved carbon beam deposition chamber for reduced defects
06/26/2007US7235853 Fingerprint detection device and method of its manufacture, and apparatus for forming a protective film
06/26/2007US7235701 Process for producing aldehyde
06/26/2007US7235486 Method for forming tungsten materials during vapor deposition processes
06/26/2007US7235484 Nanolayer thick film processing system and method
06/26/2007US7235281 forming collar which narrows opening and applying heat/pressure, then reflowing sealing layer; chemical/physical vapor deposition; for use in microelectronics, microelectromechanical systems
06/26/2007US7235155 Method and apparatus for monitoring plasma conditions using a monitoring ring
06/26/2007US7235139 Wafer carrier for growing GaN wafers
06/26/2007US7235138 Microfeature workpiece processing apparatus and methods for batch deposition of materials on microfeature workpieces
06/26/2007US7235137 Conductor treating single-wafer type treating device and method for semi-conductor treating
06/26/2007US7235130 Apparatus and method for diamond production
06/26/2007US7234476 Method of cleaning CVD equipment processing chamber
06/26/2007US7234413 Plasma processing apparatus
06/26/2007US7234412 Semiconductor substrate deposition processor chamber liner apparatus
06/22/2007CA2571993A1 Chemical vapor deposition apparatus and methods of using the apparatus
06/21/2007WO2007069973A1 Coated cutting tool insert
06/21/2007WO2007069599A1 Method for precoating film forming apparatus
06/21/2007WO2007069523A1 PROCESS FOR PRODUCING InGaN
06/21/2007WO2007069438A1 Metal film decarbonizing method, film forming method and semiconductor device manufacturing method
06/21/2007WO2007069419A1 Copper based composite base material for electronic part, electronic part and process for producing copper based composite base material for electronic part
06/21/2007WO2007069011A1 Alkylsilanes as solvents for low vapor pressure precursors
06/21/2007WO2007053553A3 Method and system for forming a nitrided germanium-containing layer using plasma processing
06/21/2007WO2007048937B1 Method for monitoring a plasma, device for carrying out this method, use of this method for depositing a film onto a pet hollow body
06/21/2007WO2007038710A3 Intra-cavity gettering of nitrogen in sic crystal growth
06/21/2007WO2007019581A3 Weldable ultrahard materials and associated methods of manufacture
06/21/2007WO2006133123A3 Shadow mask deposition of materials using reconfigurable shadow masks
06/21/2007WO2005029542A3 Apparatus and method for point-of-use treatment of effluent gas streams
06/21/2007US20070142956 Method for adjoining adjacent coatings on a processing element
06/21/2007US20070141855 Methods of modifying interlayer adhesion
06/21/2007US20070141851 System and method of reducing particle contamination of semiconductor substrates
06/21/2007US20070141846 Rapid thermal processing system
06/21/2007US20070141347 Hard carbon film, production method thereof, and sliding member
06/21/2007US20070141274 Barrier metal film production apparatus, barrier metal film production method, metal film production method, and metal film production apparatus
06/21/2007US20070141272 Methods and apparatus for coating gas turbine components
06/21/2007US20070141258 Methods of growing nitride-based film using varying pulses
06/21/2007US20070141257 Method and apparatus for forming metal silicate film, and method for manufacturing semiconductor device
06/21/2007US20070141256 Methods for elimination or reduction of oxide and/or soot deposition in carbon containing layers
06/21/2007US20070141255 Method and apparatus for strengthening a porous substrate
06/21/2007US20070141233 EB-PVD system with automatic melt pool height control
06/21/2007US20070140947 making a nanotube growing mat in a predetermined pattern of nanosized catalytic metal particles whose pattern produces nanotubes in a highly ordered forms; substrate comprising carbon and silicon in alternating layers; chemical vapor deposition
06/21/2007US20070140671 Cooling Device, and Apparatus and Method for Manufacturing Image Display Panel Using Cooling Device
06/21/2007US20070138000 Concentration-modulated coatings
06/21/2007US20070137794 Thermal processing system with across-flow liner
06/21/2007US20070137793 Processing apparatus
06/21/2007US20070137671 Fluorine based cleaning of an ion source
06/21/2007US20070137576 Technique for providing an inductively coupled radio frequency plasma flood gun
06/21/2007US20070137575 Plasma processing apparatus
06/21/2007US20070137574 Low-cost and high performance solar cell manufacturing machine
06/21/2007US20070137573 Apparatus for an optimized plasma chamber grounded electrode assembly
06/21/2007US20070137572 Plasma processing apparatus
06/21/2007US20070137571 Deposition apparatus
06/21/2007US20070137570 Semiconductor manufacturing apparatus and semiconductor manufacturing method using the same
06/21/2007US20070137569 Electrode assembly for a non-equilibrium plasma treatment
06/21/2007US20070137568 Reciprocating aperture mask system and method
06/21/2007US20070137567 Apparatus for manufacturing a semiconductor device
06/21/2007US20070137566 Modular device for coating surfaces
06/21/2007DE19721677B4 Elektrische Leitung und Herstellungsverfahren dafür Electrical Conduction and manufacturing method thereof
06/21/2007DE112005002005T5 Clusterfreier amorpher Siliziumfilm, und Verfahren und Vorrichtung zu dessen Herstellung Cluster-free amorphous silicon film, and method and apparatus for its production
06/21/2007DE102006010512A1 Verfahren zur Eliminierung oder Verringerung der Oxid- und/oder Russabscheidung in kohlenstoffhaltigen Schichten Process for the elimination or reduction of the oxide and / or carbon black deposition in carbonaceous layers
06/21/2007DE102005061327A1 Plasma CVD coating, is formed by locating the component to be coated in a vacuum chamber, evacuating the chamber, supplying a process gas, and creating a plasma
06/21/2007DE102005061134A1 Bauteil eines Stahlwerks, wie Stranggussanlage oder Walzwerk, Verfahren zur Herstellung eines solchen Bauteils sowie Anlage zur Erzeugung oder Verarbeitung von metallischen Halbzeugen Component of a steel plant, such as continuous casting plant or mill, process for producing such a component and plant for the production or processing of semi-finished metal
06/20/2007EP1798309A2 Coated cutting tool insert
06/20/2007EP1798307A1 Organometallic composition
06/20/2007EP1797581A1 Precursor for film formation and method for forming ruthenium-containing film
06/20/2007EP1797217A1 Method and device for applying an electrically conductive transparent coating to a substrate
06/20/2007EP1797216A2 Heated gas box for pecvd applications
06/20/2007EP1796875A1 Focussing nozzle
06/20/2007EP1796850A2 Method of cryogenically coating a device
06/20/2007EP1680528A4 Heat treatable coated article with diamond-like carbon (dlc) coating
06/20/2007EP1390968B1 Smooth multipart substrate support member for cvd
06/20/2007EP1346074B1 Coated cutting tool insert with iron-nickel based binder phase
06/20/2007EP1254249B1 Deposited thin films and their use in detection, attachment, and bio-medical applications
06/20/2007EP1044074B1 Photoresist coating process control with solvent vapor sensor
06/20/2007CN2914322Y Heat insulation wall, heating element structure holding body, heating device and substrate board processing device
06/20/2007CN1985364A Method of evaluating characteristics of an insulating film for a semiconductor device and method of forming the insulating film
06/20/2007CN1985083A Piston ring, piston, cylinder and piston pin having amorphous and hard carbon film
06/20/2007CN1985028A Common rack for electroplating and pvd coating operations
06/20/2007CN1984839A Methods of forming alpha and beta tantalum films with controlled and new microstructures
06/20/2007CN1984523A Plasma processing apparatus and method
06/20/2007CN1982242A 光学材料及光学装置 Optical materials and optical means
06/20/2007CN1982020A Mould core and its production
06/20/2007CN1981981A Modified welding torch cathode for use in roughening a surface and related method
06/20/2007CN1322793C Surface wave plasma treatment apparatus using multi-slot antenna
06/20/2007CN1322559C Plasma processor
06/20/2007CN1322558C Cleaning method of substrate treating apparatus, and substrate treating apparatus
06/20/2007CN1322557C Processing apparatus and gas discharge suppressing member
06/20/2007CN1322551C Vapor phase epitaxial apparatus and vapor phase epitaxial method
06/20/2007CN1322178C Coloured diamond
06/20/2007CN1321886C Method for controlling carbon nanometer tube three-dimension graphics type growth by spray plating precious metal membrane
06/20/2007CN1321885C Method for preparing film of tube of directed nano carbon on soft base
06/20/2007CN1321752C Coating method on inner walls of reaction tubes in hydrocarbon pyrolysis reactor
06/20/2007CN1321717C Filtering unit
06/19/2007US7232774 Polycrystalline silicon layer with nano-grain structure and method of manufacture
06/19/2007US7232772 Substrate processing method