| Patents for C23C 16 - Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition (cvd) processes (71,892) |
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| 07/12/2007 | US20070160757 Processing method |
| 07/12/2007 | US20070160756 Apparatus and method for the deposition of ruthenium containing films |
| 07/12/2007 | US20070160753 Method to encapsulate phosphor via chemical vapor deposition |
| 07/12/2007 | US20070160454 Substrate carrying device, substrate carrying method and computer-readable storage medium |
| 07/12/2007 | US20070160447 Semiconductor treating device |
| 07/12/2007 | US20070158182 Silicon dot forming method and apparatus |
| 07/12/2007 | US20070158027 Plasma treatment device |
| 07/12/2007 | US20070158026 Processing apparatus |
| 07/12/2007 | US20070157966 Process for producing transparent conductive film and process for producing tandem thin-film photoelectric converter |
| 07/12/2007 | US20070157886 Substrate support assembly with thermal isolating plate |
| 07/12/2007 | US20070157885 Device For Manufacturing DLC Film-Coated Plastic Container |
| 07/12/2007 | US20070157884 Organosiloxane copolymer film, production method and deposition apparatus for said copolymer film, and semiconductor device using said copolymer film |
| 07/12/2007 | US20070157883 Device For Coating Both Sides of Substrates With A Hydrophobic Layer |
| 07/12/2007 | US20070157882 Producing method of semiconductor device and substrate processing apparatus |
| 07/12/2007 | US20070157668 Method for cleaning a substrate |
| 07/12/2007 | US20070157466 Substrate supporting apparatus and manufacturing method therefor |
| 07/12/2007 | DE102006000823A1 Wolfram- und Molybdän-Verbindungen und ihre Verwendung für die Chemical Vapour Deposition (CVD) Tungsten and molybdenum compounds and their use for the chemical vapor deposition (CVD) |
| 07/12/2007 | DE102005062917A1 Atomlagenabscheideverfahren Atomlagenabscheideverfahren |
| 07/11/2007 | EP1806776A1 Plasma film forming method and plasma film forming device |
| 07/11/2007 | EP1806438A1 Method of surface reconstruction for silicon carbide substrate |
| 07/11/2007 | EP1806427A2 Method of forming phase change material thin film, and method of manufacturing phase change memory device using the same |
| 07/11/2007 | EP1806426A1 Supporting device for metallic turbine components |
| 07/11/2007 | EP1806352A1 Tungsten and molybdenum compounds and their application for Chemical Vapour Deposition (CVD) |
| 07/11/2007 | EP1806192A1 Edge replacement type cutting tip and method of manufacturing the same |
| 07/11/2007 | EP1805356A2 Surface and composition enhancements to high aspect ratio c-mems |
| 07/11/2007 | EP1805346A2 Apparatus and process for surface treatment of substrate using an activated reactive gas |
| 07/11/2007 | EP1805345A2 Multi-zone atomic layer deposition apparatus and method |
| 07/11/2007 | EP1805195A2 Organometallic precursor compounds |
| 07/11/2007 | EP1720702A4 Dual layer diffusion bonded chemical vapor coating for medical implants |
| 07/11/2007 | EP0738336B2 Oxide coated cutting tool |
| 07/11/2007 | CN2922119Y 晶圆片承载模组 Wafer carrier module |
| 07/11/2007 | CN1998272A Plasma processing equipment |
| 07/11/2007 | CN1997770A Epitaxial reactor with controlled positioning susceptor |
| 07/11/2007 | CN1997769A Two-layer shadow mask with small dimension apertures and method of making and using same |
| 07/11/2007 | CN1997766A Al2O3 ceramic tools with diffusion bonding enhanced layer |
| 07/11/2007 | CN1995453A PCVD filming process |
| 07/11/2007 | CN1995452A PA-SiN chemical gas phase deposition method |
| 07/11/2007 | CN1995451A Plasma assisted reaction heat chemical gas phase deposition method for preparing microcrystalline silicon germanium film |
| 07/11/2007 | CN1326255C Method of depositing an oxide layer on a substrate |
| 07/11/2007 | CN1326205C Semiconductor films and the manufacturing method, semiconductor equipment, integrated circuits, electrooptics device and electron machine |
| 07/11/2007 | CN1325822C Piston for internal combustion engine |
| 07/11/2007 | CN1325694C Method and an installation for subjecting carbon fabrics to high temperature heat treatment and to densification by chemical vapor infiltration |
| 07/11/2007 | CN1325676C Leadless copper base high temperature self lubricating composite material |
| 07/11/2007 | CN1325433C Ceramic-metal and ceramic-ceramic light composite material and manufacturing method thereof |
| 07/10/2007 | US7242013 Method for depositing a film using a charged particle beam, method for performing selective etching using the same, and charged particle beam equipment therefor |
| 07/10/2007 | US7241912 Copper (I) amidinate precursors for forming copper thin films in the manufacture of semiconductor devices; preparation by reacting cuprous chloride with a lithium derivative of an amidine |
| 07/10/2007 | US7241704 forming precursor film on substrate, film comprising a porogen and a structure former, wherein the structure former has one or more carbon-carbon double or triple bonds and porogen has at least one bulky organic functional group and porogen precursor is a polyfunctional cyclic non-aromatic compound |
| 07/10/2007 | US7241703 Film forming method for semiconductor device |
| 07/10/2007 | US7241701 Method and furnace for the vapor phase deposition of components onto semiconductor substrates with a variable main flow direction of the process gas |
| 07/10/2007 | US7241479 chemical vapor deposition (CVD); nanowires and nanobelts; heating the chamber to a temperature at which the metal becomes molten, and flowing a vapor-phase reactant through the chamber |
| 07/10/2007 | US7241475 A halogen-ion plasma is reacted with a metal carbide to form a volatile metal halide and a low-friction pure carbon film at or near room temperature |
| 07/10/2007 | US7241470 Method for monitoring the course of a process using a reactive gas containing one or several hydrocarbons |
| 07/10/2007 | US7241397 Honeycomb optical window deposition shield and method for a plasma processing system |
| 07/10/2007 | US7241362 Substrate treatment method and substrate treatment apparatus |
| 07/10/2007 | US7241361 Magnetically enhanced, inductively coupled plasma source for a focused ion beam system |
| 07/10/2007 | US7241360 Method and apparatus for neutralization of ion beam using AC ion source |
| 07/10/2007 | US7241346 Apparatus for vapor deposition |
| 07/10/2007 | US7241345 Cylinder for thermal processing chamber |
| 07/10/2007 | CA2239014C Capacitively coupled rf diamond-like-carbon reactor |
| 07/05/2007 | WO2007076076A2 Gas coupler for substrate processing chamber |
| 07/05/2007 | WO2007075977A2 Eb-pvd system with automatic melt pool height control |
| 07/05/2007 | WO2007074683A1 Stacked photoelectric transducer |
| 07/05/2007 | WO2007074678A1 Film forming apparatus, film forming method, precoating layer, and method for precoating layer formation |
| 07/05/2007 | WO2007074545A1 Cvd apparatus and method of forming thin film with the same |
| 07/05/2007 | WO2007017175B1 Vacuum depositing with condensation removing |
| 07/05/2007 | WO2006036820A3 Methods and apparatus for monitoring a process in a plasma processing system by measuring impedance |
| 07/05/2007 | US20070155190 Systems and methods for forming metal oxide layers |
| 07/05/2007 | US20070155185 Electrical sensor for real-time feedback control of plasma nitridation |
| 07/05/2007 | US20070154737 Coated cutting tool |
| 07/05/2007 | US20070154650 Method and apparatus for glow discharge plasma treatment of flexible material at atmospheric pressure |
| 07/05/2007 | US20070154638 Chemical vapor deposition method |
| 07/05/2007 | US20070154637 Organometallic composition |
| 07/05/2007 | US20070154623 Method for manufacturing single-walled carbon nanotube on glass |
| 07/05/2007 | US20070154210 Method and apparatus for dispense pump calibration in a track lithography system |
| 07/05/2007 | US20070152256 Method for fabricating a metal insulator-metal (MIM) capacitor having capacitor dielectric layer formed by atomic layer deposition (ALD) |
| 07/05/2007 | US20070152194 Nano-scale particle paste for wiring microelectronic devices using deposition and ink-jet printing |
| 07/05/2007 | US20070151863 Complex of silver with hydantoin or a substituted hydantoin; sulfamic, hydrofluoric, nitric, fluoboric, glycolic or lactic acid nonprecipitating electrolyte salts; pyridine, nicotinamide and dipyridyl for a mirror bright to brilliant deposit; surface active material is Hamposyl, Blancol, Rhodacal |
| 07/05/2007 | US20070151669 Vacuum processing apparatus |
| 07/05/2007 | US20070151668 Gas supply system, substrate processing apparatus, and gas supply method |
| 07/05/2007 | US20070151581 exposure to activated gaseous species with or without plasma, heat or UV light, template is then rinsed with oxygenated or hydrogenated deionized water with or without megasonic to remove organic contaminants, template is then dry cleaned with a reactive plasma, e.g., containing O2 or O3; |
| 07/05/2007 | US20070151518 Evaporator featuring annular ridge member provided on side wall surface of evaporating chamber |
| 07/05/2007 | US20070151517 Heater for depositing thin film |
| 07/05/2007 | US20070151516 Chemical vapor deposition apparatus and electrode plate thereof |
| 07/05/2007 | US20070151515 Multi-chamber semiconductor device fabrication apparatus comprising wafer-cooling blade |
| 07/05/2007 | US20070151514 Apparatus and method for hybrid chemical processing |
| 07/05/2007 | US20070151508 Zinc oxide nanotip and fabricating method thereof |
| 07/05/2007 | DE19781667B4 Plasmaerzeugungsverfahren und -gerät mit einer induktiv gekoppelten Plasmaquelle Plasma generation method and apparatus using an inductively coupled plasma source |
| 07/05/2007 | DE102006056973A1 Heizeinrichtung zum Ablagern einer Dünnschicht Heating means for depositing a thin film |
| 07/05/2007 | DE102006041791A1 Reinigungsverfahren für eine Vorrichtung zum Abscheiden eines Al-aufweisenden Metallfilms und eines Al-aufweisenden Metallnitridfilms The cleaning method for an apparatus for depositing an Al-containing metal film and an Al-containing metal nitride |
| 07/05/2007 | DE102005052409B3 Coating method for coating of surface, involves application of low-energy undercoating on surface which is to be coated and subsequently applying of layer containing or consisting of cross-linkable substance |
| 07/04/2007 | EP1803839A1 Fabrication method and fabrication apparatus of group III nitride crystal substance |
| 07/04/2007 | EP1803835A1 Coated cutting tool insert |
| 07/04/2007 | EP1802787A1 Method for producing silicon nitride films |
| 07/04/2007 | EP1802784A2 Gas turbine engine components with aluminide coatings and method of forming such aluminide coatings on gas turbine engine components |
| 07/04/2007 | EP1802686A1 Process for plasma coating |
| 07/04/2007 | EP1601471A4 Gas gate for isolating regions of differing gaseous pressure |
| 07/04/2007 | EP1422316A9 Method for cleaning reaction container and film deposition system |
| 07/04/2007 | EP1392462A4 SOURCE REAGENT COMPOSITION FOR CVD FORMATION OF Zr/Hf DOPED GATE DIELECTRIC AND HIGH DIELECTRIC CONSTANT METAL OXIDE THIN FILMS AND METHOD OF USING SAME |
| 07/04/2007 | EP1229990A4 Auto-switching gas delivery system utilizing sub-atmospheric pressure gas supply vessels |
| 07/04/2007 | CN1993814A Method of forming film and film forming apparatus |