Patents for C23C 16 - Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition (cvd) processes (71,892)
07/2007
07/24/2007US7247561 Method of removing residual contaminants from an environment
07/24/2007US7247504 Ferroelectric capacitor, process for production thereof and semiconductor device using the same
07/24/2007US7247348 providing an airfoil substrate having an airfoil substrate surface, and depositing a diamond-like coating (DLC) directly on the airfoil substrate surface
07/24/2007US7247207 Vacuum processing apparatus
07/24/2007US7246796 Carburetor, various types of devices using the carburetor, and method of vaporization
07/24/2007CA2182452C Shadow sculpted thin films
07/19/2007WO2007081653A2 Apparatus for an optimized plasma chamber grounded electrode assembly
07/19/2007WO2007081434A1 Apparatus and method for the deposition of ruthenium containing films
07/19/2007WO2007081298A1 Method for producing a carbon-containing material by carbon electron-beam vaporisation in a vacuum and a subsequent condensation thereof on a substrate and a device for carrying out said method
07/19/2007WO2007081202A1 Method and apparatus for controlled deposition of material by means of plasma on a three-dimensional substrate
07/19/2007WO2007080934A1 Vacuum treating device and vacuum treating method
07/19/2007WO2006020409A3 Apparatus and method for depositing a material on a substrate
07/19/2007US20070167263 Playing Field Obstacle Kit and Method
07/19/2007US20070167023 Manufacturing method for wiring
07/19/2007US20070166999 Systems and methods of forming refractory metal nitride layers using disilazanes
07/19/2007US20070166556 Using a plasma treatment in an oxidizing atmosphere (oxygen, nitrogen or others) to passivate the aluminum layer immediately after deposition and prior to rewinding the coated web into a roll; corrosion resistance; antipeeling agents; packaging
07/19/2007US20070166477 Yttria-coated ceramic components of semiconductor material processing apparatuses and methods of manufacturing the components
07/19/2007US20070166459 Assembly and method for delivering a reactant material onto a substrate
07/19/2007US20070166458 Vaporizer for cvd, solution-vaporization type cvd apparatus and vaporization method for cvd
07/19/2007US20070166457 Vaporizer, film forming apparatus including the same, method of vaporization and method of forming film
07/19/2007US20070166205 Effluent gas stream treatment system having utility for oxidation treatment of semiconductor manufacturing effluent gases
07/19/2007US20070166133 Decoupled chamber body
07/19/2007US20070164680 Plasma generation and processing with multiple radiation sources
07/19/2007US20070164306 Group III nitride semiconductor crystal and method of its manufacture, group III nitride semiconductor device and method of its manufacture, and light-emitting appliance
07/19/2007US20070163716 Gas distribution apparatuses and methods for controlling gas distribution apparatuses
07/19/2007US20070163713 Gas supply system and processing system
07/19/2007US20070163617 Method for cleaning treatment chamber iIn substrate treating apparatus and method for detecting endpoint of cleaning
07/19/2007US20070163504 Vapor phase growth apparatus
07/19/2007US20070163503 Thin film preparation apparatus
07/19/2007US20070163502 Substrate processing apparatus
07/19/2007US20070163501 Plasma processing apparatus
07/19/2007US20070163500 Rectangular planar-type ICP antenna having balanced ratio of magnetic field and electric potential
07/19/2007US20070163499 Plasma treatment apparatus and method
07/19/2007US20070163498 Gas dispersion shield and method
07/19/2007US20070163497 Two-dimensional aperture array for vapor deposition
07/19/2007US20070163496 Chemical vapor deposition apparatus having a reaction chamber condition detection function and a detection method thereof
07/19/2007US20070163488 Method of growing oxide thin films
07/19/2007DE10345393B4 Verfahren zur Abscheidung eines leitfähigen Materials auf einem Substrat und Halbleiterkontaktvorrichtung A process for depositing a conductive material on a substrate and semiconductor contact device
07/19/2007DE102006002333A1 Verfahren und Vorrichtung zum Löschen von Bogenentladungen Method and device for extinguishing arc discharges
07/19/2007DE102006002034A1 Gegenstand, der ein relativ weiches Trägermaterial und eine relativ harte dekorative Schicht aufweist, sowie Verfahren zu dessen Herstellung An article comprising a relatively soft support material and a relatively hard decorative layer as well as methods for its preparation
07/19/2007DE102005061563A1 Anlage zur Behandlung von Substraten und Verfahren Plant for the treatment of substrates and methods
07/18/2007EP1808510A2 Thin film preparation apparatus
07/18/2007EP1807634A1 Counter track joint having a track inflection point
07/18/2007EP1807551A2 Titanium oxide based hybrid material, respective preparation process and uses
07/18/2007EP1807548A2 Abrasion resistant coatings by plasma enhanced chemical vapor deposition
07/18/2007EP1807547A1 An elongated gas ditribution system
07/18/2007EP1807546A1 Coating of displacer components (tooth components) for providing a displacer unit with chemical resistance and tribological protection against wear
07/18/2007EP1807545A1 Multilayer coatings by plasma enhanced chemical vapor deposition
07/18/2007EP1807372A1 Glass ceramic article having a diffusion barrier and method for producing a glass ceramic article having a diffusion barrier
07/18/2007EP1807371A1 Object comprising a barrier coating, and method for the production of such an object
07/18/2007EP1807346A2 Ultratouch cvd single crystal diamond and three dimensional growth thereof
07/18/2007EP1628923B1 Small glass cutter wheel
07/18/2007EP1573795A4 A system and method for controlling plasma with an adjustable coupling to ground circuit
07/18/2007EP1087035B1 Method and apparatus for formation of thin film
07/18/2007CN2924787Y Semiconduct or reaction chamber element fixing device
07/18/2007CN1327492C Gas for plasma reaction, process for producing the same, and use
07/18/2007CN1327485C Cleaning method of thin tilm forming device
07/18/2007CN1327483C Crystal manufacturing method
07/18/2007CN1327475C Suspended gas distribution manifold for plasma chamber
07/18/2007CN101002308A Method and equipment for forming oxide film
07/18/2007CN101001978A Susceptor
07/18/2007CN101001977A Solution raw material for organic metal chemical vapor deposition and complex oxide dielectric thin film formed by using such raw mataerial
07/18/2007CN101001976A Conductive material comprising an me-dlc hard material coating
07/18/2007CN101001975A Methods and apparatus for optimal temperature control in a plasma processing system
07/18/2007CN101001685A Method and system for characterizing porous materials
07/18/2007CN100999811A Mask, film forming method, light-emitting device, and electronic apparatus
07/18/2007CN100999388A Preparation method of polycrystalline silicon film of decorated and coated solution on surface with induction crystallization
07/17/2007US7245068 Apparatus for controlled alignment of catalytically grown nanostructures
07/17/2007US7244683 Integration of ALD/CVD barriers with porous low k materials
07/17/2007US7244667 Method and device for the production of thin epitaxial semiconductor layers
07/17/2007US7244657 A semiconductor device containing a porous film inside, the porous film being formed by using a zeolite sol having an average particle diameter of 3 to 15 nm, wherein the zeolite sol is prepared by hydrolyzing and condensing in the presence
07/17/2007US7244648 Methods of forming semiconductor constructions
07/17/2007US7244475 Plasma treatment apparatus and control method thereof
07/17/2007US7244474 applying plasma source power to generate a plasma of the deposition precursor species in the ion generation region, and applying a grid potential to the ion shower grid to create a flux of ions from the plasma through the grid and into the process region
07/17/2007US7244467 Process for a beta-phase nickel aluminide overlay coating
07/17/2007US7244464 May have either a single laser diode and a beam splitter or a pair of laser diodes with a pair of collimated optical beams that indicate distance to the target surface by the relative location of a pair of illuminated spots on the target surface.
07/17/2007US7244375 Thermostable electroconductive polymer layer and method of preparing the same
07/17/2007US7244341 forming spin valves; preoxygen exposure; ion beam sputtering; copper deposits
07/17/2007US7244311 Heat transfer system for improved semiconductor processing uniformity
07/17/2007US7244086 Apparatus for vacuum treating two dimensionally extended substrates and method for manufacturing such substrates
07/17/2007US7243610 Plasma device and plasma generating method
07/12/2007WO2007078556A1 Rotatable aperture mask assembly and deposition system
07/12/2007WO2007077765A1 Stage apparatus and plasma processing apparatus
07/12/2007WO2007045110A3 Cleaning means for large area pecvd devices using a remote plasma source
07/12/2007WO2007044145A3 Method and apparatus for the low temperature deposition of doped silicon nitride films
07/12/2007WO2007021520A3 Substrate support for increasing substrate temperature in plasma reactors
07/12/2007WO2006055459A3 Tensile and compressive stressed materials for semiconductors
07/12/2007WO2006019565B1 Method and system for coating internal surfaces of prefabricated process piping in the field
07/12/2007WO2005081940A3 Magnetically enhanced, inductively coupled plasma source for a focused ion beam system
07/12/2007US20070161260 Methods of forming a phosphorus doped silicon dioxide-comprising layer
07/12/2007US20070161201 Liquid spraying method, liquid spraying system and liquid spraying execute program
07/12/2007US20070161128 Semiconductor device manufacturing apparatus and semiconductor device manufacturing method
07/12/2007US20070160872 Method of altering crystal structure of group 13 element nitride, group 13 element nitride and structure material containing cubic nitride
07/12/2007US20070160790 Liquid repellent structure, method of producing the same, liquid ejection head and protective film
07/12/2007US20070160775 Physical vapor deposition process and apparatus therefor
07/12/2007US20070160774 Method for producing silicon nitride films and silicon oxynitride films by chemical vapor deposition
07/12/2007US20070160761 Tungsten and molybdenum compounds and thier use for chemical vapour deposition (CVD)
07/12/2007US20070160760 Methods of forming phase change material thin films and methods of manufacturing phase change memory devices using the same
07/12/2007US20070160759 Method for coating surfaces exposed to hydrocarbon fluids
07/12/2007US20070160758 Process for improving the emissions of electron field emitters