Patents for C23C 16 - Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition (cvd) processes (71,892)
08/2007
08/01/2007CN101010445A Layered composite including cubic boron nitride
08/01/2007CN101010442A Wear-resistant coating and method for producing same
08/01/2007CN101009347A Non polarity A side nitride film growing on the silicon(102) substrate and its making method and use
08/01/2007CN101009346A Non polarity A side nitride film growing on the silicon substrate and its making method and use
08/01/2007CN101008082A CVD diamond film continuous preparation system
08/01/2007CN101008081A Graphite boat for silicon wafer production
08/01/2007CN101008080A Film-forming device
08/01/2007CN101008079A Method for preparation silicon layer with vapor-phase deposition technique on the surface of base material
08/01/2007CN101008072A Apparatus and method to confine plasma and to enhance flow conductance
07/2007
07/31/2007US7250380 Method of depositing a silicon dioxide-comprising layer in the fabrication of integrated circuitry
07/31/2007US7250379 Method of forming metal oxide using an atomic layer deposition process
07/31/2007US7250378 Method of depositing a silicon dioxide-comprising layer in the fabrication of integrated circuitry
07/31/2007US7250320 Semiconductor light emitting element, manufacturing method thereof, integrated semiconductor light emitting device, manufacturing method thereof, image display device, manufacturing method thereof, illuminating device and manufacturing method thereof
07/31/2007US7250228 Yttrium-doped bismuth titanate thin film and preparation thereof
07/31/2007US7250220 Fabricating zirconia into components for the vacuum deposition chamber; andcoating the fabricated zirconia components with a metal layer having a high surface roughness
07/31/2007US7250094 Heat treatment apparatus
07/31/2007US7250084 Downward mechanism for support pins
07/31/2007US7250083 ALD method and apparatus
07/31/2007CA2205139C Apparatus for use with cvi/cvd processes
07/26/2007WO2007084493A2 High temperature ald inlet manifold
07/26/2007WO2007084492A2 Tubular or other member formed of staves bonded at keyway interlocks
07/26/2007WO2007084275A1 Two-dimensional aperture array for vapor deposition
07/26/2007WO2007083795A1 Plasma processing equipment
07/26/2007WO2007083729A1 Method for producing titanium oxide
07/26/2007WO2007083654A1 Process for producing siliceous film and substrate with siliceous film produced thereby
07/26/2007WO2007083653A1 Plasma processing apparatus
07/26/2007WO2007057443B1 Cvd reactor with slidingly mounted susceptor holder
07/26/2007US20070173072 Method for producing silicon oxide film
07/26/2007US20070173046 Substrate processing apparatus and method and a manufacturing method of a thin film semiconductor device
07/26/2007US20070172660 Carbon film
07/26/2007US20070172603 Process and Apparatus for Silicon Boat, Silicon Tubing and Other Silicon Based Member Fabrication
07/26/2007US20070172597 Automatic spraying method for flux of wave solder oven
07/26/2007US20070172591 METHOD OF FABRICATING ZnO FILM AND THIN FILM TRANSISTOR ADOPTING THE ZnO FILM
07/26/2007US20070170604 Safe liquid source containers
07/26/2007US20070170552 Ultra thin TCS (SiCl4) cell nitride for DRAM capacitor with DCS (SiH2cl2) interface seeding layer
07/26/2007US20070170397 Method of preparing storage phosphors from dedicated precursors
07/26/2007US20070170088 Container, container producing method, substrate processing device, and semiconductor device producing method
07/26/2007US20070170050 Method for the production of an ultra barrier layer system
07/26/2007US20070169890 Exhaust processing method, plasma processing method and plasma processing apparatus
07/26/2007US20070169889 Methods and apparatus for selectively coupling process tools to abatement reactors
07/26/2007US20070169704 Apparatus for shielding process chamber port having dual zone and optical access features
07/26/2007US20070169703 Advanced ceramic heater for substrate processing
07/26/2007US20070169702 Equipment innovations for nano-technology aquipment, especially for plasma growth chambers of carbon nanotube and nanowire
07/26/2007US20070169701 Tubular or Other Member Formed of Staves Bonded at Keyway Interlocks
07/26/2007US20070169700 Sensing system and method for determining the alignment of a substrate holder in a batch reactor
07/26/2007US20070169699 Method and Apparatus for Depositing a Magnetoresistive Multilayer Film
07/26/2007US20070169698 Ring plasma jet method and apparatus for making an optical fiber preform
07/26/2007US20070169697 Method of manufacturing capacitor of semiconductor device by simplifying process of forming dielectric layer and apparatus thereof
07/26/2007US20070169696 Two-step post nitridation annealing for lower eot plasma nitrided gate dielectrics
07/26/2007US20070169695 Process and device for coating strips
07/26/2007US20070169694 Feedback control of sub-atmospheric chemical vapor deposition processes
07/26/2007US20070169692 Fibre coating method and apparatus
07/26/2007DE102006003464A1 Verfahren zur Erzeugung einer Siliciumschicht auf einer Substratoberfläche durch Gasphasenabscheidung A method for producing a silicon film on a substrate surface by vapor deposition
07/26/2007DE10010642B4 Maschine zum Beschichten von Hohlkörpern Machine for the coating of hollow bodies
07/25/2007EP1811059A1 Process for formation of copper-containing film
07/25/2007EP1811056A1 Method for producing film, and, film
07/25/2007EP1810344A2 Pallet based system for forming thin-film solar cells
07/25/2007EP1810318A1 Substrate carrier for parallel wafer processing reactor
07/25/2007EP1810001A2 An apparatus for and method of sampling and collecting powders flowing in a gas stream
07/25/2007EP1809792A1 Common rack for electroplating and pvd coating operations
07/25/2007EP1809789A1 Epitaxial reactor cooling method and reactor cooled thereby
07/25/2007EP1809788A1 Method and apparatus for growing a group (iii) metal nitride film and a group (iii) metal nitride film
07/25/2007EP1809787A2 Pressure control system in a photovoltaic substrate deposition
07/25/2007EP1809786A2 Method and apparatus for forming a thin-film solar cell using a continuous process
07/25/2007EP1809785A2 Vertical production of photovoltaic devices
07/25/2007CN1328766C Process system and process method
07/25/2007CN1328757C Gas processing equipment having clearing device
07/25/2007CN1328755C Low contaminatino, high density plasma etch chamber and method for making the same
07/25/2007CN1328751C Device for coating of objects
07/25/2007CN1328411C Laser CVD apparatus and laser CVD method
07/25/2007CN1328410C Low-pressure metal organic chemical vapour phase depositing apparatus for zinc oxide and process thereof
07/25/2007CN1328284C Stabilized silver sulfonate complex of organo-phosphine, method for synthesizing and use thereof
07/25/2007CN1328215C Method for preparing carbon/carbon composite material
07/25/2007CN101006567A Film forming apparatus, film forming method, program and storage medium
07/25/2007CN101006563A Apparatus for an optimized plasma chamber top piece
07/25/2007CN101006548A Deposition technique for producing high quality compound semiconductor materials
07/25/2007CN101006199A Method of forming film, film forming apparatus and storage medium
07/25/2007CN101006198A In situ surface contaminant removal for ion implanting
07/25/2007CN101006197A Vaporizing device and treatment apparatus
07/25/2007CN101006196A Shield body and vacuum processing apparatus
07/25/2007CN101006195A Method for producing silicon nitride films
07/25/2007CN101006194A Film-forming apparatus and film-forming method
07/25/2007CN101006193A Metal product, method of manufacturing a metal product and use thereof
07/25/2007CN101005031A Plasma processing apparatus and controlling method for plasma processing apparatus
07/25/2007CN101005029A Film formation method and apparatus for semiconductor process
07/25/2007CN101005013A Pressure reduction vessel and pressure reduction processing apparatus
07/25/2007CN101005011A 等离子体处理装置 Plasma processing apparatus
07/25/2007CN101005007A Plasma processing apparatus and plasma processing method
07/25/2007CN101004532A Micro Nano silicon based optical amplifier, and method for preparing gain medium of the amplifier
07/25/2007CN101004142A Cmas resistant thermal barrier coating
07/25/2007CN101003896A Distributed control equipment of vacuum inductive chemical vapor deposition / penetration system
07/25/2007CN101003895A Device for delivering reactant to substrate, and process method
07/25/2007CN101003894A Method for preparing transparent Zn0 film, and product obtained
07/25/2007CN101003889A Surface process technique for artificial joint, bone lamella, and bone nail coated by Nano diamond
07/25/2007CN101003033A Gas separation type showerhead
07/24/2007US7247888 Film forming ring and method of manufacturing semiconductor device
07/24/2007US7247818 Substrate heating apparatus and manufacturing method for the same
07/24/2007US7247817 Ceramic heater having a resistance heater element
07/24/2007US7247812 Laser annealing apparatus
07/24/2007US7247581 Methods for treating pluralities of discrete semiconductor substrates