Patents
Sitemap › C23 - Coating metallic material; Coating material with metallic material; Chemical surface treatment; Diffusion treatment of metallic material; Coating by vacuum evaporation, by sputtering, by ion implantation or by chemical vapour deposition, in general; Inhibiting corrosion of metallic material or incrustation in general › C23C - Coating metallic material; Coating material with metallic material; Surface treatment of metallic material by diffusion into the surface, by chemical conversion or substitution; Coating by vacuum evaporation, by sputtering, by ion implantation or by chemical vapour deposition, in general › C23C 16 - Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition (cvd) processes
Patents for C23C 16 - Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition (cvd) processes (71,892)
08/2007
08/16/2007WO2007091555A1 Apparatus for controlling substrate processing apparatus and program for controlling substrate processing apparatus
08/16/2007WO2007091339A1 Method of forming metal film
08/16/2007WO2007091139A1 Member for cavitation erosion resistance and method for manufacturing same
08/16/2007WO2007048993A3 Plasma abatement device
08/16/2007WO2007003502A3 Parylene coating and method for the production thereof
08/16/2007WO2005022602A3 A method and apparatus for semiconductor processing
08/16/2007US20070192057 Method and apparatus for repairing shape, and method for manufacturing semiconductor device using those
08/16/2007US20070190807 Method for forming dielectric or metallic films
08/16/2007US20070190802 Method for manufacturing semiconductor device, substrate treater, and substrate treatment system
08/16/2007US20070190800 Low-k dielectric material
08/16/2007US20070190796 Method and apparatus for manufacturing a functional layer consisting of at least two components
08/16/2007US20070190780 Atomic layer deposition of barrier materials
08/16/2007US20070190779 Diffusion Barrier Layers and Methods Comprising for Depositing Metal Films by CVD or ALD Processes
08/16/2007US20070190775 Low selectivity deposition methods
08/16/2007US20070190744 Method for fabricating semiconductor devices
08/16/2007US20070190684 Precursors for deposition of metal oxide layers or films
08/16/2007US20070190677 Semiconductor light emitting element, manufacturing method thereof, integrated semiconductor light emitting device, manufacturing method thereof, image display device, manufacturing method thereof, illuminating device and manufacturing method thereof
08/16/2007US20070190362 Patterned electroless metallization processes for large area electronics
08/16/2007US20070190266 Water vapor passivation of a wall facing a plasma
08/16/2007US20070190250 Coating with controlled grain size and morphology for enhanced wear resistance and toughness
08/16/2007US20070190249 Material for chemical vapor deposition and thin film forming method
08/16/2007US20070190248 Thin metal films by atomic layer deposition: tungsten nucleation layer over a silicon wafer; copper film from CuCl and triethylboron; vapor phase pulses in inert gas
08/16/2007US20070190247 Method for forming organic light-emitting layer
08/16/2007US20070190235 Film forming apparatus, film forming method, and manufacturing method of light emitting element
08/16/2007US20070190232 Utilize a Fourier transform infrared (FTIR) spectrometer to characterize the porosity of low porous dielectric constant film, and assess the effectiveness of sealing pores in the film
08/16/2007US20070189953 Method for obtaining carbon nanotubes on supports and composites comprising same
08/16/2007US20070187704 Semiconductor light emitting element, manufacturing method thereof, integrated semiconductor light emitting device, manufacturing method thereof, image display device, manufacturing method thereof, illuminating device and manufacturing method thereof
08/16/2007US20070187363 Substrate processing apparatus and substrate processing method
08/16/2007US20070187235 Substrate holder and sputtering apparatus having same
08/16/2007US20070186952 Method of cleaning substrate processing chamber, storage medium, and substrate processing chamber
08/16/2007US20070186858 Susceptor
08/16/2007US20070186857 Plasma processing apparatus and method of using the same
08/16/2007US20070186856 Plasma processing apparatus having high frequency power source with sag compensation function and plasma processing method
08/16/2007US20070186855 Plasma processing reactor with multiple capacitive and inductive power sources
08/16/2007US20070186854 Apparatus and method for plasma processing
08/16/2007US20070186853 System and method for varying wafer surface temperature via wafer-carrier temperature offset
08/16/2007US20070186852 Manufacturing apparatus
08/16/2007US20070186851 Vacuum chamber system for semiconductor processing
08/16/2007US20070186850 Substrate processing apparatus and substrate processing method
08/16/2007US20070186849 Deposition apparatus and method for depositing film
08/16/2007DE10222958B4 Verfahren zur Herstellung eines organischen elektro-optischen Elements und organisches elektro-optisches Element A method of manufacturing an organic electro-optical element and an organic electro-optical element
08/16/2007DE102006007267A1 Two-stage process to dope a semiconductor by atomization of alcoholized droplets followed by heating
08/16/2007DE102004059616B4 Verfahren zum Reinigen einer Halbleitervorrichtungs-Herstellungsvorrichtung A method of cleaning a semiconductor device manufacturing apparatus
08/15/2007EP1817500A2 Fore-line preconditioning for vacuum pumps
08/15/2007EP1817442A1 Machining tool
08/15/2007EP1817440A1 Method and device for the deposition of gallium nitrite layers on a sapphire substrate and associated substrate holder
08/15/2007EP1721025B1 Vaporizing temperature sensitive materials for oled
08/15/2007EP1517863B1 Method and device for vaporizing a liquid reactant in manufacturing a glass preform
08/15/2007EP1425432A4 Atmospheric pressure wafer processing reactor having an internal pressure control system and method
08/15/2007EP1299571B1 Apparatus for performing at least one process on a substrate
08/15/2007EP1276356B1 Apparatus for plasma processing
08/15/2007EP1226286A4 Apparatus for atomic layer chemical vapor deposition
08/15/2007EP1166323B1 Method and apparatus for compensating non-uniform wafer processing in plasma processing
08/15/2007EP1125321B1 Chemical deposition reactor and method of forming a thin film using the same
08/15/2007CN2935467Y Anti-corrosion aluminum element with multi-coating
08/15/2007CN1332420C Preloaded plasma reactor device and its use
08/15/2007CN1332064C Method of lowering residual fluorind in sedimentation reaction chamber cavity body
08/15/2007CN1332063C Strip coating installation with a vacuum chamber and a coating cylinder
08/15/2007CN101018890A Cemented carbide insert for wear resistance demanding short hole drilling operations
08/15/2007CN101018889A Cutting tool with oxide coating
08/15/2007CN101018887A Plasma enhanced chemical vapor deposition apparatus and method
08/15/2007CN101018886A Plasma uniformity control by gas diffuser curvature
08/15/2007CN101018885A Semiconductor processing components and semiconductor processing utilizing same
08/15/2007CN101018884A Apparatus including gas distribution member supplying process gas and radio frequency (RF) power for plasma processing
08/15/2007CN101017771A Gas supply apparatus, substrate processing apparatus and gas supply method
08/15/2007CN101017769A Plasma processing apparatus and plasma processing method
08/15/2007CN101016625A Imperceptible electric spark deposition processing pulse power source in gas medium
08/15/2007CN101016624A Plasma chemical gas phase deposition apparatus and plasma surface treatment method
08/15/2007CN101016623A Method and device for coating non-metallic material with ferromagnetic and magnetic metal plating coat
08/15/2007CN101016622A Chemical vapor deposition apparatus for flat display
08/15/2007CN101015783A Preparing method and device of composite material of black lead for synthesizing diamond and catalyst
08/14/2007US7256370 Vacuum thermal annealer
08/14/2007US7256145 Manufacture of semiconductor device having insulation film of high dielectric constant
08/14/2007US7256144 Method for forming a metal oxide film
08/14/2007US7256139 Methods and apparatus for e-beam treatment used to fabricate integrated circuit devices
08/14/2007US7255898 Zirconia toughened ceramic components and coatings in semiconductor processing equipment and method of manufacture thereof
08/14/2007US7255775 Semiconductor wafer treatment member
08/14/2007US7255774 Process apparatus and method for improving plasma production of an inductively coupled plasma
08/14/2007US7255773 Plasma processing apparatus and evacuation ring
08/14/2007US7255772 High pressure processing chamber for semiconductor substrate
08/14/2007US7255748 Apparatus for integrated monitoring of wafers and for process control in semiconductor manufacturing and a method for use thereof
08/14/2007US7255744 Low-resistivity n-type semiconductor diamond and method of its manufacture
08/09/2007WO2007089712A2 Composite diamond assembly
08/09/2007WO2007088692A1 Plasma etching method
08/09/2007WO2007088292A1 Dli-mocvd process for making electrodes for electrochemical reactors
08/09/2007WO2007088291A1 Cathode for electrochemical reactor, electrochemical reactor incorporating such cathodes and method for making said cathode
08/09/2007WO2007088249A1 Protective coating of silver
08/09/2007WO2007087708A1 Organic nanofluids, method and reactor for synthesis thereof
08/09/2007WO2006104864A3 A plasma enhanced atomic layer deposition system
08/09/2007WO2006090046A3 Composite material consisting of a porous matrix and metal or metal oxide nanoparticles
08/09/2007WO2005013334A3 Holder for supporting wafers during semiconductor manufacture
08/09/2007US20070184745 Aligning OLED substrates to a shadow mask
08/09/2007US20070184617 Method for manufacturing semiconductor device
08/09/2007US20070184210 chemical vapor deposition; atomic layer deposition; nitridation
08/09/2007US20070184195 Mask film formation method and mask film formation apparatus
08/09/2007US20070184191 Plasma enhanced cemical vapor deposition of microcrystalline silicon for solar cells with a balanced amorpnous phase by variation of conditions like high frequency, power density and bias current; suppression of the photodegradation at a high level; cost efficiency
08/09/2007US20070184190 Method for producing carbon nanowalls, carbon nanowall, and apparatus for producing carbon nanowalls
08/09/2007US20070184189 Method that allows one part of an atomic layer deposition (ALD) process sequence to occur at a first temperature while allowing another part of the ALD process sequence to occur at a second temperature; can switch between these two thermal states in rapid succession
08/09/2007US20070184188 Method for cleaning a thin film forming apparatus and method for forming a thin film using the same
08/09/2007US20070184187 Process for the preparation of a composite material
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