| Patents for C23C 16 - Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition (cvd) processes (71,892) |
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| 08/29/2007 | CN200940159Y Leading-out electrode sealing device for resistance chemical vapor deposition furnace |
| 08/29/2007 | CN101027941A Organic el light emitting element, manufacturing method thereof and display |
| 08/29/2007 | CN101027798A Protected polymeric film |
| 08/29/2007 | CN101027426A Method for deposition of ruthenium metal layers in a thermal chemical vapor deposition process |
| 08/29/2007 | CN101027425A Thin diamond film coating method and cemented carbide member coated with diamond thin film |
| 08/29/2007 | CN101027424A System for and method of manufacturing a large-area backplane by use of a small-area shadow mask |
| 08/29/2007 | CN101026921A Plasma generation apparatus and work processing apparatus |
| 08/29/2007 | CN101026920A Plasma generation apparatus and work processing apparatus |
| 08/29/2007 | CN101026083A Reactor chip manufacturing method |
| 08/29/2007 | CN101024893A Method for micro-wave plasma low-temperature synthesizing film |
| 08/29/2007 | CN101024876A Method and use of synthesizing nano diamond on metal base |
| 08/29/2007 | CN101024213A Method for producing chip-bearing disc protective layer |
| 08/29/2007 | CN100334924C Method and device for microwave plasma deposition of a coating on a thermoplastic container surface |
| 08/29/2007 | CN100334703C Method of calibrating and using a semiconductor processing system |
| 08/29/2007 | CN100334692C Constant pressure control method for process reaction chamber and pressure regulating valve thereof |
| 08/29/2007 | CN100334262C Method for producing single crystal of multi- element oxide single crystal containing bismuth as constituting element |
| 08/29/2007 | CN100334253C Wiring repair apparatus |
| 08/28/2007 | US7263447 Method and apparatus for electron density measurement and verifying process status |
| 08/28/2007 | US7262500 Interconnection structure |
| 08/28/2007 | US7262133 Enhancement of copper line reliability using thin ALD tan film to cap the copper line |
| 08/28/2007 | US7262132 Metal plating using seed film |
| 08/28/2007 | US7262125 Method of forming low-resistivity tungsten interconnects |
| 08/28/2007 | US7261919 Controlling stress in the deposited silicon carbide film by controlling pressure in the reaction chamber during chemical vapor deposition; microelectromechanical systems (MEMS); nanomechanical devices |
| 08/28/2007 | US7261796 Method and apparatus for aligning a machine tool |
| 08/28/2007 | US7261779 System, method, and apparatus for continuous synthesis of single-walled carbon nanotubes |
| 08/28/2007 | US7261118 Method and vessel for the delivery of precursor materials |
| 08/28/2007 | CA2350384C Thin alkali metal film member and method of producing the same |
| 08/28/2007 | CA2241678C Silicon dioxide deposition by plasma activated evaporation process |
| 08/23/2007 | WO2007095407A1 Film precursor evaporation system and method of using |
| 08/23/2007 | WO2007051994A3 Nanoparticle and nanocomposite films |
| 08/23/2007 | WO2006055937A8 Systems and methods for achieving isothermal batch processing of substrates used for the production of micro-electro-mechanical systems |
| 08/23/2007 | US20070197810 Copper(I) formate complexes |
| 08/23/2007 | US20070197407 Lubricated part having partial hard coating allowing reduced amounts of antiwear additive |
| 08/23/2007 | US20070197398 Copper film deposition method |
| 08/23/2007 | US20070197031 Methods for forming rhodium-containing layers such as platinum-rhodium barrier layers |
| 08/23/2007 | US20070197028 Formation of boride barrier layers using chemisorption techniques |
| 08/23/2007 | US20070197027 Formation of boride barrier layers using chemisorption techniques |
| 08/23/2007 | US20070196682 Three dimensional multilayer barrier and method of making |
| 08/23/2007 | US20070196670 Absorber coating of titaniuim aluminum nitride, second absorber layer of titanium aluminum oxynitride and a third antireflection layer of silicon nitride; multilayer coating provides oxidation resistance, chemical resistance, stable microstructure, and high hardness, heat resistance at high-temperature |
| 08/23/2007 | US20070196662 depositing onto a substrate, a powder form of a material acting as a thermal barrier; low thermal conductivity, good lifetime, good resistance to erosion, and high yield and deposition rates |
| 08/23/2007 | US20070196591 Support and organic electroluminescence element comprising the support |
| 08/23/2007 | US20070196576 Flexible display device having enhanced thin film semiconductive layer and method of manufacture |
| 08/23/2007 | US20070196575 Metal film is fabricated to provide uniform catalytic sites to facilitate uniform growth of carbon nanotubes; film comprises an active component and an inactive component wherein active component is capable of catalyzing formation of carbon nanotubes at 300-1200 degrees C. in presence of carbon precursor |
| 08/23/2007 | US20070196574 Method and device for coating of a component part |
| 08/23/2007 | US20070196564 Electron emitting member and manufacturing method thereof, cold cathode field emission device and manufacturing method thereof |
| 08/23/2007 | US20070196561 Apparatus and method for the manufacture of a three- dimensional object |
| 08/23/2007 | US20070195853 Heat treatment apparatus and method of calibrating the apparatus |
| 08/23/2007 | US20070194470 Direct liquid injector device |
| 08/23/2007 | US20070193688 Process tuning gas injection from the substrate edge |
| 08/23/2007 | US20070193520 Lift pin calibrator and method of setting position of lift pin using the same |
| 08/23/2007 | US20070193519 Large area deposition in high vacuum with high thickness uniformity |
| 08/23/2007 | US20070193518 Plasma generator |
| 08/23/2007 | US20070193517 Plasma generation apparatus and work processing apparatus |
| 08/23/2007 | US20070193516 Plasma generation apparatus and work processing apparatus |
| 08/23/2007 | US20070193515 Apparatus for generating remote plasma |
| 08/23/2007 | US20070193514 Method and apparatus for measuring electron density of plasma and plasma processing apparatus |
| 08/23/2007 | US20070193513 Plasma generating method, plasma generating apparatus, and plasma processing apparatus |
| 08/23/2007 | US20070193512 Plasma generating method, plasma generating apparatus, and plasma processing apparatus |
| 08/23/2007 | US20070193505 Apparatus and method for diamond production |
| 08/22/2007 | EP1820939A1 Method and apparatus for the coating of turbine blades |
| 08/22/2007 | EP1820881A2 Low-K dielectric layers for large substrates |
| 08/22/2007 | EP1820005A1 Method for applying selectively a layer to a structured substrate by the usage of a temperature gradient in the substrate |
| 08/22/2007 | EP1819843A1 Improved deposition rate plasma enhanced chemical vapor process |
| 08/22/2007 | EP1819841A2 Scratch resistant coated glass article including layer(s) resistant to fluoride-based etchant(s), and method of making article using combustion cvd |
| 08/22/2007 | EP1566081B1 Method and device for microwave plasma deposition of a coating on a thermoplastic container surface |
| 08/22/2007 | EP1547138B1 Methods for producing silicon nitride films and silicon oxynitride films by thermal chemical vapor deposition |
| 08/22/2007 | EP1376668B1 Microwave plasma process device, plasma ignition method, plasma forming method, and plasma process method |
| 08/22/2007 | CN2937155Y Device for depositing eka-diamond membrane on aluminium surface |
| 08/22/2007 | CN1333489C Plasma resonant cavity tunable waveguide device |
| 08/22/2007 | CN1333106C Liquid material gasifying and supply device |
| 08/22/2007 | CN101023714A Plasma processing apparatus |
| 08/22/2007 | CN101023713A Plasma processing apparatus |
| 08/22/2007 | CN101023516A Process for film production and semiconductor device utilizing film produced by the process |
| 08/22/2007 | CN101023515A Substrate treating apparatus and semiconductor device manufacturing method |
| 08/22/2007 | CN101023508A Improved method and apparatus for the etching of microstructures |
| 08/22/2007 | CN101023499A 透明导电膜 The transparent conductive film |
| 08/22/2007 | CN101023201A Apparatus for the optimization of atmospheric plasma in a plasma processing system |
| 08/22/2007 | CN101023200A Susceptor for vapor deposition apparatus |
| 08/22/2007 | CN101023199A Pulsed mass flow delivery system and method |
| 08/22/2007 | CN101023198A Cleaning process and operating process for a CVD reactor |
| 08/22/2007 | CN101023197A 晶片加热器组件 Wafer heater assembly |
| 08/22/2007 | CN101022912A Portable arc-seeded microwave plasma torch |
| 08/22/2007 | CN101021005A Deposition apparatus and method for depositing film |
| 08/21/2007 | US7259409 Thin film device and its fabrication method |
| 08/21/2007 | US7259094 Apparatus and method for heat treating thin film |
| 08/21/2007 | US7259085 Method for forming thin film, substrate having thin film formed by the method, and photoelectric conversion device using the substrate |
| 08/21/2007 | US7259058 Fabricating method of semiconductor integrated circuits |
| 08/21/2007 | US7259019 For quantifying or identifying components of interest in a biological system, such as in an animal |
| 08/21/2007 | US7258934 outer layer presents a different microstructure than the inner layer; especially dysprosia-stabilized zirconia; low thermal conductivity, sufficient mechanical strength and low weight; gas turbine engines |
| 08/21/2007 | US7258899 Selecting a porous substrate, selecting a precursor, wetting said surface of said porous substrate with precursor solution to coat said porous substrate, removing liquid solvent, introducing precursor coated porous substrate into plasma reaction chamber; evacuating |
| 08/21/2007 | US7258895 First species monolayer is chemisorbed onto a substrate within a chamber from a gaseous first precursor, exposing the substrate having the discontinuous first species monolayer to a gaseous second precursor, exposing the substrate having the second species monolayer and the reaction product to gas |
| 08/21/2007 | US7258892 Methods and systems for controlling temperature during microfeature workpiece processing, e.g., CVD deposition |
| 08/21/2007 | US7258807 Controlled growth of gallium nitride nanostructures |
| 08/21/2007 | US7258768 Method of fabricating an EL display device, and apparatus for forming a thin film |
| 08/21/2007 | US7258746 Coating apparatus for segments of cylindrical substrates |
| 08/21/2007 | US7258725 Gas supplying method and system |
| 08/21/2007 | CA2331438C Manufacturing method and apparatus of fiber reinforced composite member |
| 08/16/2007 | WO2007092442A1 System and method for producing and delivering vapor |
| 08/16/2007 | WO2007092130A2 Dry etch and epitaxial deposition process and apparatus |
| 08/16/2007 | WO2007091638A1 Susceptor and apparatus for manufacturing epitaxial wafer |