Patents for C23C 16 - Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition (cvd) processes (71,892)
09/2007
09/07/2007WO2007100297A1 Porous layer
09/07/2007WO2007099973A1 Beam detecting member and beam detector using it
09/07/2007WO2007099491A1 Processing assembly and method for processing a wafer in such a processing assembly
09/07/2007WO2007099490A1 Processing assembly and method for processing a batch of wafers
09/07/2007WO2007070116A3 Remote chamber method using sulfur fluoride for removing surface deposits from the interior of a cvd /pecvd- plasma chamber
09/07/2007WO2006085925A3 Synthesis of a self assembled hybrid of ultrananocrystalline diamond and carbon nanotubes
09/06/2007US20070208120 Polyvinyl alcohol composition includes 50-99 wt % partially hydrolyzed first polyvinyl alcohol resin having a degree of hydrolysis in the range of 80-90 percent and 1-50 wt % of a second polyvinyl alcohol resin having an elevated degree of hydrolysis; protective coatings for automobiles
09/06/2007US20070207610 Semiconductor device, semiconductor wafer, and methods of producing same device and wafer
09/06/2007US20070207321 Method For Treating Surface Of Material, Surface-Treated Material, Medical Material, And Medical Instrument
09/06/2007US20070207319 Composite material and process for preparing a composite material
09/06/2007US20070207276 Plasma processing method and plasma processing apparatus
09/06/2007US20070207268 Ribbed CVC structures and methods of producing
09/06/2007US20070207267 Disposable liners for etch chambers and etch chamber components
09/06/2007US20070207266 Method and apparatus for coating particulates utilizing physical vapor deposition
09/06/2007US20070207261 Cooling solid organic material in an evaporization apparatus below the vaporization temperature, heating a second region of the vaporization apparatus above the vaporization temperature of the material so that there is a steep thermal gradient, vaporizing thin cross section of solid organic material
09/06/2007US20070207260 Coating plant and associated coating process
09/06/2007US20070207259 Track lithography system with integrated photoresist pump, filter, and buffer vessel
09/06/2007US20070205452 Method for forming a metal oxide film
09/06/2007US20070205095 Placing substrate on stage within chamber; depositing a matrix thin film nanodots on substrate by introducing a reaction gas and generating plasma, while doping deposited matrix thin film with a light emitting material by sputtering light emitting material; for light emission in nano-size photonic device
09/06/2007US20070204958 Plasma processing apparatus
09/06/2007US20070204907 Apparatus and method of gas injection sequencing
09/06/2007US20070204798 Apparatus for evaporating vapor-deposition material
09/06/2007US20070204797 Methods and apparatus for selective pre-coating of a plasma processing chamber
09/06/2007US20070204796 Vapor phase deposition apparatus and support table
09/06/2007US20070204794 Method and apparatus for an improved baffle plate in a plasma processing system
09/06/2007US20070204792 Vaporizer with Integral Diaphragm
09/06/2007DE19516446B4 Verfahren zur Herstellung eines Dünnschichthalbleiterbauelements über einer TCO-Elektrodenschicht A method for producing a thin film semiconductor device on a TCO electrode layer
09/06/2007DE112005002353T5 Verfahren zur Herstellung von Sammelleitungen aus Kupfer Process for the preparation of collecting lines of copper
09/06/2007DE102006009822A1 Verfahren und Vorrichtung zur Plasmabehandlung von akali- und erdalkalihaltigen Oberflächen Method and apparatus for plasma treatment of surfaces akali- and alkaline earth
09/06/2007DE102006009460A1 Process device used in production of integrated circuits comprises process chamber, holder within chamber for holding substrate, radiation source, radiation detector and control and evaluation unit
09/05/2007EP1830396A1 Magnetic fluid sealing unit for semiconductor wafer vertical heat treating apparatus
09/05/2007EP1830392A2 Thermal processing system with accross-flow liner
09/05/2007EP1829986A1 Method for treating surfaces of a hard carbon coating
09/05/2007EP1828433A1 Method for manufacturing a pecvd carbon coated polymer article and article obtained by such method
09/05/2007EP1828432A2 Method for protecting parts made of creep-resistant steel from corroding
09/05/2007EP1828431A2 Method for preparing nanoparticles of a metal or a metal alloy, dispersed on a substrate, by chemical vapour deposition
09/05/2007EP1828430A2 Method for deposition of metal layers from metal carbonyl precursors
09/05/2007EP1704756B1 Plasma treatment of large-scale components
09/05/2007EP1479056B1 Device for depositing thin layers with a wireless detection of process parameters
09/05/2007EP1390559B1 Method for producing a layer with a predefined layer thickness profile
09/05/2007EP1373278A4 Metalloamide and aminosilane precursors for cvd formation of dielectric thin films
09/05/2007EP1326718B2 Method and apparatus for forming a coating
09/05/2007EP1200981B1 Gas distribution apparatus for semiconductor processing
09/05/2007EP1030788B1 Plasma processing methods and apparatus
09/05/2007CN101032007A Method for forming copper wiring
09/05/2007CN101032000A Method and system for forming a passivated metal layer
09/05/2007CN101031677A Surface and composition enhancements to high aspect ratio c-mems
09/05/2007CN101031671A Epitaxial reactor cooling method and reactor cooled thereby
09/05/2007CN101031670A Substrate stage mechanism and substrate processing apparatus
09/05/2007CN101031669A Multilayer coatings by plasma enhanced chemical vapor deposition
09/05/2007CN101030524A Corrosion resistant multilayer member
09/05/2007CN101029385A Microwave plasma back-coating and re-coating method for CVD diamond coating cutter
09/05/2007CN101029384A A method for thin film vapor deposition of dialkyl amido dihydro aluminium compound
09/05/2007CN100336176C Heat treatment method and heat treatment apparatus
09/05/2007CN100336175C Method of forming nanocrystals
09/05/2007CN100336165C Gas injection apparatus for semiconductor processing system
09/05/2007CN100336139C Formation of thin film resistors
09/05/2007CN100335889C Evaporating/ feeding system for organic metal compound
09/05/2007CN100335677C DC electric arc plasma chemical vapor deposition apparatus and diamond coating method
09/05/2007CN100335487C Hexakis (monohydrocarbylamino) disilanes and method for the preparation thereof
09/05/2007CN100335434C Article having nano-scaled structures and a process for making such article
09/05/2007CN100335376C Plastic containers coated on the inner surface and process for production thereof
09/04/2007US7265963 Holding mechanism of object to be processed
09/04/2007US7265427 Semiconductor apparatus and method of manufacturing the semiconductor apparatus
09/04/2007US7265407 Capacitive electrode having semiconductor layers with an interface of separated grain boundaries
09/04/2007US7265233 Organometallic iridium compound, process for producing the same and process for preparing film
09/04/2007US7264850 Plasma enhanced chemical vapor deposition of a diamond-like carbon film by generating a plasma in a form of plane perpendicular to a substrate for depositing the film, and forming the film on a magnetic layer over the substrate using the plasma; useful for fabricating a magnetic recording medium
09/04/2007US7264849 Roll-vortex plasma chemical vapor deposition method
09/04/2007US7264846 Ruthenium layer formation for copper film deposition
09/04/2007US7264742 Method of planarizing a surface
09/04/2007US7264741 Coater having substrate cleaning device and coating deposition methods employing such coater
09/04/2007US7264699 Workpiece holder for processing apparatus, and processing apparatus using the same
09/04/2007US7264688 Plasma reactor apparatus with independent capacitive and toroidal plasma sources
09/04/2007US7264679 Cleaning of chamber components
09/04/2007US7264677 Process for treating solid surface and substrate surface
09/04/2007US7264676 Plasma apparatus and method capable of adaptive impedance matching
08/2007
08/30/2007WO2007098438A2 Direct liquid injector device
08/30/2007WO2007098071A2 Process tuning gas injection from the substrate edge
08/30/2007WO2007097432A1 Method for forming amorphous carbon film and method for manufacturing semiconductor device using same
08/30/2007WO2007097270A1 Film forming apparatus and substrate processing method
08/30/2007WO2007097024A1 Vaporizer, semiconductor production apparatus and process of semiconductor production
08/30/2007WO2007095973A1 Integrated system for semiconductor substrate processing using liquid phase metal deposition
08/30/2007US20070202270 Method And Apparatus For Coating A Substrate Using Dielectric Barrier Discharge
08/30/2007US20070202255 Titanium Or Titanium Alloy Adhesive Resin Composition Prepreg And Composite Material
08/30/2007US20070202254 Process for forming cobalt-containing materials
08/30/2007US20070202253 Thin organic alignment layers with a batch process for liquid crystal displays
08/30/2007US20070199660 Bonded body, wafer support member using the same, and wafer treatment method
08/30/2007US20070199659 Pedestal for furnace
08/30/2007US20070199658 Integrated capacitive and inductive power sources for a plasma etching chamber
08/30/2007US20070199510 Systems and methods for sealing in site-isolated reactors
08/30/2007US20070199509 Apparatus for the efficient coating of substrates
08/30/2007DE102007006786A1 Installation for coating a substrate comprises a diffusion barrier arranged in a gas discharge zone to keep the gas with layer-forming materials from an insulator
08/30/2007DE10051509B4 Verfahren zur Herstellung eines Dünnschichtsystems und Anwendung des Verfahrens A method for producing a thin-layer system and use of the method
08/29/2007EP1826248A1 Container fastening coating composition, container fastening coating, its manufacture and application
08/29/2007EP1825025A2 METHODS FOR MAKING HIGH-TEMPERATURE COATINGS HAVING PT METAL MODIFIED GAMMA-Ni + GAMMA'-Ni3AL ALLOY COMPOSITIONS AND A REACTIVE ELEMENT
08/29/2007EP1825020A1 Liquid precursor refill system
08/29/2007EP1825019A2 Low temperature sin deposition methods
08/29/2007EP1660871A4 Photoluminescent heterodiamondoids as biological labels
08/29/2007EP1305453A4 Ring-shaped high-density plasma source and method
08/29/2007EP1042531B1 Material deposition