Patents for C23C 16 - Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition (cvd) processes (71,892)
09/2007
09/19/2007CN101039993A Process for plasma coating
09/19/2007CN101039801A Gas barrier laminated film and laminated material using it
09/19/2007CN101039544A Plasma processor with electrode simultaneously responsive to plural frequencies
09/19/2007CN101038943A Method for preparation of a-b orientated ZnO nanometer linear array
09/19/2007CN101038859A Plasma processing apparatus and electrode used therein
09/19/2007CN101037768A Method and device for plating diamond like film on inner-outer wall of quartz round tube
09/19/2007CN101037767A Diamond film formation method and film formation jig thereof
09/19/2007CN101037566A Wear resistant low friction coating composition, coated components, and method for coating thereof
09/19/2007CN100338977C Gel and powder making
09/19/2007CN100338734C Susceptor, vapor phase growth device, device and method of manufacturing epitaxial wafer, and epitaxial wafer
09/19/2007CN100338733C Group III nitride semiconductor crystal, production method thereof and group III nitride semiconductor epitaxial wafer
09/19/2007CN100337881C DLC film coated plastic container, and device and method for manufacturing the plastic container
09/18/2007US7271111 Shadow mask deposition of materials using reconfigurable shadow masks
09/18/2007US7271096 Method for improved deposition of dielectric material
09/18/2007US7271082 Method of manufacturing a semiconductor device
09/18/2007US7271077 Deposition methods with time spaced and time abutting precursor pulses
09/18/2007US7271071 Method of forming a catalytic surface comprising at least one of Pt, Pd, Co and Au in at least one of elemental and alloy forms
09/18/2007US7271038 Methods of forming ruthenium film by changing process conditions during chemical vapor deposition and ruthenium films formed thereby
09/18/2007US7270851 depositing monomer from the vapor phase onto the surface of the aerogel substrate under deposition conditions effective to produce a vapor pressure sufficient to cause the vapor phase monomer to penetrate into the bubble matrix and deposit onto the surface of the aerogel substrate, polymerizing
09/18/2007US7270850 Mesoporous permeation layers for use on active electronic matrix devices
09/18/2007US7270849 Organic siloxane copolymer film, method and deposition apparatus for producing same, and semiconductor device using such copolymer film
09/18/2007US7270848 depositing a Ru metal layer on a patterned substrate; thermal chemical vapor deposition using process gas containing Ru3(CO)12 precursor vapor and a CO gas
09/18/2007US7270724 Scanning plasma reactor
09/18/2007US7270715 Chemical vapor deposition apparatus
09/18/2007US7270713 Tunable gas distribution plate assembly
09/18/2007US7270709 Method and apparatus of generating PDMAT precursor
09/18/2007US7270708 Susceptor, vapor phase growth apparatus, epitaxial wafer manufacturing apparatus, epitaxial wafer manufacturing method, and epitaxial wafer
09/13/2007WO2007103812A1 Method for low temperature production of nano-structured iron oxide coatings
09/13/2007WO2007103598A2 Silicon photovoltaic cell junction formed from thin film doping source
09/13/2007WO2007102923A2 Methods and arrangement for implementing highly efficient plasma traps
09/13/2007WO2007102444A1 Method for production of diamond electrodes
09/13/2007WO2007102333A1 Methods of depositing ruthenium film and memory medium readable by computer
09/13/2007WO2007102288A1 Method of making hcd gas harmless and apparatus therefor
09/13/2007WO2007101465A1 Method for coating a blade and blade of a gas turbine
09/13/2007WO2006092550A8 Trap device
09/13/2007WO2005108641A3 Multi-workpiece processing chamber
09/13/2007US20070212811 Low temperature CVD process with selected stress of the CVD layer on CMOS devices
09/13/2007US20070212543 Coloured diamond
09/13/2007US20070212497 Making a hard disk drive platter of glassy metal layer (zirconium, titanium, nickel, copper, beryllium) onaluminum-alloy substrate and adding a strengthing layer (siicon nitride) and a magnetic layer; injection molding; central aperture; faster rotation by a spindle motor; cost/energy efficiecency
09/13/2007US20070212487 Effect pigments based on coated glass flakes
09/13/2007US20070212486 Plasma Enhanced Chemical Vapor Deposition of Metal Oxide
09/13/2007US20070212485 Gasification monitor, method for detecting mist, film forming method and film forming apparatus
09/13/2007US20070212484 Exhaust apparatus configured to reduce particle contamination in a deposition system
09/13/2007US20070212288 Effluent gas stream treatment system having utility for oxidation treatment of semiconductor manufacturing effluent gases
09/13/2007US20070210431 Support with integrated deposit of gas absorbing material for manufacturing microelectronic microoptoelectronic or micromechanical devices
09/13/2007US20070209686 Apparatus for cleaning chamber using gas separation type showerhead
09/13/2007US20070209677 Self-Cleaning Catalytic Chemical Vapor Deposition Apparatus And Cleaning Method Thereof
09/13/2007US20070209593 Semiconductor wafer cooling device
09/13/2007US20070209592 Low-pressure process apparatus
09/13/2007US20070209591 Substrate processing system, substrate surface processing apparatus, substrate surface inspecting apparatus, substrate surface inspecting method, and storage medium storing program for implementing the method
09/13/2007US20070209590 Sealing device and method for a processing system
09/13/2007US20070209589 Slab cross flow cvd reactor
09/13/2007US20070209588 Exhaust system for a vacuum processing system
09/13/2007US20070209533 Metallic Thin Film Chip Producing Method and Metallic Thin Film Chip Producing Apparatus
09/13/2007DE102006010929A1 Coating process for gas turbine components involves closing up openings in components through plastics closures which are then removed after coating the component with the coating material
09/13/2007DE102005050374B4 Gleitschicht mit verschleißmindernden Ausscheidungen und Verfahren zur Herstellung einer solchen Gleitschicht Sliding layer with wear-reducing secretions and method for producing such a sliding layer
09/13/2007DE102005013532B4 EUV-Lithographiesystem und Retikelhalter zum Lösen von Retikeln in einer vakuumisolierten Umgebung EUV lithography system and reticle for solving reticles in a vacuum-insulated environment
09/13/2007CA2633206A1 Method for coating a blade and blade of a gas turbine
09/12/2007EP1832364A1 Surface coating cutter
09/12/2007EP1832351A2 Low dielectric materials and methods for making same
09/12/2007EP1832340A1 Process and device for partial surface treatment of a component by low pressure plasma generated in a vacuum chamber
09/12/2007EP1831437A1 Cvd reactor comprising an rf-heated treatment chamber
09/12/2007EP1831429A2 Methods and apparatus for sequentially alternating among plasma processes in order to optimize a substrate
09/12/2007EP1831425A2 Method and apparatus for processing metal bearing gases
09/12/2007EP1831424A1 Ultra hydrophilic ti-o-c based nano film and fabrication method thereof
09/12/2007EP1831422A2 Device for the tempered storage of a container
09/12/2007EP1831408A2 Composition and process for enhanced properties of ferrous components
09/12/2007EP0996765B1 Substrate processing apparatus having a substrate transport with a front end extension and an internal substrate buffer
09/12/2007EP0953064B1 Reagent supply vessel for chemical vapor deposition
09/12/2007CN101036420A Microwave plasma processing apparatus
09/12/2007CN101036219A 等离子体成膜方法和等离子体成膜装置 The plasma film forming method and a plasma film forming apparatus
09/12/2007CN101036215A Chemical vapor deposition reactor
09/12/2007CN101035933A Nitride semiconductor single crystal including ga, method for manufacturing the same, and substrate and device using the crystal
09/12/2007CN101035923A Method of making vapour deposited oxygen-scavenging particles
09/12/2007CN101033544A Continuous synthesis method for rare earth ion nitriding-rare earth ion plating composite coating
09/12/2007CN101033541A Method of forming siliceous film and of reducing particle number
09/12/2007CN101033540A Apparatus for cleaning chamber using gas separation type showerhead
09/12/2007CN101033537A Vaporizer delivery ampoule
09/12/2007CN100337348C Method for preparing negative pole of lithium secondary cell
09/12/2007CN100337313C Plasma processing device and baffle plate thereof
09/12/2007CN100337310C Low-resistance n type semiconductor diamond and process for producing the same
09/12/2007CN100336936C Process for reducing particles in low pressure chemical vapor deposition equipment
09/12/2007CN100336586C Submerged plasma generator, method of generating plasma in liquid and method of decomposing toxic substance with plasma in liquid
09/11/2007US7269343 Heating configuration for use in thermal processing chambers
09/11/2007US7268365 Porous solid of copper, silicon wafers, or silicon dioxide coated with a barrier layer with a complex of a substituted diimine or diamine propyl group
09/11/2007US7268322 Semiconductor heating apparatus
09/11/2007US7268321 Wafer holder and semiconductor manufacturing apparatus
09/11/2007US7268089 Method for forming PE-TEOS layer of semiconductor integrated circuit device
09/11/2007US7268047 Semiconductor device and method for manufacturing the same
09/11/2007US7268035 Methods of forming semiconductor constructions comprising cerium oxide and titanium oxide
09/11/2007US7267848 Method of fabricating a protective film by use of vacuum ultraviolet rays
09/11/2007US7267843 Textile fabric and yarn composed of synthetic fibers, preparation thereof and use thereof
09/11/2007US7267842 Method for removing titanium dioxide deposits from a reactor
09/11/2007US7267741 Silicon carbide components of semiconductor substrate processing apparatuses treated to remove free-carbon
09/11/2007US7267731 close to the designed shape using a focused charged-particle beam by reducing the effects of etching and deposition which vary according to various conditions when a processing work is performed
09/11/2007US7267725 Thin-film deposition apparatus
09/11/2007US7267724 Thin-film disposition apparatus
09/11/2007US7267701 TiBN coating
09/11/2007US7267132 Methods for removing silicon and silicon-nitride contamination layers from deposition tubes
09/11/2007CA2206679C Plasma processor for large workpieces