| Patents for C23C 16 - Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition (cvd) processes (71,892) |
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| 09/26/2007 | EP1837904A2 Method for manufacturing buried insulating layer type single crystal silicon carbide substrate and corresponding manufacturing device |
| 09/26/2007 | EP1837319A2 Products in the form of tiles or slabs consisting of agglomerated stone surface-treated by low-temperature polymerisation of an organic or inorganic film |
| 09/26/2007 | EP1837161A1 Sealing Device |
| 09/26/2007 | EP1725504B1 Method for depositing gallium oxide coatings on flat glass |
| 09/26/2007 | EP1678351B1 Method and system for selectively coating metal surfaces |
| 09/26/2007 | EP1299900A4 METHOD FOR ACHIEVING IMPROVED EPITAXY QUALITY (SURFACE TEXTURE AND DEFECT DENSITY) ON FREE-STANDING (ALUMINUM, INDIUM, GALLIUM) NITRIDE ((Al,In,Ga)N) SUBSTRATES FOR OPTO-ELECTRONIC AND ELECTRONIC DEVICES |
| 09/26/2007 | EP1252647B1 Impedance adapted microwave energy coupling device |
| 09/26/2007 | EP1029109B1 Long life high temperature process chamber |
| 09/26/2007 | CN200952035Y Improved plasma vacuum film-coating device |
| 09/26/2007 | CN200952034Y Super large plasma vacuum coating device |
| 09/26/2007 | CN101044603A 等离子体cvd装置 Plasma cvd device |
| 09/26/2007 | CN101044598A Hdp-cvd multistep gapfill process |
| 09/26/2007 | CN101044263A Method and device for applying an electrically conductive transparent coating to a substrate |
| 09/26/2007 | CN101044262A Remote chamber methods for removing surface deposits |
| 09/26/2007 | CN101044261A Process for formation of copper-containing film |
| 09/26/2007 | CN101043001A Vapor-phase epitaxial growth method and vapor-phase epitaxy apparatus |
| 09/26/2007 | CN101042993A 氧化铝烧结体 Alumina sintered body |
| 09/26/2007 | CN101042992A Vertical plasma processing apparatus for semiconductor process |
| 09/26/2007 | CN101042990A Plasma processing apparatus and method |
| 09/26/2007 | CN101042978A Apparatus for shielding process chamber port having dual zone and optical access features |
| 09/26/2007 | CN101042570A Micro-mechanical piece made from insulating material and method of manufacture therefor |
| 09/26/2007 | CN101041893A Apparatus for depositing atomic layer using gas separation type showerhead |
| 09/26/2007 | CN101041892A Graphite washing unit |
| 09/26/2007 | CN100339945C Plasma processing system and cleaning method for the same |
| 09/26/2007 | CN100339942C Gas driven planetary rotation apparatus and methods for forming silicon carbide layers |
| 09/26/2007 | CN100339505C Surface activated plasma CVD system |
| 09/26/2007 | CN100339504C Supplying device of chemical gaseous phase deposition solid state precusor |
| 09/26/2007 | CN100339503C Silicon carbide-coated carbonaceous material and carbonaceous material to be coated with silicon carbide |
| 09/25/2007 | US7274038 Silicon nitride film, a semiconductor device, a display device and a method for manufacturing a silicon nitride film |
| 09/25/2007 | US7274006 Heater |
| 09/25/2007 | US7274005 Bake plate having engageable thermal mass |
| 09/25/2007 | US7274004 Method and apparatus for controlling the spatial temperature distribution across the surface of a workpiece support |
| 09/25/2007 | US7273818 Film formation method and apparatus for semiconductor process |
| 09/25/2007 | US7273799 Deposition over mixed substrates |
| 09/25/2007 | US7273793 Methods of filling gaps using high density plasma chemical vapor deposition |
| 09/25/2007 | US7273772 Method for manufacturing thin film transistor array panel |
| 09/25/2007 | US7273665 Surface-coated cermet cutting tool with hard coating layer having excellent chipping resistance |
| 09/25/2007 | US7273660 Mixed composition interface layer and method of forming |
| 09/25/2007 | US7273655 Slidably movable member and method of producing same |
| 09/25/2007 | US7273638 High density plasma oxidation |
| 09/25/2007 | US7273635 Concentration of aluminum trichloride (AlCl3) in the coating chamber and/or the total pressure of coating gas is reduced to provide an unexpected increase in growth rate of an outwardly grown aluminide diffusion coating and improved oxidation resistance |
| 09/25/2007 | US7273536 Conductive diamond electrode and process for producing the same |
| 09/25/2007 | US7273534 Optical device substrate film-formation apparatus, optical disk substrate film-formation method, substrate holder manufacture method, substrate holder, optical disk and a phase-change recording type of optical disk |
| 09/25/2007 | US7273533 Plasma processing system with locally-efficient inductive plasma coupling |
| 09/25/2007 | US7273526 Thin-film deposition apparatus |
| 09/25/2007 | US7273525 Methods for forming phosphorus- and/or boron-containing silica layers on substrates |
| 09/20/2007 | WO2007106462A2 Temperature controlled cold trap for a vapour deposition process and uses thereof |
| 09/20/2007 | WO2007106418A1 Glazing system with high glass transition temperature decorative ink |
| 09/20/2007 | WO2007106332A2 Transfer of wafers with edge grip |
| 09/20/2007 | WO2007106180A2 Photovoltaic contact and wiring formation |
| 09/20/2007 | WO2007105432A1 METHOD FOR FORMING Ti-BASED FILM AND STORAGE MEDIUM |
| 09/20/2007 | WO2007105431A1 Substrate processing apparatus and substrate processing method |
| 09/20/2007 | WO2007105428A1 Plasma generation device nozzle, plasma generation device, plasma surface treatment device, plasma generation method, and plasma surface treatment method |
| 09/20/2007 | WO2007105412A1 Method of seasoning film-forming apparatus |
| 09/20/2007 | WO2007105010A1 Apparatus for treating a gas stream |
| 09/20/2007 | WO2007104765A1 Method and device for coating an inner surface of a hollow endless geometry, in particular of a pipe |
| 09/20/2007 | WO2007015248A3 Method for preparation of stable metal oxide nanoparticles suspensions |
| 09/20/2007 | WO2006022778A3 Plasma arc coating system |
| 09/20/2007 | US20070218706 Heat treating apparatus, heat treating method, and storage medium |
| 09/20/2007 | US20070218702 Semiconductor-processing apparatus with rotating susceptor |
| 09/20/2007 | US20070218701 Semiconductor-processing apparatus with rotating susceptor |
| 09/20/2007 | US20070218688 Method for depositing tungsten-containing layers by vapor deposition techniques |
| 09/20/2007 | US20070218687 Process for producing materials for electronic device |
| 09/20/2007 | US20070218683 Method of integrating PEALD Ta- containing films into Cu metallization |
| 09/20/2007 | US20070218283 Method of Producing Carbon-Encapsulated Metal Nanoparticles |
| 09/20/2007 | US20070218266 Components with bearing or wear-resistant surfaces |
| 09/20/2007 | US20070218265 Photo-induced hydrophilic article and method of making same |
| 09/20/2007 | US20070218215 Plasma processing method and color filter manufactured by using the same and process for manufacturing color filter by using the same |
| 09/20/2007 | US20070218213 Method of manufacturing liquid crystal alignment film |
| 09/20/2007 | US20070218205 Chemical vapor deposition of high conductivity, adherent thin films of ruthenium |
| 09/20/2007 | US20070218204 Apparatus and process for surface treatment of substrate using an activated reactive gas |
| 09/20/2007 | US20070218203 Method and Equipment for Forming Oxide Film |
| 09/20/2007 | US20070218202 Directed assembly of highly-organized carbon nanotube architectures |
| 09/20/2007 | US20070218200 Method and apparatus for reducing particle formation in a vapor distribution system |
| 09/20/2007 | US20070218199 Crucible eliminating line of sight between a source material and a target |
| 09/20/2007 | US20070218197 Vacuum processing system and method of making |
| 09/20/2007 | US20070217460 Nitride semiconductor device and process for producing the same |
| 09/20/2007 | US20070217119 Apparatus and Method for Carrying Substrates |
| 09/20/2007 | US20070215454 Method for Oxidizing Substance and Oxidation Apparatus Therefor |
| 09/20/2007 | US20070215284 Plasma processing apparatus and electrode assembly for plasma processing apparatus |
| 09/20/2007 | US20070215049 Transfer of wafers with edge grip |
| 09/20/2007 | US20070215048 Method and apparatus for reducing particle contamination in a deposition system |
| 09/20/2007 | US20070215047 Vacuum Device Where Power Supply Mechanism Is Mounted And Power Supply Method |
| 09/20/2007 | US20070215036 Method and apparatus of time and space co-divided atomic layer deposition |
| 09/20/2007 | US20070214834 Method for Producing a Hollow Cylinder From Synthetic Quartz Glass, Using a Retaining Device |
| 09/20/2007 | US20070214599 Exhaust Gas Treatment |
| 09/20/2007 | DE202006007937U1 Plasmabehandlungsanlage Plasma treatment plant |
| 09/20/2007 | DE19913123B4 Kristallwachstumsverfahren für Dünnfilme aus BiSrCaCuO-Oxiden Crystal growth method for thin films of oxides BiSrCaCuO |
| 09/20/2007 | DE102006012021A1 Verfahren und Vorrichtung zum Beschichten einer Innenfläche einer hohlen Endlosgeometrie, insbesondere eines Rohres Method and apparatus for coating an interior surface of a hollow continuous geometry, in particular a tube |
| 09/20/2007 | DE102005061248B4 Systemträger mit in Kunststoffmasse einzubettenden Oberflächen, Verfahren zur Herstellung eines Systemträgers und Verwendung einer Schicht als Haftvermittlerschicht System carrier having embedded in plastics material surfaces, methods of manufacturing a system carrier, and use of a layer as a bonding layer |
| 09/20/2007 | CA2645621A1 Method and device for coating an inner surface of a hollow endless geometry, in particular of a pipe |
| 09/19/2007 | EP1834933A1 Process for producing glass plate with thin film |
| 09/19/2007 | EP1834925A1 Apparatus for manufacturing carbon film by plasma cvd, method for manufacturing the same, and carbon film |
| 09/19/2007 | EP1834008A2 Al2o3 multilayer plate |
| 09/19/2007 | EP1833759A2 High purity granular silicon and method of manufacturing the same |
| 09/19/2007 | EP1368505B1 A ccvd method for producing tubular carbon nanofibers |
| 09/19/2007 | CN101040368A Method for fabrication of group iii nitride semiconductor |
| 09/19/2007 | CN101040061A An elongated gas ditribution system |
| 09/19/2007 | CN101040060A Vapor deposition systems and methods |
| 09/19/2007 | CN101040059A Heat transfer system for improved semiconductor processing uniformity |