Patents
Sitemap › C23 - Coating metallic material; Coating material with metallic material; Chemical surface treatment; Diffusion treatment of metallic material; Coating by vacuum evaporation, by sputtering, by ion implantation or by chemical vapour deposition, in general; Inhibiting corrosion of metallic material or incrustation in general › C23C - Coating metallic material; Coating material with metallic material; Surface treatment of metallic material by diffusion into the surface, by chemical conversion or substitution; Coating by vacuum evaporation, by sputtering, by ion implantation or by chemical vapour deposition, in general › C23C 16 - Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition (cvd) processes
Patents for C23C 16 - Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition (cvd) processes (71,892)
10/2007
10/04/2007US20070231493 Method for forming a patterned array of carbon nanotubes
10/04/2007US20070231490 Uniformly vaporizing metals and organic materials
10/04/2007US20070231489 Method for introducing a precursor gas to a vapor deposition system
10/04/2007US20070231488 Method for Producing Virtual Ge Substrates for III/V-Integration on Si(001)
10/04/2007US20070231487 Method of forming a metal carbide or metal carbonitride film having improved adhesion
10/04/2007US20070231485 Silane process chamber with double door seal
10/04/2007US20070231484 Method and apparatus for processing polysilazane film
10/04/2007US20070231462 Polymerizing vinylidene fluoride in the presence of a free radical catalyst to form a green powder having a specific crystal structure; forming a film of the polyvinylidene fluoride; and subjectng the film to polarization
10/04/2007US20070231460 Film formation method
10/04/2007US20070231459 Change rate prediction method, storage medium, and substrate processing system
10/04/2007US20070231251 Capacitor Film Forming Material
10/04/2007US20070227668 Plasma processing apparatus
10/04/2007US20070227666 Plasma processing apparatus
10/04/2007US20070227664 Plasma processing apparatus and plasma processing method
10/04/2007US20070227661 Microwave plasma processing apparatus, method for manufacturing microwave plasma processing apparatus and plasma processing method
10/04/2007US20070227554 Semiconductor processing with a remote plasma source for self-cleaning
10/04/2007US20070227451 Device for producing excited and/or ionized particles in a plasma
10/04/2007US20070227450 Plasma Cvd Equipment
10/04/2007US20070227449 Plasma processing apparatus and method
10/04/2007US20070227441 Method of manufacturing epitaxial silicon wafer and apparatus thereof
10/03/2007EP1840249A2 Silicone carbide film and method for manufacturing the same
10/03/2007EP1840243A2 Susceptor for epitaxial growth and epitaxial growth method
10/03/2007EP1840242A1 Void apparatus with a movable guiding rail
10/03/2007EP1840241A2 Atomic deposition layer methods
10/03/2007EP1838896A2 Alloyed tungsten produced by chemical vapour deposition
10/03/2007EP1838895A2 Low friction sliding mechanism
10/03/2007EP1838894A2 Pentaborane(9) storage and delivery
10/03/2007EP1838893A1 Thin films prepared with gas phase deposition technique
10/03/2007EP1838640A2 Fine-laminar barrier protection layer
10/03/2007EP1730087B1 Process for the deposition of aluminium oxide coatings
10/03/2007EP1549780A4 Substrate processing apparatus and related systems and methods
10/03/2007EP1316108B9 Fabrication process of a semiconductor device comprising an intermediate low-dielectric silicon nitride film
10/03/2007EP1305161B1 Electronic and optical materials
10/03/2007EP1213749B1 Plasma processing apparatus and method of plasma processing
10/03/2007EP0990059B1 Low temperature chemical vapor deposition process for forming bismuth-containing ceramic thin films useful in ferroelectric memory devices
10/03/2007CN101048853A Precursor for film formation and method for forming ruthenium-containing film
10/03/2007CN101048852A Substrate carrier for parallel wafer processing reactor
10/03/2007CN101048533A Abrasion resistant coatings by plasma enhanced chemical vapor diposition
10/03/2007CN101048532A Improved deposition rate plasma enhanced chemical vapor process
10/03/2007CN101048531A Protective coating on a substrate and method of making thereof
10/03/2007CN101048029A Microwave plasma processing apparatus, method for manufacturing microwave plasma processing apparatus and plasma processing method
10/03/2007CN101047118A Plasma processing apparatus and plasma processing method
10/03/2007CN101047114A Plasma processing apparatus and plasma processing method
10/03/2007CN101047113A Plasma processing apparatus and plasma processing method
10/03/2007CN101047112A Plasma processing method and plasma processing apparatus
10/03/2007CN101045990A Etch resistant heater and assembly thereof
10/03/2007CN100341386C Inductive coupled antenna and plasma processor using the same
10/03/2007CN100341120C Plasma processing device and method thereof
10/03/2007CN100341116C Porous substrate and its manufacturing method, and GaN semiconductor multilayer substrate and its manufacturing method
10/03/2007CN100341047C Film forming method and system
10/03/2007CN100340701C Method for modifying surface of solid material, surface-modified solid material and device for modifying surface of solid material
10/02/2007US7277892 Database processing system, method, program and program storage device
10/02/2007US7276458 Anti-ballistic fabric or other substrate
10/02/2007US7276444 Method for processing interior of vapor phase deposition apparatus, method for depositing thin film and method for manufacturing semiconductor device
10/02/2007US7276301 Surface-coated cermet cutting tool with a hard coating layer exhibiting excellent chipping resistance
10/02/2007US7276125 Barrel type susceptor
10/02/2007US7276124 Reactor having a movable shutter
10/02/2007US7276123 Semiconductor-processing apparatus provided with susceptor and placing block
10/02/2007US7276122 Multi-workpiece processing chamber
10/02/2007US7275553 Liquid processing apparatus and liquid processing method
10/02/2007US7275305 Method of manufacturing a thin-film magnetic head
09/2007
09/27/2007WO2007109482A2 Diffusion barrier coatings having graded compositions and devices incorporating the same
09/27/2007WO2007109410A2 Method and apparatus for reducing particle contamination in a deposition system
09/27/2007WO2007108952A2 High throughput deposition apparatus with magnetic support
09/27/2007WO2007108871A1 Pressure control system with optimized performance
09/27/2007WO2007108514A1 Glass plate having antibacterial film, method of producing the same and article having the glass plate
09/27/2007WO2007108401A1 Semiconductor device manufacturing method and substrate processing apparatus
09/27/2007WO2007108394A1 Laminated body and carbon film deposition method
09/27/2007WO2007092130A3 Dry etch and epitaxial deposition process and apparatus
09/27/2007US20070224837 Method for producing material of electronic device
09/27/2007US20070224833 Method of forming carbon polymer film using plasma CVD
09/27/2007US20070224817 Plasma processing apparatus, plasma processing method, and storage medium
09/27/2007US20070224777 Substrate Holder Having a Fluid Gap and Method of Fabricating the Substrate Holder
09/27/2007US20070224548 High performance display or electronic applications, lower cost of manufacture; semiconductor material, attached to a second layer including a glass or glass-ceramic, with the strain point of the glass or glass-ceramic equal to or greater than about 800 degrees
09/27/2007US20070224413 Transparent barrier sheet and production method of transparent barrier sheet
09/27/2007US20070224410 Electrodes, printing plate precursors and other articles including multi-strata porous coatings, and method for their manufacture
09/27/2007US20070224394 Transparent barrier sheet and preparation method thereof
09/27/2007US20070224393 Transparent barrier sheet and preparation method thereof
09/27/2007US20070224392 Transparent barrier sheet and production method of transparent barrier sheet
09/27/2007US20070224376 Metallized multi-layer films, methods of manufacture and articles made therefrom
09/27/2007US20070224365 High pretilt homogeneous alignment and tilted vertical alignment by surface modification of thin films with nitrogen ion beam
09/27/2007US20070224364 Plasma processing apparatus, plasma processing method, plasma film deposition apparatus, and plasma film deposition method
09/27/2007US20070224350 Edge coating in continuous deposition line
09/27/2007US20070224349 Wear-Resistant Coating and Method for Producing Same
09/27/2007US20070224348 Atomic layer deposition system and method for coating flexible substrates
09/27/2007US20070224342 Apparatus and method for forming antireflection film
09/27/2007US20070223560 Measuring device for measuring the temperature of a thermally loaded metallic base element, provided with a protective surface coating, and method for producing such a measuring device
09/27/2007US20070223176 Capacitor with hafnium oxide and aluminum oxide alloyed dielectric layer and method for fabricating the same
09/27/2007US20070221623 Plasma processing apparatus and method
09/27/2007US20070221332 Plasma processing apparatus
09/27/2007US20070221294 Plasma processing apparatus and plasma processing method
09/27/2007US20070221132 Composition, coating, coated article, and method
09/27/2007US20070221131 Vapor deposition source and vapor deposition apparatus
09/27/2007US20070221130 Substrate Processing Apparatus
09/27/2007US20070221129 Apparatus for depositing atomic layer using gas separation type showerhead
09/27/2007US20070221128 Method and apparatus for improving uniformity of large-area substrates
09/27/2007US20070221127 Bubbler for Constant Vapor Delivery of a Solid Chemical
09/27/2007US20070221119 Method of Sic Single Crystal Growth and Sic Single Crystal
09/27/2007DE102006013801A1 Device for deposition of layer on substrate, comprises reactor housing, base, process chamber, quartz gas discharge plate, gas discharge openings, broad sidewall, gas inlet device, and gas passage openings
09/27/2007DE102004034417B4 Verfahren zur Herstellung eines beschichteten Substrats mit gewölbter Oberfläche A process for preparing a coated substrate with a vaulted surface
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