Patents
Sitemap › C23 - Coating metallic material; Coating material with metallic material; Chemical surface treatment; Diffusion treatment of metallic material; Coating by vacuum evaporation, by sputtering, by ion implantation or by chemical vapour deposition, in general; Inhibiting corrosion of metallic material or incrustation in general › C23C - Coating metallic material; Coating material with metallic material; Surface treatment of metallic material by diffusion into the surface, by chemical conversion or substitution; Coating by vacuum evaporation, by sputtering, by ion implantation or by chemical vapour deposition, in general › C23C 16 - Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition (cvd) processes
Patents for C23C 16 - Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition (cvd) processes (71,892)
10/2007
10/11/2007WO2007114156A1 Atomic layer growing apparatus
10/11/2007WO2007113840A1 Articles with two crystalline materials and method of making same
10/11/2007WO2007113104A1 Novel pore-forming precursors composition and porous dielectric layers obtained there from
10/11/2007WO2007112780A1 Method for depositing silicon nitride films and/or silicon oxynitride films by chemical vapor deposition
10/11/2007WO2007112779A1 Pentakis(dimethylamino) disilane precursor comprising compound and method for the preparation thereof
10/11/2007WO2007053607A3 Pumping system for atomic layer deposition
10/11/2007WO2006118735A3 Method of making diamond-like carbon hydrophilic using barrier discharge pyrolysis
10/11/2007US20070238292 Semiconductor device manufacturing method and semiconductor manufacturing apparatus
10/11/2007US20070238199 Method for conditioning a process chamber
10/11/2007US20070237970 Diffusion barrier with low dielectric constant and semiconductor device containing same
10/11/2007US20070237947 Superhydrophobic fibers produced by electrospinning and chemical vapor deposition
10/11/2007US20070237895 Method and system for initiating a deposition process utilizing a metal carbonyl precursor
10/11/2007US20070237894 System and method for transport
10/11/2007US20070237887 Varnishing device and method for the application of varnish
10/11/2007US20070237886 Imprint lithography
10/11/2007US20070237699 Method of forming mixed rare earth oxynitride and aluminum oxynitride films by atomic layer deposition
10/11/2007US20070237698 Method of forming mixed rare earth nitride and aluminum nitride films by atomic layer deposition
10/11/2007US20070237697 Method of forming mixed rare earth oxide and aluminate films by atomic layer deposition
10/11/2007US20070236148 Plasma processing apparatus
10/11/2007US20070235890 Coated molds and related methods and components
10/11/2007US20070235339 Method and Apparatus for Treating a Fluorocompound-Containing Gas Stream
10/11/2007US20070235327 Internal coil with segmented shield and inductively-coupled plasma source and processing system therewith
10/11/2007US20070235134 Multi-zone substrate temperature control system and method of operating
10/11/2007US20070235058 System and method for removing residue from a wafer processing chamber using sound waves
10/11/2007US20070234962 System for introducing a precursor gas to a vapor deposition system
10/11/2007US20070234961 Vertical plasma processing apparatus and method for semiconductor process
10/11/2007US20070234960 Plasma processing apparatus
10/11/2007US20070234959 Evaporation apparatus, evaporation method, method of manufacturing electro-optical device, and film-forming apparatus
10/11/2007US20070234958 Apparatus for Manufacturing Magnetic Recording Disk, and In-Line Type Substrate Processing Apparatus
10/11/2007US20070234957 Method of forming oxide film and oxide deposition apparatus
10/11/2007US20070234956 Method and apparatus for providing uniform gas delivery to a reactor
10/11/2007US20070234955 Method and apparatus for reducing carbon monoxide poisoning at the peripheral edge of a substrate in a thin film deposition system
10/11/2007DE102004036170B4 Vakuumbeschichtungsanlage und Verfahren zur Vakuumbeschichtung und deren Verwendung Vacuum coating system and method for vacuum coating and their use
10/10/2007EP1843388A1 Substrate surface treating apparatus
10/10/2007EP1842943A1 Nanowire composite and preparation method thereof
10/10/2007EP1842938A2 Method and apparatus for providing uniform gas delivery to a reactor
10/10/2007EP1841897A1 Member for cavitation erosion resistance and method for manufacturing same
10/10/2007EP1841896A1 Amorphous carbon film, process for forming the same, and high wear-resistant sliding member with amorphous carbon film provided
10/10/2007EP1565929B1 Method for the plasma treatment of surfaces under vacuum
10/10/2007EP1547131A4 Large-diameter sic wafer and manufacturing method thereof
10/10/2007EP1504200B1 Method for production of a slide element
10/10/2007EP1495485A4 Remote monitoring system for chemical liquid delivery
10/10/2007EP1412101B1 Method and device for the simultaneous coating and moulding of a body
10/10/2007EP1205576B1 Method for producing ceramic
10/10/2007EP1115146B1 Method and apparatus for vacuum processing
10/10/2007CN200958115Y Crystal-growth carbon-film coater for quartz crucible
10/10/2007CN101053075A Diamond semiconductor element and method for manufacturing same
10/10/2007CN101053073A Selective w-cvd process and process for producing cu multilayer wiring
10/10/2007CN101053070A Low-k dielectric layer formed from aluminosilicate precursors
10/10/2007CN101052816A Counter track joint having track inflection point
10/10/2007CN101052754A Method of surface reconstruction for silicon carbide substrate
10/10/2007CN101052745A Apparatuses and methods for atomic layer deposition of hafnium-containing high-K dielectric materials
10/10/2007CN101052744A Apparatus for film formation and method for film formation
10/10/2007CN101052743A Divided solid composition made from particles with continuous metal deposition, and its manufacturing method and its application as catalyst mode
10/10/2007CN101052742A Remote chamber methods for removing surface deposits
10/10/2007CN101052741A Raw material liquid for metal organic chemical vapor deposition and method of producing Hf-Si containing complex oxide film using the raw material liquid
10/10/2007CN101052615A Metal compound, thin film-forming material, and method for producing thin film
10/10/2007CN101052602A Placing table structure, method for manufacturing placing table structure and heat treatment apparatus
10/10/2007CN101052463A Micro-channel reactor with catalysts applied directly to thermally-grown alumina, methods using same and oxidative dehydrogenation
10/10/2007CN101051606A Vertical plasma processing apparatus and method for semiconductor process
10/10/2007CN101050524A Method and apparatus for providing uniform gas delivery to a reactor
10/10/2007CN101050523A Method of forming oxide film and oxide deposition apparatus
10/10/2007CN101050522A Method for forming tetragonal zirconium oxide layer and method for fabricating capacitor having the same
10/10/2007CN101050521A Heat preservation apparatus of foam charcoal in use for vacuum induction gaseous phase deposition stove
10/10/2007CN100342518C Processed object processing apparatus, processed object processing method, pressure control method, processed object transfer method, and transfer apparatus
10/10/2007CN100342501C Substrate processing apparatus and substrate processing method, high speed rotary valve, and cleaning method
10/10/2007CN100342500C Method for forming dielectric film
10/10/2007CN100342496C Method and apparatus for chemical vapor deposition capable of preventing contamination and enhancing film growth rate
10/10/2007CN100342057C Gas distribution showerhead
10/09/2007US7279732 Enhanced atomic layer deposition
10/09/2007US7279434 Material and method for forming low-dielectric-constant film
10/09/2007US7279398 Microfeature workpiece processing apparatus and methods for controlling deposition of materials on microfeature workpieces
10/09/2007US7279392 Thin film structure, capacitor, and methods for forming the same
10/09/2007US7279239 Laminating product including adhesion layer and laminate product including protective film
10/09/2007US7279201 Methods and apparatus for forming precursors
10/09/2007US7279078 The coating of silicon, doped silicon, titanium or doped titanium is intentionally non-uniform and may be varied, and may have different patterns and color among different articles, and even among different areas on the same article
10/09/2007US7279068 Temperature control assembly for use in etching processes
10/09/2007US7279067 Port structure in semiconductor processing system
10/09/2007US7279049 Apparatus for reducing entrapment of foreign matter along a moveable shaft of a substrate support
10/09/2007US7279048 Semiconductor manufacturing apparatus
10/09/2007US7279047 Reactor for extended duration growth of gallium containing single crystals
10/09/2007US7279041 Atomic layer deposition methods and atomic layer deposition tools
10/09/2007US7278587 Thermal treatment apparatus and thermal treatment method
10/09/2007US7278438 Apparatus and process for refilling a bubbler
10/04/2007WO2007112394A2 Method for purifying metal carbonyl precursors
10/04/2007WO2007112179A2 Method and apparatus for improving uniformity of large-area substrates
10/04/2007WO2007111779A2 Method of integrating peald ta-containing films into cu metallization
10/04/2007WO2007111351A1 Semiconductor device manufacturing method
10/04/2007WO2007111251A1 Surface processing apparatus
10/04/2007WO2007111204A1 Electrode and vacuum processing apparatus
10/04/2007WO2007111075A1 Transparent barrier sheet and method for producing transparent barrier sheet
10/04/2007WO2007111074A1 Transparent barrier sheet and method for producing transparent barrier sheet
10/04/2007WO2007111028A1 Method for microcrystalline silicon film formation and solar cell
10/04/2007WO2007084493A3 High temperature ald inlet manifold
10/04/2007WO2007064597A3 Uniform surfaces for hybrid material substrates and methods for making and using same
10/04/2007WO2007016592A3 Gas manifold valve cluster
10/04/2007WO2006104863A3 A plasma enhanced atomic layer deposition system
10/04/2007WO2006101886A3 A plasma enhanced atomic layer deposition system and method
10/04/2007WO2006091413A3 Silicon gas injector and method of making
10/04/2007US20070231589 Thermal barrier coatings and processes for applying same
1 ... 299 300 301 302 303 304 305 306 307 308 309 310 311 312 313 314 315 316 317 318 319 ... 719