C23C 16 - Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition (cvd) processes

Patents for C23C 16 - Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition (cvd) processes (71,892)
11/2007
11/21/2007	CN101074478A Method for forming CVD film
11/21/2007	CN101074203A Metal complexes of polydentate beta-ketoiminates
11/21/2007	CN101073934A Carbon nano-pipe array/laminated composite and its production
11/21/2007	CN100350574C Method of CVD for forming silicon nitride film on substrate
11/21/2007	CN100350571C Silex glass spraying component and manufacturing method thereof
11/21/2007	CN100350551C Apparatus and method of making slip-free wafer boat
11/21/2007	CN100350545C Plasma reaction chamber component having improved temp uniformity
11/21/2007	CN100350072C Rotary type CVD film forming apparatus for mass production and method of forming a CVD film on the internal surface of a plastic container
11/21/2007	CN100350071C 包装材料 Packaging Materials
11/20/2007	US7297641 Method to form ultra high quality silicon-containing compound layers
11/20/2007	US7297368 Method of making carbon fiber-carbon matrix reinforced ceramic composites
11/20/2007	US7296534 Hybrid ball-lock attachment apparatus
11/20/2007	US7296533 Radial antenna and plasma device using it
11/20/2007	US7296532 Bypass gas feed system and method to improve reactant gas flow and film deposition
11/20/2007	CA2421538C Optical member and process for producing it and thin films
11/15/2007	WO2007131053A2 Batch processing chamber with diffuser plate and injector assembly
11/15/2007	WO2007131040A2 Method and apparatus for photo-excitation of chemicals for atomic layer deposition of dielectric film
11/15/2007	WO2007130916A2 A method of ultra-shallow junction formation using si film alloyed with carbon
11/15/2007	WO2007129773A1 Iii nitride compound semiconductor laminated structure
11/15/2007	WO2007129622A1 Thin film production equipment and inner block for thin film production equipment
11/15/2007	WO2007128061A1 Method of mounting objects for chemical vapour deposition
11/15/2007	WO2007109410A3 Method and apparatus for reducing particle contamination in a deposition system
11/15/2007	WO2006093578A3 Chuck pedestal shield
11/15/2007	WO2006055236A3 Wafer processing system and method of manufacturing wafers
11/15/2007	US20070264807 Cleaining Process and Operating Process for a Cvd Reactor
11/15/2007	US20070264508 Abrasion Resistant Coatings by Plasma Enhanced Chemical Vapor Diposition
11/15/2007	US20070264507 Method for depositing zinc oxide coatings on flat glass
11/15/2007	US20070264444 Particle-measuring system and particle-measuring method
11/15/2007	US20070264443 Apparatus and method for avoidance of parasitic plasma in plasma source gas supply conduits
11/15/2007	US20070264441 Plasma Processing Apparatus and Plasma Processing Method
11/15/2007	US20070264429 Method of depositing zinc oxide coatings on a substrate
11/15/2007	US20070264428 Corrosion Preventing Method
11/15/2007	US20070264427 Thin film formation by atomic layer growth and chemical vapor deposition
11/15/2007	US20070264421 Method for Producing Multiple Layer Systems
11/15/2007	US20070264420 Method of detecting the dryness of a water based composition used in an automated process
11/15/2007	US20070262307 Method of forming an oxygen- or nitrogen-terminated silicon nanocrystalline structure and an oxygen- or nitrogen-terminated silicon nanocrystalline structure formed by the method
11/15/2007	US20070261956 Coating installation with carrier for substrate coating
11/15/2007	US20070261638 Coating layer thickness measurement mechanism and coating layer forming apparatus using the same
11/15/2007	DE10342548B4 Schnelle Abscheidung von Borsilicatglasfilmen Rapid separation of Borsilicatglasfilmen
11/15/2007	DE102006022799A1 Vorrichtung zur plasmagestützten chemischen Oberflächenbehandlung von Substraten im Vakuum Apparatus for plasma-assisted chemical surface treatment of substrates in vacuum
11/15/2007	DE102006021539A1 Verfahren zur Herstellung von Bauteilen für den Raketenbau Method for producing components for rocket
11/15/2007	CA2587583A1 Solid electrolyte and method of producing the same
11/14/2007	EP1854907A2 Device for plasma-based chemical treatment of surfaces of substrates in a vacuum
11/14/2007	EP1854906A2 Analysis of a reactive gas such as silane for particle generating impurities
11/14/2007	EP1854905A1 Method for manufacturing components for rocket construction
11/14/2007	EP1854559A2 Method for cleaning a source liquid feed conduit
11/14/2007	EP1853748A2 High temperature chemical vapor deposition apparatus
11/14/2007	EP1853747A1 Trap device
11/14/2007	EP1853746A1 Diamond-coated bearing or seal structure and fluid machine comprising the same
11/14/2007	EP1853745A2 Ruthenium layer deposition apparatus and method
11/14/2007	EP1771599B1 Epitaxial reactor with susceptor controlled positioning
11/14/2007	EP1540714A4 Barrier coatings produced by atmospheric glow discharge
11/14/2007	EP1376665B1 Gaseous phase growing device
11/14/2007	EP1123639A4 Wafer level burn-in and test thermal chuck and method
11/14/2007	EP1110248B1 Method for depositing layers of high quality semiconductor material
11/14/2007	EP1074042B1 Synchronous multiplexed near zero overhead architecture for vacuum processes
11/14/2007	EP0914497B1 Hard graphite-like material bonded by diamond-like framework
11/14/2007	CN101072900A CVD reactor comprising an rf-heated treatment chamber
11/14/2007	CN101072895A Substrate temperature control for combustion chemical vapor deposition
11/14/2007	CN101072894A Method for deposition of metal layers from metal carbonyl precursors
11/14/2007	CN101071763A Method of gap-filling using amplitude modulation radiofrequency power and apparatus for the same
11/14/2007	CN101071755A Decoupled chamber body
11/14/2007	CN101070611A Gallium-nitride metal organic-matter chemical gas-phase depositing apparatus for super-high vertical reactor
11/14/2007	CN101070593A Ultrasonic-atomizing heat-decomposing compound semiconductor film preparing system
11/14/2007	CN100349269C Laser anneal equipment and laser film forming method
11/14/2007	CN100349262C Heat treatment apparatus
11/14/2007	CN100349261C Method and device for plasma CVD
11/14/2007	CN100349253C Tool for handling wafers and epitaxial growth station
11/14/2007	CN100349043C Processing apparatus and method for removing particles therefrom
11/14/2007	CN100348969C Evaporating/ feeding system for liquid organic metal compound
11/14/2007	CN100348774C Nano-diamond film suitable for SAW device, its preparation method and use
11/14/2007	CN100348288C Trapping device, processing system, and method for removing impurities
11/13/2007	US7294588 In-situ-etch-assisted HDP deposition
11/13/2007	US7294556 Method of forming trench isolation in the fabrication of integrated circuitry
11/13/2007	US7294553 Plasma-enhanced chemical vapour deposition process for depositing silicon nitride or silicon oxynitride, process for producing one such layer arrangement, and layer arrangement
11/13/2007	US7294546 Capacitor for a semiconductor device and method of fabricating same
11/13/2007	US7294528 Supercritical fluid-assisted deposition of materials on semiconductor substrates
11/13/2007	US7294361 Method and device for gas phase diffusion coating of metal components
11/13/2007	US7294360 optical structure having a surface with uneven structures is exposed one or more precursor vapors to create a self-limiting film growth on the surface of the optical structure. The film thickness may be increased and controlled by subsequent exposures; atomic layer deposition
11/13/2007	US7294283 Penning discharge plasma source
11/13/2007	US7294245 Cover ring and shield supporting a wafer ring in a plasma reactor
11/13/2007	US7294209 Apparatus and method for depositing material onto a substrate using a roll-to-roll mask
11/13/2007	US7294208 Apparatus for providing gas to a processing chamber
11/13/2007	US7294207 Gas-admission element for CVD processes, and device
11/13/2007	US7294205 Method for reducing the intrinsic stress of high density plasma films
11/13/2007	US7293852 Deposition of soluble materials using an inkjet print head and CCD microscope
11/13/2007	US7293526 Plasma reaction chamber liner consisting essentially of osmium
11/08/2007	WO2007127657A2 Increased polysilicon deposition in a cvd reactor
11/08/2007	WO2007127294A2 Exhaust system
11/08/2007	WO2007127007A2 System and method for transport
11/08/2007	WO2007126585A2 Process for atomic layer deposition
11/08/2007	WO2007126582A2 Apparatus for atomic layer deposition
11/08/2007	WO2007126016A1 Film position adjusting method, memory medium and substrate processing system
11/08/2007	WO2007125837A1 METHOD FOR DEPOSITING Ti FILM
11/08/2007	WO2007125836A1 METHOD FOR DEPOSITING Ti FILM
11/08/2007	WO2007125589A1 Plasma display panel and film forming apparatus used for manufacturing same
11/08/2007	WO2007125174A1 Hot source
11/08/2007	WO2007125159A1 Surface modified aerosol particles, a method and apparatus for production thereof and powders and dispersions containing said particles
11/08/2007	WO2007124890A1 Multifunctional hard material layers
11/08/2007	WO2007106462A3 Temperature controlled cold trap for a vapour deposition process and uses thereof

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