| Patents for C23C 16 - Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition (cvd) processes (71,892) |
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| 11/08/2007 | WO2007066215A3 High crystalline quality synthetic diamond |
| 11/08/2007 | WO2007035199A3 Deposition apparatus for the formation of polycrystalline materials on mobile substrates |
| 11/08/2007 | WO2007027436A3 Processing thin wafers |
| 11/08/2007 | US20070260097 Deposition of Polymeric Materials and Precursors Therefor |
| 11/08/2007 | US20070259532 Producing Method of Semiconductor Device and Substrate Processing Apparatus |
| 11/08/2007 | US20070259212 Methods of forming metal thin films, lanthanum oxide films, and high dielectric films for semiconductor devices using atomic layer deposition |
| 11/08/2007 | US20070259204 Diamond Thin Film Coating Method and Diamond-Coated Cemented Carbide Member |
| 11/08/2007 | US20070259192 Method for producing components for rocket construction |
| 11/08/2007 | US20070259184 Method of mounting objects for chemical vapour deposition |
| 11/08/2007 | US20070259132 Composite material |
| 11/08/2007 | US20070259130 System for Low-Energy Plasma-Enhanced Chemical Vapor Deposition |
| 11/08/2007 | US20070259129 Controlled zone microwave plasma system |
| 11/08/2007 | US20070259128 Method for controlled density growth of carbon nanotubes |
| 11/08/2007 | US20070259113 Silicon Monoxide Vapor Deposition Material, Silicon Powder for Silicon Monoxide Raw Material, and Method for Producing Silicon Monoxide |
| 11/08/2007 | US20070259112 Gas manifolds for use during epitaxial film formation |
| 11/08/2007 | US20070259111 Method and apparatus for photo-excitation of chemicals for atomic layer deposition of dielectric film |
| 11/08/2007 | US20070259110 Plasma, uv and ion/neutral assisted ald or cvd in a batch tool |
| 11/08/2007 | US20070257372 Method for Forming Ti Film and Tin Film, Contact Structure, Computer Readable Storing Medium and Computer Program |
| 11/08/2007 | US20070256934 Apparatus and Method for Coating Substrates With Approximate Process Isolation |
| 11/08/2007 | US20070256639 Process furnance or the like |
| 11/08/2007 | US20070256638 Electrode plate for use in plasma processing and plasma processing system |
| 11/08/2007 | US20070256637 Methods and apparatus for using a reinforced diffuser in substrate processing |
| 11/08/2007 | US20070256636 Gas preheater for chemical vapor processing furnace |
| 11/08/2007 | US20070256635 UV activation of NH3 for III-N deposition |
| 11/08/2007 | US20070256627 Method of ultra-shallow junction formation using si film alloyed with carbon |
| 11/08/2007 | DE69837289T2 Vorrichtung zur Förderung von Chemischen Wirkstoffen Device for conveying chemical agents |
| 11/08/2007 | DE112004002976T5 Organisches lichtemittierendes Element, Herstellungsverfahren hierfür und Anzeigevorrichtung An organic light emitting element display device manufacturing method thereof and |
| 11/08/2007 | CA2688288A1 Surface modified aerosol particles, a method and apparatus for production thereof and powders and dispersions containing said particles |
| 11/08/2007 | CA2650722A1 Increased polysilicon deposition in a cvd reactor |
| 11/07/2007 | EP1852897A1 Nitride semiconductor material and method for manufacturing nitride semiconductor crystal |
| 11/07/2007 | EP1852522A1 Vapor deposited film by plasma cvd method |
| 11/07/2007 | EP1852438A1 Tantalum compound, method for producing same, tantalum-containing thin film and method for forming same |
| 11/07/2007 | EP1852407A1 Tantalum carbide-covered carbon material and process for producing the same |
| 11/07/2007 | EP1851359A2 Composite material consisting of a porous matrix and metal or metal oxide nanoparticles |
| 11/07/2007 | EP1851358A1 Method for the densification of thin porous substrates by means of vapour phase chemical infiltration and device for loading such substrates |
| 11/07/2007 | EP1851357A2 Apparatus and process for carbon nanotube growth |
| 11/07/2007 | EP1850993A1 Saw band and method for the production of a saw band |
| 11/07/2007 | EP1425110A4 A method of depositing an inorganic film on an organic polymer |
| 11/07/2007 | EP1406847B1 Visible-light-responsive photoactive coating, coated article and method of making same |
| 11/07/2007 | EP1029942B1 Vacuum device |
| 11/07/2007 | EP0960435B1 Methods for minimizing as-deposited stress in tungsten silicide films |
| 11/07/2007 | CN101069300A Process for producing organic el panel and process for producing organic el display device |
| 11/07/2007 | CN101068950A Gas distribution system |
| 11/07/2007 | CN101068614A Methods and apparatus for downstream dissociation of gases |
| 11/07/2007 | CN101067986A High temperature capacitors and method of manufacturing the same |
| 11/07/2007 | CN101066844A Antireflective protecting DLC/BP film for infrared optical window and its prepn |
| 11/07/2007 | CN101066842A Process and apparatus for preparing amorphous hydrosilicon film |
| 11/07/2007 | CN100348078C Ecr等离子体源和ecr等离子体装置 Ecr plasma source and ecr plasma device |
| 11/07/2007 | CN100347890C Method for forming inorganic solid electrolyte film |
| 11/07/2007 | CN100347834C Methods for producing silicon nitride films and silicon oxynitride films by thermal chemical vapor deposition |
| 11/07/2007 | CN100347832C Method of producing electronic device material |
| 11/07/2007 | CN100347831C Deposition method and semiconductor device |
| 11/07/2007 | CN100347823C Heat treating system and heat treating method |
| 11/07/2007 | CN100347817C Plasma processing apparatus |
| 11/07/2007 | CN100347815C Method for cleaning deposition chambers for high dielectric constant materials |
| 11/07/2007 | CN100347343C Method for preparing thin film of transparent hydrophobic born nitride |
| 11/07/2007 | CN100347335C Method for depositing inorganic/organic films |
| 11/07/2007 | CN100347334C Double-frequency vacuum sediment equipment having radiofrequency power supply feeding unit |
| 11/07/2007 | CN100347229C Process and apparatus for depositing plasma coating onto a container |
| 11/07/2007 | CN100346938C Openable chip accessing manipulator for high vacuum chemical vapor deposition and epitaxial system |
| 11/06/2007 | USRE39912 Coated inserts for rough milling |
| 11/06/2007 | US7291535 Method and apparatus for fabricating semiconductor device |
| 11/06/2007 | US7291530 Semiconductor storage device and method of manufacturing the same |
| 11/06/2007 | US7291360 Chemical vapor deposition plasma process using plural ion shower grids |
| 11/06/2007 | US7291224 Covering assembly for crucible used for evaporation of raw materials |
| 11/06/2007 | CA2380595C Anti-reflection coatings and coated articles |
| 11/05/2007 | CA2582312A1 A method for the manufacture of a coating |
| 11/01/2007 | WO2007124032A2 Dual plasma beam sources and method |
| 11/01/2007 | WO2007123212A1 METHOD FOR DEPOSITING Ti FILM |
| 11/01/2007 | WO2007123211A1 METHOD FOR DEPOSITING Ti FILM |
| 11/01/2007 | WO2007123102A1 Film forming apparatus and barrier film manufacturing method |
| 11/01/2007 | WO2007122859A1 Cutting tool, method for producing same and cutting method |
| 11/01/2007 | WO2007122418A1 Method of treating a gas stream |
| 11/01/2007 | WO2007122225A1 Process furnace or the like. |
| 11/01/2007 | WO2007122147A1 Apparatus and method for controlling the surface temperature of a substrate in a process chamber |
| 11/01/2007 | WO2007122137A1 Cvd reactor having a process chamber lid which can be lowered |
| 11/01/2007 | WO2007061980A8 Deposition of ruthenium oxide coatings on a substrate |
| 11/01/2007 | WO2007041012A3 Batch wafer handling system |
| 11/01/2007 | WO2007011613A3 Method of protecting a bond layer in a substrate support adapted for use in a plasma processing system |
| 11/01/2007 | WO2007008653A3 Method for depositing silicon-containing films |
| 11/01/2007 | WO2006116326A3 Method for decreasing chemical diffusion in parylene and trapping at parylene-to-parylene interfaces |
| 11/01/2007 | WO2005052998A3 Gas distribution showerhead featuring exhaust apertures |
| 11/01/2007 | US20070254481 Method for forming tungsten materials during vapor deposition processes |
| 11/01/2007 | US20070254477 Film forming method, fabrication process of semiconductor device, computer-readable recording medium and sputtering apparatus |
| 11/01/2007 | US20070254173 Tool for machining |
| 11/01/2007 | US20070254113 Plasma processing apparatus having an evacuating arrangement to evacuate gas from gas-introducing part of a process chamber |
| 11/01/2007 | US20070254101 Film Forming Equipment and Film Forming Method |
| 11/01/2007 | US20070254100 MOCVD reactor without metalorganic-source temperature control |
| 11/01/2007 | US20070254096 Apparatus and Method for Cleaning at Least One Process Chamber for Coating at Least One Substrate |
| 11/01/2007 | US20070254094 Method and apparatus for controlling dispense operations in a track lithography tool |
| 11/01/2007 | US20070254093 MOCVD reactor with concentration-monitor feedback |
| 11/01/2007 | US20070254092 Systems and Methods for Detecting Abnormal Dispense of Semiconductor Process Fluids |
| 11/01/2007 | US20070253881 A Silicon Nitride Film, A Semiconductor Device, A Display Device and a Method for Manufacturing a Silicon Nitride Film |
| 11/01/2007 | US20070252873 Liquid discharge head substrate, liquid discharge head using the substrate, and manufacturing method therefor |
| 11/01/2007 | US20070252299 Synchronization of precursor pulsing and wafer rotation |
| 11/01/2007 | US20070252092 Method for depositing a film using a charged particle beam, method for performing selective etching using the same, and charged particle beam equipment therefor |
| 11/01/2007 | US20070251457 Electrode cover and evaporation device |
| 11/01/2007 | US20070251456 Composite heater and chill plate |
| 11/01/2007 | US20070251455 Increased polysilicon deposition in a CVD reactor |
| 11/01/2007 | US20070251454 Plasma Surface Processing System and Supply Device for Plasma Processing Solution Therefor |