C23C 16 - Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition (cvd) processes

Patents for C23C 16 - Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition (cvd) processes (71,892)
11/2007
11/29/2007	US20070272153 Apparatus for low-temperature plasma treatment
11/29/2007	US20070272122 Reactive coatings for regioselective surface modification
11/29/2007	DE102006024433A1 Verschleißfeste Kette mit Verschleißschutzbeschichtung in nanokristalliner Struktur Wear resistant chain with wear-resistant coating in nanocrystalline structure
11/29/2007	DE10194692B4 Verfahren zur chemischen Aufdampfung zur Bildung einer dielektrischen Schicht mit hohem K-Wert und Verfahren zur Bildung eines Kondensators Chemical vapor deposition method for forming a dielectric layer with a high K-value and method for forming a capacitor
11/29/2007	CA2652586A1 Wear resistant coating
11/29/2007	CA2650894A1 Superconducting thin film material and method for manufacturing the same
11/28/2007	EP1860690A2 Process for producing silicon oxide films from organoaminosilane precursors
11/28/2007	EP1860685A1 Transparent conductive film forming apparatus, multilayer transparent conductive film continuously forming apparatus and method of film forming therewith
11/28/2007	EP1860208A1 Delivery device
11/28/2007	EP1859077A2 Systems and methods for achieving isothermal batch processing of substrates used for the production of micro-electro-mechanical systems
11/28/2007	EP1859073A1 Method for producing coated carbon particles and use of the latter in anode materials for lithium-ion batteries
11/28/2007	EP1859072A2 Deposition of polymeric materials and precursors therefor
11/28/2007	EP1858695A2 Coated article with anti-reflective coating and method of making same
11/28/2007	EP1858651A1 Sealable biaxially oriented polypropylene film for packaging
11/28/2007	EP1552034B1 Apparatus and method for depositing an oxide film
11/28/2007	CN200983358Y Improved structure of vacuum cavity
11/28/2007	CN200983104Y A set for detecting exception operation of conveyer
11/28/2007	CN101080511A Method and apparatus for forming a thin-film solar cell using a continuous process
11/28/2007	CN101079379A Integrated process modulation (IPM) novel method for gapfill with HDP-CVD
11/28/2007	CN101078110A Semiconductor manufacturing device
11/28/2007	CN101078109A Process for producing silicon oxide films from organoaminosilane precursors
11/28/2007	CN101078108A Silicon coating by silane cracking method
11/28/2007	CN101077823A 气化器 Gasifier
11/28/2007	CN101077492A Ultrasonics gasifier
11/28/2007	CN100352316C Plasma processor and plasma processing method
11/28/2007	CN100352017C Semiconductor device and method for manufacturing semiconductor device
11/28/2007	CN100352002C Method of growing nitride single crystal, nitride semiconductor light emitting device, method of manufacturing the same
11/28/2007	CN100351989C Plasma apparatus with device for reducing polymer deposition on a substrate and method for reducing polymer deposition
11/28/2007	CN100351427C Process for preparing nano composite ultra-hard film material by industrial equipment
11/28/2007	CN100351426C Chemical vapor deposition equipment
11/28/2007	CN100351422C Apparatus for surface modification of polymer, metal and ceramic materials using ion beam
11/27/2007	US7300995 Stabilizers to inhibit the polymerization of substituted cyclotetrasiloxane
11/27/2007	US7300885 Film formation apparatus and method for semiconductor process
11/27/2007	US7300870 Systems and methods of forming refractory metal nitride layers using organic amines
11/27/2007	US7300684 Method and system for coating internal surfaces of prefabricated process piping in the field
11/27/2007	US7300563 Acidity plating bath; electrodeposition
11/27/2007	US7300559 Filtered cathodic arc deposition method and apparatus
11/27/2007	US7300556 Improving performance; reducing separation of protective overcoat from magnetic media; vacuum deposition, bombarding silicon target with xenon ions
11/27/2007	US7300538 Spinning disk evaporator
11/27/2007	US7300537 Productivity enhancing thermal sprayed yttria-containing coating for plasma reactor
11/27/2007	US7300038 Method and apparatus to help promote contact of gas with vaporized material
11/27/2007	CA2303167C A method of depositing an electrocatalyst and electrodes formed by such method
11/27/2007	CA2262504C Method of depositing tin oxide and titanium oxide coatings on flat glass and the resulting coated glass
11/27/2007	CA2198134C Process for depositing pyrocarbon coatings in a fluidized bed
11/22/2007	WO2007134035A2 Method for formation of oxidized aluminum nitride films
11/22/2007	WO2007133378A1 Multi-wall plastic sheet having an internal plasma-enhanced chemical vapor deposition coating and process for manufacturing the same
11/22/2007	WO2007133358A2 Semiconductor buffer structures
11/22/2007	WO2007132887A1 Film forming method and film forming apparatus
11/22/2007	WO2007132824A1 Heating apparatus
11/22/2007	WO2007132676A1 Gas supply pipe for plasma treatment
11/22/2007	WO2007132644A1 Method of selectively forming atomically flat plane on diamond surface, diamond substrate produced by the method, and semiconductor element employing the same
11/22/2007	WO2007132051A1 Material with fullerene-type structure, production method and applications thereof
11/22/2007	WO2007131900A1 Source container of a vpe reactor
11/22/2007	WO2007131547A1 Semiconductor control device for a cvd or rtp process
11/22/2007	WO2007040856A3 Plasma-assisted vapor phase treatment of low dielectric constant films using a batch processing system
11/22/2007	WO2006121891A3 Medical devices and methods of making the same
11/22/2007	WO2006091413B1 Silicon gas injector and method of making
11/22/2007	WO2006057829A3 Scratch resistant coated article and method of making
11/22/2007	WO2006038975A3 Method and system for improving coupling between a surface wave plasma source and a plasma space
11/22/2007	WO2006015915B1 Device and method for high-throughput chemical vapor deposition
11/22/2007	US20070269983 Ald Apparatus and Method
11/22/2007	US20070269955 Semiconductor device and method for manufacturing same
11/22/2007	US20070269922 Fingerprint detection device and method of its manufacture, and apparatus for forming a protective film
11/22/2007	US20070269646 Bond termination of pores in a porous diamond dielectric material
11/22/2007	US20070269612 Method and an Apparatus for Applying a Coating on a Substrate
11/22/2007	US20070269611 Systems and methods of combinatorial synthesis
11/22/2007	US20070269598 Method, apparatus and starting material for providing a gaseous precursor
11/22/2007	US20070269597 Modified CVD cooling loop
11/22/2007	US20070269596 Valve failure detection
11/22/2007	US20070269595 Method for preventing metal leaching from copper and its alloys
11/22/2007	US20070269587 Film formation source, vacuum film formation apparatus, organic el panel and method of manufacturing the same
11/22/2007	US20070267145 Sample table and plasma processing apparatus provided with the same
11/22/2007	US20070266949 Delivery device
11/22/2007	US20070266948 Device for Controlling Electron Temperature in an Ecr Plasma
11/22/2007	US20070266947 Plasma generating device
11/22/2007	US20070266946 Semiconductor device manufacturing apparatus and method of using the same
11/22/2007	US20070266945 Plasma cvd apparatus equipped with plasma blocking insulation plate
11/22/2007	US20070266944 Film Forming Apparatus and Vaporizer
11/22/2007	US20070266943 Shadow mask and evaporation system incorporating the same
11/22/2007	US20070266942 Variable environment, scale-able, roll to roll process/apparatus for manufacturing thin film electronics on flexible substrates
11/22/2007	US20070266941 System and method for recirculating fluid supply for an injector for a semiconductor fabrication chamber
11/22/2007	US20070266934 Method of forming a silicon dioxide film
11/22/2007	US20070266932 Vapor phase growth apparatus and method for vapor phase growth
11/22/2007	DE202007011623U1 Düseneinsatz für eine Heißkanaldüse Nozzle insert for a hot runner nozzle
11/22/2007	DE102006023046A1 Verfahren, Vorrichtung und Ausgangsmaterial zum Bereitstellen eines gasförmigen Precursors Method, apparatus and raw material for providing a gaseous precursor
11/22/2007	DE102006023018A1 Plasmaverfahren zur Oberflächenbehandlung von Werkstücken Plasma process for the surface treatment of workpieces
11/21/2007	EP1858056A1 Plasma method for treating the surface of workpieces
11/21/2007	EP1857569A2 Plasma processing system
11/21/2007	EP1857411A1 modified CVD cooling loop
11/21/2007	EP1856304A2 Method and system for coating sections of internal surfaces
11/21/2007	EP1855863A1 Processes for the production of organometallic compounds
11/21/2007	EP1448319B1 Source liquid supply apparatus having a cleaning function
11/21/2007	EP1374291B1 Deposition method over mixed substrates using trisilane
11/21/2007	CN101076716A An apparatus for and method of sampling and collecting powders flowing in a gas stream
11/21/2007	CN101076614A Protective coating on a substrate and method of making thereof
11/21/2007	CN101076493A High purity granular silicon and method of manufacturing the same
11/21/2007	CN101076220A 电感耦合等离子体处理装置和等离子体处理方法 Apparatus and plasma processing method of inductively coupled plasma processing
11/21/2007	CN101075639A Semiconductor device and fabricating method thereof
11/21/2007	CN101075550A Corrosion resistant member
11/21/2007	CN101075500A Solid electrolyte and method of producing the same

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