Patents for C23C 16 - Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition (cvd) processes (71,892)
12/2007
12/06/2007WO2007140426A2 Process chamber for dielectric gapfill
12/06/2007WO2007140421A2 Process chamber for dielectric gapfill
12/06/2007WO2007140377A2 A novel deposition-plasma cure cycle process to enhance film quality of silicon dioxide
12/06/2007WO2007139379A1 Method and apparatus for deposition using pulsed atmospheric pressure glow discharge
12/06/2007WO2007139159A1 Device for supplying organic metal compound
12/06/2007WO2007139142A1 Plasma cvd method, method for forming silicon nitride film, method for manufacturing semiconductor device and plasma cvd method
12/06/2007WO2007139140A1 Plasma cvd method, method for forming silicon nitride film and method for manufacturing semiconductor device
12/06/2007WO2007139041A1 Method for forming metal compound layer, method for manufacturing semiconductor device, and apparatus for forming metal compound layer
12/06/2007WO2007139015A1 Method for film formation, mold, and method for manufacturing mold
12/06/2007WO2007138837A1 Production method of gas barrier resin substrate and production system of gas barrier resin substrate
12/06/2007WO2007138439A1 System and method for delivery of precursor material
12/06/2007WO2007137890A1 Method and device for treating the surfaces of containers and objects
12/06/2007WO2007103598A3 Silicon photovoltaic cell junction formed from thin film doping source
12/06/2007WO2007037955A3 Actively heated aluminum baffle component having improved particle performance and methods of use and manufacture thereof
12/06/2007WO2007016013A3 Unique passivation technique for a cvd blocker plate to prevent particle formation
12/06/2007WO2006137852A3 Apparatus and methods for synthesis of large size batches of carbon nanostructures
12/06/2007US20070281481 Controlled growth of gallium nitride nanostructures
12/06/2007US20070281478 Plasma processing method and apparatus
12/06/2007US20070281448 Novel deposition-plasma cure cycle process to enhance film quality of silicon dioxide
12/06/2007US20070281447 Method of loading and/or unloading wafer in semiconductor manufacturing apparatus
12/06/2007US20070281183 Film formation method, die, and method of manufacturing the same
12/06/2007US20070281109 Multilayer system with protecting layer system and production method
12/06/2007US20070281108 Process for Plasma Coating
12/06/2007US20070281090 System architecture and method for solar panel formation
12/06/2007US20070281089 Systems and methods for roll-to-roll atomic layer deposition on continuously fed objects
12/06/2007US20070281088 Low plasticity burnishing of coated titanium parts
12/06/2007US20070281087 Catalyst for the Growth of Carbon Single-Walled Nanotubes
12/06/2007US20070281086 Apparatus and method for producing carbon nanotubes
12/06/2007US20070281085 Multi-Workpiece Processing Chamber
12/06/2007US20070281084 Apparatus and method for depositing layer on substrate
12/06/2007US20070281083 Elimination of first wafer effect for pecvd films
12/06/2007US20070281082 Flash Heating in Atomic Layer Deposition
12/06/2007US20070281075 Optical method to monitor nano thin-film surface structure and thickness thereof
12/06/2007US20070281074 Methods for controlling plasma spray coating porosity on an article and articles manufactured therefrom
12/06/2007US20070280848 Methods Of Forming Alpha And Beta Tantalum Films With Controlled And New Microstructures
12/06/2007US20070277736 Method for manufacturing substrate, and vapor deposition apparatus used for the same
12/06/2007US20070277735 Systems for Atomic Layer Deposition of Oxides Using Krypton as an Ion Generating Feeding Gas
12/06/2007US20070277734 Process chamber for dielectric gapfill
12/06/2007DE112005003322T5 Zusammensetzung, die eine Siloxanverbindung und eine Phenolverbindung enthält Composition containing a siloxane compound and a phenol compound
12/06/2007DE102006026253A1 Beschichteter Körper und Verfahren zu seiner Herstellung Coated body and process for its preparation
12/06/2007DE102006025751A1 Verfahren zur Abdichtung einer Vakuumkammer und Schleuseneinrichtung für eine Vakuumkammer A method of sealing a vacuum chamber and lock device for a vacuum chamber
12/06/2007DE102006024050A1 Device for applying coating on surface of workpiece, comprises plasma generator for producing plasma in a plasma chamber, arrangement for producing gas flow through plasma chamber, and device for supplying and inserting coating material
12/06/2007DE102005049266B4 Vorrichtung und Verfahren zur Plasmabehandlung von Objekten Apparatus and method for plasma treatment of objects
12/05/2007EP1862788A1 Evaporator for organic material, coating installation, and method for use thereof
12/05/2007EP1862567A2 Method of sealing a vacuum chamber and sluice device for a vacuum chamber
12/05/2007EP1862566A1 Diethylsilane as a silicone source in the deposition of metal silicate films
12/05/2007EP1861869A1 Vapor phase treatment of dielectric materials
12/05/2007EP1861520A2 Gas inlet element for a cvd reactor
12/05/2007EP1861519A2 Method of forming silicon oxide containing films
12/05/2007EP1861518A2 Coils utilized in vapor deposition applications and methods of production
12/05/2007EP1581667B1 Support system for a treatment apparatus
12/05/2007EP1204490A4 Coating method on the inner walls of the reaction tubes in a hydrocarbon pyrolysis reactor
12/05/2007CN101084571A Magnetic fluid sealing unit for semiconductor wafer vertical heat treating apparatus
12/05/2007CN101084327A Film-forming method and recording medium
12/05/2007CN101084326A Substrate-to-mask alignment and securing system
12/05/2007CN101084229A Copper (i) compounds useful as deposition precursors of copper thin films
12/05/2007CN101083289A Method for processing surface oxidation film of mercury cadmium telluride film material
12/05/2007CN101082131A Method for plating diamond film on surface of stainless steel metal
12/05/2007CN101082125A Apparatus for thermal and plasma enhanced vapor deposition and method of operating
12/05/2007CN101082124A Method for developing m-face or a-face ZnO film by metal organic chemical vapour deposition
12/05/2007CN101081586A Method for making gold photo
12/05/2007CN100353517C 基片支撑件 Substrate support member
12/05/2007CN100353493C Heater module for semiconductor manufacturing device
12/05/2007CN100353186C Optical and optoelectronic articles
12/05/2007CN100352968C Engine piston-pin sliding structure
12/04/2007US7305275 Material supply system in semiconductor device manufacturing plant
12/04/2007US7304435 Device for confinement of a plasma within a volume
12/04/2007US7304004 System and method for forming a gate dielectric
12/04/2007US7304003 Oxidizing method and oxidizing unit for object to be processed
12/04/2007US7303998 Plasma processing method
12/04/2007US7303991 Atomic layer deposition methods
12/04/2007US7303940 Semiconductor component having at least one organic semiconductor layer and method for fabricating the same
12/04/2007US7303790 Electron cyclotron resonance plasma deposition process and device for single-wall carbon nanotubes and nanotubes thus obtained
12/04/2007US7303789 Methods for producing thin films on substrates by plasma CVD
12/04/2007US7303782 Extrusion die coating method
12/04/2007US7303635 Deposition mask, method for manufacturing display unit using it, and display unit
12/04/2007US7303141 Gas supplying apparatus
12/04/2007US7302910 Plasma apparatus and production method thereof
12/04/2007CA2372033C Method for producing an anhydrite iii or .alpha. based hydraulic bonding agent
12/04/2007CA2175041C Chemical vapour infiltration process of a pyrocarbon matrix within a porous substrate with creation of a temperature gradient in the substrate
11/2007
11/29/2007WO2007136777A2 Wear resistant coating
11/29/2007WO2007136209A1 Methods for preparation of high-purity polysilicon rods using a metallic core means
11/29/2007WO2007136131A1 Amorphous carbon film, method for forming amorphous carbon film, electroconductive member comprising amorphous carbon film, and separator for fuel battery
11/29/2007WO2007136023A1 Wafer holder, method for producing the same and semiconductor production apparatus
11/29/2007WO2007135832A1 Superconducting thin film material and method for producing the same
11/29/2007WO2007115029A3 Method of forming mixed rare earth oxide and mixed rare earth aluminate films by atomic layer deposition
11/29/2007WO2007092611A3 Disposable liners for etch chambers and etch chamber components
11/29/2007WO2006132878A3 Substrate support
11/29/2007WO2006053218A3 Pressure control system in a photovoltaic substrate deposition
11/29/2007WO2006042074A3 Multi-zone atomic layer deposition apparatus and method
11/29/2007WO2006039133A3 Cluster tool process chamber having integrated high pressure and vacuum chambers
11/29/2007US20070275569 Methods and apparatus for e-beam treatment used to fabricate integrated circuit devices
11/29/2007US20070275568 UV stabilizer, Beige pigment, anti-block, low density polyethylene, polypropylene, and anti-slip butylene-ethylene-styrene block terpolymer; KRATON.RTM. MD6649; low in cost and helps prevent water from penetrating the primary roofing material; anti-skid surface upon which an individual may safely walk
11/29/2007US20070275181 Barrier films for plastic substrates fabricated by atomic layer deposition
11/29/2007US20070275177 Ceramic foam-filled sandwich panels and method
11/29/2007US20070275166 Process for producing silicon oxide films from organoaminosilane precursors
11/29/2007US20070275164 Vapour Deposition Method
11/29/2007US20070275157 Apparatus and method for measuring widthwise ejection uniformity of slit nozzle
11/29/2007US20070272156 Linear evaporator for manufacturing organic light emitting device using numerous crucibles
11/29/2007US20070272154 Shower Head and Film-Forming Device Using the Same