| Patents for C23C 16 - Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition (cvd) processes (71,892) |
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| 01/03/2008 | WO2008001723A1 Thin film forming apparatus and thin film forming method |
| 01/03/2008 | WO2008001483A1 Vaporizer/supplier of material and automatic pressure regulator for use therein |
| 01/03/2008 | WO2008000573A2 Wear-resistant coating and production method for the same |
| 01/03/2008 | WO2007067706A3 Pressurized aerosol formulation for use in radiation sensitive coatings |
| 01/03/2008 | US20080003763 Method of depositing silicon with high step coverage |
| 01/03/2008 | US20080003458 Method of altering crystal structure of group 13 element nitride, group 13 element nitride and structure material containing cubic nitride |
| 01/03/2008 | US20080003365 Substrate processing method and substrate processing apparatus |
| 01/03/2008 | US20080003362 Film formation apparatus and method for using the same |
| 01/03/2008 | US20080003361 Coating using metal organic chemical vapor deposition |
| 01/03/2008 | US20080003360 Method for increasing deposition rates of metal layers from metal-carbonyl precursors |
| 01/03/2008 | US20080003359 tetrakis(N,N'-dimethylbutyramidinato)hafnium; chemical vapor deposition or atomic layer deposition of hafnium oxide or hafnium nitride thin film on a substrate |
| 01/03/2008 | US20080003358 Power loading substrates to reduce particle contamination |
| 01/03/2008 | US20080003349 Stent coating method and apparatus |
| 01/03/2008 | US20080003081 Load-lock technique |
| 01/03/2008 | US20080000424 Showerhead for a Gas Supply Apparatus |
| 01/03/2008 | US20080000423 System for improving the wafer to wafer uniformity and defectivity of a deposited dielectric film |
| 01/03/2008 | DE102006029415A1 Verschleißfeste Beschichtung sowie Herstellverfahren hierfür Wear-resistant coating and manufacturing method thereof |
| 01/02/2008 | EP1873818A2 Process for curing dielectric films |
| 01/02/2008 | EP1873280A1 Oxygen-doped N-type gallium nitride single crystal substrate and method for producing the same |
| 01/02/2008 | EP1873275A2 Showerhead for a gas supply apparatus |
| 01/02/2008 | EP1872847A1 Apparatus and method for separating gas |
| 01/02/2008 | EP1871923A1 Source, an arrangement for installing a source, and a method for installing and removing a source |
| 01/02/2008 | EP1871409A2 Improved method and apparatus for treating bacterial infections in devices |
| 01/02/2008 | EP1366207A4 Plating method of metal film on the surface of polymer |
| 01/02/2008 | EP1070161B1 A method and a device for epitaxial growth of objects by chemical vapour deposition |
| 01/02/2008 | CN200999259Y Automatic furnace gate opening gear |
| 01/02/2008 | CN101098981A Winding plasma cvd apparatus |
| 01/02/2008 | CN101096755A Film forming device and method for using same |
| 01/02/2008 | CN101096754A Shadow mask and method of fabricating organic light-emitting device using the same |
| 01/02/2008 | CN101096753A Film forming device and method |
| 01/02/2008 | CN100359635C Substrate processing apparatus |
| 01/02/2008 | CN100359043C Prep. of alumina---monox composite oxides film |
| 01/02/2008 | CN100359042C Product support for vapour deposition apparatus |
| 01/01/2008 | USRE39987 Coated turning insert |
| 01/01/2008 | USRE39986 Cemented carbide body with overcoating; cutting tool; performance in severing of steel or stainless steel |
| 01/01/2008 | USRE39969 Processing system |
| 01/01/2008 | US7314651 Film forming method and film forming device |
| 01/01/2008 | US7314537 Method and apparatus for detecting a plasma |
| 01/01/2008 | US7314527 Reactor system |
| 01/01/2008 | US7314526 Reaction chamber for an epitaxial reactor |
| 01/01/2008 | US7314525 Plasma CVD apparatus |
| 01/01/2008 | US7314519 Vapor-phase epitaxial apparatus and vapor phase epitaxial method |
| 01/01/2008 | US7313931 Method and device for heat treatment |
| 12/27/2007 | WO2007149761A2 Methods to improve the in-film defectivity of pecvd amorphous carbon films |
| 12/27/2007 | WO2007149265A2 Cvd coating scheme including alumina and/or titanium-containing materials and method of making the same |
| 12/27/2007 | WO2007148760A1 METHOD OF FORMING TaSiN FILM |
| 12/27/2007 | WO2007148692A1 Film forming apparatus and film forming method |
| 12/27/2007 | WO2007148569A1 Plasma processing apparatus, plasma processing method and photoelectric conversion element |
| 12/27/2007 | WO2007148457A1 Apparatus for catalytic chemical vapor deposition |
| 12/27/2007 | WO2007147946A1 Method for manufacturing fibre preform |
| 12/27/2007 | WO2007121249A3 Process for forming cobalt-containing materials |
| 12/27/2007 | WO2007095376A3 Method and apparatus for coating particulates utilizing physical vapor deposition |
| 12/27/2007 | WO2007084492A3 Tubular or other member formed of staves bonded at keyway interlocks |
| 12/27/2007 | WO2007076076A3 Gas coupler for substrate processing chamber |
| 12/27/2007 | WO2007075977A3 Eb-pvd system with automatic melt pool height control |
| 12/27/2007 | WO2007047095A3 Integrated chamber cleaning system |
| 12/27/2007 | WO2007002402A3 An apparatus and method for growing a synthetic diamond |
| 12/27/2007 | US20070298280 Surface-Coated Cutting Tool |
| 12/27/2007 | US20070298250 Methods for producing coated phosphor and host material particles using atomic layer deposition methods |
| 12/27/2007 | US20070298232 CVD coating scheme including alumina and/or titanium-containing materials and method of making the same |
| 12/27/2007 | US20070298168 Multifunctional carbon nanotube based brushes |
| 12/27/2007 | US20070298159 Organic evaporator, coating installation, and method for use thereof |
| 12/27/2007 | US20070298158 Testing bonding materials in a disc production line |
| 12/27/2007 | US20070297775 Heating Configuration for Use in Thermal Processing Chambers |
| 12/27/2007 | US20070296335 Process for Producing Layered Member and Layered Member |
| 12/27/2007 | US20070295276 Bake plate having engageable thermal mass |
| 12/27/2007 | US20070295275 Epitaxial Reactor Cooling Method and Reactor Cooled Thereby |
| 12/27/2007 | US20070295274 Batch Processing Platform For ALD and CVD |
| 12/27/2007 | US20070295273 Systems and methods for forming metal oxides using metal diketonates and/or ketoimines |
| 12/27/2007 | US20070295272 Methods to improve the in-film defectivity of pecvd amorphous carbon films |
| 12/27/2007 | DE112005002334T5 Niedrig-K dielelektrische Schicht gebildet aus Vorläufern eines Aluminiumsilikats Low-K dielelektrische layer formed from precursors of an aluminum silicate |
| 12/27/2007 | DE10352606B4 Plasmabehandlungsvorrichtung Plasma treatment apparatus |
| 12/27/2007 | DE102006032959B3 Workpiece support for a vacuum coating installation comprises a support body having radially protruding magnetic holding bodies with a holding surface for workpieces to be coated |
| 12/27/2007 | DE102006029039A1 Monitoring of processes for ion etching or material deposition in vacuum chamber, employs quartz resonator, excitation oscillator and sensor inside chamber |
| 12/27/2007 | DE102006028749A1 Production of a transparent aluminum oxide protective layer on a glass substrate for household glassware comprises feeding aluminum-containing precursor compounds into a coating chamber containing a glass substrate and further processing |
| 12/27/2007 | DE102005023670B4 Verfahren zum Ausbilden von Metall-Nitrid-Schichten in Kontaktöffnungen und integrierte Schaltung mit derart ausgebildeten Schichten A method of forming metal nitride layers in the contact openings and integrated circuit thus formed layers |
| 12/27/2007 | DE10134181B4 Verfahren zur Herstellung eines p-leitenden Nitrid-Halbleiters A method for producing a p-type nitride semiconductor |
| 12/27/2007 | CA2659588A1 Cvd coating scheme including alumina and/or titanium-containing materials and method of making the same |
| 12/26/2007 | EP1870490A2 Evaporator for CVD and gas flow rate regulator. |
| 12/26/2007 | EP1869228A2 Plasma confinement ring assemblies having reduced polymer deposition characteristics |
| 12/26/2007 | EP1687460B1 Method and apparatus for fabricating a conformal thin film on a substrate |
| 12/26/2007 | EP1628923B8 Small glass cutter wheel |
| 12/26/2007 | EP1606429B1 Method for cvd deposition of a silver film on a substrate |
| 12/26/2007 | EP1340247A4 Method of forming dielectric films |
| 12/26/2007 | EP1339625B1 Throughput enhancement for single wafer reactor |
| 12/26/2007 | EP1212475A4 Protective gas shield apparatus |
| 12/26/2007 | CN200996047Y Device for modifying polymer material surface |
| 12/26/2007 | CN200996046Y Chemical gas-phase depositing system for processing planar display device lining |
| 12/26/2007 | CN200996045Y Air-inlet shower head for inhibiting chemical gas-phase deposition pre-reaction |
| 12/26/2007 | CN200996044Y Depositer of insulated medium surface diamond thin film |
| 12/26/2007 | CN200996043Y Shielding frame assembly |
| 12/26/2007 | CN200995578Y Golden picture with long-distance preservation |
| 12/26/2007 | CN101095214A Semiconductor manufacturing apparatus, abnormality detection in such semiconductor manufacturing apparatus, method for specifying abnormality cause or predicting abnormality, and recording medium wher |
| 12/26/2007 | CN101094938A Window protector for sputter etching of metal layers |
| 12/26/2007 | CN101094935A Mothod for producing zno-based transparent electroconductive film by MOCVD(metal organic chemical vapor deposition) method |
| 12/26/2007 | CN101094934A AL2O3 multilayer plate |
| 12/26/2007 | CN101094933A A method and apparatus for semiconductor processing |
| 12/26/2007 | CN101094732A Deposition of silicon-containing films from hexachlorodisilane |
| 12/26/2007 | CN101093883A Negative electrode for nonaqueous electrolyte secondary battery, manufacturing method of the same, and nonaqueous electrolyte secondary battery |
| 12/26/2007 | CN101093825A Electronic structures utilizing etch resistant boron and phosphorus materials and methods to form same |