| Patents for C23C 16 - Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition (cvd) processes (71,892) |
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| 01/17/2008 | US20080011716 Plasma Processing Apparatus And Method |
| 01/17/2008 | US20080011425 Plasma Processing Apparatus And Method |
| 01/17/2008 | US20080011232 Device for depositing a coating on an internal surface of a container |
| 01/17/2008 | US20080011231 Applicator for use in semiconductor manufacturing apparatus |
| 01/17/2008 | US20080011230 Chemical vapor deposition equipment |
| 01/17/2008 | DE102006033072A1 Molten metal immersion process for tin-plating involves plasma-physical etching and immersion within vacuum chamber |
| 01/17/2008 | DE102006032568A1 Verfahren zur plasmagestützten chemischen Gasphasenabscheidung an der Innenwand eines Hohlkörpers A method for plasma-assisted chemical vapor deposition on the inner wall of a hollow body |
| 01/17/2008 | CA2693039A1 Method for plasma-assisted chemical vapour deposition on the inner wall of a hollow body |
| 01/16/2008 | EP1879213A2 Microwave plasma processing apparatus |
| 01/16/2008 | EP1878039A1 Plasma amplifier for plasma treatment plant |
| 01/16/2008 | EP1877114A2 Medical devices and methods of making the same |
| 01/16/2008 | EP1590498A4 Methods of making carbon nanotube films, layers, fabrics, ribbons, elements and articles |
| 01/16/2008 | CN101107695A Transparent conductive film forming apparatus, multilayer transparent conductive film continuously forming apparatus and method of film forming therewith |
| 01/16/2008 | CN101107693A Magnetron control method, magnetron service life judgment method, microwave generation device, magnetron service life judgment device, processing device, computer program, and storage medium |
| 01/16/2008 | CN101107384A Gas distributor with pre-chambers arranged in planes |
| 01/16/2008 | CN101107383A Interface engineering to improve adhesion between low k stacks |
| 01/16/2008 | CN101107382A Method for chemical infiltration in the gas phase for the densification of porous substrates with pyrolytic carbon |
| 01/16/2008 | CN101107379A Gas treatment method and computer readable storage medium |
| 01/16/2008 | CN101106075A Film formation apparatus for semiconductor process and method for using the same |
| 01/16/2008 | CN101105545A Novel process for producing microcolor filter array |
| 01/16/2008 | CN101104926A Method for preparing boron phosphite hard coating |
| 01/16/2008 | CN101104925A Method for chemical gaseous phase deposition of silicon nitride film by electron cyclotron resonance plasma |
| 01/16/2008 | CN101104924A Method for preparing carbon coating cobalt nano particle by cobalt/aluminum catalytic chemical gaseous phase deposition |
| 01/16/2008 | CN101104923A Vacuum ripple sorption pipe used for chemical gaseous phase deposition device |
| 01/16/2008 | CN100362667C Semiconductor element and its producing method |
| 01/16/2008 | CN100362634C Ozone processing device |
| 01/16/2008 | CN100362621C Device and method for reducing thin-film type capacitance vacuum gauge zero-point drift |
| 01/16/2008 | CN100362620C Loading umloading device of semiconductor processing piece and its loading and unloading method |
| 01/16/2008 | CN100362217C Tappet for internal combustion engine |
| 01/16/2008 | CN100362216C Valve train for internal combustion engine |
| 01/16/2008 | CN100362128C Method of atmospheric pressure plane discharge chemical gaseous phase depositing nano-particular film and its device |
| 01/16/2008 | CN100361930C Anti-corrosion processing section |
| 01/15/2008 | USRE40005 Coated cutting insert |
| 01/15/2008 | US7319295 High-frequency power supply structure and plasma CVD device using the same |
| 01/15/2008 | US7319068 Method of depositing low k barrier layers |
| 01/15/2008 | US7319064 Nitride based semiconductor device and process for preparing the same |
| 01/15/2008 | US7318869 Variable gas conductance control for a process chamber |
| 01/10/2008 | WO2008005832A2 Pre-cleaning of substrates in epitaxy chambers |
| 01/10/2008 | WO2008005773A2 Cluster tool for advanced front-end processing |
| 01/10/2008 | WO2008005490A1 Organometallic compounds having sterically hindered amides |
| 01/10/2008 | WO2008004657A1 p-TYPE ZINC OXIDE THIN FILM AND METHOD FOR FORMING THE SAME |
| 01/10/2008 | WO2008004318A1 Method of microwave plasma treatment and apparatus therefor |
| 01/10/2008 | WO2007133358A3 Semiconductor buffer structures |
| 01/10/2008 | WO2007117989A3 Method of forming mixed rare earth oxynitride and aluminum oxynitride films by atomic layer deposition |
| 01/10/2008 | WO2007117294A3 System and method for continuous deposition of graded coatings |
| 01/10/2008 | WO2007098438A3 Direct liquid injector device |
| 01/10/2008 | US20080008968 Coating method for non-destructive examination of articles of manufacture |
| 01/10/2008 | US20080008843 Method for Production of Metal Oxide Coatings |
| 01/10/2008 | US20080008823 Deposition processes for tungsten-containing barrier layers |
| 01/10/2008 | US20080008640 Cluster-Free Amorphous Silicon Film, and Method and Apparatus for Producing the Same |
| 01/10/2008 | US20080008460 System and process for heating semiconductor wafers by optimizing absorption of electromagnetic energy |
| 01/10/2008 | US20080006523 Cooled pvd shield |
| 01/10/2008 | US20080006208 Metal organic chemical vapor deposition equipment |
| 01/10/2008 | US20080006207 Heat-transfer structure and substrate processing apparatus |
| 01/10/2008 | US20080006206 Winding Type Plasma Cvd Apparatus |
| 01/10/2008 | US20080006205 Apparatus and Method for Controlling Plasma Potential |
| 01/10/2008 | US20080006204 Corrosion resistant wafer processing apparatus and method for making thereof |
| 01/10/2008 | DE112006000320T5 Filmausbilde-Vorrichtung, Abgleichvorrichtung und Impedanz-Steuerungsverfahren Film forming apparatus, and impedance matching device control method |
| 01/10/2008 | DE102007031416A1 Polymer substrate, useful in electronic units such as screens and semiconductor elements in organic light emitting diode, comprises water and oxygen barrier coating, which contains an alternative sequence of carbon- and silicon- layer |
| 01/09/2008 | EP1876639A1 Shower plate and method for manufacturing the same |
| 01/09/2008 | EP1876270A1 METHOD FOR GROWTH OF GaN SINGLE CRYSTAL, METHOD FOR PREPARATION OF GaN SUBSTRATE, PROCESS FOR PRODUCING GaN-BASED ELEMENT, AND GaN-BASED ELEMENT |
| 01/09/2008 | EP1874986A1 Controlled growth of a nanostructure on a substrate, and electron emission devices based on the same |
| 01/09/2008 | EP1874982A1 Method for electrodeposition of bronzes |
| 01/09/2008 | EP1874979A1 Reactor |
| 01/09/2008 | EP1874978A2 Combustion chemical vapor deposition on temperature-sensitive substrates |
| 01/09/2008 | EP1751329B1 Method of sic single crystal growth and sic single crystal |
| 01/09/2008 | EP1303644A4 Production of carbon and carbon-based materials |
| 01/09/2008 | CN101103137A Method and apparatus for monolayer deposition |
| 01/09/2008 | CN101103135A Pentaborane(9) storage and delivery |
| 01/09/2008 | CN101102970A Glass ceramic article having a diffusion barrier and method for producing a glass ceramic article having a diffusion barrier |
| 01/09/2008 | CN101101887A Corrosion resistant wafer processing apparatus and method for making thereof |
| 01/09/2008 | CN101101875A Electronic structure and method for forming medium film |
| 01/09/2008 | CN101101866A Processing method, compress control method, transmitting method and transmitting device |
| 01/09/2008 | CN101101859A Vertical heat processing apparatus and method for using the same |
| 01/09/2008 | CN101101855A Electrode pattern for resistance heating element and wafer processing apparatus |
| 01/09/2008 | CN101100743A Metal organic chemical vapor deposition equipment |
| 01/09/2008 | CN100361280C Plasma curing process for porous low-k materials |
| 01/09/2008 | CN100361258C Manufacturing method of electronic transmitting element, electronic source and image forming device using carbon fibre, ink made of carbon fibre |
| 01/09/2008 | CN100360710C Vapor deposition of silicon dioxide nanolaminates |
| 01/09/2008 | CN100360709C Volatile copper(II) complexes for deposition of copper films by atomic layer deposition |
| 01/09/2008 | CN100360637C Controlled sulfur species deposition process |
| 01/09/2008 | CN100360449C Protective layer for a body, and process and arrangement for producing protective layers |
| 01/08/2008 | USRE39999 Coated turning insert and method of making it |
| 01/08/2008 | US7317961 Substrate processing apparatus and method of transporting substrates and method of processing substrates in substrate processing apparatus |
| 01/08/2008 | US7316969 Method and apparatus for thermally treating substrates |
| 01/08/2008 | US7316761 Apparatus for uniformly etching a dielectric layer |
| 01/08/2008 | US7316199 Method and apparatus for controlling the magnetic field intensity in a plasma enhanced semiconductor wafer processing chamber |
| 01/08/2008 | CA2486867C Ceramic thin film on various substrates, and process for producing same |
| 01/08/2008 | CA2409533C Silver-containing copper alloys for journal bearings |
| 01/08/2008 | CA2354925C Apparatus and method for coating substrates |
| 01/05/2008 | CA2592747A1 Metal organic chemical vapor deposition equipment |
| 01/03/2008 | WO2008002831A2 Medical device |
| 01/03/2008 | WO2008002780A2 Batch processing platform for ald and cvd |
| 01/03/2008 | WO2008002750A2 Laser based metal deposition (lbmd) of antimicrobials to implant surfaces |
| 01/03/2008 | WO2008002546A1 Metal(iv) tetra-amidinate compounds and their use in vapor deposition |
| 01/03/2008 | WO2008002415A2 Precursors for depositing silicon containing films and processes thereof |
| 01/03/2008 | WO2008002369A2 System and method for deposition of a material on a substrate |
| 01/03/2008 | WO2008001853A1 Plasma processing method and equipment |
| 01/03/2008 | WO2008001844A1 Process for producing high-purity hexafluoropropylene and cleaning gas |
| 01/03/2008 | WO2008001809A1 Microwave plasma processing device |