| Patents for C23C 16 - Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition (cvd) processes (71,892) |
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| 02/13/2008 | EP1885909A1 Nanostructure production methods and apparatus |
| 02/13/2008 | EP1885908A1 Coating comprising layered structures of diamond like nanocomposite layers and diamond like carbon layers |
| 02/13/2008 | EP1885907A2 Systems and methods for thermal management of electronic components |
| 02/13/2008 | EP1885658A2 Method of making scratch resistant coated glass article including layer(s) resistant to fluoride-based etchant(s) |
| 02/13/2008 | EP1252358A4 System and method for depositing inorganic/organic dielectric films |
| 02/13/2008 | EP1138060B1 Gas driven rotating susceptor for rapid thermal processing (rtp) system |
| 02/13/2008 | CN201021459Y Plasm processing room with coverage plate and gas allocation plate component |
| 02/13/2008 | CN101124676A Supercritical fluid-assisted deposition of materials on semiconductor substrates |
| 02/13/2008 | CN101124656A Shadow mask deposition of materials using reconfigurable shadow masks |
| 02/13/2008 | CN101124353A Method and apparatus for growing a group (III) metal nitride film and a group (III) metal nitride film |
| 02/13/2008 | CN101124352A Method for increasing deposition rates of metal layers from metal-carbonyl precursors |
| 02/13/2008 | CN101124351A Deposition of polymeric materials and precursors therefor |
| 02/13/2008 | CN101123201A Stage for plasma processing apparatus, and plasma processing apparatus |
| 02/13/2008 | CN101123200A Stage for plasma processing apparatus, and plasma processing apparatus |
| 02/13/2008 | CN101123174A Vacuum processing device, diagnostic method for static electricity chuck and storing medium |
| 02/13/2008 | CN101122056A Silicon nitride coat ring and preparation method thereof |
| 02/13/2008 | CN101122015A Method for preparing nano silicon-base porous luminescent material by normal pressure plasma gas phase deposition |
| 02/13/2008 | CN101122014A Method for forming medium film with gradual changed components |
| 02/13/2008 | CN101122013A Purge gas unit and purge gas supply integrated unit |
| 02/13/2008 | CN101122012A Large-area pectinate spraying head used for metal organic chemical gas phase deposition device |
| 02/13/2008 | CN101122011A Methods for low temperature deposition of an amorphous carbon layer |
| 02/13/2008 | CN101122010A Precursors having open ligands for ruthenium containing films deposition |
| 02/13/2008 | CN101121734A Organometallic compounds |
| 02/13/2008 | CN101121733A Organometallic compounds |
| 02/13/2008 | CN101121576A Method for manufacturing low radiation coated glass and coated solution used for the same |
| 02/13/2008 | CN101121497A Carbon nano-tube composite material and preparation method thereof |
| 02/13/2008 | CN101121108A Vacuum processing apparatus |
| 02/13/2008 | CN100369230C Processing method and processing appts |
| 02/13/2008 | CN100369217C Method for eliminating graphics effect in furnace tube operation |
| 02/13/2008 | CN100369213C Plasma processing device and method thereof |
| 02/13/2008 | CN100369202C Method for preparing nano-silicone base lighting composite film |
| 02/13/2008 | CN100369201C Chemical meteorological depositer with high-density plasma |
| 02/13/2008 | CN100369192C Semiconductor processing system reaction chamber |
| 02/13/2008 | CN100368593C Annealing technique for eliminating titanium nitride film stress and decreasing film resistance |
| 02/13/2008 | CN100368592C Large power heat gradient chemical gas phase infiltration process system monitoring device and method |
| 02/13/2008 | CN100368591C Electronic absorbing disk for chemical gas-phase depositor |
| 02/12/2008 | USRE40046 Processing system |
| 02/12/2008 | US7329768 Chemical vapor deposition precursors for deposition of tantalum-based materials |
| 02/12/2008 | US7329615 Atomic layer deposition method of forming an oxide comprising layer on a substrate |
| 02/12/2008 | US7329612 Semiconductor device and process for producing the same |
| 02/12/2008 | US7329609 Substrate processing method and substrate processing apparatus |
| 02/12/2008 | US7329591 Method for forming silicon-containing film and method for decreasing number of particles |
| 02/12/2008 | US7329590 Method for depositing nanolaminate thin films on sensitive surfaces |
| 02/12/2008 | US7329436 A flow of a first material (Ti/Al/V alloy) is passed through a molten body of a second material (Zr/Mo alloy) and from the molten body to a substrate as a vapor flow; a non-expending portion of the molten body is an alloy having a melting point below the melting point of the first material |
| 02/12/2008 | US7329328 Method for etch processing with end point detection thereof |
| 02/12/2008 | US7329292 Process byproduct trap and system including same |
| 02/12/2008 | CA2285125C Hard carbon film and surface-acoustic-wave substrate |
| 02/07/2008 | WO2008016390A2 Catalyst for the growth of carbon single-walled nanotubes |
| 02/07/2008 | WO2008016023A1 Gas supply device and board treatment apparatus |
| 02/07/2008 | WO2008015914A1 Cvd film forming method and cvd film forming apparatus |
| 02/07/2008 | WO2008015912A1 Substrate processing apparatus, program, recording medium and conditioning necessity determining method |
| 02/07/2008 | WO2008015902A1 Method of manufacturing liquid crystal display device, and liquid crystal display device |
| 02/07/2008 | WO2008015533A2 Porous dielectric layers obtained from pore -forming precursors |
| 02/07/2008 | WO2008014915A2 Method for the plasma treatment of a surface |
| 02/07/2008 | WO2007118006A3 Method of forming mixed rare earth nitride and aluminum nitride films by atomic layer deposition |
| 02/07/2008 | WO2007112394A3 Method for purifying metal carbonyl precursors |
| 02/07/2008 | WO2006101578A8 Vapor phase treatment of dielectric materials |
| 02/07/2008 | US20080032880 Process For Manufacturing Wafer Of Silicon Carbide Single Crystal |
| 02/07/2008 | US20080032514 Method For Manufacturing Semiconductor Device, And Substrate Processing Apparatus |
| 02/07/2008 | US20080032511 Semiconductor Device Manufacturing Method and Plasma Oxidation Treatment Method |
| 02/07/2008 | US20080032502 Safety features for semiconductor processing apparatus using pyrophoric precursor |
| 02/07/2008 | US20080032157 Infrared reflecting layer system for transparent substrate |
| 02/07/2008 | US20080032064 Selective sealing of porous dielectric materials |
| 02/07/2008 | US20080032063 Plasma deposition apparatus and deposition method utilizing same |
| 02/07/2008 | US20080032062 Organometallic compounds having sterically hindered amides |
| 02/07/2008 | US20080032044 Process For Producing Zno Transparent Conductive Film By Mocvd (Metal-Organic Chemical Vapor Deposition) Method |
| 02/07/2008 | US20080032043 Method and apparatus for processing the peripheral and edge portions of a wafer after performance of a surface treatment thereon |
| 02/07/2008 | US20080032040 Wafer Support and Semiconductor Substrate Processing Method |
| 02/07/2008 | US20080032036 Manufacturing apparatus for semiconductor device and manufacturing method for semiconductor device |
| 02/07/2008 | US20080031698 Cutting Insert Provided With Structured Surfaces |
| 02/07/2008 | US20080029484 In-situ process diagnostics of in-film aluminum during plasma deposition |
| 02/07/2008 | US20080029032 Substrate support with protective layer for plasma resistance |
| 02/07/2008 | US20080029031 Methods and apparatus for forming thin films for semiconductor devices |
| 02/07/2008 | US20080029029 Transfer chamber for cluster system |
| 02/07/2008 | US20080029028 Systems and methods for depositing material onto microfeature workpieces in reaction chambers |
| 02/07/2008 | US20080029027 Plasma Cvd Device |
| 02/07/2008 | DE19820147B4 Verfahren zur Bildung einer leitfähigen Schicht mittels eines atomaren Schichtdepositionsprozesses A method for forming a conductive layer by an atomic layer deposition process |
| 02/07/2008 | DE102006036403A1 Verfahren und Vorrichtung zur Beschichtung eines Substrats mit einer definierten Schichtdickenverteilung Method and apparatus for coating a substrate with a defined layer thickness distribution |
| 02/07/2008 | CA2658796A1 Method for the plasma treatment of a surface |
| 02/06/2008 | EP1884987A1 Process for producing silicon compound |
| 02/06/2008 | EP1884979A2 Self-passivating plasma resistant material for joining chamber components |
| 02/06/2008 | EP1884576A2 Device for plasma coating of long, cylindrical components |
| 02/06/2008 | EP1884518A1 Metal-imino complexes suitable for use as vapor deposition precursors |
| 02/06/2008 | EP1884517A1 Organometallic compounds containing an alkenyl ligand and suitable for use as vapor deposition precursors |
| 02/06/2008 | EP1884501A1 Method and formulation for depositing a metal-containing coating on a substrate |
| 02/06/2008 | CN201016122Y Wafer surface illuvium growing device |
| 02/06/2008 | CN101120124A Process for producing silicon carbide single crystal |
| 02/06/2008 | CN101120122A Gas distribution showerhead featuring exhaust apertures |
| 02/06/2008 | CN101120116A Method for the densification of thin porous substrates by means of vapour phase chemical infiltration and device for loading such substrates |
| 02/06/2008 | CN101119859A System and method for increasing the emissivity of a material |
| 02/06/2008 | CN101119807A Dense coating formation by reactive deposition |
| 02/06/2008 | CN101119012A Method for fabrication of semiconductor device |
| 02/06/2008 | CN101119011A Method for fabrication of semiconductor device |
| 02/06/2008 | CN101118865A Substrate support with a protective layer for plasma resistance |
| 02/06/2008 | CN101118841A Heat treatment device for semiconductor |
| 02/06/2008 | CN101118007A High strength gear, power transmission mechanism using the same, and production method for high strength gear |
| 02/06/2008 | CN101117707A Method for improving inner evenness of high-temperature deposition oxidation film |
| 02/06/2008 | CN101117220A Method for the production of metal carbides |
| 02/06/2008 | CN100367562C Thin film lithium ion cell using silver selenide film as anode material and its preparing method |
| 02/06/2008 | CN100367472C Material for insulation film containing organic silane compound its producing method and semiconductor device |