| Patents for C23C 16 - Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition (cvd) processes (71,892) |
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| 01/24/2008 | WO2008010489A1 Film forming method and film forming apparatus |
| 01/24/2008 | WO2008009967A1 Thermochromic coatings ii |
| 01/24/2008 | WO2008009716A1 Arrangement comprising nanoparticles, and method for the production thereof |
| 01/24/2008 | WO2008009715A1 Method for depositing non-oxide ceramic coatings |
| 01/24/2008 | WO2008009714A1 Method for depositing hard metallic coatings |
| 01/24/2008 | WO2007130447A3 Method for depositing zinc oxide coatings on flat glass |
| 01/24/2008 | WO2007127294A3 Exhaust system |
| 01/24/2008 | WO2007076195A3 Small volume symmetric flow single wafer ald apparatus |
| 01/24/2008 | WO2006120449A8 Nanostructure production methods and apparatus |
| 01/24/2008 | US20080020574 Hybrid RF capacitively and inductively coupled plasma source using multifrequency RF powers and methods of use thereof |
| 01/24/2008 | US20080020494 Film formation apparatus, precursor introduction method and film formation method |
| 01/24/2008 | US20080020281 Negative electrode for lithium ion secondary battery, method for producing the same, and lithium ion secondary battery |
| 01/24/2008 | US20080020242 Perpendicular magnetic recording medium and manufacturing method thereof |
| 01/24/2008 | US20080020216 High performance coated material with improved metal dusting corrosion resistance |
| 01/24/2008 | US20080020146 Diffuser plate with slit valve compensation |
| 01/24/2008 | US20080020140 Chemical vapor deposition of a silicon nitride film on a substrate surface decomposing and/or activating a raw material gas supplied from the gas supply system by maintaining the heating element at a predetermined temperature; using a gaseous mixture of silane, ammonia and hydrogen; quality; |
| 01/24/2008 | US20080020139 Article having nano-scaled structures and a process for making such article |
| 01/24/2008 | US20080020138 Method for manufacturing poorly conductive layers |
| 01/24/2008 | US20080020130 A modified chemical-vapor-deposition reaction chamber reduces the turbulence of the hydrocarbon gas flow during the growth phase to promote an environment for ultra-long nanotube formation; freely suspended from the substrate to form electrical contacts by bridging the gap between catalyst pads |
| 01/24/2008 | US20080017950 Methods of forming ruthenium film by changing process conditions during chemical vapor deposition and ruthenium films formed thereby |
| 01/24/2008 | US20080017613 Method for processing outer periphery of substrate and apparatus thereof |
| 01/24/2008 | US20080017516 Plasma chamber; electroplated coating of yttrium-containing aluminum oxide and zirconium oxide; exhibit improved corrosion or erosion resistance to energized gases; not easily susceptible to flaking off during operation, thermal cycling |
| 01/24/2008 | US20080017500 Thin-film disposition apparatus |
| 01/24/2008 | US20080017319 Magnetically enhanced, inductively coupled plasma source for a focused ion beam system |
| 01/24/2008 | US20080017318 Semiconductor device manufacturing apparatus capable of reducing particle contamination |
| 01/24/2008 | US20080017317 Substrate processing apparatus |
| 01/24/2008 | US20080017117 Substrate support with adjustable lift and rotation mount |
| 01/24/2008 | US20080017116 Substrate support with adjustable lift and rotation mount |
| 01/24/2008 | US20080017115 Apparatus for reducing entrapment of foreign matter along a moveable shaft of a substrate support |
| 01/24/2008 | US20080017114 Heat treatment apparatus of light emission type |
| 01/24/2008 | US20080017113 Inner Electrode for Barrier Film Formation and Apparatus for Film Formation |
| 01/24/2008 | US20080017112 Ion source with recess in electrode |
| 01/24/2008 | US20080017111 Semiconductor Manufacturing Device and Method for Manufacturing Semiconductor Devices |
| 01/24/2008 | US20080017110 Rotation evaporator for thin film deposition and thin film deposition apparatus using the same |
| 01/24/2008 | US20080017109 Method and system for isolated and discretized process sequence integration |
| 01/24/2008 | US20080017108 Gas combustion apparatus |
| 01/24/2008 | US20080017107 Plasma processing apparatus |
| 01/24/2008 | US20080017106 Apparatus to Modify the Spatial Response of a Pattern Generator |
| 01/24/2008 | DE112006000611T5 Verfahren zum Herstellen eines Films und Filmbildungssystem A method of manufacturing a film, and film-forming system |
| 01/24/2008 | DE10330795B4 Kohlenstoff-Hartmaske mit einer Stickstoff-dotierten Kohlenstoffschicht als haftfähiger Schicht zur Haftung auf Metall oder metallhaltigen anorganischen Materialien und Verfahren zu deren Herstellung The carbon hard mask with a nitrogen-doped carbon layer as an adhesion layer capable of adhesion to metal or metal-containing inorganic materials and processes for their preparation |
| 01/24/2008 | DE102006034061A1 Polysilanverarbeitung und Verwendung Polysilanverarbeitung and use |
| 01/24/2008 | DE102006033047A1 Device for masking surface areas that should not be treated with surface changing treatment of work pieces, has coverings that consist of same physical and chemical characteristics as the surface areas of the work pieces not to be treated |
| 01/24/2008 | DE102006033037A1 Einstufiges Verfahren zur Aufbringung einer Metallschicht auf ein Substrat Single-stage process for applying a metal layer on a substrate |
| 01/23/2008 | EP1881088A1 Apparatus for depositing a coating on the internal surface of a container |
| 01/23/2008 | EP1881087A1 Winding plasma cvd apparatus |
| 01/23/2008 | EP1881086A1 Substrate holder with magnetic housing for vacuum coating apparatuses |
| 01/23/2008 | EP1880037A2 System and method for depositing a material on a substrate |
| 01/23/2008 | EP1716202A4 Polypropylene modification for improved adhesion of polypropylene-based multilayer packaging film structure to vacuum deposited aluminum |
| 01/23/2008 | EP1320875A4 Gas compositions for cleaning the interiors of reactors as well as for etching films of silicon-containing compounds |
| 01/23/2008 | EP1207216B1 Coated hard alloy |
| 01/23/2008 | CN101111628A Method and apparatus for monolayer deposition (mld) |
| 01/23/2008 | CN101111502A Tantalum compound, method for producing same, tantalum-containing thin film and method for forming same |
| 01/23/2008 | CN101111501A Cyclic siloxane compound, si-containing film-forming material, and use thereof |
| 01/23/2008 | CN101109078A Chemistry vapor depositing method of low dielectric constant silicon oxide membrane |
| 01/23/2008 | CN101109077A Method of plasma chemistry vapor depositing fluoridation amorphous carbon membrane and membrane layer structure thereof |
| 01/23/2008 | CN101109076A Device for depositing a coating on an internal surface of a container |
| 01/23/2008 | CN101109075A Plasma resonant cavity waveguide assembly with heat insulating function |
| 01/23/2008 | CN101109074A Method to reduce gas-phase reactions in a pecvd process with silicon and organic precursors to deposit defect-free initial layers |
| 01/23/2008 | CN101109073A Nitrogen enriched cooling air module for uv curing system |
| 01/23/2008 | CN101108328A Proessure reduction vessel, pressure reduction processing apparatus and method of manufacturing a proessure reduction vessel |
| 01/23/2008 | CN100364067C Method for forming metal oxide-film |
| 01/23/2008 | CN100364053C Method of polycyrstallization, method of manufacturing polysilicon thin film transistor, and laser irradiation device therefor |
| 01/23/2008 | CN100364046C Treating apparatus and method of treating |
| 01/23/2008 | CN100364035C Procedure and device for the production of a plasma |
| 01/23/2008 | CN100363618C Vacuum exhaust system and monitoring and controlling method thereof |
| 01/23/2008 | CN100363536C Deposition methods utilizing phased array microwave excitation, and deposition apparatuses |
| 01/22/2008 | US7320943 Capacitor with hafnium, lanthanum and oxygen mixed dielectric and method for fabricating the same |
| 01/22/2008 | US7320941 Plasma stabilization method and plasma apparatus |
| 01/22/2008 | US7320858 Formation of combinatorial arrays of materials using solution-based methodologies |
| 01/22/2008 | US7320827 Comprising a glass sheet and a chemical vapor deposited metal oxide particles; window glass for buildings or vehicles; high visible light transmittance |
| 01/22/2008 | US7320815 Method for forming oriented film, oriented film, substrate for electronic device, liquid crystal panel, and electronic device |
| 01/22/2008 | US7320734 Plasma immersion ion implantation system including a plasma source having low dissociation and low minimum plasma voltage |
| 01/22/2008 | CA2450412C Support with getter-material for microelectronic, microoptoelectronic or micromechanical device |
| 01/17/2008 | WO2008008259A2 Apparatus and method for controlling plasma potential |
| 01/17/2008 | WO2008008098A2 Plasma deposition apparatus and method for making polycrystalline silicon |
| 01/17/2008 | WO2008007675A1 Film formation method, cleaning method, and film formation device |
| 01/17/2008 | WO2008007180A1 Glass with scratch-resistant coating |
| 01/17/2008 | WO2008007165A1 Surface treatment for titanium or titanium-alloys |
| 01/17/2008 | WO2008006856A1 Method and device for plasma-assisted chemical vapour deposition on the inner wall of a hollow body |
| 01/17/2008 | WO2008006785A1 One-step method for applying a metal layer onto a substrate |
| 01/17/2008 | WO2007126482A3 Methods for forming thin oxide layers on semiconductor wafers |
| 01/17/2008 | US20080014825 Deposition apparatus |
| 01/17/2008 | US20080014762 Process for producing zirconium oxide thin films |
| 01/17/2008 | US20080014725 Deposition over mixed substrates using trisilane |
| 01/17/2008 | US20080014724 Methods for depositing tungsten after surface treatment |
| 01/17/2008 | US20080014445 Chamberless Plasma Deposition of Coatings |
| 01/17/2008 | US20080014431 Systems and methods of synthesis of extended length nanostructures |
| 01/17/2008 | US20080014406 Injection molded soldering head for high temperature application and method of making same |
| 01/17/2008 | US20080014363 Electro-Static Chucking Mechanism and Surface Processing Apparatus |
| 01/17/2008 | US20080014352 System and method for forming an integrated barrier layer |
| 01/17/2008 | US20080014351 Film forming system, method of operating the same, and storage medium for executing the method |
| 01/17/2008 | US20080014350 Apparatus and Methods for Chemical Vapor Deposition |
| 01/17/2008 | US20080014349 Process For Producing Glass Plate With Thin Film |
| 01/17/2008 | US20080014348 Method of coating gas turbine components |
| 01/17/2008 | US20080014347 Method for manufacturing a erosion preventative diamond-like coating for a turbine engine compressor blade |
| 01/17/2008 | US20080014346 Method of synthesizing single-wall carbon nanotubes |
| 01/17/2008 | US20080014345 Processing apparatus, exhaust processing process and plasma processing process |
| 01/17/2008 | US20080014334 Depositing a droplet containing a substance on an electrode coupled to an oscillator; detecting oscillator frequency; evaporating the droplet to leave the substance on the electrode; detecting the frequency after evaporation; comparing the frequencies; and comparing droplet and substance quantities |
| 01/17/2008 | US20080014057 Loading and Unloading Apparatus For A Coating Device |
| 01/17/2008 | US20080011734 Heat-treating apparatus |