| Patents for C23C 16 - Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition (cvd) processes (71,892) |
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| 02/06/2008 | CN100367471C Vaporizer and semiconductor processing apparatus |
| 02/06/2008 | CN100367460C Heat treatment apparatus and heat treatment method |
| 02/06/2008 | CN100367459C Substrate treatment appratus and method of manufacturing semiconductor device |
| 02/06/2008 | CN100367457C Island projection-modified part, method for producing same, and appts. comprising same |
| 02/06/2008 | CN100366793C Method and equipment for preparing single-crystal doped Nano zinc oxide tube through gaseous phase deposition |
| 02/06/2008 | CN100366792C Thin film forming method and film forming device |
| 02/05/2008 | USH2209 Uses an electron beam-produced plasma that delivers substantial ion and radical fluxes at low temperatures over an organic plastic or polymer substrate; surface is physically and chemically altered to improve metal adhesion |
| 02/05/2008 | US7327948 Cast pedestal with heating element and coaxial heat exchanger |
| 02/05/2008 | US7327556 Carbon-coated aluminum and method for producing same |
| 02/05/2008 | US7326980 Devices with HfSiON dielectric films which are Hf-O rich |
| 02/05/2008 | US7326657 Post-deposition treatment to enhance properties of Si-O-C low k films |
| 02/05/2008 | US7326502 Ion beam deposition and atomic layer deposition to form alternating stack of thin films; to smooth surface defects; form extreme ultraviolet reflective mask in semiconductor processing; optical ultraviolet system for making semiconductor wafer |
| 02/05/2008 | US7326445 Method and apparatus for manufacturing ultra fine three-dimensional structure |
| 02/05/2008 | US7326438 Depositing a silicon nitride film with a different thickness for each region of the film from ammonia and silane using a single chamber-type apparatus; first and second nitride films deposited together have a greater thickness at the upper region as compared to the side regions and the lower region |
| 02/05/2008 | US7326436 Magnetic recording medium and method of fabricating the same |
| 02/05/2008 | US7325511 Microwave plasma processing apparatus, microwave processing method and microwave feeding apparatus |
| 02/05/2008 | US7325419 Method of forming a phosphorus doped optical core using a PECVD process |
| 02/05/2008 | CA2445119C Thermal flux regulator |
| 01/31/2008 | WO2008014040A2 Apparatus and method for coating substrates with approximate process isolation |
| 01/31/2008 | WO2008013314A1 Plastic molded article comprising vapor deposition film formed by plasma cvd method |
| 01/31/2008 | WO2008013244A1 Organoruthenium complex, and method for production of ruthenium thin film using the ruthenium complex |
| 01/31/2008 | WO2008013112A1 Microwave plasma source and plasma processing apparatus |
| 01/31/2008 | WO2008013108A1 Process for producing single-crystal substrate with off angle |
| 01/31/2008 | WO2008013087A1 Standing wave measuring unit in waveguide and standing wave measuring method, electromagnetic wave using device, plasma processing device, and plasma processing method |
| 01/31/2008 | WO2008012956A1 Device for vacuum process |
| 01/31/2008 | WO2008012921A1 Apparatus for chemical vapor deposition and method of chemical vapor deposition |
| 01/31/2008 | WO2008012665A1 Method of cleaning film forming apparatus and film forming apparatus |
| 01/31/2008 | WO2008012098A2 Silane-free plasma-assisted cvd deposition of silicon nitride as an antireflective film and for hydrogen passivation of photocells constructed on silicon wafers |
| 01/31/2008 | WO2007140375A3 Methods and systems for selectively depositing si-containing films using chloropolysilanes |
| 01/31/2008 | WO2007130448A3 Method of depositing zinc oxide coatings on a substrate |
| 01/31/2008 | WO2007044298A3 Wide range pressure control using turbo pump |
| 01/31/2008 | WO2006127208A3 Systems and methods for thermal management of electronic components |
| 01/31/2008 | US20080026578 Organometallic compounds |
| 01/31/2008 | US20080026259 Magnetic recording medium and method of fabricating the same |
| 01/31/2008 | US20080026251 Insulating film formation method, semiconductor device, and substrate processing apparatus |
| 01/31/2008 | US20080026168 Isotope-doped carbon nanotube |
| 01/31/2008 | US20080026162 Radical-enhanced atomic layer deposition system and method |
| 01/31/2008 | US20080026149 Methods and systems for selectively depositing si-containing films using chloropolysilanes |
| 01/31/2008 | US20080026148 Film Forming System And Method For Forming Film |
| 01/31/2008 | US20080026147 Method and formulation for depositing a metal-containing coating on a substrate |
| 01/31/2008 | US20080026146 Method of depositing a multilayer coating with a variety of oxide adhesion layers and organic layers |
| 01/31/2008 | US20080026145 Re-useable offset printing plate and method for producing the printing plate |
| 01/31/2008 | US20080026144 Method for manufacturing plastic products |
| 01/31/2008 | US20080026143 Process for flourinating piping |
| 01/31/2008 | US20080026133 Monitoring plasma ion implantation systems for fault detection and process control |
| 01/31/2008 | US20080025899 Plasma surface treatment method, quartz member, plasma processing apparatus and plasma processing method |
| 01/31/2008 | US20080025369 Simultaneous control of deposition time and temperature of multi-zone furnaces |
| 01/31/2008 | US20080024055 Transparent conducting oxide thin films and related devices |
| 01/31/2008 | US20080023648 Scintillator plate |
| 01/31/2008 | US20080023442 Method for manufacturing electronic device |
| 01/31/2008 | US20080023147 Plasma processing apparatus |
| 01/31/2008 | US20080023141 Substrate processing apparatus |
| 01/31/2008 | US20080023139 Plasma processing apparatus and plasma processing method |
| 01/31/2008 | US20080023029 Silicon carbide components of semiconductor substrate processing apparatuses treated to remove free-carbon |
| 01/31/2008 | US20080022928 Substrate processing apparatus |
| 01/31/2008 | DE112006000631T5 Verdampfer und Verfahren zum Verdampfen einer Flüssigkeit für die Dünnfilm-Zuführung Vaporizer and method for vaporizing a liquid for the thin film supply |
| 01/31/2008 | DE102007033670A1 Dotierte Magnesiumdiborid-Pulver und Verfahren zu deren Herstellung Doped magnesium diboride powders and methods for their preparation |
| 01/31/2008 | DE102006035563A1 Silan freie plasmagestützte CVD-Abscheidung von Siliziumnitrid als anti-reflektierendem Film und zur Wasserstoffpassivierung von auf Siliziumwafern aufgebauten Photozellen Silane-free plasma-enhanced CVD deposition of silicon nitride as an anti-reflective film and the hydrogen passivation of silicon wafers constructed photocells |
| 01/31/2008 | CA2660082A1 Methods and systems for manufacturing polycrystalline silicon and silicon-germanium solar cells |
| 01/30/2008 | EP1882757A1 Metal organic chemical vapor deposition equipment |
| 01/30/2008 | EP1882052A1 Method for modifying a silicone rubber surface |
| 01/30/2008 | EP1458903B1 Method for depositing silicon nitride films and silicon oxynitride films by chemical vapor deposition |
| 01/30/2008 | EP1337684B1 Vacuum metalization process for chroming substrates |
| 01/30/2008 | CN201012941Y Graphite boat used in production of silicon chip |
| 01/30/2008 | CN101116170A Encapsulated wafer processing device and process for making thereof |
| 01/30/2008 | CN101115864A Layered thin film structure, layered thin film forming method, film forming system and storage medium |
| 01/30/2008 | CN101115863A Low friction sliding mechanism |
| 01/30/2008 | CN101115862A Wafer carrier for growing GaN wafer |
| 01/30/2008 | CN101115860A Production method for vacuum component, resin coating forming device and vacuum film forming system |
| 01/30/2008 | CN101113517A Substrate processing apparatus |
| 01/30/2008 | CN101113516A Method for preparing nano composite diamond coating |
| 01/30/2008 | CN101113514A Substrate processing apparatus |
| 01/30/2008 | CN100365339C Flow system with high resolution proportional valve with customizable performance |
| 01/29/2008 | US7323729 Methods for improving quality of high temperature oxide (HTO) formed from halogen-containing precursor and products thereof and apparatus therefor |
| 01/29/2008 | US7323661 Heat treatment apparatus using a lamp for rapidly and uniformly heating a wafer |
| 01/29/2008 | US7323424 Semiconductor constructions comprising cerium oxide and titanium oxide |
| 01/29/2008 | US7323412 Atomic layer deposition methods, and methods of forming materials over semiconductor substrates |
| 01/29/2008 | US7323400 Plasma processing, deposition and ALD methods |
| 01/29/2008 | US7323399 Clean process for an electron beam source |
| 01/29/2008 | US7323371 Deposition method of insulating layers having low dielectric constant of semiconductor device, a thin film transistor substrate using the same and a method of manufacturing the same |
| 01/29/2008 | US7323257 Complex oxide having an oxygen octahedral structure containing Si and Ge formed by post-annealing the components in a pressurized atmosphere including oxygen or ozone; dielectric capacitors |
| 01/29/2008 | US7323249 Methods of obtaining photoactive coatings and/or anatase crystalline phase of titanium oxides and articles made thereby |
| 01/29/2008 | US7323231 Apparatus and methods for plasma vapor deposition processes |
| 01/29/2008 | US7323220 Gas phase growth system, method of operating the system, and vaporizer for the system |
| 01/29/2008 | US7323219 Apparatus and method for applying diamond-like carbon coatings |
| 01/29/2008 | US7323218 Synthesis of composite nanofibers for applications in lithium batteries |
| 01/29/2008 | US7323212 Method and system of controlling dummy dispense |
| 01/29/2008 | US7323157 Production of agglomerates from gas phase |
| 01/29/2008 | US7323088 Taking a glazing panel having on one of its surfaces transparent coating layer having a transformable portion, and enamel material associated with the transformable portion of the coating layer; heating to cause interaction |
| 01/29/2008 | US7323064 Supercritical fluid technology for cleaning processing chambers and systems |
| 01/29/2008 | US7323042 Abatement system targeting a by-pass effluent stream of a semiconductor process tool |
| 01/29/2008 | US7322368 Plasma cleaning gas and plasma cleaning method |
| 01/29/2008 | CA2365659C The surface modification of solid supports through the thermal decomposition and functionalization of silanes |
| 01/24/2008 | WO2008011329A2 Method and system for isolated and discretized process sequence integration |
| 01/24/2008 | WO2008011306A2 Substrate support with adjustable lift and rotation mount |
| 01/24/2008 | WO2008010943A2 Hybrid rf capacitively and inductively coupled plasma source using multifrequency rf powers and methods of use thereof |
| 01/24/2008 | WO2008010882A2 Ion source with recess in electrode |
| 01/24/2008 | WO2008010591A1 Method for forming porous insulating film |
| 01/24/2008 | WO2008010537A1 Plasma processing device, plasma processing method, and plasma surface processing method |
| 01/24/2008 | WO2008010520A1 Shower plate, method for producing the same, plasma processing apparatus using the shower plate, plasma processing method, and method for manufacturing electronic device |