| Patents for C23C 16 - Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition (cvd) processes (71,892) |
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| 02/21/2008 | US20080041307 Control of gas flow and delivery to suppress the formation of particles in an mocvd/ald system |
| 02/21/2008 | DE102006038780A1 Verfahren und Vorrichtung zum Herstellen einer Beschichtung Method and apparatus for producing a coating |
| 02/20/2008 | EP1890344A1 Method of fabricating light emitting device |
| 02/20/2008 | EP1889953A1 Process for producing silicon carbide single crystal |
| 02/20/2008 | EP1889947A1 Method and device for forming vapor deposition film by surface liquid plasma |
| 02/20/2008 | EP1889946A2 Surface Processing Apparatus |
| 02/20/2008 | EP1889945A1 METHOD FOR PRODUCING ZnO-BASED TRANSPARENT ELECTROCONDUCTIVE FILM BY MOCVD (METAL ORGANIC CHEMICAL VAPOR DEPOSITION) METHOD |
| 02/20/2008 | EP1889943A1 Method and device for coating a carrier |
| 02/20/2008 | EP1889817A2 Single body injector |
| 02/20/2008 | EP1888810A2 Substrate temperature control for combustion chemical vapor deposition |
| 02/20/2008 | EP1888803A1 Apparatus for gas-dynamic applying coatings an method of coating |
| 02/20/2008 | EP1556395A4 Methods for making metallocene compounds |
| 02/20/2008 | EP1556394A4 Asymmetric group 8 (viii) metallocene compounds |
| 02/20/2008 | EP1540034A4 Method for energy-assisted atomic layer depositon and removal |
| 02/20/2008 | EP1226395A4 Hot wall rapid thermal processor |
| 02/20/2008 | EP0997554B1 Plasma cvd method, plasma cvd apparatus, and electrode |
| 02/20/2008 | CN201025611Y Belt shielding for lining processing room |
| 02/20/2008 | CN101128621A Composite material consisting of a porous matrix and metal or metal oxide nanoparticles |
| 02/20/2008 | CN101128620A Method of forming film and apparatus for film formation |
| 02/20/2008 | CN101128619A Method for preparing nanoparticles of a metal or a metal alloy, dispersed on a substrate, by chemical vapour deposition |
| 02/20/2008 | CN101128402A Fine-laminar barrier protection layer |
| 02/20/2008 | CN101128084A Plasma generation device, plasma control method, and substrate manufacturing method |
| 02/20/2008 | CN101128083A Plasma generation device, plasma control method, and substrate manufacturing method |
| 02/20/2008 | CN101127432A Ti Hz quanta cascaded semiconductor laser material and its growth method |
| 02/20/2008 | CN101127305A Plasma generation device, plasma control method, and substrate manufacturing method |
| 02/20/2008 | CN101127298A Heat processing apparatus, heat processing method, computer program and storage medium |
| 02/20/2008 | CN101126155A Chemical vapor deposition apparatus |
| 02/20/2008 | CN101126154A GAS reaction inner tube with quartz nozzle protection components and reaction system |
| 02/20/2008 | CN101126148A Nano thin film with separation and protection function and manufacturing method thereof |
| 02/20/2008 | CN100370585C Method of forming barrier film and method of forming electrode film |
| 02/20/2008 | CN100370281C Method for depositing carbon film on resin lens |
| 02/20/2008 | CN100370060C Mold with super hard coating |
| 02/20/2008 | CN100370055C Method for quick-speed preparing carbon/carbon composite material using heat gradient chemical gas phase infiltration |
| 02/20/2008 | CN100370045C Clean aluminium alloy for semiconductor processing equipment |
| 02/19/2008 | USRE40082 Coated inserts for rough milling |
| 02/19/2008 | US7332442 Systems and methods for forming metal oxide layers |
| 02/19/2008 | US7332262 Forming amorphous carbon layer on semiconductor stack; etching; elimination of intermediate layer |
| 02/19/2008 | US7332226 thin-film solar cells; effectively scatters light of wavelengths longer than the absorption region of amorphous silicon and has a low reflectance |
| 02/19/2008 | US7332195 Chemical vapor deposition method |
| 02/19/2008 | US7332055 Substrate processing apparatus |
| 02/19/2008 | US7332040 Semiconductor manufacturing system having a vaporizer which efficiently vaporizes a liquid material |
| 02/19/2008 | US7332039 Plasma processing apparatus and method thereof |
| 02/19/2008 | US7332038 Device for depositing in particular crystalline layers on one or more, in particular likewise crystalline substrates |
| 02/19/2008 | US7332032 Precursor mixtures for use in preparing layers on substrates |
| 02/19/2008 | US7331751 Vacuum processing method |
| 02/19/2008 | US7331307 Thermally sprayed member, electrode and plasma processing apparatus using the electrode |
| 02/19/2008 | US7331306 Plasma processing method and apparatus |
| 02/19/2008 | CA2398598C Method and device for coating substrates |
| 02/19/2008 | CA2365902C Method for increasing the yield in processes of deposition of thin layers onto a substrate |
| 02/14/2008 | WO2008018994A1 Zirconium substituted barium titanate gate dielectrics |
| 02/14/2008 | WO2008018956A2 Coating composition, article, and associated method |
| 02/14/2008 | WO2008018861A1 Copper(i) complexes and processes for deposition of copper films by atomic layer deposition |
| 02/14/2008 | WO2008018613A1 Semiconductor manufacturing apparatus |
| 02/14/2008 | WO2008018545A1 Substrate processing apparatus and semiconductor device manufacturing method |
| 02/14/2008 | WO2008018119A1 Film deposition apparatus |
| 02/14/2008 | WO2008017880A1 Apparatus for conveying a waste stream |
| 02/14/2008 | WO2008017382A2 Process for producing components in a medium-containing circuit, in particular a heat exchanger, and component of this type |
| 02/14/2008 | WO2008017208A1 Automatic purging device for purging the pipeline of a photoresist coating and developing apparatus |
| 02/14/2008 | WO2007109482A3 Diffusion barrier coatings having graded compositions and devices incorporating the same |
| 02/14/2008 | US20080038936 Method to form ultra high quality silicon-containing compound layers |
| 02/14/2008 | US20080038919 Plasma sputtering film deposition method and equipment |
| 02/14/2008 | US20080038861 Support with integrated deposit of gas absorbing material for manufacturing microelectronic microoptoelectronic or micromechanical devices |
| 02/14/2008 | US20080038680 transfer layer, antistatic layer, a light-to-heat conversion layer on a base layer, anda conductive frame connected to the antistatic layer; making OLED, controlling static electricity |
| 02/14/2008 | US20080038579 Metal Product, Method of Manufacturing a Metal Product and Use Thereof |
| 02/14/2008 | US20080038578 Atomic layer deposition for turbine components |
| 02/14/2008 | US20080038541 Method of forming thin film, substrate having thin film formed by the method, photoelectric conversion device using the substrate |
| 02/14/2008 | US20080038538 Method of Producing Nanostructure Tips |
| 02/14/2008 | US20080038524 Selective Doping of a Material |
| 02/14/2008 | US20080038509 Nano structured phased hydrophobic layers on substrates |
| 02/14/2008 | US20080038486 Radical Assisted Batch Film Deposition |
| 02/14/2008 | US20080038484 Coatings, and Methods and Devices for the Manufacture Thereof |
| 02/14/2008 | US20080038480 Plasma method for biomedical material onto hydrophilic polymer sheet |
| 02/14/2008 | US20080038477 Method for preparing and ultrasonically testing a thermal-spray coated article |
| 02/14/2008 | US20080038466 Tantalum and niobium compounds and their use for chemical vapour deposition (cvd) |
| 02/14/2008 | US20080038465 Precursor For Film Formation And Method For Forming Ruthenium-Containing Film |
| 02/14/2008 | US20080038464 Methods for Coating a Substrate and Forming a Colored Film and Related Device |
| 02/14/2008 | US20080038463 Atomic layer deposition process |
| 02/14/2008 | US20080038462 Method of forming a carbon layer on a substrate |
| 02/14/2008 | US20080038095 Apparatus for vacuum treating two dimensionally extended substrates and method for manufacturing such substrates |
| 02/14/2008 | US20080036155 Ferrofluid Seal Unit Used on Vertical Thermal Processing Furnace System for Semiconductor Wafer |
| 02/14/2008 | US20080035979 Capacitive electrode having semiconductor layers with an interface of separated grain boundaries |
| 02/14/2008 | US20080035613 Machine for the Treatment of Bottles That are Equipped with an Interchangeable Connection Cartridge |
| 02/14/2008 | US20080035608 Surface processing apparatus |
| 02/14/2008 | US20080035062 Deposition system for increasing deposition rates of metal layers from metal-carbonyl precursors |
| 02/14/2008 | US20080035061 Fabricating A Semiconductor Device |
| 02/14/2008 | US20080035060 Chemical vapor deposition reactor |
| 02/14/2008 | US20080035059 Chemical vapor deposition reactor |
| 02/14/2008 | US20080035057 Method and Apparatus for Creating a Phase Step in Mirrors Used in Spatial Light Modulator Arrays |
| 02/14/2008 | US20080035056 Apparatus For Manufacturing Coated Fuel Particles For High-Temperature Gas-Cooled Reactor |
| 02/14/2008 | US20080035055 Thermal processing system with improved process gas flow and method for injecting a process gas into a thermal processing system |
| 02/14/2008 | DE102007035221A1 Coating components of vehicle engine-cooling and air conditioning systems with glass or ceramic layer, heats surface and exposes to reactive gas flow |
| 02/14/2008 | DE102006037955A1 Tantal- und Niob-Verbindungen und ihre Verwendung für die Chemical Vapour Deposition (CVD) Tantalum and niobium compounds and their use for the chemical vapor deposition (CVD) |
| 02/14/2008 | CA2660200A1 Method for densification of porous articles |
| 02/14/2008 | CA2658615A1 Power control for densification of one or more porous articles |
| 02/13/2008 | EP1887617A2 Deposition method over mixed substrates using trisilane |
| 02/13/2008 | EP1887104A2 Radical assisted batch film deposition |
| 02/13/2008 | EP1887103A2 High strength gear, power transmission mechanism using the same, and production method for high strength gear |
| 02/13/2008 | EP1887102A1 Precursors having open ligands for ruthenium containing films deposition |
| 02/13/2008 | EP1887012A2 Organometallic compounds for chemical vapour deposition and atomic layer deposition of thin films |
| 02/13/2008 | EP1886050A2 Isolation valve for energetic and high temperature gasses |