| Patents for C23C 16 - Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition (cvd) processes (71,892) |
|---|
| 02/28/2008 | US20080050581 Rare Earth Magnet and Method for Manufacturing Same |
| 02/28/2008 | US20080050567 Barrier film |
| 02/28/2008 | US20080050538 Thin Film Forming Method and Thin Film Forming Apparatus |
| 02/28/2008 | US20080050536 Vacuum Processing Chamber for Very Large Area Substrates |
| 02/28/2008 | US20080050523 Unit-Layer Post-Processing Catalyst Chemical-Vapor-Deposition Apparatus and Its Film Forming Method |
| 02/28/2008 | US20080050522 Preparative method for protective layer of susceptor |
| 02/28/2008 | US20080050521 Apparatus & method for vapor phase lubrication of recording media with reduced lubricant consumption |
| 02/28/2008 | US20080050517 Pulse Heating Methods and Apparatus for Printing and Dyeing |
| 02/28/2008 | US20080050511 Apparatus and Method for Processing Biological Liquids |
| 02/28/2008 | US20080050510 Method for measuring precursor amounts in bubbler sources |
| 02/28/2008 | US20080049379 Scalable lead zirconium titanate (pzt) thin film material and deposition method, and ferroelectric memory device structures comprising such thin film material |
| 02/28/2008 | US20080048280 Light Receiving Device, Method for Fabricating Same, and Camera |
| 02/28/2008 | US20080048148 Ethyleneoxide-silane and bridged silane precursors for forming low k films |
| 02/28/2008 | US20080047490 Vapor deposition of benzotriazole (BTA) for protecting copper interconnects |
| 02/28/2008 | US20080047489 Chemical vapor deposition reactor that pre-heats applied gas and substrate before reaction |
| 02/28/2008 | DE10335460B4 Verfahren zum Betreiben einer CVD-Anlage A method of operating a CVD system |
| 02/28/2008 | DE102006036536B3 Verfahren zum Plasmabehandeln einer Oberfläche A method for treating a surface plasma |
| 02/28/2008 | DE102004053338B4 Reduktion einer Oxidschicht auf einer Oberfläche eines Siliziumhalbleiters Reducing an oxide film on a surface of a silicon semiconductor |
| 02/27/2008 | EP1893001A2 Lamp fasteners for semiconductor processing reactors |
| 02/27/2008 | EP1892752A1 Method of film formation and computer-readable storage medium |
| 02/27/2008 | EP1892318A1 Halogen gas plasma-resistive members, laminates, and corrosion-resistant members |
| 02/27/2008 | EP1534874A4 Continuous chemical vapor deposition process and process furnace |
| 02/27/2008 | EP1036210B1 Apparatus for surface modification of polymer, metal and ceramic materials using ion beam |
| 02/27/2008 | CN201028140Y Enhancement type plasma oxide film deposition device cavity cover cooling water pipe |
| 02/27/2008 | CN101133688A Microwave plasma processing device |
| 02/27/2008 | CN101133479A Plasma processing apparatus and gas permeable plate |
| 02/27/2008 | CN101133186A Self-cooling gas delivery apparatus under high vacuum for high density plasma applications |
| 02/27/2008 | CN101133185A Trap device |
| 02/27/2008 | CN101133184A Diamond coated bearing or seal structure, and fluid machine with the same |
| 02/27/2008 | CN101133183A Method and system for coating sections of internal surfaces |
| 02/27/2008 | CN101131930A Method for improving FSG caulking property |
| 02/27/2008 | CN101130861A Tin phosphate barrier film, method and apparatus |
| 02/27/2008 | CN101130860A Material for forming film and method for producing film |
| 02/27/2008 | CN101130859A Resistor external-heating type thermal gradient vapor phase carbon sinking device for densification technique of airplane carbon brake disc |
| 02/27/2008 | CN100372079C Method of manufacturing semiconductor device having nitride film with improved insulating properties |
| 02/27/2008 | CN100372067C Diffusion system |
| 02/27/2008 | CN100372065C Method and device for preparing p-type zinc oxide crystal film by doping phosphorus |
| 02/27/2008 | CN100372064C Substrate transfer device for thin-film deposition apparatus |
| 02/27/2008 | CN100372063C Group III nitride semiconductor substrate and its manufacturing method |
| 02/27/2008 | CN100372055C Method for etching high dielectric constant materials and for cleaning deposition chambers for high dielectric constant materials |
| 02/27/2008 | CN100371494C Gas preheater and preheating method |
| 02/27/2008 | CN100371493C Method and device for densifying porous substrates by chemical vapour infiltration |
| 02/27/2008 | CN100371491C Pulsed plasma processing method and apparatus |
| 02/26/2008 | US7335783 chemical vapor deposition process comprising a bis( beta -diketonato)zinc that is liquid at 25 degrees C.; stability |
| 02/26/2008 | US7335584 Method of using SACVD deposition and corresponding deposition reactor |
| 02/26/2008 | US7335569 In-situ formation of metal insulator metal capacitors |
| 02/26/2008 | US7335429 Gas turbine engine protuberances coated with a cooling coating and a protective coating; improved heat exchange and oxidation and corrosion resistances |
| 02/26/2008 | US7335398 Using physical and photochemical vapor deposition in conjunction with positioning the substrate a desired distance from a blocking device or at a desired speed, so that reflected light from the modified substrate is trapezoidal or another custom profile; lithography |
| 02/26/2008 | US7335397 Pressure gradient CVI/CVD apparatus and method |
| 02/26/2008 | US7335396 Methods for controlling mass flow rates and pressures in passageways coupled to reaction chambers and systems for depositing material onto microfeature workpieces in reaction chambers |
| 02/26/2008 | US7335278 Plasma processing apparatus and plasma processing method |
| 02/26/2008 | US7335277 Vacuum processing apparatus |
| 02/26/2008 | US7335267 Heat treating apparatus having rotatable heating unit |
| 02/26/2008 | US7335266 Method of forming a controlled and uniform lightly phosphorous doped silicon film |
| 02/26/2008 | US7334708 Integral blocks, chemical delivery systems and methods for delivering an ultrapure chemical |
| 02/21/2008 | WO2008022254A2 Vehicle structure with three dimensional film and method |
| 02/21/2008 | WO2008021791A2 Nano structured phased hydrophobic layers on substrates |
| 02/21/2008 | WO2008021460A2 Catch-cup to diverter alignment leveling jig |
| 02/21/2008 | WO2008020592A1 Film-forming material, silicon-containing insulating film and method for forming the same |
| 02/21/2008 | WO2007149265A3 Cvd coating scheme including alumina and/or titanium-containing materials and method of making the same |
| 02/21/2008 | WO2007142850A3 Gas flow control by differential pressure measurements |
| 02/21/2008 | WO2007140424A3 Chemical vapor deposition of high quality flow-like silicon dioxide using a silicon containing precursor and atomic oxygen |
| 02/21/2008 | WO2007134035A3 Method for formation of oxidized aluminum nitride films |
| 02/21/2008 | WO2007095158A3 Process for preparing substrates with porous surface |
| 02/21/2008 | WO2007064376A3 Organometallic precursors and related intermediates for deposition processes, their production and methods of use |
| 02/21/2008 | WO2006104841B1 Methods and apparatus for determining the endpoint of a cleaning or conditioning process in a plasma processing system |
| 02/21/2008 | WO2006047410A3 Fluid storage and dispensing system including dynamic fluid monitoring of fluid storage and dispensing vessel |
| 02/21/2008 | WO2005123282A3 Methods for wet cleaning quartz surfaces of components for plasma processing chambers |
| 02/21/2008 | US20080046111 Heat processing apparatus, heat processing method, computer program and storage medium |
| 02/21/2008 | US20080044850 Membrane Bioreactor |
| 02/21/2008 | US20080044687 Copper (II) Complexes for Deposition of Copper Films by Atomic Layer Deposition |
| 02/21/2008 | US20080044605 Multilayer containers and preforms having barrier properties |
| 02/21/2008 | US20080044600 Vehicle structure with three dimensional film and method |
| 02/21/2008 | US20080044594 Stress reduction of sioc low k film by addition of alkylenes to omcts based processes |
| 02/21/2008 | US20080044593 Method of forming a material layer |
| 02/21/2008 | US20080044589 CVD system and substrate cleaning method |
| 02/21/2008 | US20080044584 Device and a Method for Stabilizing a Metallic Object |
| 02/21/2008 | US20080044574 Method of manufacturing nano-crystalline silicon dot layer |
| 02/21/2008 | US20080044573 Rate control process for a precursor delivery system |
| 02/21/2008 | US20080044572 Right-sized vacuum precursor (rsvp) distillation system |
| 02/21/2008 | US20080044571 System and method for deposition of a material on a substrate |
| 02/21/2008 | US20080044569 Methods for atomic layer deposition of hafnium-containing high-k dielectric materials |
| 02/21/2008 | US20080044568 Anti-clogging nozzle for semiconductor processing |
| 02/21/2008 | US20080044567 Method of Depositing Thin Film |
| 02/21/2008 | US20080044560 Method of manufacturing a radiation image storage panel |
| 02/21/2008 | US20080044557 Low dielectric constant film produced from silicon compounds comprising silicon-carbon bond |
| 02/21/2008 | US20080044556 In-line deposition processes for circuit fabrication |
| 02/21/2008 | US20080044339 Thick single crystal diamond layer method for making it and gemstones produced from the layer |
| 02/21/2008 | US20080042162 Ultraviolet light-emitting device in which p-type semiconductor is used |
| 02/21/2008 | US20080041836 High temperature heating element for preventing contamination of a work piece |
| 02/21/2008 | US20080041831 Thermal flux processing by scanning a focused line beam |
| 02/21/2008 | US20080041820 Apparatus for reducing polymer deposition on a substrate and substrate support |
| 02/21/2008 | US20080041527 Antenna of plasma processing apparatus |
| 02/21/2008 | US20080041414 Pump Cleaning |
| 02/21/2008 | US20080041314 Vaccum coater device and mechanism for transporting workpieces in same |
| 02/21/2008 | US20080041313 Gas delivery apparatus for atomic layer deposition |
| 02/21/2008 | US20080041312 Stage for plasma processing apparatus, and plasma processing apparatus |
| 02/21/2008 | US20080041311 Chemical delivery apparatus for cvd or ald |
| 02/21/2008 | US20080041310 Method and apparatus to help promote contact of gas with vaporized material |
| 02/21/2008 | US20080041308 Substrate treatment apparatus and cleaning method |