Patents for C23C 16 - Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition (cvd) processes (71,892)
03/2008
03/06/2008WO2008027087A1 Method of forming a zinc oxide coated article
03/06/2008WO2008027086A1 Method of making a low-resistivity, doped zinc oxide coated glass article and the coated glass article made thereby
03/06/2008WO2008026738A1 Apparatus and method for manufacturing carbon structure
03/06/2008WO2008026700A1 Cutting tool, process for producing the same, and method of cutting
03/06/2008WO2008026491A1 Thin film manufacturing apparatus using discharge electrode, and solar cell manufacturing method
03/06/2008WO2008026470A1 Imide complex, method for producing the same, metal-containing thin film and method for producing the same
03/06/2008WO2008026469A1 Bottle made of synthetic resin
03/06/2008WO2008026395A1 Method for forming carbon film
03/06/2008WO2008026242A1 Cvd apparatus and method for thin film formation using the same
03/06/2008WO2008025352A2 Apparatus and method of forming thin layers on substrate surfaces
03/06/2008WO2008002415A3 Precursors for depositing silicon containing films and processes thereof
03/06/2008WO2007149761A3 Methods to improve the in-film defectivity of pecvd amorphous carbon films
03/06/2008WO2007113444A3 Process for functionalizing a glass reinforcement for composite material
03/06/2008US20080057739 Defect Control in Gate Dielectrics
03/06/2008US20080057737 System and method for forming a gate dielectric
03/06/2008US20080057734 Apparatus for fabricating a semiconductor device and method of fabricating a semiconductor device using the same
03/06/2008US20080057700 Apparatus for manufacturing semiconductor device and method for manufacturing semiconductor device using the same
03/06/2008US20080057686 Continuous dopant addition
03/06/2008US20080057633 Method for manufacturing thin film transistor array
03/06/2008US20080057344 Formation of Titanium Nitride Film
03/06/2008US20080057327 Al2O3 Ceramic Tool with Diffusion Bonding Enhanced Layer
03/06/2008US20080057280 Coated cutting tool and method for producing the same
03/06/2008US20080057225 Method of making low resisitivity doped zinc oxide coatings and the articles formed thereby
03/06/2008US20080057223 heat resistance, abrasion resistance and low friction characteristics; comprises antimony trioxide (Sb2O3), binder, tungsten disulfide (WS2) and silver
03/06/2008US20080057222 radio frequency electrode is disposed opposite to the opposing electrode in a vacuum chamber; device for applying a pulsed voltage to generate plasma with a smaller ion energy range; reactive ion etching; plasma etching silicon oxide film and silicon nitride film
03/06/2008US20080057221 lab-ambient controlled transfer module that is coupled to one or more wet substrate processing modules; enables controlled processing of substrate in either first, second or third ambient environments, as well as during associated transitions; avoiding unnecessary exposure to an uncontrolled ambient
03/06/2008US20080057220 Silicon photovoltaic cell junction formed from thin film doping source
03/06/2008US20080057218 Method and apparatus to help promote contact of gas with vaporized material
03/06/2008US20080057200 Method of forming a zinc oxide coated article
03/06/2008US20080057199 Oxidation method and apparatus for semiconductor process
03/06/2008US20080057198 Enhanced electromigration, lower metal resistivity, improved metal-to-metal interfacial adhesion for copper interconnects
03/06/2008US20080057197 Chemical vapor deposition reactor having multiple inlets
03/06/2008US20080057196 Insulation film manufacturing method, reaction device, power generation device and electronic apparatus
03/06/2008US20080057195 Apparatus includes a housing, a vapor source, at least one nozzle, and a vacuum pumping system; oxidation and heat resistance; used in gas turbine engines, ceramic thermal barrier coatings
03/06/2008US20080057193 Protective coatings for components exposed to high temperatures within a chemically and thermally hostile environment; uniform; oxidation and corrosion resistance; gas turbine engine
03/06/2008US20080057183 Method for lithium deposition in oled device
03/06/2008US20080056967 Oxidizing method and oxidizing unit for object to be processed
03/06/2008US20080054795 Organic El Light Emitting Element, Manufacturing Method Thereof, and Display Device
03/06/2008US20080054378 Semiconductor apparatus and method of manufacturing the semiconductor apparatus
03/06/2008US20080054228 one non-silicon precursor (such as a germanium precursor, a carbon precursor, etc.) during formation of a silicon nitride, silicon oxide, silicon oxynitride or silicon carbide film improves the deposition rate and/or makes possible tuning of properties of the film
03/06/2008US20080053816 Plasma processing apparatus and method
03/06/2008US20080053615 High-Frequency Plasma Processing Apparatus
03/06/2008US20080053614 Surface Processing Apparatus
03/06/2008DE10137088B4 Verfahren zum Ausbilden von siliziumhaltigen Dünnschichten mittels Atomschichtabscheidung (Atomic Layer Deposition) unter Verwendung von Aminosilanen A method of forming silicon-containing thin films by atomic layer deposition (Atomic Layer Deposition) using aminosilanes
03/05/2008EP1895579A1 Diamond semiconductor element and method for manufacturing same
03/05/2008EP1895575A1 Heat treatment apparatus
03/05/2008EP1895573A1 Silicon carbide single-crystal wafer and process for producing the same
03/05/2008EP1894449A2 Method for treating plasma under continuous atmospheric pressure of work pieces, in particular, material plates or strips
03/05/2008EP1893786A1 A method of producing metal cutting tools
03/05/2008EP1893785A2 Method for feeding powdered or granular material
03/05/2008EP1893784A2 Method and apparatus for producing a coating on a substrate
03/05/2008EP1893783A1 Method of deposting germanium films
03/05/2008EP1478595B1 Method and apparatus for the production of carbon nanostructures
03/05/2008EP1454346A4 Method and apparatus for chemical vapor ddeposition capable of preventing contamination and enhancing film growth rate
03/05/2008EP1421606A4 Plasma enhanced atomic layer deposition (peald) equipment and method of forming a conducting thin film using the same thereof
03/05/2008EP1238421B1 Apparatus and method for minimizing parasitic chemical vapor deposition during atomic layer deposition
03/05/2008EP1177112A4 Remote plasma generator
03/05/2008CN201032628Y Carrier for silicon slice production
03/05/2008CN101138076A Method of substrate treatment, recording medium and substrate treating apparatus
03/05/2008CN101138073A Nitride semiconductor material and method of manufacturing nitride semiconductor crystal
03/05/2008CN101137765A Method for producing coated carbon particles and use of the latter in anode materials for lithium-ion batteries
03/05/2008CN101137267A Plasma generation apparatus and workpiece processing apparatus using the same
03/05/2008CN101136321A Plasma apparatus with device for reducing polymer deposition on a substrate and method for reducing polymer deposition
03/05/2008CN101135048A Plasma film coating device and method
03/05/2008CN101135047A Gastification device and semiconductor processing system
03/05/2008CN101135046A Film formation method and apparatus for semiconductor process
03/05/2008CN101135033A Conductive, plasma-resistant member
03/05/2008CN101134202A Automatic determination method of the cleaning course end for the reaction boiler tube
03/05/2008CN100373578C Stand arrangement and control thereof
03/05/2008CN100373559C CVD method and device for forming silicon-containing insulation film
03/05/2008CN100373548C Method for generating nopolar GaN thick film on lithium aluminate chip
03/05/2008CN100373547C Component structure of deposition chamber
03/05/2008CN100373543C Rhodium-riched oxygen barriers
03/05/2008CN100373542C Vacuum processing apparatus
03/05/2008CN100373541C Chuck plate assembly with cooling means
03/05/2008CN100373540C Bottom electrode assembly for semiconductor device
03/05/2008CN100373539C Plasma processing apparatus
03/05/2008CN100373535C Semi-conductor manufacturing installation
03/05/2008CN100372971C Switched uniformity control
03/05/2008CN100372766C Al18B4O33 nano wire uniform cladded with BN and preparation process thereof
03/04/2008US7339656 Method and apparatus for measuring electron density of plasma and plasma processing apparatus
03/04/2008US7339648 Apparatus for manufacturing liquid crystal display device and liquid crystal display device manufactured using the same
03/04/2008US7339139 Multi-layered radiant thermal evaporator and method of use
03/04/2008US7338900 Method for forming tungsten nitride film
03/04/2008US7338699 Island projection-modified part, method for producing the same, and apparatus comprising the same
03/04/2008US7338578 Step edge insert ring for etch chamber
03/04/2008US7338577 Inductively coupled plasma processing apparatus having internal linear antenna for large area processing
03/04/2008US7338575 Hydrocarbon dielectric heat transfer fluids for microwave plasma generators
03/04/2008US7337745 Electrode, susceptor, plasma processing apparatus and method of making the electrode and the susceptor
02/2008
02/28/2008WO2008024874A2 Method for measuring precursor amounts in bubbler sources
02/28/2008WO2008023748A1 Method for oxide film formation and apparatus for the method
02/28/2008WO2008023711A1 Integrated gas panel apparatus
02/28/2008WO2008023697A1 Vapor phase growth system
02/28/2008WO2007147946A8 Method for manufacturing fibre preform
02/28/2008WO2007120776A3 Plasma deposition apparatus and method for making solar cells
02/28/2008WO2007085328A3 Nanocomposite materials in a layer of a sliding bearing
02/28/2008US20080050929 Method of and Apparatus for Low-Temperature Epitaxy on a Plurality of Semiconductor Substrates
02/28/2008US20080050927 Variable temperature and dose atomic layer deposition
02/28/2008US20080050688 System and Process for Heating Semiconductor Wafers by Optimizing Absorption of Electromagnetic Energy
02/28/2008US20080050637 Microfabricated Fuel Cell