| Patents for C23C 16 - Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition (cvd) processes (71,892) |
|---|
| 03/27/2008 | US20080072929 Dilution gas recirculation |
| 03/27/2008 | US20080072823 Self aligning non contact shadow ring process kit |
| 03/27/2008 | US20080072822 System and method including a particle trap/filter for recirculating a dilution gas |
| 03/27/2008 | US20080072821 Small volume symmetric flow single wafer ald apparatus |
| 03/27/2008 | US20080072792 Good film forming properties and step coverage is obtained by using 1,3-dioxolane; hardly freezes even in cold regions |
| 03/27/2008 | US20080072585 Exhaust system |
| 03/27/2008 | DE102007042943A1 New titanium, zirconium and hafnium alkenoxides useful for forming thin films, e.g. on electronic or optical components |
| 03/27/2008 | DE102007039645A1 Coating or modifying surface of organic or inorganic wires, fibers or assemblies of them comprises exposing them to flame, plasma or stream of hot gas containing layer-forming organic or inorganic components |
| 03/27/2008 | DE102006045617A1 Verfahren zur Herstellung einer anorganisch-anorganischen bzw. anorganisch-organischen Gradientenkompositschicht A process for preparing a inorganic-inorganic or inorganic-organic Gradientenkompositschicht |
| 03/27/2008 | DE102006043943A1 Verfahren zum Aufbringen von Schichten auf Substraten mit gekrümmten Oberflächen A process for applying layers to substrates having curved surfaces |
| 03/27/2008 | DE102006043755A1 Equipment with vaporizer, vapor line and deposition chamber producing e.g. thin films of titanium oxidic ceramic by chemical vapor deposition, includes temperature control chamber |
| 03/27/2008 | DE102006043543A1 Homogenisator für der Beschichtung von Oberflächen dienende Gasströme Homogenizer for the coating of surfaces serving gas streams |
| 03/27/2008 | DE102006043542A1 Verfahren zum Beschichten von Oberflächen A method for coating surfaces |
| 03/27/2008 | DE102006043036A1 Vorrichtung und Verfahren zur Modifizierung von Innenoberflächen Device and method for the modification of internal surfaces |
| 03/27/2008 | DE10120295B4 Gerät und Prozess zur Gasphasenbeschichtung Device and process for gas-phase coating |
| 03/26/2008 | EP1903618A1 Method for producing trialkyl gallium |
| 03/26/2008 | EP1903124A2 Method for manufacturing an inorganic-inorganic or inorganic-organic gradient composite coating |
| 03/26/2008 | EP1902156A2 Method for treating plasma and/or covering plasma of workpieces under continuous atmospheric pressure, in particular material plates or strips |
| 03/26/2008 | EP1902155A1 Hard-coated body and method for production thereof |
| 03/26/2008 | EP1902154A2 Apparatus for the pecvd deposition of an inner barrier layer on a container, comprising an optical plasma analysis device |
| 03/26/2008 | EP1901983A2 Load port module |
| 03/26/2008 | EP1275135B1 Apparatus for thermally processing wafers |
| 03/26/2008 | EP0938741B1 Vacuum plasma processor having coil with intermediate portion coupling lower magnetic flux density to plasma than center and peripheral portions of the coil |
| 03/26/2008 | CN101151223A Object comprising a barrier coating, and method for the production of such an object |
| 03/26/2008 | CN101151115A Replacement cutter tip and method of manufacturing the same |
| 03/26/2008 | CN101150039A Gas injection device |
| 03/26/2008 | CN101148756A Vacuum plasma reactor used for large area film growth |
| 03/26/2008 | CN101148755A Underlay processing device |
| 03/26/2008 | CN100377319C Gas supply system and treatment system |
| 03/26/2008 | CN100377306C Non-polar single crystalline A-plane nitride semiconductor wafer and preparation method thereof |
| 03/26/2008 | CN100376717C Scale-viewing temperature area temperature stabilizing method in chemical gaseous phase deposition course |
| 03/26/2008 | CN100376477C Growth apparatus of carson nanotube array and growth method of multi-wall carbon nanotube array |
| 03/26/2008 | CN100376309C Device for puritying fluid |
| 03/25/2008 | US7348445 Dimethylethyl ethylenediamine dimethylaluminum; liquid at room temperature, adequate vapor pressure, thermal stability; vapor deposition |
| 03/25/2008 | US7348200 Method of growing non-polar a-plane gallium nitride |
| 03/25/2008 | US7348042 Plasma vapor deposition; integrated circuits |
| 03/25/2008 | US7348041 Antireflection film made of a CVD SiO2 film containing a fluoro and/or alkyl modifier |
| 03/25/2008 | US7347901 Thermally zoned substrate holder assembly |
| 03/25/2008 | US7347900 Chemical vapor deposition apparatus and method |
| 03/25/2008 | US7347006 Processing apparatus and method for removing particles therefrom |
| 03/25/2008 | CA2238208C Protective coating by high rate arc plasma deposition |
| 03/21/2008 | CA2601993A1 Composition and method for alloy having improved stress relaxation resistance |
| 03/20/2008 | WO2008033436A1 Systems and methods for forming strontium-and/or barium-containing layers |
| 03/20/2008 | WO2008032910A1 Apparatus of chemical vapor deposition with a showerhead regulating injection velocity of reactive gases positively and method thereof |
| 03/20/2008 | WO2008032108A1 Method of recycling hydrogen |
| 03/20/2008 | WO2008031768A1 Coated cutting tool |
| 03/20/2008 | WO2008031604A1 Methods for the application of layers to substrates having curved surfaces |
| 03/20/2008 | WO2008013665A3 Methods and apparatus for the vaporization and delivery of solution precursors for atomic layer deposition |
| 03/20/2008 | WO2008011329A3 Method and system for isolated and discretized process sequence integration |
| 03/20/2008 | WO2008002780A3 Batch processing platform for ald and cvd |
| 03/20/2008 | WO2007149694A3 Apparatuses, systems and methods for rapid cleaning of plasma confinement rings with minimal erosion of other chamber parts |
| 03/20/2008 | WO2007141426A3 Machine for plasma treatment of containers comprising an integrated vacuum circuit |
| 03/20/2008 | WO2007119077A3 Vacuum pumping system |
| 03/20/2008 | WO2007085928A3 Multiple precursor dispensing apparatus |
| 03/20/2008 | US20080070051 Chemical and corrosion resistant protective coatings; multilayer composite comprising a metal alloy undercoatings, yttrium oxide overcoatings which was formed by spraying under depressurization |
| 03/20/2008 | US20080070049 Method for making a highly stable diamond film on a subtrate |
| 03/20/2008 | US20080070047 Sealable packaging structures and applications related thereto |
| 03/20/2008 | US20080070032 Processing apparatus with a chamber having therein a high-corrosion-resistant sprayed film |
| 03/20/2008 | US20080070028 Internal member for plasma-treating vessel and method of producing the same |
| 03/20/2008 | US20080070017 Layered Thin Film Structure, Layered Thin Film Forming Method, Film Forming System and Storage Medium |
| 03/20/2008 | US20080069972 Chemical vapor deposition obtaining a nanocrystalline diamond matrix free of graphite inclusions by inducing a plasma if a hydrogcarbon/inert gas mixture using radio waves to produce a direct current bias voltage that precludes the formation of an allotrope; protective coatings of plastics/metals |
| 03/20/2008 | US20080069966 A protective film of oxides of aluminum and yttrium formed on an inner wall surface of the chamber and the internal exposed surfaces of the apparatus for processing semiconductor wafers; high-corrosion resistance and dielectric property; etching resistance; spraying yttrium, aluminum and amorphous garnet |
| 03/20/2008 | US20080069955 Atomic layer deposition apparatus |
| 03/20/2008 | US20080069954 improve delivering hexamethyldisilazane vapor in photolithography system; coating wafer in the chamber with vaporized photolithography chemical reacting with carrier gas nitrogen; equalizing pressure to prevent negative pressure; computer program is used to control the chemical vapor deposition |
| 03/20/2008 | US20080069953 three gas inlet zones disposed vertically one above the other, located between the ceiling and the heated floor; vapor deposition of semiconductor crystalline layers; reduce the horizontal extent of the inlet zone |
| 03/20/2008 | US20080069952 cleaning a silicon wafer with hydrogen gas and oxidizing to form silica film in one pot process; under predetermined subatmospheric pressure, heating the substrate |
| 03/20/2008 | US20080069951 Wafer processing hardware for epitaxial deposition with reduced auto-doping and backside defects |
| 03/20/2008 | US20080069945 Generating aerosols, reaction driven by a radiation source; forming deposits; forming a glass on a substrate or a doped glass layer; forming a protective glass layer on wafers |
| 03/20/2008 | US20080069944 Method of chemical protection of metal surface |
| 03/20/2008 | US20080069709 Pump piston and/or elements sealing the pump piston, in particular a sealing ring of elastomeric material, and a device and method for coating an object of elastomeric material |
| 03/20/2008 | US20080067522 Gallium Nitride-Based Semiconductor Stacked Structure, Production Method Thereof, and Compound Semiconductor and Light-Emitting Device Each Using the Stacked Structure |
| 03/20/2008 | US20080067147 Processing apparatus and processing method |
| 03/20/2008 | US20080066868 Focus ring and plasma processing apparatus |
| 03/20/2008 | US20080066861 Plasma processing chamber with an apparatus for measuring set of electrical characteristics in a plasma |
| 03/20/2008 | US20080066684 Wafer processing hardware for epitaxial deposition with reduced backside deposition and defects |
| 03/20/2008 | US20080066683 Assembly with Enhanced Thermal Uniformity and Method For Making Thereof |
| 03/20/2008 | US20080066682 Substrate supporting mechanism and substrate processing apparatus |
| 03/20/2008 | US20080066681 Batch-Type Remote Plasma Processing Apparatus |
| 03/20/2008 | US20080066680 Sequential chemical vapor deposition |
| 03/20/2008 | US20080066679 Processing system and plasma generation device |
| 03/20/2008 | US20080066678 Apparatus and methods for transporting and processing substrates |
| 03/20/2008 | US20080066677 Semiconductor manufacturing system |
| 03/20/2008 | US20080066676 Heating apparatus with enhanced thermal uniformity and method for making thereof |
| 03/20/2008 | US20080066647 Al2O3 film formed on the undercoat as a middle layer and high purity Y2O3 plasma sprayed coating as a top coat; chemical resistance, corrosion resistance |
| 03/20/2008 | DE10291037B4 Verfahren zur Herstellung von Tantal- und Niobalkoholaten A process for producing tantalum and Niobalkoholaten |
| 03/20/2008 | DE102006042328A1 Vorrichtung und Verfahren zur Ausbildung dünner Schichten auf Substratoberflächen Apparatus and method for forming thin films on substrate surfaces |
| 03/20/2008 | DE102006041515A1 Coated carbon nanotubes, e.g. useful as catalysts, comprise one or more transition metal layers formed by chemical vapor deposition |
| 03/20/2008 | DE102006039956A1 Atomic layer deposition of hafnium oxide or hafnium silicon oxide, involves depositing material on substrate using hafnium precursor, fluctuating process temperature of substrate between low and high temperatures after heating |
| 03/19/2008 | EP1901358A1 Method of fabricating light emitting device |
| 03/19/2008 | EP1900856A2 Silicon carbide manufacturing device and method of maufacturing silicon carbide |
| 03/19/2008 | EP1900841A2 Homogenizer for gas streams for coating surfaces |
| 03/19/2008 | EP1900686A1 Method of making dust-free granular silicon |
| 03/19/2008 | EP1900493A1 Device for modifying inner surfaces of tubular hollow bodies using plasma |
| 03/19/2008 | EP1900439A1 Green compact of polymer ceramics and process for closing openings in workpieces |
| 03/19/2008 | EP1900436A2 Method for coating surfaces |
| 03/19/2008 | EP1899498A1 Method for manufacturing flat substrates |
| 03/19/2008 | EP1899497A1 Deposition method of ternary films |
| 03/19/2008 | EP1899496A2 Hydrophilic dlc on substrate with barrier discharge pyrolysis treatment |
| 03/19/2008 | EP1899048A1 Low wetting hysteresis hydrophobic surface coating, method for depositing same, microcomponent and use |
| 03/19/2008 | EP1617955A4 Products for treating and preventing chronic diseases: eliminating the autoimmune triggers that underly chronic disease |