| Patents for C23C 16 - Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition (cvd) processes (71,892) |
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| 04/16/2008 | CN101163818A Reactor |
| 04/16/2008 | CN101163817A Vapor deposition film by plasma CVD method |
| 04/16/2008 | CN101163816A Remote chamber methods for removing surface deposits |
| 04/16/2008 | CN101163815A Source, an arrangement for installing a source, and a method for installing and removing a source |
| 04/16/2008 | CN101163556A Surface treatment |
| 04/16/2008 | CN101162686A Heat treatment apparatus |
| 04/16/2008 | CN101161859A Internal barrier coating apparatus using microwave plasma for thermoplastic container |
| 04/16/2008 | CN101161858A Installation for depositing, by means of microwave plasma, an internal barrier coating in thermoplastic containers |
| 04/16/2008 | CN101161857A Aluminum alloy surface treatment method |
| 04/16/2008 | CN100382239C Method for electrically discharging substrate, substrate processing apparatus and program |
| 04/16/2008 | CN100382238C Opening/closing mechanism for vacuum processing apparatus, and vacuum processing apparatus |
| 04/16/2008 | CN100382237C Vacuum treatment device |
| 04/16/2008 | CN100382234C Load lock chamber for large area substrate processing system |
| 04/16/2008 | CN100382230C Silicon electrode and its production method, method for producing silicon parts and processing semiconductor wafer |
| 04/16/2008 | CN100381607C Lighting MOCVD apparatus for growth of ZnO thin-film and P-type doping process |
| 04/16/2008 | CN100381606C Rapid process for producing multilayer barrier coatings |
| 04/16/2008 | CN100381402C Nanometer multilayer hard AlN/SiO2 film |
| 04/15/2008 | US7358554 Semiconductor manufacturing apparatus for modifying-in-film stress of thin films, and product formed thereby |
| 04/15/2008 | US7358200 Gas-assisted rapid thermal processing |
| 04/15/2008 | US7358197 Method for avoiding polysilicon film over etch abnormal |
| 04/15/2008 | US7358187 Coating process for patterned substrate surfaces |
| 04/15/2008 | US7357975 Carbon-containing hard coating and a method for depositing a hard coating onto a substrate |
| 04/15/2008 | US7357958 Methods for depositing gamma-prime nickel aluminide coatings |
| 04/15/2008 | US7357846 Substrate processing apparatus and substrate processing method |
| 04/15/2008 | US7357697 Superhard material article of manufacture |
| 04/15/2008 | US7357138 Method for etching high dielectric constant materials and for cleaning deposition chambers for high dielectric constant materials |
| 04/10/2008 | WO2008042981A2 Ald of metal silicate films |
| 04/10/2008 | WO2008042691A2 Processing system containing a hot filament hydrogen radical source for integrated substrate processing |
| 04/10/2008 | WO2008042590A2 Batch reaction chamber employing separate zones for radiant heating and resistive heating |
| 04/10/2008 | WO2008042032A1 Apparatus and method for delivering uniform fluid flow in a chemical deposition system |
| 04/10/2008 | WO2008041991A1 Density-matching alkyl push flow for vertical flow rotating disk reactors |
| 04/10/2008 | WO2008041578A1 Method for manufacturing magnetic recording medium and method for manufacturing laminated body |
| 04/10/2008 | WO2008041519A1 Nitride semiconductor manufacturing method |
| 04/10/2008 | WO2008041499A1 Filming method for iii-group nitride semiconductor laminated structure |
| 04/10/2008 | WO2008041444A1 Raw material for formation of thin film, method for production of thin film, and zinc compound |
| 04/10/2008 | WO2008041386A1 Production device of gas barrier plastic container and its production method |
| 04/10/2008 | WO2008040819A1 Method of decontamination by means of dry ice |
| 04/10/2008 | WO2008040695A2 Piston ring for internal combustion engines |
| 04/10/2008 | WO2008040694A2 Piston ring for internal combustion engines |
| 04/10/2008 | WO2008025352A3 Apparatus and method of forming thin layers on substrate surfaces |
| 04/10/2008 | WO2008021482A3 Diamond-like carbon electronic devices and methods of manufacture |
| 04/10/2008 | WO2007106332A3 Transfer of wafers with edge grip |
| 04/10/2008 | US20080086229 Substrate processing system |
| 04/10/2008 | US20080085419 Electro- and Electroless Plating of Metal in the Manufacture of PCRAM Devices |
| 04/10/2008 | US20080085407 Superabrasive elements, methods of manufacturing, and drill bits including same |
| 04/10/2008 | US20080085377 Plasma treatment apparatus and method for plasma treatment |
| 04/10/2008 | US20080085375 Protective layer material for PDP and method of manufacturing the same |
| 04/10/2008 | US20080085368 Precisedly timed preheating in discrete, repeated cycles synchronized to deposition step; such as bonding tungsten carbide cobalt to stainless steel parts |
| 04/10/2008 | US20080085365 Alkoxide Compound, Thin Film-Forming Material And Method For Forming Thin Film |
| 04/10/2008 | US20080083989 Semiconductor Device and Method for Fabricating the Same |
| 04/10/2008 | US20080083732 Wafer holder and exposure apparatus equipped with wafer holder |
| 04/10/2008 | US20080083372 Heat processing apparatus for semiconductor process |
| 04/10/2008 | DE112006000464T5 Chemischer Bedampfungs-Reaktor mit einer Vielzahl von Einlässen Chemical vapor deposition reactor comprising a plurality of inlets |
| 04/10/2008 | DE102006048000A1 Verfahren zur Herstellung eines zweiphasigen Schichtwerkstoffs A process for preparing a two-phase film material |
| 04/09/2008 | EP1909006A1 Revolving pressure distributor and rotating machine for treating hollow bodies equipped with same |
| 04/09/2008 | EP1907609A1 Method and reactor for growing crystals |
| 04/09/2008 | EP1907601A1 Apparatus for plasma-enhanced chemical vapour deposition (pecvd) of an internal barrier layer on a container, comprising a gas line insulated by an electromagnetic valve |
| 04/09/2008 | EP1907600A2 Atomic layer deposition systems and methods including metal beta-diketiminate compounds |
| 04/09/2008 | EP1907599A2 Method for depositing silicon-containing films |
| 04/09/2008 | EP1907596A1 Injection type plasma treatment apparatus and method |
| 04/09/2008 | EP1907354A2 Unsymmetrical ligand sources, reduced symmetry metal-containing compounds, and systems and methods including same |
| 04/09/2008 | EP1907320A2 Colorless single-crystal cvd diamond at rapid growth rate |
| 04/09/2008 | EP1599614A4 Method to deposit an impermeable film onto a porous low-k dielectric film |
| 04/09/2008 | EP1539336A4 Vaporizer delivery ampoule |
| 04/09/2008 | EP1438360B1 Pigment with a metallic lustre |
| 04/09/2008 | EP1363859A4 Apparatus and method for atmospheric pressure reactive atom plasma processing for shaping of damage free surfaces |
| 04/09/2008 | EP1343596B1 Surface modification process |
| 04/09/2008 | EP1035757B1 Substrate electrode plasma generator and substance/material processing method |
| 04/09/2008 | CN101160192A Saw band and method for the production of a saw band |
| 04/09/2008 | CN101159228A Processing gas supplying mechanism, supplying method and gas processing unit |
| 04/09/2008 | CN101158035A Chemical vapour deposition apparatus |
| 04/09/2008 | CN101158034A Device for rapid large-area preparation of thin film material and setting method |
| 04/09/2008 | CN101158033A Double temperature field chemical vapour deposition apparatus |
| 04/09/2008 | CN101158032A Film forming device and method thereof |
| 04/09/2008 | CN101158031A Rotary pressure distributor and roulette type hollow composing machine with the same |
| 04/09/2008 | CN100380606C 等离子体处理系统 The plasma processing system |
| 04/09/2008 | CN100380593C Thin film processing method and system |
| 04/09/2008 | CN100380592C Thin film forming apparatus and thin film forming method and thin film forming system |
| 04/09/2008 | CN100380591C Manufacturing apparatus and method for a semiconductor device, and cleaning method for a semiconductor manufacturing device |
| 04/09/2008 | CN100380590C Method for generating barrier coatings by atmospheric glow discharge |
| 04/09/2008 | CN100380586C Method and apparatus for manufacturing single crystal silicon carbide |
| 04/09/2008 | CN100380581C Manufacturing line of semiconductor device |
| 04/09/2008 | CN100380564C Method and apparatus for an improved baffle plate in a plasma processing system |
| 04/09/2008 | CN100379912C Composite diamond coating-like spinning rings and preparing method thereof |
| 04/09/2008 | CN100379894C Multi-chamber installation for treating objects under vacuum, method for evacuating said installation and evacuation system therefor |
| 04/09/2008 | CN100379893C Matching box, vacuum device using the same and vacuum processing method |
| 04/09/2008 | CN100379745C Improved precursors for chemical vapour deposition |
| 04/09/2008 | CN100379698C Method of making coated articles and coated articles made thereby |
| 04/08/2008 | US7356130 Method and system for selecting speech or DTMF interfaces or a mixture of both |
| 04/08/2008 | US7355341 Organic electroluminescence display panel including a gas barrier laminate between a substrate and an organic electroluminescence element |
| 04/08/2008 | US7355171 Method and apparatus for process monitoring and control |
| 04/08/2008 | US7354858 Film formation method and apparatus for semiconductor process |
| 04/08/2008 | US7354857 Method of making iron silicide and method of making photoelectric transducer |
| 04/08/2008 | US7354842 Methods of forming conductive materials |
| 04/08/2008 | US7354631 Chemical vapor deposition apparatus and methods |
| 04/08/2008 | US7354622 Method for forming thin film and apparatus for forming thin film |
| 04/08/2008 | US7354620 Method for deposition of inert barrier coating to increase corrosion resistance |
| 04/08/2008 | US7354619 Protection of the SiC surface by a GaN layer |
| 04/08/2008 | US7354617 Forming a fixing belt by depositing elastic layer and mold releasing layer on substrate; performing a hardness test; flexibility is determined by creep value; preventing crumpling |
| 04/08/2008 | US7354504 Analyzes over a wide frequency range which allows adjustment of the microwave frequency prior to material irradiation; power levels which avoid or reduce alteration of the target material |