| Patents for C23C 16 - Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition (cvd) processes (71,892) |
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| 04/24/2008 | US20080093341 RF Plasma Reactor Having a Distribution Chamber with at Least One Grid |
| 04/24/2008 | US20080093215 Batch-Type Remote Plasma Processing Apparatus |
| 04/24/2008 | US20080093024 Plasma Treating Apparatus |
| 04/24/2008 | US20080092821 Quartz Jig and Semiconductor Manufacturing Apparatus |
| 04/24/2008 | US20080092820 Evaporator having multi-layered conical slit nozzles for vacuum thermal evaporation |
| 04/24/2008 | US20080092819 Substrate support structure with rapid temperature change |
| 04/24/2008 | US20080092818 Thermally zoned substrate holder assembly |
| 04/24/2008 | US20080092817 Cvd Reactor with Rf-Heated Process Chamber |
| 04/24/2008 | US20080092815 Gas distribution assembly for use in a semiconductor work piece processing reactor |
| 04/24/2008 | US20080092814 Systems and methods for selective deposition of graded materials on continuously fed objects |
| 04/24/2008 | US20080092812 Methods and Apparatuses for Depositing Uniform Layers |
| 04/24/2008 | DE102006049845A1 Coating apparatus has reactive gas feed and inductively coupled plasma (ICP) source and is also fitted with hollow cathode plasma source |
| 04/24/2008 | DE10159907B4 Beschichtungsverfahren Coating process |
| 04/24/2008 | CA2665685A1 Sliding mating part in lubricated regime, coated by a thin film |
| 04/23/2008 | EP1913629A1 Method of forming a high dielectric constant film and method of forming a semiconductor device |
| 04/23/2008 | EP1913174A1 Atomic layer deposition of ruthenium-containing films using surface-activating agents and selected ruthenium complexes |
| 04/23/2008 | EP1913173A2 Atomic layer deposition of tantalum-containing films using surface-activating agents and novel tantalum complexes |
| 04/23/2008 | EP1913172A2 Gas manifold valve cluster |
| 04/23/2008 | EP1912894A1 Separation of grown diamond from diamond seeds mosaic |
| 04/23/2008 | EP1451102B1 Method for catalytic growth of nanotubes or nanofibers comprising a nisi alloy diffusion barrier |
| 04/23/2008 | EP1210468B1 Method for cleaning a pvd or cvd reactor and waste-gas lines of the same |
| 04/23/2008 | EP1190121A4 Truncated susceptor for vapor-phase deposition |
| 04/23/2008 | EP1156518B1 Heat treating device and heat treating method |
| 04/23/2008 | CN201049963Y Chemical vapor deposition device |
| 04/23/2008 | CN101167177A Integration process for fabricating stressed transistor structure |
| 04/23/2008 | CN101167165A Method to increase the compressive stress of PECVD silicon nitride films |
| 04/23/2008 | CN101166583A Methods and apparatus for determining the endpoint of a cleaning or conditioning process in a plasma processing system |
| 04/23/2008 | CN101165871A Substrate supporting member |
| 04/23/2008 | CN101165208A Rotating pressure distributor and carousel-type machine for treating hollow bodies which is equipped therewith |
| 04/23/2008 | CN101165207A Semiconductor processing apparatus and method for using same |
| 04/23/2008 | CN101164773A Coated cutting tool |
| 04/23/2008 | CN101164772A Coated cutting tool |
| 04/23/2008 | CN101164689A Nanocrystalline porous TiO2 film and preparation method thereof |
| 04/23/2008 | CN100384000C Film lithium ion cell with zinc selenide film as anode and method for preparing same |
| 04/23/2008 | CN100383971C Capacitor of somiconductor storage element and production method thereof |
| 04/23/2008 | CN100383934C Method for controlling dielectric reflecting-resisting-layer characteristics and method for making dielectric reflection resisting-layer |
| 04/23/2008 | CN100383918C Replacing method of valv device, processing system and sealing components |
| 04/23/2008 | CN100383277C Die with superhard filming |
| 04/22/2008 | US7363100 Material application system with remote access |
| 04/22/2008 | US7361949 Method of making a haze free, lead rich PZT film |
| 04/22/2008 | US7361614 Method of depositing a silicon dioxide comprising layer in the fabrication of integrated circuitry |
| 04/22/2008 | US7361611 Doped nitride film, doped oxide film and other doped films |
| 04/22/2008 | US7361595 Transition metal thin film forming method |
| 04/22/2008 | US7361387 thin film deposition on semiconductors |
| 04/22/2008 | US7361302 Oxidation and fatigue resistant metallic coating |
| 04/22/2008 | US7361230 Substrate processing apparatus |
| 04/22/2008 | US7361229 Device for deposition with chamber cleaner and method for cleaning chamber |
| 04/22/2008 | US7361228 Showerheads for providing a gas to a substrate and apparatus |
| 04/22/2008 | US7361016 Temperature control assembly for use in etching processes and an associated retrofit method |
| 04/22/2008 | CA2427550C Oxidation and fatigue resistant metallic coating |
| 04/17/2008 | WO2008045972A2 Precursor delivery system |
| 04/17/2008 | WO2008045794A1 Contamination reducing liner for inductively coupled chamber |
| 04/17/2008 | WO2008045547A2 Fluoroalkyl carbinol generating silane surface treatment agents |
| 04/17/2008 | WO2008045423A1 Self assembled controlled luminescent transparent conductive photonic crystals for light emitting devices |
| 04/17/2008 | WO2008045226A1 Plasma-enhanced chemical vapor deposition coating process |
| 04/17/2008 | WO2008045130A2 Property modification during film growth |
| 04/17/2008 | WO2008044951A2 An implant for bone replacement and attachment |
| 04/17/2008 | WO2008044577A1 Film forming method and film forming apparatus |
| 04/17/2008 | WO2008044478A1 Organic ruthenium compound for chemical vapor deposition, and chemical vapor deposition method using the organic ruthenium compound |
| 04/17/2008 | WO2008044474A1 Method for forming transparent conductive film |
| 04/17/2008 | WO2008044473A1 Method for forming transparent conductive film and transparent conductive film substrate |
| 04/17/2008 | WO2008043333A1 Method for the production of a two-phase laminate material |
| 04/17/2008 | WO2008043325A1 Picvd coating for plastic containers |
| 04/17/2008 | WO2008027216A3 Processes and integrated systems for engineering a substrate surface for metal deposition |
| 04/17/2008 | WO2007038050A8 Treatment processes for a batch ald reactor |
| 04/17/2008 | US20080090429 Stress metal springs; contactors; electroplating |
| 04/17/2008 | US20080090415 Substrate processing apparatus, method of manufacturing a semiconductor device, and method of forming a thin film on metal surface |
| 04/17/2008 | US20080090389 Manufacturing method of semiconductor device and substrate processing apparatus |
| 04/17/2008 | US20080090311 Dipping detecting device for fabricating a semiconductor device |
| 04/17/2008 | US20080090310 Substrate processing apparatus and substrate processing termination detection method |
| 04/17/2008 | US20080090101 Mixing a lower alcohol, a polyethylene glycol, a complexing agent and water with a higher alcohol and a zirconium, aluminium, titanium, tantalum or yttrium alkoxide; hydrolyzing the metal alkoxide to a metal oxide and an alcohol; adding a medium alcohol to the concentrate |
| 04/17/2008 | US20080090099 Layer system with at least one mixed crystal layer of a multi-oxide |
| 04/17/2008 | US20080090052 Nanoimprint Mold, Method of Forming a Nonopattern, and a Resin-Molded Product |
| 04/17/2008 | US20080090022 High rate, continuous deposition of high quality amorphous, nanocrystalline, microcrystalline or polycrystalline materials |
| 04/17/2008 | US20080089004 Capacitor with hafnium, lanthanum and oxygen mixed dielectric and method for fabricating the same |
| 04/17/2008 | US20080087642 Method for removing surface deposits in the interior of a chemical vapor deposition reactor |
| 04/17/2008 | US20080087641 Components for a plasma processing apparatus |
| 04/17/2008 | US20080087359 Heat treatment; spray coating; vapor deposition; fusion |
| 04/17/2008 | US20080087221 Installation for depositing, by means of a microwave plasma, an internal barrier coating in thermoplastic containers |
| 04/17/2008 | US20080087220 Plasma Processing Apparatus and Multi-Chamber System |
| 04/17/2008 | US20080087197 Which modifies surface of silicon/metal oxide surfaces via homogeneous and heterogeneous amine catalysis |
| 04/17/2008 | DE112006001323T5 Verfahren und Vorrichtung zum Verhindern der Beschädigung von Vakuumpumpen durch ALD-Reaktanten Method and apparatus for preventing the damage of vacuum pumps by ALD reactants |
| 04/17/2008 | DE102006049432A1 Verfahren zur Herstellung von selbst aggregierenden Monolagen auf Festkörperoberflächen Process for the preparation of self-aggregating monolayers on solid surfaces |
| 04/17/2008 | DE102006048658A1 PICVD-Beschichtung für Kunststoffbehälter PICVD coating for plastic containers |
| 04/17/2008 | CA2664807A1 A device |
| 04/16/2008 | EP1912483A1 Plasma generator and film forming method employing same |
| 04/16/2008 | EP1912247A1 Installation for depositing, by means of microwave plasma, an internal barrier coating in thermoplastic containers |
| 04/16/2008 | EP1912246A2 Power supply antenna and power supply method |
| 04/16/2008 | EP1911859A1 Carbon film |
| 04/16/2008 | EP1911794A1 PICVD coating for plastic containers |
| 04/16/2008 | EP1911538A1 Edge replacing cutting tip and method for producing the same |
| 04/16/2008 | EP1911102A1 Method for passivating a substrate surface |
| 04/16/2008 | EP1911074A2 Beta-diketiminate ligand sources and metal-containing compounds thereof, and systems and methods including same |
| 04/16/2008 | EP1911073A2 Method and apparatus for semiconductor processing |
| 04/16/2008 | EP1910486A1 Low wetting hysteresis polysiloxane-based material and method for depositing same |
| 04/16/2008 | EP1909978A2 Systems and methods for capture substrates |
| 04/16/2008 | EP1466353A4 Contamination suppression in chemical fluid deposition |
| 04/16/2008 | CN101164161A Low-temperature chemical vapor deposition of low-resistivity ruthenium layers |
| 04/16/2008 | CN101164156A Substrate processing apparatus and substrate stage used for the same |
| 04/16/2008 | CN101163819A Film-forming apparatus, matching unit, and impedance control method |