| Patents for C23C 16 - Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition (cvd) processes (71,892) |
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| 05/22/2008 | US20080118641 High speed chemical vapor deposition |
| 05/22/2008 | US20080118629 Solution spray apparatus and solution spray method |
| 05/22/2008 | US20080118628 Method And Apparatus For Coating A Carrier |
| 05/22/2008 | US20080117276 Thermal head and method of manufacturing thermal head |
| 05/22/2008 | US20080116058 Filtered cathodic arc deposition method and apparatus |
| 05/22/2008 | US20080115729 Evaporation source and vacuum evaporator using the same |
| 05/22/2008 | US20080115728 Plasma Processing Apparatus |
| 05/21/2008 | EP1923485A1 Method for the vaporization of liquid raw material which enables low-temperature vaporization of liquid raw material and vaporizer for the method |
| 05/21/2008 | EP1923484A1 Dlc film-forming apparatus |
| 05/21/2008 | EP1923483A1 Deposition of amorphous silicon films by electron cyclotron resonance |
| 05/21/2008 | EP1922435A1 Barrier layer |
| 05/21/2008 | EP1922431A1 Method for coating or decoating a component |
| 05/21/2008 | EP1809788A4 Method and apparatus for growing a group (iii) metal nitride film and a group (iii) metal nitride film |
| 05/21/2008 | EP1483782A4 Production method of sic monitor wafer |
| 05/21/2008 | DE10261362B4 Substrat-Halter Substrate holder |
| 05/21/2008 | DE102006054695A1 Verfahren zur Regelung nanoskaliger elektronenstrahlinduzierter Abscheidungen Method for controlling nanoscale electron-beam-induced deposition |
| 05/21/2008 | CN101184865A High temperature chemical vapor deposition apparatus |
| 05/21/2008 | CN101183158A Wire grating wideband polarizer and method of producing the same |
| 05/21/2008 | CN101182634A Vacuum multi sphere ion film coating machine intelligent integrated controller |
| 05/21/2008 | CN101182633A Low temperature ald SiO2 |
| 05/21/2008 | CN101182339A Metal-imino complexes suitable for use as vapor deposition precursors |
| 05/21/2008 | CN100389482C Substrate processing device |
| 05/21/2008 | CN100389225C Plasma reaction chamber |
| 05/20/2008 | US7375366 Carbon nanotube and method for producing the same, electron source and method for producing the same, and display |
| 05/20/2008 | US7374994 Bismuth titanium silicon oxide, bismuth titanium silicon oxide thin film, and method for forming the thin film |
| 05/20/2008 | US7374941 determining changes in a reactant supply system for repeated pulses of a vapor phase reactant; Atomic Layer Deposition |
| 05/20/2008 | US7374818 compliant layer having an elastic modulus of between 30 and 130 GPa is provided between the silicon based substrate and a silicon metal containing oxygen gettering layer; does not adversely affect the mechanical behavior of the substrate such as reduction in the flexure or tensile strength |
| 05/20/2008 | US7374798 Method and apparatus of forming alignment film |
| 05/20/2008 | US7374794 Metallized film, method for the production thereof, and use thereof |
| 05/20/2008 | US7374793 Methods and structures for promoting stable synthesis of carbon nanotubes |
| 05/20/2008 | US7374738 Superhard dielectric compounds and methods of preparation |
| 05/20/2008 | US7374731 Reaction apparatus for producing vapor-grown carbon fibers and continuous production system thereof |
| 05/20/2008 | US7374648 Single piece coil support assemblies, coil constructions and methods of assembling coil constructions |
| 05/20/2008 | US7374642 Treatment process for improving the mechanical, catalytic, chemical, and biological activity of surfaces and articles treated therewith |
| 05/20/2008 | US7374636 Method and apparatus for providing uniform plasma in a magnetic field enhanced plasma reactor |
| 05/20/2008 | US7374620 Substrate processing apparatus |
| 05/20/2008 | US7374617 Atomic layer deposition methods and chemical vapor deposition methods |
| 05/20/2008 | US7374604 System and method for flue gas treatment |
| 05/20/2008 | US7373899 Plasma processing apparatus using active matching |
| 05/20/2008 | US7373873 Low friction, high durability ringless piston and piston sleeve |
| 05/20/2008 | CA2450723C Method of repairing a ni-based alloy part |
| 05/20/2008 | CA2434560C Photo-induced hydrophilic article and method of making same |
| 05/15/2008 | WO2008057749A1 Vapor deposition of metal carbide films |
| 05/15/2008 | WO2008057742A1 Removal of oxidation layer from metal substrate and deposition of titanium adhesion layer on metal substrate |
| 05/15/2008 | WO2008057625A2 Systems and methods for roll-to-roll atomic layer deposition on continuously fed objects |
| 05/15/2008 | WO2008057394A1 Hybrid layers for use in coatings on electronic devices or other articles |
| 05/15/2008 | WO2008057183A1 Method for continuous, in situ evaluation of entire wafers for macroscopic features during epitaxial growth |
| 05/15/2008 | WO2008057180A1 Process for forming oled conductive protective layer |
| 05/15/2008 | WO2008056742A1 Barrier film forming method |
| 05/15/2008 | WO2008056632A1 GaN SEMICONDUCTOR LIGHT EMITTING ELEMENT |
| 05/15/2008 | WO2008017676A3 Method for densification of porous articles |
| 05/15/2008 | US20080113303 Multilayer Coatings For EUV Mask Substrates |
| 05/15/2008 | US20080113110 Plasma-enhanced deposition of metal carbide films |
| 05/15/2008 | US20080113109 Coating system and method for coating, as well as coated articles |
| 05/15/2008 | US20080113107 a plasma enhanced chemical vapor deposition (PECVD) chamber comprising substrate supports, an antenna confined by free radical shields, gas intakes and controllable apertures that allows the free radical radicals to enter and collide with the gases, and form films on the substrate; coating |
| 05/15/2008 | US20080113104 removing an oxide film from the surfaces of wafers, by conveying the wafer into vessels, then supplying nitrogen flouride gas, allowing the gas to react with the oxide film, to form a reaction-product film, heating to evaporate and remove the reaction-product film; sublimation; surface treatment |
| 05/15/2008 | US20080113097 LOW TEMPERATURE ALD SiO2 |
| 05/15/2008 | US20080113096 Method of depositing catalyst assisted silicates of high-k materials |
| 05/15/2008 | US20080113086 Nanosize Heater-Mounted Nozzle and Method for Manufacturing Same and Method for Forming Micro Thin Film |
| 05/15/2008 | US20080110760 improved corrosion or erosion resistance to corrosive energized gases; anodizing exposed surface of the metal alloy to form yttrium aluminum oxide; YAG; wafers, displays, panels; plasma deposition |
| 05/15/2008 | US20080110402 Susceptor and method of forming a led device using such susceptor |
| 05/15/2008 | US20080110401 Susceptor For Vapor-Phase Growth Reactor |
| 05/15/2008 | US20080110400 Vacuum processing apparatus |
| 05/15/2008 | US20080110399 Atomic layer deposition apparatus |
| 05/15/2008 | DE112006001816T5 Sensor zur Überwachung und Steuerung einer impulsförmigen Abscheidung Sensor for monitoring and controlling a pulse-shaped deposition |
| 05/15/2008 | DE10394037B4 Verfahren zur Herstellung einer Metallsulfidschicht A process for producing a metal sulfide layer |
| 05/15/2008 | DE102007037527A1 Beschichtungsanlage und Verfahren zur Beschichtung sowie beschichtete Gegenstände Coating system and method for coating and coated articles |
| 05/15/2008 | DE102006053366A1 Verfahren und Vorrichtung zur plasmaunterstützten chemischen Dampfphasenabscheidung Method and apparatus for plasma-enhanced chemical vapor deposition |
| 05/14/2008 | EP1921656A1 Method and device for plasma-aided chemical vapour deposition |
| 05/14/2008 | EP1921180A1 Plasma discharge processing device and production method of gas barrier film |
| 05/14/2008 | EP1921179A2 Coating facility and method for coating |
| 05/14/2008 | EP1921178A1 Film deposition of amorphous films by electron cyclotron resonance |
| 05/14/2008 | EP1921061A1 Metal-containing compound, process for producing the same, metal-containing thin film, and method of forming the same |
| 05/14/2008 | EP1921015A1 Synthetic resin container with high barrier capability |
| 05/14/2008 | EP1920819A1 Method and device for purifying the waste gas of a silicon layer production facility |
| 05/14/2008 | EP1920456A1 Low resistance titanium nitride films |
| 05/14/2008 | EP1920081A2 Atomic layer deposition of metal-containing films using surface-activating agents |
| 05/14/2008 | EP1920080A2 High colour diamond |
| 05/14/2008 | EP1919632A1 Coated articles |
| 05/14/2008 | EP1551768A4 Process for manufacturing a gallium rich gallium nitride film |
| 05/14/2008 | EP0958400B1 Method and apparatus for plasma deposition of a thin film onto the interior surface of a container |
| 05/14/2008 | CN101180699A Termination of secondary frequencies in RF power delivery |
| 05/14/2008 | CN101180420A Method for growth of GaN single crystal, method for preparation of GaN substrate, process for producing GaN-based element, and GaN-based element |
| 05/14/2008 | CN101180418A Method and system for improving coupling between a surface wave plasma source and a plasma space |
| 05/14/2008 | CN101180135A Chemical vapor deposition of chalcogenide materials |
| 05/14/2008 | CN101179005A Exhaust air system, semi-conductor manufacturing installation for manufacturing thin film by the same and method thereof |
| 05/14/2008 | CN101179000A Plasma source and uses thereof |
| 05/14/2008 | CN101178609A Method and device for adjusting the electrical power supply of a magnetron, and installation for treatment of thermoplastic containers applying same |
| 05/14/2008 | CN101177782A System and method for shielding during PECVD deposition processes |
| 05/14/2008 | CN101177781A System and method for control of electromagnetic radiation in PECVD discharge processes |
| 05/14/2008 | CN100388439C Method for depositing silicide on silicon substrate |
| 05/14/2008 | CN100388438C Fabrication process of a semiconductor device |
| 05/14/2008 | CN100388421C Structure and method for ultra-small grain size polysilicon |
| 05/14/2008 | CN100388414C Substrate processing apparatus and cleaning method therefor |
| 05/14/2008 | CN100387753C Method for manufacturing diamond coating on spherical substrate and device thereof |
| 05/14/2008 | CN100387752C System for continuous batch preparing diamond film |
| 05/14/2008 | CN100387492C Producing hydrocarbons and non-hydrocarbon containing materials from a hydrocarbon containing formation |
| 05/14/2008 | CN100387385C Diamond film coated tool |
| 05/13/2008 | US7372121 GeBPSG top clad for a planar lightwave circuit |
| 05/13/2008 | US7371880 Copper (I) compounds useful as deposition precursors of copper thin films |