| Patents for C23C 16 - Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition (cvd) processes (71,892) |
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| 06/03/2008 | US7381445 Method of coating a ceramic matrix composite fiber |
| 06/03/2008 | US7381293 Convex insert ring for etch chamber |
| 06/03/2008 | US7381292 Inductively coupled plasma generating apparatus incorporating serpentine coil antenna |
| 06/03/2008 | US7381291 Dual-chamber plasma processing apparatus |
| 06/03/2008 | US7381290 Microwave plasma generator |
| 06/03/2008 | US7381276 Susceptor pocket with beveled projection sidewall |
| 06/03/2008 | US7381275 Apparatus and method for manufacturing semiconductor |
| 06/03/2008 | US7381274 Gas valve assembly and apparatus using the same |
| 06/03/2008 | US7381052 Apparatus and method for heating substrates |
| 05/29/2008 | WO2008063266A1 Multilayered coatings for use on electronic devices or other articles |
| 05/29/2008 | WO2008062730A1 Process for producing plastic container coated with oxide thin film |
| 05/29/2008 | WO2008062685A1 Substrate provided with transparent conductive film for photoelectric conversion device, method for manufacturing the substrate, and photoelectric conversion device using the substrate |
| 05/29/2008 | WO2008062663A1 Method for manufacturing solar cell and apparatus for manufacturing solar cell |
| 05/29/2008 | WO2008062269A1 Reactor for growing crystals |
| 05/29/2008 | WO2007057631A3 Improved bubbler for the transportation of substances by a carrier gas |
| 05/29/2008 | US20080124945 Production Method for Semiconductor Device and Substrate Processing Apparatus |
| 05/29/2008 | US20080124941 Manufacturing method of semiconductor device and semiconductor device manufacturing apparatus |
| 05/29/2008 | US20080124901 Method for maintaining semiconductor manufacturing apparatus, semiconductor manufacturing apparatus, and method for manufacturing semiconductor |
| 05/29/2008 | US20080124817 Stress measurement and stress balance in films |
| 05/29/2008 | US20080124670 Inductively heated trap |
| 05/29/2008 | US20080124485 prevent wafer breaking prior depositing another film over, by removing accumulated electric charges in presence of inert gas; chemical vapor deposition; improve film quality |
| 05/29/2008 | US20080124484 pretreating the semiconductor surface with a metal-organic precursor, forming metal nitrides, or carbonitrides barrier layer, prior depositing ruthenium thin film, for improving adhesion with Cu wire |
| 05/29/2008 | US20080124479 Processes for preparing corrosion resistant coating systems for silicon-containing substrates |
| 05/29/2008 | US20080124463 Chemical vapor deposition |
| 05/29/2008 | US20080124462 Chemical vapor infiltration/chemical vapor deposition (CVI/CVD); carbon fibers; machining |
| 05/29/2008 | US20080124460 Methods of obtaining photoactive coatings and/or anatase crystalline phase of titanium oxides and articles made thereby |
| 05/29/2008 | US20080124453 In-situ detection of gas-phase particle formation in nitride film deposition |
| 05/29/2008 | US20080121890 Deposition method of insulating layers having low dielectric constant of semiconductor device, a thin film transistor substrate using the same and a method of manufacturing the same |
| 05/29/2008 | US20080121620 Processing chamber |
| 05/29/2008 | US20080121344 Plasma processing apparatus |
| 05/29/2008 | US20080121249 Method for Cleaning Film-Forming Apparatuses |
| 05/29/2008 | US20080121225 Radiation selective absorber coating for an absorber pipe, absorber pipe with said coating, and method of making same |
| 05/29/2008 | US20080121184 In-situ method of cleaning vaporizer during dielectric layer deposition process |
| 05/29/2008 | US20080121183 supporting bars |
| 05/29/2008 | US20080121182 Apparatus of supplying organometallic compound |
| 05/29/2008 | US20080121181 Cvd process for forming a thin film |
| 05/29/2008 | US20080121180 Substrate Processing Apparatus and Reaction Container |
| 05/29/2008 | US20080121179 Gas baffle and distributor for semiconductor processing chamber |
| 05/29/2008 | US20080121178 Dual top gas feed through distributor for high density plasma chamber |
| 05/29/2008 | US20080121177 Dual top gas feed through distributor for high density plasma chamber |
| 05/29/2008 | US20080121176 Installation for depositing, by means of a microwave plasma, an internal barrier coating on thermoplastic containers |
| 05/29/2008 | DE10342398B4 Schutzschicht für einen Körper sowie Verfahren zur Herstellung und Verwendung von Schutzschichten Protective layer for a body and methods of making and use of protective layers |
| 05/29/2008 | DE102006052586A1 Verfahren und Vorrichtung zur Reinigung der Abgase einer Siliziumdünnschicht-Produktionsanlage Method and apparatus for cleaning the exhaust gases of a silicon thin film production plant |
| 05/28/2008 | EP1926211A2 Diamond enhanced thickness shear mode resonator |
| 05/28/2008 | EP1926133A2 A method for boron contamination reduction in IC fabrication |
| 05/28/2008 | EP1925692A1 Method of depositing hafnium silicate by catalyst assisted atomic layer deposition |
| 05/28/2008 | EP1925691A1 Low temperature ALD SiO2 |
| 05/28/2008 | EP1924722A2 Methods of making shape memory films by chemical vapor deposition and shape memory devices made thereby |
| 05/28/2008 | EP1754254B1 Lift pin with roller glide for reducing friction |
| 05/28/2008 | EP1535319A4 Atomic layer deposition of high k metal oxides |
| 05/28/2008 | EP1535314A4 High rate deposition at low pressures in a small batch reactor |
| 05/28/2008 | CN201065431Y Fast discharging cold trap for metal organic chemical gas phase deposition device vacuum system |
| 05/28/2008 | CN101189360A Method for forming vapor deposition film by using surface wave plasma, and apparatus therefor |
| 05/28/2008 | CN101188207A Electrostatic sucking electrode, substrate processing apparatus and manufacturing method for electrostatic sucking electrode |
| 05/28/2008 | CN101188189A Plasma confinement baffle and flow equalizer for enhanced magnetic control of plasma radial distribution |
| 05/28/2008 | CN101187016A Large area VHF-PECVD reaction chamber back feed-in type parallel plate electrode capable of obtaining even electric field |
| 05/28/2008 | CN101187015A Large area VHF-PECVD reaction chamber special-shaped electrode capable of obtaining even electric field |
| 05/28/2008 | CN101187014A Large area VHF-PECVD reaction chamber electrode capable of obtaining even electric field |
| 05/28/2008 | CN101187013A Plasma processing chamber with ground member integrity indicator and method for using the same |
| 05/28/2008 | CN101187012A Method of depositing hafnium silicate assisted by catalyst |
| 05/28/2008 | CN101187011A Method of improving initiation layer for low-k dielectric film by digital liquid flow meter |
| 05/28/2008 | CN101186488A Method for manufacturing alumina made ceramic structure member |
| 05/28/2008 | CN101186135A Coated inserts for milling of compacted graphite iron |
| 05/28/2008 | CN100391035C Thin film lithium battery using diselenid nickel thin film as cathode material and its preparation method |
| 05/28/2008 | CN100390958C Plasma enhanced ALD of tantalum nitride and bilayer |
| 05/28/2008 | CN100390943C Thin-film shaper and shaping method thereof |
| 05/28/2008 | CN100390922C Evaluation of chamber components having textured coatings |
| 05/28/2008 | CN100390317C Film forming apparatus |
| 05/28/2008 | CN100390316C Method for preparing n type CVD co-doped diamond film |
| 05/28/2008 | CN100390304C Laser strengthening and toughening method for interface between ground-mass and coating |
| 05/28/2008 | CN100390186C Organic iridium compound, method for producing the compound and method for producing film |
| 05/27/2008 | US7378354 Atomic layer deposition methods |
| 05/27/2008 | US7378304 Method of forming silicon oxide layer and method of manufacturing thin film transistor thereby |
| 05/27/2008 | US7378133 Fabrication system, light-emitting device and fabricating method of organic compound-containing layer |
| 05/27/2008 | US7378129 Chemisorption ; contacting cycles |
| 05/27/2008 | US7378128 applying release coatings comprising silica, silicon nitride, silicon dioxide and silicon multilayers on the surfaces of containers, used for handling of melts that are solidified and removed as ingots |
| 05/27/2008 | US7378127 Chemical vapor deposition methods |
| 05/27/2008 | US7378126 Light-emitting device and method of manufacturing the same, and method of operating manufacturing apparatus |
| 05/27/2008 | US7377977 High-purity crystal growth |
| 05/27/2008 | US7377976 Method for growing thin oxide films |
| 05/27/2008 | US7377228 System for and method of gas cluster ion beam processing |
| 05/22/2008 | WO2008059925A1 Gas barrier film laminate |
| 05/22/2008 | WO2008059896A1 Abrasion-resistant film and tool provided with the same |
| 05/22/2008 | WO2008059857A1 Thin-film photoelectric conversion device |
| 05/22/2008 | WO2008059705A1 Photogravure engraving roll and method for manufacturing the same |
| 05/22/2008 | WO2008059070A2 Method for regulating nanoscale electron beam induced depositions |
| 05/22/2008 | WO2008042691A3 Processing system containing a hot filament hydrogen radical source for integrated substrate processing |
| 05/22/2008 | WO2008027956A3 Continuous dopant addition |
| 05/22/2008 | WO2008027216A9 Processes and integrated systems for engineering a substrate surface for metal deposition |
| 05/22/2008 | WO2008017678A3 Power control for densification of one or more porous articles |
| 05/22/2008 | WO2007121087A3 Controlling plasma processing using parameters derived through the use of a planar ion flux probing arrangement |
| 05/22/2008 | US20080119098 Atomic layer deposition on fibrous materials |
| 05/22/2008 | US20080118844 Borides, carbides, nitrides, and/or oxides of silicon and metal such as cobalt or nickel; high-performance, high discharging capacity, high charging/discharging efficiency in the initial stage and during cyclic operation |
| 05/22/2008 | US20080118770 Continuously coating an ultra-hydrophilic titanium compound thin film on both surfaces of a sheet-shaped metal substrate in a vacuum chamber using plasma, mechanically processing the thin film coated sheet into a target shape |
| 05/22/2008 | US20080118734 Coating Compositions |
| 05/22/2008 | US20080118712 Epitaxially coated semiconductor wafer and device and method for producing an epitaxially coated semiconductor wafer |
| 05/22/2008 | US20080118664 Forming a dense and relatively thick film; for forming a film on a surface of a workpiece using an electric discharge machining technology |
| 05/22/2008 | US20080118663 Depositing a film through a plasma enhanced chemical vapor deposition; suitable for use with large area glass or polymer substrate |
| 05/22/2008 | US20080118662 Transforming an amorphous Si film into a microcrystalline or nano-crystalline Si thin film with a metal silicide of Si Al (aluminum) through a process in a reacting chamber only |
| 05/22/2008 | US20080118643 Multilayer nitride-containing coatings |