| Patents for C23C 16 - Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition (cvd) processes (71,892) |
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| 06/11/2008 | CN101197249A Reaction cavity lining and reaction cavity including the same |
| 06/11/2008 | CN101195910A Method for detecting exception condition of tungsten chemical vapor deposition equipment |
| 06/11/2008 | CN101195909A Direct current plasma chemical vapor deposition equipment |
| 06/11/2008 | CN101195908A Technique for cleaning reaction chamber of chemical vapor deposition equipment |
| 06/11/2008 | CN101195288A Coated cutting tool insert |
| 06/11/2008 | CN101195193A Laser processing apparatus, laser processing method, manufacturing method of wiring substrate, manufacturing method of display apparatus and wiring substrate |
| 06/11/2008 | CN101195112A Gas injection apparatus |
| 06/11/2008 | CN100394551C Solid organometallic compound-filled container and filling method thereof |
| 06/11/2008 | CN100394550C Coated semiconductor wafer, and process and device for producing the semiconductor wafer |
| 06/11/2008 | CN100394549C Semiconductor layer |
| 06/11/2008 | CN100394535C High-density plasma processing apparatus |
| 06/11/2008 | CN100394060C Airplane carbon brake disc integral adhesive maintenance method |
| 06/10/2008 | US7384875 Method of manufacturing semiconductor device using flexible tube |
| 06/10/2008 | US7384867 Formation of composite tungsten films |
| 06/10/2008 | US7384828 Semiconductor film, semiconductor device and method of their production |
| 06/10/2008 | US7384696 Corrosion resistant member and method for manufacturing the same |
| 06/10/2008 | US7384693 Diamond-like carbon films with low dielectric constant and high mechanical strength |
| 06/10/2008 | US7384689 Cemented carbide body |
| 06/10/2008 | US7384668 CCVD method for producing tubular carbon nanofibers |
| 06/10/2008 | US7384663 Carbon nanotubes; surface treatment; brake discs |
| 06/10/2008 | US7384486 Chamber cleaning method |
| 06/10/2008 | US7384471 Porogens, porogenated precursors and methods for using the same to provide porous organosilica glass films with low dielectric constants |
| 06/10/2008 | US7383841 Method of cleaning substrate-processing device and substrate-processing device |
| 06/10/2008 | US7383702 Method of forming a phosphorus doped optical core using a PECVD process |
| 06/10/2008 | CA2247210C Improved fine powders and method for manufacturing |
| 06/05/2008 | WO2008067379A2 System and method for depositing a gaseous mixture onto a substrate surface using a showerhead apparatus |
| 06/05/2008 | WO2008066841A2 Inductively heated trap |
| 06/05/2008 | WO2008066804A1 Quartz encapsulated heater assembly |
| 06/05/2008 | WO2008066520A1 Antireflective surfaces, methods of manufacture thereof and articles comprising the same |
| 06/05/2008 | WO2008066438A1 Wear resistant tool for wood chipping |
| 06/05/2008 | WO2008066173A1 Amorphous carbon film, semiconductor device, film forming method, film forming apparatus and storage medium |
| 06/05/2008 | WO2008066172A1 Film forming method, film forming apparatus, storage medium and semiconductor device |
| 06/05/2008 | WO2008066103A1 Substrate processing apparatus |
| 06/05/2008 | WO2008065918A1 Solar cell and method for manufacturing the same |
| 06/05/2008 | WO2008065861A1 Atmospheric plasma processing apparatus and atmospheric plasma processing method |
| 06/05/2008 | WO2008065804A1 Apparatus and method for manufacturing semiconductor element and semiconductor element manufactured by the method |
| 06/05/2008 | WO2008065745A1 Plasma processing apparatus |
| 06/05/2008 | WO2008065744A1 Plasma processing apparatus |
| 06/05/2008 | WO2008045130A9 Property modification during film growth |
| 06/05/2008 | WO2008044951A3 An implant for bone replacement and attachment |
| 06/05/2008 | WO2008042590A3 Batch reaction chamber employing separate zones for radiant heating and resistive heating |
| 06/05/2008 | WO2008033436A8 Systems and methods for forming strontium-and/or barium-containing layers |
| 06/05/2008 | WO2008012098A3 Silane-free plasma-assisted cvd deposition of silicon nitride as an antireflective film and for hydrogen passivation of photocells constructed on silicon wafers |
| 06/05/2008 | US20080132087 Post-deposition treatment to enhance properties of si-o-c low k films |
| 06/05/2008 | US20080132069 Apparatus and method for forming a thin layer on semiconductor substrates |
| 06/05/2008 | US20080132061 Contact barrier layer deposition process |
| 06/05/2008 | US20080132045 Laser-based photo-enhanced treatment of dielectric, semiconductor and conductive films |
| 06/05/2008 | US20080132044 Nitride Semiconductor Device Manufacturing Method |
| 06/05/2008 | US20080132040 Deposition Technique for Producing High Quality Compound Semiconductor Materials |
| 06/05/2008 | US20080132018 Formation and treatment of epitaxial layer containing silicon and carbon |
| 06/05/2008 | US20080131979 Vapor-Phase Growth System and Vapor-Phase Growth Method |
| 06/05/2008 | US20080131727 Work piece with a hard film of alcr-containing material, and process for its production |
| 06/05/2008 | US20080131725 at cycle times and at a cost that match similar processes on alloyed cast grey iron under dry and wet conditions; tunsten carbide with Cobalt and Tanatalum and Niobium and a highly W-alloyed binder phase; alumina layer and titanium nitride layer |
| 06/05/2008 | US20080131635 Laminate Comprising Multilayer Film Assembled By Hydrogen Bond, Self-Supported Thin Film Obtained Therefrom, and Production Method and Application of the Same |
| 06/05/2008 | US20080131623 Mold is disposed in an evacuable chamber, cleaned to remove surface organic contamination and coated with the surface release layer in a chamber, all without relocation or undesired time delay; imprint lithography |
| 06/05/2008 | US20080131611 Method for Application of a Thermal Barrier Coating and Resultant Structure Thereof |
| 06/05/2008 | US20080131602 Depositing metal oxide film comprised of transition metal growth agent, agglomeration preventing precursor metal and precious metal providing quasi explosive dispersion effect upon reduction; forming such as cobalt metal, chromium oxide and platinum metal high performance film |
| 06/05/2008 | US20080131601 Uniform film deposition; exposing wafer alternately to two different chemically reactive precursors under starved saturation conditions; rapid deposition rate, high throughput |
| 06/05/2008 | US20080131479 Endoprosthesis with three-dimensional disintegration control |
| 06/05/2008 | US20080128871 Apparatus and Process for Producing Thin Films and Devices |
| 06/05/2008 | US20080128863 Fabrication method of semiconductor device and semiconductor device |
| 06/05/2008 | US20080128772 In-Situ Formation of Metal Insulator Metal Capacitors |
| 06/05/2008 | US20080128656 Process for Preparing Metal or Metal Alloy Nanoparticles Dispersed on a Substrate by Chemical Vapour Deposition |
| 06/05/2008 | US20080128089 Plasma processing apparatus |
| 06/05/2008 | US20080127895 Ultraviolet-ray-assisted processing apparatus for semiconductor process |
| 06/05/2008 | US20080127894 Housing assembly for an induction heating device including liner or susceptor coating |
| 06/05/2008 | US20080127893 Method and apparatus for preventing the formation of a plasma-inhibiting substance |
| 06/05/2008 | DE4416525B4 Verfahren zur Herstellung einer Beschichtung erhöhter Verschleißfestigkeit auf Werkstückoberflächen, und dessen Verwendung A process for producing a coating of increased wear resistance on workpiece surfaces, and the use thereof |
| 06/05/2008 | CA2613079A1 Method for producing porous surfaces on metal components |
| 06/04/2008 | EP1927124A2 Method and device for the plasma treatment of the interior of hollow bodies |
| 06/04/2008 | EP1926840A1 Apparatus and process for surface treatment of substrate using an activated reactive gas |
| 06/04/2008 | EP1660698B1 Microfeature workpiece processing apparatus and methods for batch deposition of materials on microfeature workpieces |
| 06/04/2008 | EP1603924B1 Alcoholates of rare earth mtals a precursors for metaloxides layers or films |
| 06/04/2008 | EP1153739B1 Aerogel substrate and method for preparing the same |
| 06/04/2008 | EP1141439A4 Distributed control system architecture and method for a material transport system |
| 06/04/2008 | CN101194053A Method for producing gaxin1-xn(0<=x<=1=1) crystal, gaxin1-xn(0<=x<=1=1) crystalline substrate, method for producing gan crystal, gan crystalline substrate, and product |
| 06/04/2008 | CN101194049A Method for electrodeposition of bronzes |
| 06/04/2008 | CN101194046A Methods for wet cleaning quartz surfaces of components for plasma processing chambers |
| 06/04/2008 | CN101194040A Rotating substrate support and methods of use |
| 06/04/2008 | CN101192534A Film formation apparatus for semiconductor process and method for using the same |
| 06/04/2008 | CN101192511A Vacuum processing device |
| 06/04/2008 | CN101192508A Xenon difluoride selective erosion for titanium nitride |
| 06/04/2008 | CN101191204A Method for preparing network interpenetration type diamond coat multi-pore electrode |
| 06/04/2008 | CN101191203A Plasma reactor substrate mounting surface texturing |
| 06/04/2008 | CN101191202A Heating system for metal organic substance chemical gaseous phase deposition device reaction cavity |
| 06/04/2008 | CN101191201A Reaction cavity for metal organic substance chemical gaseous phase deposition device |
| 06/04/2008 | CN101191200A Gas baffle and distributor for semiconductor processing chamber |
| 06/04/2008 | CN101191199A APCVD spraying formulation |
| 06/04/2008 | CN101191198A Method for forming alignment layers for liquid crystal displays |
| 06/04/2008 | CN101190786A Nano metal particle and its nano carbon tube and its luminous element preparation method |
| 06/04/2008 | CN101190779A Magnetic field auxiliary chemical vapor deposition method |
| 06/04/2008 | CN100392929C Semiconductor device and method for fabrication thereof |
| 06/04/2008 | CN100392815C Apparatus capable of eliminating slip line and high stress zone in silicon gas phase epitaxial layer |
| 06/04/2008 | CN100392804C Semiconductor processing equipment having tiled ceramic liner |
| 06/04/2008 | CN100392792C Linear drive system for use in plasma processing system |
| 06/04/2008 | CN100392276C One piece shim |
| 06/04/2008 | CN100392148C Methods for silicon oxide and oxynitride deposition using single wafer low pressure CVD |
| 06/03/2008 | US7381673 SiC, SiO2, and Al and/or Si, with He leak rate of 1.3x10-10 Pa*m3/sec or below; high vacuum air-tightness, excellent thermal conductivity, adjustable coefficient of thermal expansion, small variation in strength and high reliability |
| 06/03/2008 | US7381661 Method for the production of a substrate with a magnetron sputter coating and unit for the same |
| 06/03/2008 | US7381452 low temperature, low power and low vacuum cathodic sputtering process |