| Patents for C23C 16 - Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition (cvd) processes (71,892) |
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| 06/24/2008 | US7389580 Method and apparatus for thin-film battery having ultra-thin electrolyte |
| 06/19/2008 | WO2008074016A2 Method and apparatus for low temperature and low k sibn deposition |
| 06/19/2008 | WO2008073750A2 Technique for atomic layer deposition |
| 06/19/2008 | WO2008071458A1 Container having improved ease of discharge product residue, and method for the production thereof |
| 06/19/2008 | WO2008070926A1 Nanotube and carbon layer nanostructured composites |
| 06/19/2008 | WO2008047044A3 Sliding mating part in lubricated regime, coated by a thin film |
| 06/19/2008 | WO2008027845A3 Dopant activation in doped semiconductor substrates |
| 06/19/2008 | WO2008011642A3 Method for applying a coating material and coating for a metallic surface |
| 06/19/2008 | WO2007119123A3 Interconnects and heat dissipators based on nanostructures |
| 06/19/2008 | US20080146041 Semiconductor Device Manufacturing Method and Plasma Oxidation Method |
| 06/19/2008 | US20080145570 Method of preparing carbon nanotube/polymer composite material |
| 06/19/2008 | US20080145536 Apparatus comprises a chamber, a gas mixing block connected to the chamber, and separate boron-containing precursor, silicon-containing precursor, and nitrogen-containing precursor gas line systems that are connected to gas mixing block; reacting precursors, depositing silicon boron nitride film |
| 06/19/2008 | US20080145535 Cyclic Chemical Vapor Deposition of Metal-Silicon Containing Films |
| 06/19/2008 | US20080145533 Substrate processing apparatus and substrate processing method |
| 06/19/2008 | US20080145521 Substrate processing system comprising source unit configured to supply deposition material to substrate, substrate holder configured to hold substrate to receive deposition material, shadow mask, transport mechanism configured to produce relative movement between shadow mask and substrate |
| 06/19/2008 | US20080145193 Vacuum Processing Apparatus |
| 06/19/2008 | US20080143012 Novel Polymer Films and Textile Laminates Containing Such Polymer Films |
| 06/19/2008 | US20080142846 Nitride semiconductor substrate and manufacturing method thereof |
| 06/19/2008 | US20080142160 Substrate mounting table and method for manufacturing same, substrate processing apparatus, and fluid supply mechanism |
| 06/19/2008 | US20080141943 Thin Film Forming Apparatus |
| 06/19/2008 | US20080141941 Showerhead electrode assembly with gas flow modification for extended electrode life |
| 06/19/2008 | US20080141940 Method and apparatus for preventing arcing at ports exposed to a plasma in plasma processing chambers |
| 06/19/2008 | US20080141939 Encapsulated and water cooled electromagnet array |
| 06/19/2008 | US20080141938 Processing apparatus, coated article and method |
| 06/19/2008 | DE19944977B4 Beschichtungen zur Anwendung bei Brennstoffeinspritzvorrichtungskomponenten Coatings for use in fuel injector components |
| 06/19/2008 | DE102007059662A1 Chemical vapor deposition apparatus comprises outer chamber fitted with gas inlet and outlet and inner chamber with apertures in its walls which contains heating elements and susceptors which can be rotated around apertures |
| 06/19/2008 | DE102006059848A1 Positioning plate for connecting two processing chambers is mounted horizontally on one edge between them and has central slot, allowing workpieces to be passed through it from one chamber to another |
| 06/19/2008 | DE102006058771A1 Behälter mit verbesserter Restentleerbarkeit und Verfahren zu dessen Herstellung Container with improved removal of residual and process for its preparation |
| 06/18/2008 | EP1933388A1 Silicon-based thin film photoelectric converter, and method and apparatus for manufacturing same |
| 06/18/2008 | EP1933373A2 Method for producing a device based on nanocrystals covered with a nitride layer applied by CVD |
| 06/18/2008 | EP1933372A1 Process for producing epitaxial wafer and epitaxial wafer produced therefrom |
| 06/18/2008 | EP1933368A2 Rapid conductive cooling using a secondary process plane |
| 06/18/2008 | EP1932942A2 Splashguard and inlet diffuser for high vacuum, high flow bubbler vessel |
| 06/18/2008 | EP1932941A1 Thermal etch process for cleaning CVD chambers |
| 06/18/2008 | EP1932170A2 Systems and methods for determination of endpoint of chamber cleaning processes |
| 06/18/2008 | EP1931818A2 Method for epitaxial growth of silicon carbide |
| 06/18/2008 | EP1931816A1 Corrosion resistant coating based on silicon, carbon, hydrogen and nitrogen |
| 06/18/2008 | EP1931814A1 Device for internal coating, retorts and method of internal coating |
| 06/18/2008 | EP1931811A1 Dry composition, use of its layer system and coating process |
| 06/18/2008 | CN201075383Y Support |
| 06/18/2008 | CN201074247Y Heat-conducting oil heating equipment in non-crystalline silicon deposition furnace |
| 06/18/2008 | CN101203945A Method of forming a high dielectric constant film and method of forming a semiconductor device |
| 06/18/2008 | CN101203944A Vapor phase treatment of dielectric materials |
| 06/18/2008 | CN101203626A Method for forming a dielectric film and novel precursors for implementing said method |
| 06/18/2008 | CN101203625A Chamber for vacuum treatment |
| 06/18/2008 | CN101202207A Method for removing successive sedimentation multiplelayer films of electric charge cumulated on the substrate |
| 06/18/2008 | CN101202206A Reaction chamber inner lining and reaction chamber containing the inner lining |
| 06/18/2008 | CN101202197A Ionization arrangement |
| 06/18/2008 | CN101200802A Engine inner surface ceramic treatment method |
| 06/18/2008 | CN101200798A Surface treatment method and electronic installation |
| 06/18/2008 | CN100395908C Negative pole material for lithium battery and producing method thereof |
| 06/18/2008 | CN100395373C Growth apparatus of Chemical gaseous phase deposition |
| 06/17/2008 | US7388740 Foil for negative electrode of capacitor and process for producing the same |
| 06/17/2008 | US7388246 Lanthanide doped TiOx dielectric films |
| 06/17/2008 | US7388113 Volatile copper(II) complexes for deposition of copper films by atomic layer deposition |
| 06/17/2008 | US7387835 Silicon carbide-coated carbonaceous material and carbonaceous material to be coated with silicon carbide |
| 06/17/2008 | US7387816 Scratch resistant coated glass article including layer(s) resistant to fluoride-based etchant(s), and method of making article using combustion CVD |
| 06/17/2008 | US7387815 Metallization of substrate(s) by a liquid/vapor deposition process |
| 06/17/2008 | US7387687 Support system for a treatment apparatus |
| 06/17/2008 | US7387686 Film formation apparatus |
| 06/17/2008 | US7387685 Apparatus and method for depositing materials onto microelectronic workpieces |
| 06/17/2008 | US7387663 Method and system for supplying high purity fluid |
| 06/17/2008 | US7387081 Plasma reactor including helical electrodes |
| 06/12/2008 | WO2008070631A2 Method and apparatus for preventing the formation of a plasma inhibiting substance |
| 06/12/2008 | WO2008069312A1 Process and apparatus for producing carbonaceous film |
| 06/12/2008 | WO2008068368A1 Process for low-temperature cvd production of coatings applicable to materials in electric power generation plants |
| 06/12/2008 | US20080139855 comprising a chainlike perfluoroalkyne having 5 or 6 carbon atoms, preferably perfluoro-2-pentyne. This plasma reaction gas is suitable for dry etching for formation of a fine pattern, for plasma CVD for formation of a thin film, and for plasma ashing. |
| 06/12/2008 | US20080139832 Dimethylethyl ethylenediamine methylaluminum; non-pyrophoric , long shelf life; thin films for liquid crystal displays, electroluminescent displays, solar cells, semiconductors |
| 06/12/2008 | US20080138984 Organometallic Precursor Compounds |
| 06/12/2008 | US20080138694 High-Temperature Fuel Cell System |
| 06/12/2008 | US20080138605 composites obtained by laminating diamond thin films on glass substrates |
| 06/12/2008 | US20080138571 Fabrication of Semiconductor Metamaterials |
| 06/12/2008 | US20080138535 plasma treating apparatus include electrodes on which substrates are supported, an inert gas and air supply used to control the temperature of the substrate during chucking and dechucking; surface treatment |
| 06/12/2008 | US20080138518 Atomic Layer Epitaxy; feed reactants as vapor-phase pulses repeatedly and alternately from a separate source into reaction space; first reactant is zinc, zinc chloride,tetramethyl aluminum; second reactant is water, sulfur, hydrogen sulfide, ammonia; purge with inert gas between vapor depositions |
| 06/12/2008 | US20080138517 Coating shower head without plugging holes; heat source vessel generate deposition gas phase of organic and inorganic materials; transfer path maintains a constant temperature to prevent deposition; purging the process chamber using a diluted gas and a transfer gas adsorbtion on substrate |
| 06/12/2008 | US20080138511 Non-invasive thermal management processes for restorating metallic details bonded to substrates |
| 06/12/2008 | US20080135518 Method and system for uniformity control in ballistic electron beam enhanced plasma processing system |
| 06/12/2008 | US20080135516 Substrate treatment device |
| 06/12/2008 | US20080135515 Method of fabricating mirrors for liquid crystal on silicon display device |
| 06/12/2008 | US20080134977 Substrate Treating Apparatus and Semiconductor Device Manufacturing Method |
| 06/12/2008 | US20080134976 Apparatus for Forming Thin Film |
| 06/12/2008 | US20080134974 Plasma processing apparatus and gas through plate |
| 06/12/2008 | US20080134960 Diamond semiconductor element and process for producing the same |
| 06/12/2008 | US20080134887 Low pressure drop canister for fixed bed scrubber applications and method of using same |
| 06/12/2008 | DE10339988B4 Verfahren zur Herstellung einer antireflektierenden Schicht A process for producing an antireflective layer |
| 06/11/2008 | EP1930485A1 METHOD FOR PRODUCTION OF GaxIn1-xN (0 x 1) CRYSTAL, GaxIn1-xN (0 x 1) CRYSTAL SUBSTRATE, METHOD FOR PRODUCTION OF GaN CRYSTAL, GaN CRYSTAL SUBSTRATE AND PRODUCT |
| 06/11/2008 | EP1930470A1 Diamond covered substrate, filtration filter, and electrode |
| 06/11/2008 | EP1930469A1 Method of forming oxide-based nano-structured material |
| 06/11/2008 | EP1930468A1 Chamber for vacuum treatment |
| 06/11/2008 | EP1929068A1 Process for producing metal foams having uniform cell structure |
| 06/11/2008 | EP1929066A2 Device and method for continuous chemical vapour deposition under atmospheric pressure and use thereof |
| 06/11/2008 | EP1929065A1 Bonding an adherent to a substrate via a primer |
| 06/11/2008 | EP1929064A1 Ultra smooth nanostructured diamond films and compositions and methods for producing same |
| 06/11/2008 | EP1928645A2 Method for preparing an oriented and nanostructured surface of a polymer |
| 06/11/2008 | EP1423480A4 Cubic boron nitride composition, coating and articles made therefrom, methods of making and using said composition, coating and articles |
| 06/11/2008 | CN101199039A Film-forming and cleaning method |
| 06/11/2008 | CN101198812A Isolation valve for energetic and high temperature gases |
| 06/11/2008 | CN101198720A Method for manufacturing metal cutting tools |
| 06/11/2008 | CN101198719A Method and device for depositing film, deposited film and photosensitive body employing same |
| 06/11/2008 | CN101198718A Method for treating plasma and/or covering plasma of workpieces under continuous atmospheric pressure, in particular material plates or strips |