| Patents for C23C 16 - Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition (cvd) processes (71,892) |
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| 07/01/2008 | US7393432 RF ground switch for plasma processing system |
| 07/01/2008 | US7393418 Susceptor |
| 07/01/2008 | US7393417 Semiconductor-manufacturing apparatus |
| 07/01/2008 | US7393416 Vapor deposition process and apparatus therefor |
| 07/01/2008 | US7393412 Method for manufacturing compound semiconductor epitaxial substrate |
| 07/01/2008 | US7392760 Microwave-excited plasma processing apparatus |
| 07/01/2008 | US7392759 Remote plasma apparatus for processing substrate with two types of gases |
| 06/26/2008 | WO2008076678A1 Methods and systems for low interfacial oxide contact between barrier and copper metallization |
| 06/26/2008 | WO2008076408A1 Showerhead electrode assembly with gas flow modification for extended electrode life |
| 06/26/2008 | WO2008076364A1 Inline passivation of vacuum-deposited aluminum on web substrate |
| 06/26/2008 | WO2008075637A1 Gas for plasma reaction, dry etching method, and method for forming fluorocarbon film |
| 06/26/2008 | WO2008075493A1 Base material processing apparatus and method for manufacturing display device using the base material processing apparatus |
| 06/26/2008 | WO2008075293A1 Additives to stabilize cyclotetrasiloxane and its derivatives |
| 06/26/2008 | WO2008074388A1 Antimicrobial material, and a method for the production of an antimicrobial material |
| 06/26/2008 | WO2008074298A1 Method for the production of quantum dots embedded in a matrix, and quantum dots embedded in a matrix produced using the method |
| 06/26/2008 | WO2008051670A3 Substrate support structure with rapid temperature change |
| 06/26/2008 | WO2008028053A3 Compounds for forming metal nitrides |
| 06/26/2008 | WO2007051994A8 Nanoparticle and nanocomposite films |
| 06/26/2008 | WO2007030218A3 A method of forming a tantalum-containing layer from a metalorganic precursor |
| 06/26/2008 | US20080153309 Substrate Processing Apparatus and Semiconductor Device Producing Method |
| 06/26/2008 | US20080153308 Substrate Processing Apparatus |
| 06/26/2008 | US20080153291 Method and Apparatus for Material Deposition |
| 06/26/2008 | US20080153256 Methods and systems for nitridation of STI liner oxide in semiconductor devices |
| 06/26/2008 | US20080152903 System and Process for High-Density, Low-Energy Plasma Enhanced Vapor Phase Epitaxy |
| 06/26/2008 | US20080152883 Nanoengineered material for hydrogen storage |
| 06/26/2008 | US20080152882 Coated cutting tool |
| 06/26/2008 | US20080152868 Substrate with transparent conductive oxide film, process for its production and photoelectric conversion element |
| 06/26/2008 | US20080152840 Apparatus for integrated gas and radiation delivery |
| 06/26/2008 | US20080152838 Hardware development to reduce bevel deposition |
| 06/26/2008 | US20080152806 Organic vapor jet deposition using an exhaust |
| 06/26/2008 | US20080152805 Polysilicon Dummy Wafers and Process Used Therewith |
| 06/26/2008 | US20080152804 application of a metal compound onto the hot glass surfaces using a chemical-vapor deposition; compound is monobutyltin trichloride |
| 06/26/2008 | US20080152803 Method For the Densification of Thin Porous Substrates By Means of Vapour Phase Chemical Infiltration and Device For Loading Such Substrates |
| 06/26/2008 | US20080150086 Nitride based semiconductor device and process for preparing the same |
| 06/26/2008 | US20080150061 Producing optical microlenses on a semiconductor device |
| 06/26/2008 | US20080150028 Zero interface polysilicon to polysilicon gate for semiconductor device |
| 06/26/2008 | US20080149596 Methods and apparatuses for controlling gas flow conductance in a capacitively-coupled plasma processing chamber |
| 06/26/2008 | US20080149488 Solvent-soluble stamp for nano-imprint lithography and method of manufacturing the same |
| 06/26/2008 | US20080149322 Metal Coated Graphite Sheet |
| 06/26/2008 | US20080149274 Plasma processing apparatus |
| 06/26/2008 | US20080149171 Zinc Oxide Photoelectrodes and Methods of Fabrication |
| 06/26/2008 | US20080149160 Photovoltaic Cell Based on Vectorial Electron Transfer |
| 06/26/2008 | US20080149032 Lift pin, apparatus for processing a substrate and method of processing a substrate |
| 06/26/2008 | US20080149031 Ampoule with a thermally conductive coating |
| 06/26/2008 | US20080148972 Low-wear bearer ring |
| 06/26/2008 | DE10331946B4 Vorrichtung zur Behandlung von Werkstücken Apparatus for treatment of workpieces |
| 06/26/2008 | DE102006060057A1 Antimikrobiell wirkendes Material sowie Verfahren zum Herstellen eines antimikrobiell wirkenden Materials Antibacterial material and to methods for making an antimicrobial material |
| 06/26/2008 | CA2673302A1 Antimicrobial material and method for producing an antimicrobial material |
| 06/25/2008 | EP1936671A1 Substrate processing apparatus and substrate processing method |
| 06/25/2008 | EP1936668A2 Nitride semiconductor substrate and manufacturing method thereof |
| 06/25/2008 | EP1936659A1 Installation for depositing, by means of microwave plasma, an internal barrier coating in thermoplastic containers |
| 06/25/2008 | EP1936006A2 Pressure swing CVI/CVD |
| 06/25/2008 | EP1935928A1 Photocurable maskant composition and method of use |
| 06/25/2008 | EP1935897A1 New organo-Ruthenium compound, the process for its preparation and its use as a ruthenium precursor to manufacture ruthenium based film coated metal electrodes |
| 06/25/2008 | EP1935005A1 Positive displacement pumping chamber |
| 06/25/2008 | EP1935004A1 Process and device for the plasma treatment of objects |
| 06/25/2008 | EP1935003A2 Discretized processing and process sequence integration of substrate regions |
| 06/25/2008 | EP1934382A1 Method for producing a coated substrate body, substrate body comprising a coating and use of the coated substrate body |
| 06/25/2008 | EP1934043A2 Wide range pressure control using turbo pump |
| 06/25/2008 | CN101208784A Beta-diketiminate ligand sources and metal-containing compounds thereof, and systems and methods including same |
| 06/25/2008 | CN101208783A Method to increase silicon nitride film tensile stress using post PECVD deposition UV cure |
| 06/25/2008 | CN101208458A Method of forming metallic film and program-storing recording medium |
| 06/25/2008 | CN101208457A Method for manufacturing flat substrates |
| 06/25/2008 | CN101208456A Atomic layer deposition systems and methods including metal beta-diketiminate compounds |
| 06/25/2008 | CN101208455A Film forming method, mask for film forming and film forming device |
| 06/25/2008 | CN101208454A Wafer processing system and method of producing the wafer |
| 06/25/2008 | CN101208295A Unsymmetrical ligand sources, reduced symmetry metal-containing compounds, and systems and methods including the same |
| 06/25/2008 | CN101208156A Plasma coating system for coating of substrates |
| 06/25/2008 | CN101207966A Plasma processing apparatus |
| 06/25/2008 | CN101207202A NiF2 nanometer electrode material for lithium ion battery and preparation method thereof |
| 06/25/2008 | CN101207174A 氮化物半导体衬底及其制造方法 The nitride semiconductor substrate and manufacturing method thereof |
| 06/25/2008 | CN101207062A Method for manufacturing substrate mounting table |
| 06/25/2008 | CN101207061A Substrate mounting table and method for manufacturing same, substrate processing apparatus, and fluid supply mechanism |
| 06/25/2008 | CN101207056A Method for measuring loading effect and percentage of coverage for thin membrane stairway |
| 06/25/2008 | CN101207013A Method and apparatus for heating a substrate |
| 06/25/2008 | CN101207012A Method and apparatus for heating a substrate |
| 06/25/2008 | CN101207006A Vertical type heat processing apparatus and vertical type heating method |
| 06/25/2008 | CN101207003A Inner lining of wafer processing chamber and wafer processing chamber containing said inner lining |
| 06/25/2008 | CN101206999A Inner lining and reaction chamber containing the same |
| 06/25/2008 | CN101205608A Method for preparing nano polycrystalline carbon nitride films |
| 06/25/2008 | CN101205607A Method to increase the compressive stress of pecvd dielectric films |
| 06/25/2008 | CN101205606A Lift pin, apparatus for processing a substrate and method of processing a substrate |
| 06/25/2008 | CN101205605A Apparatus for hot reinforcement and plasma reinforced vapor deposition |
| 06/25/2008 | CN101205604A Splashguard and inlet diffuser for high vacuum, high flow bubbler vessel |
| 06/25/2008 | CN101205061A Preparation of nano-carbon tube array |
| 06/25/2008 | CN100397594C Semiconductor device and manufacturing method thereof |
| 06/25/2008 | CN100397577C Valve unit and heat treatment system |
| 06/25/2008 | CN100397570C Vacuum processing apparatus and method operation thereof |
| 06/25/2008 | CN100397569C Substrate processing apparatus, control method adopted in substrate processing apparatus |
| 06/25/2008 | CN100397567C Plasma reaction chamber |
| 06/25/2008 | CN100396816C Low temperature insert layer in gallium nitride film grown through hydride gas phase epitaxy and its preparing method |
| 06/25/2008 | CN100396815C Method for operating an in-line coating installation |
| 06/24/2008 | US7392106 Fabrication system and fabrication method |
| 06/24/2008 | US7390731 Method of depositing an oxide layer on a substrate and a photovoltaic cell using said substrate |
| 06/24/2008 | US7390573 Plasma coating system for non-planar substrates |
| 06/24/2008 | US7390535 Simple chemical vapor deposition system and methods for depositing multiple-metal aluminide coatings |
| 06/24/2008 | US7390527 Method for manufacturing a nanostructure at a predetermined point on supporting carrier |
| 06/24/2008 | US7390381 Information recording medium and method of manufacturing the same |
| 06/24/2008 | US7390367 Housing assembly for an induction heating device including liner or susceptor coating |
| 06/24/2008 | US7390366 Apparatus for chemical vapor deposition |