Patents for C23C 16 - Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition (cvd) processes (71,892)
07/2008
07/17/2008US20080169279 Heating device, coating and developing system, heating method and storage medium
07/17/2008US20080168947 Gas-purged vacuum valve
07/17/2008US20080168946 Liquid supplying unit and method, facility for treating substrates with the unit, and method for treating substrates
07/17/2008US20080168945 Plasma generating apparatus
07/17/2008DE112006002384T5 Präkursor-Gas-Zuführung mit Träger-Gasmischung Precursor gas supply with carrier-gas mixture
07/16/2008EP1943371A1 Method and device for coating a polymer film with an oxide layer
07/16/2008EP1943094A2 Apparatus and method for making fullerene nanotube forests, films, threads and composite structures
07/16/2008EP1943008A2 Method of preventing analyte alteration in diagnostic apparatuses involving contact of liquid and electrode
07/16/2008EP1358363B1 Diamond coatings on reactor wall and method of manufacturing thereof
07/16/2008CN101223631A Gas treatment apparatus
07/16/2008CN101223299A Tectorial membrane forming device for forming tectorial membrane on internal surface of container, production method for internal surface tectorial membrane container
07/16/2008CN101223298A Deposition method containing ruthenium membrane
07/16/2008CN101223297A Apparatus for the PECVD deposition of an inner barrier layer on a container, comprising an optical plasma analysis device
07/16/2008CN101223000A Method of protecting a bond layer in a substrate support adapted for use in a plasma processing system
07/16/2008CN101222041A Nano combination electrode material Li3N/Si used for lithium ion battery and its preparation method
07/16/2008CN101222021A Formulation and method for depositing a material on a substrate
07/16/2008CN101221896A Substrate support bushing
07/16/2008CN101220485A Method for manufacturing fluorine carbon anode chemical vapor deposition pyrolytic carbon polarization resistant coating
07/16/2008CN101220470A Method for improving film stress and method for forming high stress layer
07/16/2008CN101220469A Method and apparatus for plasma enhanced chemical vapor deposition
07/16/2008CN101220468A Growth silicon based thin film and PECVD equipment for high-efficiency silicon based thin-film solar cell
07/16/2008CN101220467A Method for producing alta-mud load TiO2 catalyst with metal organic chemical vapor deposition
07/16/2008CN101220466A Method for manufacturing gallium nitride nano-wire with tungsten auxiliary heat anneal
07/16/2008CN101220465A Cyclic chemical vapor deposition of metal-silicon containing films
07/16/2008CN101220464A High heat-resistance hollow out substrate working platform capable of multiple-surface depositing CVD diamond film
07/16/2008CN101220463A Process for chemical vapor deposition of materials with via filling capability and structure formed thereby
07/16/2008CN101220462A Gradient method preprocessing technique for depositing CVD diamond film on hard metal surface
07/16/2008CN101220461A Method for cleaning reaction chamber of semiconductor manufacturing device
07/16/2008CN101219861A Photocatalytically active coated substrates
07/16/2008CN101219777A Method of forming oxide based nano structures
07/16/2008CN100403198C Method and apparatus for controlling the ratio of process fluids
07/16/2008CN100402826C Method and system for avoiding anomaly stop of production device
07/16/2008CN100402697C Device for carrying out a plasma-assisted process
07/16/2008CN100402696C Semiconductor processing method for processing substrate to be processed and its apparatus
07/15/2008US7399716 Precursor for hafnium oxide layer and method for forming hafnium oxide film using the precursor
07/15/2008US7399707 In situ application of etch back for improved deposition into high-aspect-ratio features
07/15/2008US7399697 Producing high adhesion nanoporous layers with low capacitance loss; utilizing organosiloxane, carbon dioxide and organic nonsilicon compound having multiple unsaturated bonds and thermally labile group
07/15/2008US7399501 Gas sensor manufacturing process
07/15/2008US7399500 Rapid process for the production of multilayer barrier layers
07/15/2008US7399499 controlling the charging of gases in coaters used for atomic layer deposition and chemical vapor deposition, using activators comprising pistons or diaphragms
07/15/2008US7399497 Method for forming film, method of manufacturing electronic device, film forming system, electronic device, and electronic apparatus
07/15/2008US7399388 Plasma enhanced chemical vapor deposition of a silica glass dielectric film; repetitious exposure of a substrate to a reaction mixture of silane and oxygen gases, purging and evacuation of the reaction chamber
07/15/2008US7399364 Hermetic cap layers formed on low-κ films by plasma enhanced chemical vapor deposition
07/10/2008WO2008083310A1 Method of curing metal alkoxide-containing films
07/10/2008WO2008083026A1 Active particle trapping for process control
07/10/2008WO2008082921A1 Plasma-enhanced substrate processing method and apparatus
07/10/2008WO2008082897A1 Plasma deposited microporous carbon material
07/10/2008WO2008082883A1 Method and apparatus for stabilizing a coating
07/10/2008WO2008082834A1 Functional layers for polycarbonate glazing
07/10/2008WO2008082609A2 Transparent conductive nano-composites
07/10/2008WO2008082020A1 Surface treating method for cutting tools
07/10/2008WO2008081650A1 Highly corrosion-resistant members and processes for production thereof
07/10/2008WO2008059070A3 Method for regulating nanoscale electron beam induced depositions
07/10/2008WO2007108952A3 High throughput deposition apparatus with magnetic support
07/10/2008WO2007106611A3 Rf plasma-enhanced deposition of fluorinated films
07/10/2008US20080166886 Substrate processing apparatus
07/10/2008US20080166884 Delivery device comprising gas diffuser for thin film deposition
07/10/2008US20080166881 Semiconductor Device Manufacturing Apparatus and Manufacturing Method of Semiconductor Device
07/10/2008US20080166880 Delivery device for deposition
07/10/2008US20080166605 Two-Dimensional Composite Particle Adapted For Use As A Catalyst And Method Of Making Same
07/10/2008US20080166588 Multilayered coated cutting tool
07/10/2008US20080166586 Chemical vapor deposition in which a metal that can forming an eutectic alloy with germanium is used to catalyze the growth of the GeSb materials; selectivity, relatively low temperature; semiconductors
07/10/2008US20080166561 Multilayered erosion resistant coating for gas turbines
07/10/2008US20080166531 Preparation and properties of CR-C-P hard coatings annealed at high temperature for high temperature applications
07/10/2008US20080166527 CVD-coated cemented carbide insert for toughness demanding short hole drilling operations
07/10/2008US20080166499 Low thermal conductivity thermal barrier coating system and method therefor
07/10/2008US20080166479 Preparing matrix with geometrical shape, synthesizing diamond film on matrix by CVD to form diamond/matrix composite, composite being partially uncoated with diamond film to have an opening site, etching matrix of partially covered composite through opening site to obtain hollow diamond shell; biochips
07/10/2008US20080166472 Mixing mass of material in solid state with plurality of packing units, each unit comprising an inert material, and where structure of packing units or aggregate of packing units comprises a plurality of non-smooth features, evaporating; phosphorescent OLED devices; high yields, minimizing decomposition
07/10/2008US20080166287 Layered Structure
07/10/2008US20080164429 Bolometric Device with Receiving Cavity for Measuring the Power of a Beam of High Frequency Microwaves and Process for Coating the Internal Surface of Said Cavity
07/10/2008US20080164244 Delivery of solid chemical precursors
07/10/2008US20080163818 Substrate heating apparatus and purging method thereof
07/10/2008US20080163817 Apparatus for gas handling in vacuum processes
07/10/2008US20080163816 Apparatus For Forming Thin Film
07/10/2008DE202007018382U1 Vorrichtung zur Erzeugung eines Plasma-Jets und für eine solche Vorrichtung bestimmtes Werkzeug An apparatus for generating a plasma jet, and for such a device specific tool
07/10/2008DE10260860B4 Schicht aus Si1-xGex, Verfahren zu deren Herstellung und mikromechanisches Bauelement damit Layer of Si1-xGex, to processes for their preparation and micromechanical component thus
07/09/2008EP1942206A1 Treating device using raw material gas and reactive gas
07/09/2008EP1941539A1 Ultraviolet curing process for low k dielectric films
07/09/2008EP1941074A1 Cooled device for plasma depositing a barrier layer onto a container
07/09/2008EP1941073A1 Method of treating gas
07/09/2008EP1941072A2 Process for plasma coating a nanocomposite object
07/09/2008EP1940584A1 Rotating machines for treating containers
07/09/2008EP1940576A2 Production of nano-scale metal particles
07/09/2008EP1507887B1 Multistation coating device and method for plasma coating
07/09/2008EP1456871B1 Susceptor for epitaxial growth
07/09/2008EP0844431B1 System and method for controlled delivery of liquefied gases
07/09/2008CN201082900Y Multifunctional film forming system for packaging organic electroluminescence component
07/09/2008CN101218860A Plasma treatment apparatus
07/09/2008CN101218375A Multilayer structure and method for cleaning same
07/09/2008CN101218372A Plasma arc coating system
07/09/2008CN101218371A Coated cutting tool insert
07/09/2008CN101218370A Hard-coated body and method for production thereof
07/09/2008CN101217195A A lithium ion battery anode material of lithium iron phosphate and the corresponding vapor deposition and cladding method of conductive network
07/09/2008CN101217110A Group III nitride semiconductor substrate and its manufacturing method
07/09/2008CN101215692A Multiple reaction cavity atom layer deposition device and method
07/09/2008CN101215691A Method for in situ synthesizing metal nickel nano particle coating carbon nano-tube composite material
07/09/2008CN100401852C Method and apparatus for controlling spatial temperature distribution across surface of workpiece support
07/09/2008CN100401481C Plasma processing method and apparatus
07/09/2008CN100401474C High density electro thick fluid chemical gaseous phase sedimentation process and method of improving film thickness unifomity
07/09/2008CN100401471C Plasma processing chamber, potential controlling apparatus, method, program and storage medium