| Patents for C23C 16 - Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition (cvd) processes (71,892) |
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| 07/09/2008 | CN100401470C Method for controlling and removing fog-shaped micro-defect of silicon gas-phase epitaxial layer |
| 07/09/2008 | CN100400707C Method for forming ultra low k films using electron beam |
| 07/09/2008 | CN100400706C Heater array electrode system used for stable growth of diamond membrane with large area |
| 07/09/2008 | CN100400705C Organometallic complexes and their use as precursors to deposit metal films |
| 07/09/2008 | CN100400688C Vapor depositing in-situ reaction process for preparing carbon nanotube reinforced copper-base composite material |
| 07/08/2008 | US7397183 Diffusion barrier coatings having graded compositions and devices incorporating the same |
| 07/08/2008 | US7396949 Class of volatile compounds for the deposition of thin films of metals and metal compounds |
| 07/08/2008 | US7396783 Surface treatment; electrical discharging in gases mixture |
| 07/08/2008 | US7396777 Method of fabricating high-k dielectric layer having reduced impurity |
| 07/08/2008 | US7396748 Semiconductor device includes gate insulating film having a high dielectric constant |
| 07/08/2008 | US7396719 Method of forming high dielectric film using atomic layer deposition and method of manufacturing capacitor having the high dielectric film |
| 07/08/2008 | US7396581 Enhanced alumina layer produced by CVD |
| 07/08/2008 | US7396570 Plasma enhanced chemical vapor deposition method of forming titanium silicide comprising layers |
| 07/08/2008 | US7396565 Multiple precursor cyclical deposition system |
| 07/08/2008 | US7396564 discharging electrode mounted on one side of the positioning platform whose position can be calibrated with the platform to cut the carbon nanotube; applying a voltage pulse to the electrode |
| 07/08/2008 | US7396563 Ceramic thin film on various substrates, and process for producing same |
| 07/08/2008 | US7396480 Method for front end of line fabrication |
| 07/08/2008 | US7396432 Composite shadow ring assembled with dowel pins and method of using |
| 07/08/2008 | US7396431 Plasma processing system for treating a substrate |
| 07/08/2008 | US7396415 Apparatus and methods for isolating chemical vapor reactions at a substrate surface |
| 07/08/2008 | US7396411 Apparatus for manufacturing single crystal |
| 07/08/2008 | US7396409 Acicular silicon crystal and process for producing the same |
| 07/08/2008 | US7396371 For turning of stainless steel; cemented carbide substrate and a post-treated coating; high performance tool for high cutting speeds |
| 07/08/2008 | US7396285 Counter track joint with track turning point |
| 07/08/2008 | US7395823 Method and apparatus for local fluorine and nitrogen trifluoride production |
| 07/08/2008 | US7395779 Plasma processing apparatus |
| 07/03/2008 | WO2008079742A2 Prevention of film deposition on pecvd process chamber wall |
| 07/03/2008 | WO2008078950A1 Metal gas supply apparatus and remaining gas removal apparatus used for thin film depositing apparatus and method thereof |
| 07/03/2008 | WO2008078503A1 Film forming apparatus and method of forming film |
| 07/03/2008 | WO2008078502A1 Film deposition apparatus and film deposition method |
| 07/03/2008 | WO2008078501A1 Film forming apparatus and method of forming film |
| 07/03/2008 | WO2008078500A1 Film deposition apparatus and film deposition method |
| 07/03/2008 | WO2008078401A1 Method for producing self-supporting nitride semiconductor substrate and self-supporting nitride semiconductor substrate |
| 07/03/2008 | WO2008078296A1 Method for the deposition of a ruthenium containing film with aryl and diene containing complexes |
| 07/03/2008 | WO2008078295A1 Method for the deposition of a ruthenium containing film |
| 07/03/2008 | WO2008015533A3 Porous dielectric layers obtained from pore -forming precursors |
| 07/03/2008 | WO2007131053A3 Batch processing chamber with diffuser plate and injector assembly |
| 07/03/2008 | WO2007011666A3 Method and apparatus for semiconductor processing |
| 07/03/2008 | US20080160420 Secondary battery electrode, method for manufacturing same, and secondary battery |
| 07/03/2008 | US20080160384 Integrated biofuel cell with aligned nanotube electrodes and method of use thereof |
| 07/03/2008 | US20080160338 Steel; cast iron; impact, fracture, and wear resistance |
| 07/03/2008 | US20080160334 Circuit substrate and surface treatment process thereof |
| 07/03/2008 | US20080160311 Loading the surface of a fiber-like or plate-like inorganic particle of potassium titanate or wollastonite with fine particles of an iron catalyst and growing carbon nanotubes on the surface of the inorganic particle by a polystyrene method |
| 07/03/2008 | US20080160215 Contamination Resistant Surfaces |
| 07/03/2008 | US20080160214 Substrate processing apparatus |
| 07/03/2008 | US20080160212 Method and apparatuses for providing electrical contact for plasma processing applications |
| 07/03/2008 | US20080160205 introduction of reagents is controlled to enhance the coating formed on the substrate and conserve the amount of reagents used |
| 07/03/2008 | US20080160193 Thin layer substrate coating and method of forming same |
| 07/03/2008 | US20080160192 Cost reduction; includes technique for recycling gas stream extracted from effluent gas |
| 07/03/2008 | US20080160191 Method and Equipment of Producing Graphite and Metallic Catalyst Composite for Diamond Synthesis |
| 07/03/2008 | US20080159939 Ceramic and method of manufacturing the same, dielectric capacitor, semiconductor device, and element |
| 07/03/2008 | US20080157096 monocrystalline diamond, adapted for use as semiconductors or waveguides |
| 07/03/2008 | US20080156769 Advanced mixing system for integrated tool having site-isolated reactors |
| 07/03/2008 | US20080156440 Surface processing apparatus |
| 07/03/2008 | US20080156267 Device and method for vacuum deposition, and organic electroluminescent element provided by the device and the method |
| 07/03/2008 | US20080156266 Plasma processing apparatus |
| 07/03/2008 | US20080156265 Method and apparatus for forming nickel silicide with low defect density in fet devices |
| 07/03/2008 | US20080156264 Plasma Generator Apparatus |
| 07/03/2008 | US20080156260 Wafer Support and Method of Making Wafer Support |
| 07/03/2008 | DE102006052586B4 Verfahren und Vorrichtung zur Reinigung der Abgase einer Siliziumdünnschicht-Produktionsanlage Method and apparatus for cleaning the exhaust gases of a silicon thin film production plant |
| 07/03/2008 | DE102004042431B4 Verfahren und Vorrichtung zur Plasmabeschichtung von Werkstücken mit spektraler Auswertung der Prozessparameter und Verwendung der Vorrichtung Method and device for the plasma coating of workpieces with a spectral evaluation of the process parameters and use of the apparatus |
| 07/02/2008 | EP1939323A1 Cyclic chemical vapor deposition of metal-silicon containing films |
| 07/02/2008 | EP1938965A1 Clay thin film substrate, clay thin film substrate with electrode, and display using those |
| 07/02/2008 | EP1938360A2 Method and apparatus for converting precursor layers into photovoltaic absorbers |
| 07/02/2008 | EP1938340A1 Method for producing a metal powder and an electrically insulating polymer composite material, polymer composite material and electronic device |
| 07/02/2008 | EP1937871A2 Cleaning means for large area pecvd devices using a remote plasma source |
| 07/02/2008 | EP1937870A1 Plasma reactor |
| 07/02/2008 | EP1937869A1 Novel chips for surface plasmon (spr) detection |
| 07/02/2008 | EP1937868A2 System for improving the wearability of a surface and related method |
| 07/02/2008 | EP1937867A2 Deposition apparatus for the formation of polycrystalline materials on mobile substrates |
| 07/02/2008 | EP1851358B1 Method for the densification of thin porous substrates by means of vapour phase chemical infiltration and device for loading such substrates |
| 07/02/2008 | EP1661160A4 Supercritical fluid-assisted deposition of materials on semiconductor substrates |
| 07/02/2008 | EP1374290B1 Improved process for deposition of semiconductor films |
| 07/02/2008 | CN201080495Y Device for preparing amorphous hydrogen silicon film |
| 07/02/2008 | CN201080494Y Solar cell deposition system radio-frequency discharge device |
| 07/02/2008 | CN201080493Y Mobile PVD/CVD coating center |
| 07/02/2008 | CN101213674A Method for continuously depositing high resistance buffer layer/window layer (transparent conductive film) of cis based thin film solar cell and continuous film deposition equipment for carrying out t |
| 07/02/2008 | CN101213640A Apparatus for controlling substrate processing apparatus and program for controlling substrate processing apparatus |
| 07/02/2008 | CN101213497A Reinforced micromechanical part |
| 07/02/2008 | CN101213322A Deposition method of ternary films |
| 07/02/2008 | CN101213321A Nanostructure production methods and apparatus |
| 07/02/2008 | CN101213320A Method for forming tungsten film, film-forming apparatus, storage medium and semiconductor device |
| 07/02/2008 | CN101210318A Method for coating silicon nitride film layer on piston ring surface |
| 07/02/2008 | CN101210317A Gas integrated unit |
| 07/02/2008 | CN101210316A Heat treatment method for preparing carbon coating nano composite particles by using gas carbon source |
| 07/02/2008 | CN101210315A Heat retainer for chemical vapor deposition device |
| 07/02/2008 | CN101209833A Preparation of carbon nano-tube array |
| 07/02/2008 | CN100399517C Gaseous phase growing device |
| 07/02/2008 | CN100399512C Method of manufacturing iron silicide and photoelectric energy converter |
| 07/02/2008 | CN100398696C Emissivity-change-free pumping plate kit in a single wafer chamber |
| 07/02/2008 | CN100398695C Method and apparatus for deposition of boron-phosphorus silicate glass |
| 07/01/2008 | US7393796 Composite dielectric forming methods and composite dielectrics |
| 07/01/2008 | US7393785 Methods and apparatus for forming rhodium-containing layers |
| 07/01/2008 | US7393783 Methods of forming metal-containing structures |
| 07/01/2008 | US7393765 Low temperature CVD process with selected stress of the CVD layer on CMOS devices |
| 07/01/2008 | US7393589 Dual layer diffusion bonded chemical vapor coating for medical implants |
| 07/01/2008 | US7393563 Exposing a conductively doped silicon surface to TiCl4 without exposing it to any measurable silane for a first period of time and then exposing the surface to a mixture of TiCl4 and a silane for a second period of time |
| 07/01/2008 | US7393562 Deposition methods for improved delivery of metastable species |
| 07/01/2008 | US7393561 Depositing material on substrate by atomic layer processing including injecting series of gases sequentially into reactant chamber without purging one gas from chamber prior to injection of another gas |
| 07/01/2008 | US7393433 Plasma processing apparatus, semiconductor manufacturing apparatus and electrostatic chucking unit used thereof |