| Patents for C23C 16 - Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition (cvd) processes (71,892) |
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| 07/29/2008 | US7404990 Non-thermal process for forming porous low dielectric constant films |
| 07/29/2008 | US7404986 Physical vapor deposition is augmented by chemical vapor deposition from one or more organometallic compounds, preferably refractory metal carbonyls, to deposit coatings and repair material on superalloy turbine engine parts |
| 07/29/2008 | US7404985 Noble metal layer formation for copper film deposition |
| 07/29/2008 | US7404984 Vapor-phase reactants pulse repeatedly and alternately into reaction zone containing substrate to form solid-state thin film wherein gas volume is evacuated between pulses |
| 07/29/2008 | US7404983 A coaxial precursor and non-reactive laminar gas jet configuration insulates the deposition area from oxygen and other aerial impurities; pyrolyzing hydrocarbon gases; hermetically sealing fused quartz substrates and optical fibers; improved corrosion resistance and waterproofing of fibers |
| 07/29/2008 | US7404980 Method for producing an addressable field-emission cathode and an associated display structure |
| 07/29/2008 | US7404874 Method and apparatus for treating wafer edge region with toroidal plasma |
| 07/29/2008 | CA2483558C Methods of handling wind turbine blades and mounting said blades on a wind turbine, system and gripping unit for handling a wind turbine blade |
| 07/29/2008 | CA2368471C Highly tetrahedral amorphous carbon coating on glass |
| 07/29/2008 | CA2290985C Film or coating deposition on a substrate |
| 07/24/2008 | WO2008089168A2 Plasma immersion chamber |
| 07/24/2008 | WO2008088743A1 Gas treatment systems |
| 07/24/2008 | WO2008087930A1 Iii nitride compound semiconductor element and method for manufacturing the same, iii nitride compound semiconductor light emitting element and method for manufacturing the same, and lamp |
| 07/24/2008 | WO2007146803A3 Methods and apparatus for preventing plasma un-confinement events in a plasma processing chamber |
| 07/24/2008 | US20080176413 Selective plasma processing method |
| 07/24/2008 | US20080176067 Process for producing shaped bodies of carbon fiber reinforced carbon and shaped body produced by the process |
| 07/24/2008 | US20080176059 Impregnating microporous or mesoporous solid material with solution of one or more precursors of metallic or metal oxide nanoparticles, radiolytically reducing precursors within matrix-forming material, wherein impregnation is performed under saturated vapor pressure and reflux of precursor solution |
| 07/24/2008 | US20080176058 Porous anodic alumina template (PAA) containing thin carbon nanotube (CNT) catalyst layer directly embedded into pore walls; CNT synthesis using template selectively catalyzes single and double wall tubes from embedded catalyst layer to top PAA surface, creating vertical CNT channel within pores |
| 07/24/2008 | US20080175994 Method for forming srtio3 film |
| 07/24/2008 | US20080175993 Reel-to-reel reaction of a precursor film to form solar cell absorber |
| 07/24/2008 | US20080175988 Method and apparatus for open-air coating by laser-induced chemical vapor deposition |
| 07/24/2008 | US20080175785 Chemical vapor deposition of carbon nanotubes on structures and substrates |
| 07/24/2008 | US20080174235 Mask used to fabricate organic light-emitting diode (oled) display device, method of fabricating oled display device using the mask, oled display device fabricated using the mask, and method of fabricating the mask |
| 07/24/2008 | US20080174021 Semiconductor devices having metal interconnections, semiconductor cluster tools used in fabrication thereof and methods of fabricating the same |
| 07/24/2008 | US20080173403 Plasma stabilization method and plasma apparatus |
| 07/24/2008 | US20080173402 Microwave plasma processing apparatus |
| 07/24/2008 | US20080173366 Gas box module of semiconductor device manufacturing equipment |
| 07/24/2008 | US20080173242 Method, system, and apparatus for the growth of SiC and related or similar material, by chemical vapor deposition, using precursors in modified cold-wall reactor |
| 07/24/2008 | US20080173241 Vapor deposition sources and methods |
| 07/24/2008 | US20080173240 Liquid material vaporization apparatus for semiconductor processing apparatus |
| 07/24/2008 | US20080173239 Method, system, and apparatus for the growth of SiC and related or similar material, by chemical vapor deposition, using precursors in modified cold-wall reactor |
| 07/24/2008 | US20080173238 Substrate processing apparatus, method of manufacturing semiconductor device, and reaction vessel |
| 07/24/2008 | US20080173237 Plasma Immersion Chamber |
| 07/24/2008 | DE202008006477U1 Vorrichtung zur Modifizierung von Substratoberflächen An apparatus for modifying surfaces of substrate |
| 07/24/2008 | DE102007051640A1 Verfahren zur Bildung einer Korrosions- und Oxidationsschutzbeschichtung für Bauteile von Gasturbinen unter Verwendung eines Brennstoffadditivs A method for forming a corrosion and oxidation resistant coating for components of gas turbines using a fuel additive |
| 07/24/2008 | DE102005015362B4 Verfahren zur Herstellung einer Praseodymsilikat-Schicht A process for the preparation of a praseodymium-layer |
| 07/23/2008 | EP1947689A2 High temperature fine grain aluminium heater |
| 07/23/2008 | EP1947685A2 Semiconductor device having fluorine-added carbon dielectric film and method of fabricating the same |
| 07/23/2008 | EP1947220A1 Process for producing diamond having structure of acicular projection array disposed on surface thereof, diamond material, electrode and electronic device |
| 07/23/2008 | EP1947213A1 Process for producing an oxide coated cutting tool |
| 07/23/2008 | EP1947212A1 Method for making an architectural laminate |
| 07/23/2008 | EP1947211A1 Vacuum metallization device |
| 07/23/2008 | EP1947081A1 Titanium complexes, process for production thereof, titanium -containing thin films, and method for formation thereof |
| 07/23/2008 | EP1945840A2 Interconnects and heat dissipators based on nanostructures |
| 07/23/2008 | EP1945832A1 Dual mode ion source for ion implantation |
| 07/23/2008 | EP1945831A1 Partition-type heating apparatus |
| 07/23/2008 | EP1796875B1 Focussing nozzle |
| 07/23/2008 | EP1689907A4 Plasma production device and method and rf driver circuit with adjustable duty cycle |
| 07/23/2008 | EP1656469B1 Methods of depositing materials over substrates and methods of forming layers over substrates |
| 07/23/2008 | EP1649075B1 Cvd diamond-coated composite substrate and method for making same |
| 07/23/2008 | EP1629522A4 Gas distribution system |
| 07/23/2008 | EP1472387B1 Corona-generated chemical vapor deposition on a substrate |
| 07/23/2008 | EP1466030A4 Vaporiser/delivery vessel for volatile/thermally sensitive solid and liquid compounds |
| 07/23/2008 | EP1440179A4 Chemical vapor deposition system |
| 07/23/2008 | EP1341718B1 Method and device for electronic cyclotron resonance plasma deposit of single-wall carbon nanotubes and resulting nanotubes |
| 07/23/2008 | EP1192637B1 Method and device for electronic cyclotronic resonance plasma deposit of carbon nanofibre layers in fabric form and resulting fabric layers |
| 07/23/2008 | CN201089795Y Reversing arrangement having shut unclosed prompt facility |
| 07/23/2008 | CN101228612A System of rotatable bearing machine and treatment room inner support for chip processing device |
| 07/23/2008 | CN101228292A Method for silicon nitride chemical vapor deposition |
| 07/23/2008 | CN101228288A Injection type plasma processing apparatus and method thereof |
| 07/23/2008 | CN101226922A SICOH dielectric and its manufacturing method |
| 07/23/2008 | CN101226877A Substrate processing device and method |
| 07/23/2008 | CN101225514A Coating system, coating method and Coating products |
| 07/23/2008 | CN101225513A Manufacturing method of plasmatron for coating technique of solar cell slice |
| 07/23/2008 | CN101225512A Method of vaporizing solid organometallic compound |
| 07/23/2008 | CN101225511A Thermal etch process for cleaning CVD chambers |
| 07/23/2008 | CN101225510A Plasma preparation method of super-hydrophobic and super-hydrophilic titanium oxide film |
| 07/23/2008 | CN101225509A Metal conducting wire repairing method and repairing apparatus |
| 07/23/2008 | CN101225508A Method for manufacturing a patterned vapour-deposited film |
| 07/23/2008 | CN100405557C Plasma treatment device |
| 07/23/2008 | CN100405549C Process for depositing film, process for fabricating semiconductor device, semiconductor device and device for depositing film |
| 07/23/2008 | CN100405537C Plasma reaction device |
| 07/22/2008 | US7402876 Zr— Sn—Ti—O films |
| 07/22/2008 | US7402833 Multilayer dielectric tunnel barrier used in magnetic tunnel junction devices, and its method of fabrication |
| 07/22/2008 | US7402779 Effusion cell and method for use in molecular beam deposition |
| 07/22/2008 | US7402778 Oven for controlled heating of compounds at varying temperatures |
| 07/22/2008 | US7402518 Atomic layer deposition methods |
| 07/22/2008 | US7402513 Method for forming interlayer insulation film |
| 07/22/2008 | US7402210 Apparatus and method for hybrid chemical processing |
| 07/17/2008 | WO2008085474A2 Delivery device for thin film deposition |
| 07/17/2008 | WO2008085468A1 Delivery device for deposition |
| 07/17/2008 | WO2008085467A1 Deposition system and method |
| 07/17/2008 | WO2008045130A3 Property modification during film growth |
| 07/17/2008 | WO2008008098A3 Plasma deposition apparatus and method for making polycrystalline silicon |
| 07/17/2008 | WO2007142662A3 Production of nano-scale metal particles |
| 07/17/2008 | WO2007127007A3 System and method for transport |
| 07/17/2008 | WO2007115309A3 Apparatus and method for treating a workpiece with ionizing gas plasma |
| 07/17/2008 | US20080171435 Vacuum Processing Apparatus, Method for Manufacturing Semiconductor Device, and System For Manufacturing Semiconductor Device |
| 07/17/2008 | US20080171221 Comprising substrate, thermal barrier first layer, second layer comprising aluminide between the substrate and the thermal barrier layer anda third layer comprising PtAl2 between and distinct from the aluminide layer and the thermal barrier layer; gas turbine engine components |
| 07/17/2008 | US20080171162 Process For Plasma Coating a Polypropylene Object |
| 07/17/2008 | US20080171154 Method of treatment and processing of tools for machining of workpieces by cutting |
| 07/17/2008 | US20080171147 vapor depositing on lenses using a more reliable, versatile and safer dispensing system carrier; pre-opening the screw cap of vial prior placing within the chamber, vacuum depositing silica layer, covering with a thin polysilsesquioxane film; uniform layer, no defect, no splashing |
| 07/17/2008 | US20080171146 forming an acentric microstructure electro-optic films, by reacting chromophore pyrimidin-2,4,6-trione and/or pyrrolidinedione/2,5-/ derivative with diaminomelamine or aminopurinone groups; bonding to substrate through an aminoalkyltrialkoxysilane; quality, thickness |
| 07/17/2008 | US20080171142 Film Deposition Method And Film Deposition System |
| 07/17/2008 | US20080171134 a polymer( parylaene, polyimide or silicones) based capacitive fluidic sensor; micromachining; versatility, flexibility, high sensitivity, small footprints, and easy integration |
| 07/17/2008 | US20080171131 substrate placed on the plural protrusions provided in the heat exchange plate and attracted by suction through the gap regions defined by dividing the gap caused between the substrate and the heat exchange plate using the partition member; a little suction force required; no damage or break |
| 07/17/2008 | US20080170327 Method for forming carbon protective film and method for producing magnetic recording medium, magnetic recording medium and magnetic recording/reproducing apparatus |
| 07/17/2008 | US20080170226 Particle monitor system and substrate processing apparatus |
| 07/17/2008 | US20080170106 Heating structure and inkjet printhead including the heating structure |
| 07/17/2008 | US20080169468 Method and Apparatus For Fabricating Polycrystalline Silicon Film Using Transparent Substrate |