| Patents for C23C 16 - Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition (cvd) processes (71,892) |
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| 08/13/2008 | CN101243535A Optical emission interferometry for PECVD using a gas injection hole |
| 08/13/2008 | CN101243204A Metal carbonitride layer and method for the production of a metal carbonitride layer |
| 08/13/2008 | CN101243013A An apparatus and method for growing a synthetic diamond |
| 08/13/2008 | CN101241953A Method for improving quality of reflection reduction film of single crystal silicon solar battery |
| 08/13/2008 | CN101241845A Silicon parts for plasma reaction chamber |
| 08/13/2008 | CN101241844A In-situ dry clean chamber for front end of line fabrication |
| 08/13/2008 | CN101241840A Vacuum processing apparatus and method, and storage medium |
| 08/13/2008 | CN101241837A Exhaust unit, exhausting method, and semiconductor manufacturing facility with the exhaust unit |
| 08/13/2008 | CN101241829A 转换的均匀性控制 Conversion uniformity control |
| 08/13/2008 | CN101240417A Method for preparing silicon carbide reflecting mirror material and CVI forming device thereof |
| 08/13/2008 | CN101240416A Chemical palladium-plating method on silicon used for surface enhancement infrared spectrum |
| 08/13/2008 | CN101240415A Method for coating fluoroparylene and special coating device |
| 08/13/2008 | CN101239826A Process for preparing silicon nitride nano wave-pervious material |
| 08/13/2008 | CN101239515A Dielectric adjustable thin film based on implantation type nano line electrode and preparation thereof |
| 08/13/2008 | CN100411133C Substrate-placing platform, substrate processing device and production method of substrate-placing platform |
| 08/13/2008 | CN100411116C Dielectric film forming method |
| 08/13/2008 | CN100411102C Vaporizer for CVD, solution voporizing CVD device and voporization method for CVD |
| 08/13/2008 | CN100411096C Temperature control system and substrate processing apparatus |
| 08/13/2008 | CN100411095C Chamber for vacuum processing device and device having the chamber |
| 08/13/2008 | CN100410421C Duo-step plasma cleaning of chamber residues |
| 08/13/2008 | CN100410420C Low dielectric constant interlayer dielectric film and method of forming the same |
| 08/13/2008 | CN100409983C Preparation of diamond coat for integral rotary cutting tool made from hard metal alloy |
| 08/12/2008 | US7411773 Having a laminated structure formed by sequentially laminating a first insulation layer, an electrode layer, and a second insulation layer on a metal substrate; attraction performance over a long period while ensuring the good durability and heat resistance |
| 08/12/2008 | US7411254 Semiconductor substrate |
| 08/12/2008 | US7411161 Susceptor for deposition process equipment and method of fabricating a heater therein |
| 08/12/2008 | US7410923 SiC material, semiconductor device fabricating system and SiC material forming method |
| 08/12/2008 | US7410918 Systems and methods for forming metal oxides using alcohols |
| 08/12/2008 | US7410917 Atomic layer deposited Zr-Sn-Ti-O films using TiI4 |
| 08/12/2008 | US7410820 MEMS passivation with phosphonate surfactants |
| 08/12/2008 | US7410812 Manufacture of semiconductor device having insulation film of high dielectric constant |
| 08/12/2008 | US7410676 Chemical vapor deposition method |
| 08/12/2008 | US7410671 Sequential chemical vapor deposition |
| 08/12/2008 | US7410670 Process and apparatus for depositing single-component or multi-component layers and layer sequences using discontinuous injection of liquid and dissolved starting substances via a multi-channel injection unit |
| 08/12/2008 | US7410669 Process and apparatus for the coating or modification of surfaces |
| 08/12/2008 | US7410668 Introducing gas into a closed inner chamber within an outer chamber through a gas-distribution fixture;operating a pump to evacuate gas from the outer chamber through the gas-distribution fixture, changing relative position of the gas-distribution fixture and a substrate to form the closed inner chamber |
| 08/12/2008 | US7410666 Metal nitride carbide deposition by ALD |
| 08/12/2008 | US7410592 Stamp for use in a lithographic process, method of manufacturing a stamp, and method of manufacturing a patterned layer on a substrate |
| 08/12/2008 | US7410552 Electron cyclotron resonance equipment with variable flare angle of horn antenna |
| 08/12/2008 | US7410542 Variable environment, scale-able, roll to roll system and method for manufacturing thin film electronics on flexible substrates |
| 08/12/2008 | CA2280865C Aerosol method and apparatus, particulate products, and electronic devices made therefrom |
| 08/07/2008 | WO2008094494A1 Compositions and methods for forming and depositing metal films on semiconductor substrates using supercritical solvents |
| 08/07/2008 | WO2008094457A1 Composition and methods for forming metal films on semiconductor substrates using supercritical solvents |
| 08/07/2008 | WO2008094266A2 Drill-mounted paint roller cleaner |
| 08/07/2008 | WO2008094105A1 Coated cutting tool for medium- rough to rough turning of stainless steels and superalloys |
| 08/07/2008 | WO2008094104A1 Coated cutting tool for fine to medium-rough turning of stainless steels |
| 08/07/2008 | WO2008093787A1 Substrate treating apparatus and method of preventing particle adhesion |
| 08/07/2008 | WO2008093759A1 Method for producing group 3-5 compound semiconductor |
| 08/07/2008 | WO2008093389A1 Microwave plasma cvd system |
| 08/07/2008 | WO2008092485A1 Apparatus and process for coating plate-shaped or band-shaped metallic substrates |
| 08/07/2008 | WO2008066438A8 Wear resistant tool for wood chipping |
| 08/07/2008 | WO2008054949A3 Oxygen conditioning of plasma vessels |
| 08/07/2008 | WO2008052923A3 Method of densifying porous articles |
| 08/07/2008 | WO2008040695A3 Piston ring for internal combustion engines |
| 08/07/2008 | WO2007081653A3 Apparatus for an optimized plasma chamber grounded electrode assembly |
| 08/07/2008 | US20080188090 Internal balanced coil for inductively coupled high density plasma processing chamber |
| 08/07/2008 | US20080188013 In-situ dose monitoring using optical emission spectroscopy |
| 08/07/2008 | US20080187835 Non-aqueous electrolyte secondary battery, examination method and manufacturing method for negative electrode thereof, and examination apparatus and manufacturing apparatus for negative electrode thereof |
| 08/07/2008 | US20080187834 Active material containing metal with oxygen, carbon, nitrogen and current collector; irradiating with x-rays; testing by measuring angle of reflective light |
| 08/07/2008 | US20080187833 Secondary battery, method and device for testing the negatvie electrode, and method and device for producing negative electrode thereof |
| 08/07/2008 | US20080187781 Protective multilayer coating on magnetic recording media; corrosion resistant silicon oxynitride undercoating; diamond-like carbon overcoating |
| 08/07/2008 | US20080187778 Tungstn and cobalt carbide; controlling particle size; toughness; wear resistance; cutting edge |
| 08/07/2008 | US20080187767 Oxidation resistant coatings, processes for coating articles, and their coated articles |
| 08/07/2008 | US20080187732 Coating Composition, Its Coating Film, Antireflection Film, and Image Display Device |
| 08/07/2008 | US20080187683 Depositing particles in solvent onto substrate; freezing solution to form target; irradiating with light; vibration; vaporization; forming film |
| 08/07/2008 | US20080187682 Prevention of film deposition on pecvd process chamber wall |
| 08/07/2008 | US20080187681 Method For Transferring a Functional Organic Molecule Onto a Transparent Substrate |
| 08/07/2008 | US20080187678 Vapor deposition of tripropylene glycol, diacrylate; polymerization; curing with radiation; protective coatings |
| 08/07/2008 | US20080187663 Supplying vapors under reduced pressure with monomer; separate vapor streams; forming homogeneous film on substrate surface |
| 08/07/2008 | US20080187662 Metal alkoxide compound, material for forming thin film,and method for producing thin film |
| 08/07/2008 | US20080187661 Diamond particles contain in metal matrix composite; diffusion bonding through interface of silicon carbide; high speed solidification under pressure |
| 08/07/2008 | US20080187660 Method and device for the localized application of parting means |
| 08/07/2008 | US20080187659 Methods for preparing thermal barrier coatings with high fracture toughness inner layer for improved impact resistance |
| 08/07/2008 | US20080187652 Rapid heat up and cool down; productivity; semiconductor wafers |
| 08/07/2008 | US20080185577 Diimide-based semiconductor materials and methods of preparing and using the same |
| 08/07/2008 | US20080185284 Internal balanced coil for inductively coupled high density plasma processing chamber |
| 08/07/2008 | US20080184934 Plasma reactor for the treatment of large size substrates |
| 08/07/2008 | US20080184933 Process chamber, inline coating installation and method for treating a substrate |
| 08/07/2008 | DE102007006624A1 Electrical conductor for heating has carrier structure of bonded fiber and carbon material adhering to it as conductor |
| 08/07/2008 | DE102007005389A1 Wärmeübertrager Heat exchanger |
| 08/06/2008 | EP1953831A2 Stacked photoelectric conversion device and method of producing the same |
| 08/06/2008 | EP1953809A2 Method for depositing metal films by CVD on diffusion barrier layers |
| 08/06/2008 | EP1953808A1 Method for producing epitaxial wafer and epitaxial wafer |
| 08/06/2008 | EP1953794A1 Vacuum processing chamber for very large area substrates |
| 08/06/2008 | EP1953271A1 Diamond electrode, method for producing same, and electrolytic cell |
| 08/06/2008 | EP1953268A1 Thermal barrier coatings with low thermal conductivity comprising lanthanide sesquioxides |
| 08/06/2008 | EP1953267A1 Thermal barrier coatings with low thermal conductivity comprising lanthanide sesquioxides |
| 08/06/2008 | EP1953260A1 Surface-coated member, method for manufacture thereof, and cutting tool |
| 08/06/2008 | EP1953259A1 Process chamber, inline coating installation and method for treating a substrate |
| 08/06/2008 | EP1951931A1 Method for depositing layers in a cvd reactor and gas inlet element for a cvd reactor |
| 08/06/2008 | EP1951930A2 Improved bubbler for the transportation of substances by a carrier gas |
| 08/06/2008 | EP1951929A1 Composition for chemical vapor deposition film-formation and method for production of low dielectric constant film |
| 08/06/2008 | EP1951422A2 Plasma abatement device |
| 08/06/2008 | EP1601813B1 Method for depositing silicon |
| 08/06/2008 | EP1497476B1 Process of masking cooling holes of a gas turbine component |
| 08/06/2008 | EP1475823B1 Heat treatment device and heat treatment method |
| 08/06/2008 | CN101238550A Method for forming w-based film, method for forming gate electrode, and method for manufacturing semiconductor device |
| 08/06/2008 | CN101238238A Remote cavity method of using sulfur fluoride from CVD/PECVD cavity for removing surface deposits |
| 08/06/2008 | CN101238095A Metal-containing compound, method for producing the compound, metal-containing thin film and method for forming the thin film |
| 08/06/2008 | CN101237040A A Se indium copper anode material for lithium ion battery and its making method |
| 08/06/2008 | CN101237039A Method for synthesizing LiFePO4/C material based on chemical gas phase sediment auxiliary solid phase method |