| Patents for C23C 16 - Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition (cvd) processes (71,892) |
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| 08/21/2008 | DE10046021B4 Verfahren zur Herstellung von Kondensatoren auf Halbleitersubstraten in einer Einrichtung zur Bildung von Dünnfilmen Process for the preparation of capacitors on semiconductor substrates in a device for the formation of thin films |
| 08/20/2008 | EP1959480A1 Plasma processing apparatus and plasma processing method |
| 08/20/2008 | EP1957722A1 Method for preventing metal leaching from copper and its alloys |
| 08/20/2008 | EP1957690A1 Deposition process |
| 08/20/2008 | EP1957689A2 High crystalline quality synthetic diamond |
| 08/20/2008 | EP1957688A2 Small volume symmetric flow single wafer ald apparatus |
| 08/20/2008 | EP1957429A1 Coated hard metal member |
| 08/20/2008 | EP1828432B1 Method for protecting parts made of creep-resistant steel from corroding |
| 08/20/2008 | EP1567531A4 Composition and method for low temperature deposition of silicon-containing films such as films including silicon, silicon nitride, silicon dioxide and/or silicon-oxynitride |
| 08/20/2008 | EP1225794B1 Matching device and plasma processing apparatus |
| 08/20/2008 | EP1155437B1 Cooled showerhead for rapid thermal processing (rtp) system |
| 08/20/2008 | CN201102987Y Hot-wire hanging device with constant tension force |
| 08/20/2008 | CN201102986Y Digital crucible controller |
| 08/20/2008 | CN201102981Y Crucible transmission device |
| 08/20/2008 | CN101248221A Process for producing semiconductor substrate |
| 08/20/2008 | CN101248212A Plasma treatment of hafnium-containing materials |
| 08/20/2008 | CN101248211A Apparatus for plasma-enhanced chemical vapor deposition (PECVD) of an internal barrier layer inside a container, said apparatus including a gas line isolated by a solenoid valve |
| 08/20/2008 | CN101248210A High colour diamond layer |
| 08/20/2008 | CN101248209A Method of deposting germanium films |
| 08/20/2008 | CN101248118A Glazing system for vehicle tops and windows |
| 08/20/2008 | CN101247900A Systems and methods for capture substrates |
| 08/20/2008 | CN101246963A Carbon nano tube electrode formed by directly growing carbon nano tube on surface of carbon paper and supporting platinum-based nano catalyst on carbon nano tube using CVD method and manufacturing met |
| 08/20/2008 | CN101246932A Production of silicon hydride thin film by hydrogen argon high dilution method |
| 08/20/2008 | CN101246836A Substrate carrying platform and process method for its surface |
| 08/20/2008 | CN101246835A Substrate support assembly |
| 08/20/2008 | CN101245450A Method for film coating in enormous quantities with movable plasma case single-chamber |
| 08/20/2008 | CN101245449A Plasma case for thin film production in enormous quantities |
| 08/20/2008 | CN101245448A Method for manufacturing thin membrane silicon electrooptical device with single-chamber plasma case |
| 08/20/2008 | CN101245447A Plasma deposition method of nanocrystalline silicon |
| 08/20/2008 | CN101245446A Method for improving homogeneity of large area film coating |
| 08/20/2008 | CN101245445A Solid source container with inlet plenum |
| 08/20/2008 | CN101245444A Method for manufacturing carbon silicon nitride film |
| 08/20/2008 | CN100413382C Plasma generation device, plasma control method, and substrate manufacturing method |
| 08/20/2008 | CN100413036C Silicon nitride film producing method and apparatus for producing silicon nitride film |
| 08/20/2008 | CN100412231C Hot wire for diamond film growth device and electrode structure thereof |
| 08/20/2008 | CN100412230C Multistation coating device and method for plasma coating |
| 08/20/2008 | CN100412229C Method for preparing anti-high temperature oxidation mixed coating by electrophoretic codeposition |
| 08/20/2008 | CN100411980C Method for controlling growth density of carbon nanometer tube |
| 08/19/2008 | US7414823 Holder for use in semiconductor or liquid-crystal manufacturing device and semiconductor or liquid-crystal manufacturing device in which the holder is installed |
| 08/19/2008 | US7413982 Process for atomic layer deposition |
| 08/19/2008 | US7413914 Method and apparatus for manufacturing semiconductor device, method and apparatus for controlling the same, and method and apparatus for simulating manufacturing process of semiconductor device |
| 08/19/2008 | US7413776 Method of depositing a metal-containing film |
| 08/19/2008 | US7413775 Chemical- or plasma enhanced vapor deposition of organosilanoxy compound such as tert-butyltrimethoxysilane; semiconductors, dielectrics |
| 08/19/2008 | US7413774 Method for controlled application of reactive vapors to produce thin films and coatings |
| 08/19/2008 | US7413767 Gas supply method in a CVD coating system for precursors with a low vapor pressure |
| 08/19/2008 | US7413639 Energy and media connection for a coating installation comprising several chambers |
| 08/19/2008 | US7413628 Substrate treatment method and substrate treatment apparatus |
| 08/19/2008 | US7413627 Deposition chamber and method for depositing low dielectric constant films |
| 08/19/2008 | US7413612 In situ substrate holder leveling method and apparatus |
| 08/19/2008 | US7413611 Gas reaction system and semiconductor processing apparatus |
| 08/19/2008 | US7413610 Method and apparatus for coating or heat treatment of blisks for aircraft gas turbines |
| 08/19/2008 | US7413280 Detection method of interval of recorded positions |
| 08/14/2008 | WO2008096884A1 N-type conductive aluminum nitride semiconductor crystal and method for producing the same |
| 08/14/2008 | WO2008096717A1 Placing bed structure, treating apparatus using the structure, and method for using the apparatus |
| 08/14/2008 | WO2008096617A1 Transparent gas barrier film and method for producing transparent gas barrier film |
| 08/14/2008 | WO2008096616A1 Transparent gas barrier film and method for producing the same |
| 08/14/2008 | WO2008096615A1 Transparent gas barrier film and method for producing the same |
| 08/14/2008 | WO2008096510A1 Continuous film-forming apparatus |
| 08/14/2008 | WO2008095920A1 A hydrogenated amorphous carbon coating |
| 08/14/2008 | WO2008095873A1 Heat reservoir and method for processing a substrate coupled to a heat reservoir |
| 08/14/2008 | WO2008034092A8 System and method for detecting non-cathode arcing in a plasma generation apparatus |
| 08/14/2008 | WO2007145647A3 Apparatus and method for making fullerene nanotube forests, films, threads and composite structures |
| 08/14/2008 | US20080194088 Strontium precursor beta -diketonate, beta -diketiminate, amidinate, cyclopentadienyl, diorganoamide, carboxylate and/or alkoxide; and titanium precursor compound are reacted in a plurality of cycles to form strontium titanate; low strontium carbonate content; atomic layer deposition; high dielectrics |
| 08/14/2008 | US20080193745 Ultra-Hydrophilic and Antibacterial Thin Film Coated Metal Product, and it's Manufacturing Method |
| 08/14/2008 | US20080193721 Methods for Structuring Substrate Surfaces |
| 08/14/2008 | US20080193663 Turbine engine substrate; nickel superalloy substrate overcoated with refractory metal silicide |
| 08/14/2008 | US20080193646 Enclosure; horizonal confining tsupport able; gas passageways; rotating wheel with blades; dsicharging passageways |
| 08/14/2008 | US20080193645 Vaporizer and various devices using the same and an associated vaporizing method |
| 08/14/2008 | US20080193644 Heating Device Coating Plant and Method for Evaporation or Sublimation of Coating Materials |
| 08/14/2008 | US20080193643 Depositing thin film; partition dividing enclosure; rotating substrate; injector; inert gas environment |
| 08/14/2008 | US20080193642 Method for room temperature chemical vapor deposition on flexible polymer substrates |
| 08/14/2008 | US20080193636 Vaporizing Device and Method for Vaporizing Coating Material |
| 08/14/2008 | US20080193329 intensive and chemically active non-thermal plasma created immediately at surface of material treated; no limit on thickness of treated material; plasma can be created by use of different power supplies, such as AC, DC or pulsed periodical high-voltage generators |
| 08/14/2008 | US20080191606 Transparent conductive nano-composites |
| 08/14/2008 | US20080191153 System For Delivery Of Reagents From Solid Sources Thereof |
| 08/14/2008 | US20080190560 Microwave Plasma Processing Apparatus |
| 08/14/2008 | US20080190556 Methods of and apparatus for aligning electrodes in a process chamber to protect an exclusion area within an edge environ of a wafer |
| 08/14/2008 | US20080190364 Substrate support assembly |
| 08/14/2008 | DE112006002505T5 Verfahren zur Herstellung eines Halbleiters eines Nitrids der Gruppe 3-5 und Verfahren zur Herstellung einer lichtemittierenden Vorrichtung A process for the production of a semiconductor of a nitride of the Group 3-5 and method of manufacturing a light emitting device |
| 08/14/2008 | DE10355683B4 Vakuumschleusenanordnung, Verfahren zum Transportieren eines Objekts mit der Vakuumschleusenanordnung und Verwendung der Vakuumschleusenanordnung zum Beschichten und Reinigen von Objekten The vacuum lock arrangement, method for transporting an object with the vacuum lock arrangement and use of the vacuum lock arrangement for coating and cleaning objects |
| 08/14/2008 | DE10355679B4 Substratträger, Vorrichtung und Verfahren zum Handhaben des Substratträgers und Verwendung in Beschichtungsprozessen Substrate carrier, apparatus and method for handling the substrate support and use in coating processes |
| 08/14/2008 | DE102004034448B4 Verfahren zum Messen einer Schichtdicke einer Schicht auf einem Siliziumsubstrat und Satz von mindestens zwei Halbleiterprodukten Method for measuring a layer thickness of a layer on a silicon substrate, and set of at least two semiconductor products |
| 08/13/2008 | EP1956645A1 Shower plate and plasma treatment apparatus using shower plate |
| 08/13/2008 | EP1956442A1 Intermediate transfer member, process for producing the same and image forming apparatus |
| 08/13/2008 | EP1956113A1 Plasma-enhanced ALD of tantalum nitride films |
| 08/13/2008 | EP1956112A2 System and method for reducing particles in epitaxial reactors |
| 08/13/2008 | EP1954853A1 Cvd reactor with a gas inlet member |
| 08/13/2008 | EP1954852A1 Cvd reactor with replaceable process chamber cover |
| 08/13/2008 | EP1954851A1 Gas feed installation for machines depositing a barrier layer on containers |
| 08/13/2008 | EP1954850A2 Nanoparticle and nanocomposite films |
| 08/13/2008 | EP1954749A1 A method of producing a gas barrier polymer foil and a gas barrier polymer foil |
| 08/13/2008 | EP1954704A2 Organometallic compounds and methods of use thereof |
| 08/13/2008 | EP1661169A4 Method for depositing thin film on wafer |
| 08/13/2008 | EP1639150A4 Apparatus and method for controlled application of reactive vapors to produce thin films and coatings |
| 08/13/2008 | EP1601887B1 One piece shim |
| 08/13/2008 | EP1507625A4 Thermal flux processing by scanning electromagnetic radiation |
| 08/13/2008 | EP1387898A4 Substituted cycloalkene new copper precursors for chemical vapor deposition of copper metal thin films |
| 08/13/2008 | CN201099698Y Ternary airflow metallorganic chemical vapour deposition equipment reaction cavity |
| 08/13/2008 | CN101243733A Plasma processing apparatus |
| 08/13/2008 | CN101243544A Semiconductor substrate process using a low temperature-deposited carbon-containing hard mask |