| Patents for C23C 16 - Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition (cvd) processes (71,892) |
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| 08/06/2008 | CN101237027A Substrate carrier enclosure |
| 08/06/2008 | CN101237006A Method of forming microcrystalline silicon film |
| 08/06/2008 | CN101236892A Ion beam apparatus having plasma sheath controller |
| 08/06/2008 | CN101236888A Vaccuum processing apparatus |
| 08/06/2008 | CN101236747A Magnetic recording head and media comprising aluminum oxynitride underlayer and a diamond-like carbon overcoat |
| 08/06/2008 | CN101235493A Real time measuring weight increase speed controlling chemical gas-phase deposition device and method |
| 08/06/2008 | CN101235492A Chemical annealing method for making amorphous silicon battery more stable |
| 08/06/2008 | CN101235491A Pulsed plasma film coating method |
| 08/06/2008 | CN101235490A Method for treating amorphous silicon thin film |
| 08/06/2008 | CN101235489A Thin film sedimentation method caused by three electrodes etching |
| 08/06/2008 | CN101235488A Technique for forming thin film on substrate equipped outside radio frequency plasma |
| 08/06/2008 | CN101235487A Material gas supply device |
| 08/06/2008 | CN101235486A Container for packaging solid high-purity metal organic compound and application thereof |
| 08/06/2008 | CN101235485A Method for preparing nano diamond thin film window |
| 08/06/2008 | CN101234778A Phosphorus doping method for growing ZnO quanta dots |
| 08/06/2008 | CN101234543A Improved alumina coating grade |
| 08/06/2008 | CN100409415C Method for using alpha polycrystal silicon in integrated circuit |
| 08/06/2008 | CN100409402C System and method of fast ambient switching for rapid thermal processing |
| 08/06/2008 | CN100408721C Heat exchanger surface treatment equipment |
| 08/05/2008 | US7408225 Apparatus and method for forming thin film using upstream and downstream exhaust mechanisms |
| 08/05/2008 | US7408186 Controlled alignment catalytically grown nanostructures |
| 08/05/2008 | US7408131 Wafer holder and semiconductor manufacturing apparatus |
| 08/05/2008 | US7407893 Liquid precursors for the CVD deposition of amorphous carbon films |
| 08/05/2008 | US7407865 Epitaxial growth method |
| 08/05/2008 | US7407254 Droplet discharge inspection apparatus and method |
| 08/05/2008 | US7406940 Piston for internal combustion engine |
| 08/05/2008 | US7406925 Plasma processing method and apparatus |
| 08/05/2008 | CA2312790C Growth of very uniform silicon carbide epitaxial layers |
| 07/31/2008 | WO2008091504A1 Process for atomic layer deposition |
| 07/31/2008 | WO2008090951A1 Ceiling member, and plasma-treating apparatus using the ceiling member |
| 07/31/2008 | WO2008090512A1 Electronic field effect devices and methods for their manufacture |
| 07/31/2008 | WO2008090510A1 High uniformity boron doped diamond material |
| 07/31/2008 | WO2008070631A3 Method and apparatus for preventing the formation of a plasma inhibiting substance |
| 07/31/2008 | WO2008055017A3 Controlled composition using plasma-enhanced atomic layer deposition |
| 07/31/2008 | WO2008040694A3 Piston ring for internal combustion engines |
| 07/31/2008 | WO2008021654A3 Exhaust assembly for a plasma processing system and method |
| 07/31/2008 | WO2008010941A3 Improved methods for atomic layer deposition |
| 07/31/2008 | WO2007111781A3 Method of light enhanced atomic layer deposition |
| 07/31/2008 | US20080182112 Metal-coated polyimide film |
| 07/31/2008 | US20080182101 Barrier films for plastic substrates fabricated by atomic layer deposition |
| 07/31/2008 | US20080182037 Method of forming metal layer |
| 07/31/2008 | US20080182027 Celivering gaseous hydrocarbon and oxygen to a catalyst distributed on the surface of the substrate, using a catalytic chemical vapor deposition process, selectively heating the catalyst by causing an exothermic oxidation reaction on the surface of the catalyst forming carbon nanotubes |
| 07/31/2008 | US20080182023 Liquid phase reagent dispenser; housing with internal vessel compartment, sidewall, topwall, metal seal aligned and in contact with the top wall, inert gas feed inlet, liquid phase reagent outlet opening |
| 07/31/2008 | US20080182022 Production of an Inert Blanket in a Furnace |
| 07/31/2008 | US20080182021 Continuous ultra-thin copper film formed using a low thermal budget |
| 07/31/2008 | US20080182010 easy to clean because of the removable top wall member, maintains purity of the liquid precursor chemical, increases usage rate of the liquid or solid precursor chemical and thereby reduces waste; ampoules |
| 07/31/2008 | US20080182009 carrier enclosure has a carrier support; a displaceable cover; spacers between the support and cover; a gas inlet; and a removable lid; for depositing an air-sensitive material onto a substrate; for deposition of heteroaromatic ring containing iridium complex |
| 07/31/2008 | US20080182008 Apparatus and method for coating and inspecting objects |
| 07/31/2008 | US20080181277 Semiconductor laser and method for producing the same |
| 07/31/2008 | US20080180357 Plasma processing apparatus |
| 07/31/2008 | US20080179767 Apparatus and method for delivering vapor phase reagent to a deposition chamber |
| 07/31/2008 | US20080179741 Increasing reliability of copper-based metallization structures in a microstructure device by using aluminum nitride |
| 07/31/2008 | US20080179585 Substrate; a metal plug on the substrate and a phase change material film on the metal plug, a heating electrode on the phase change material film, wherein the heating electrode is electrically connected to the phase change material film; conductive layer on the heating electrode |
| 07/31/2008 | US20080179430 Coatings for use in fuel injector components |
| 07/31/2008 | US20080179011 Plasma reactor with wide process window employing plural vhf sources |
| 07/31/2008 | US20080179006 Substrate processing apparatus |
| 07/31/2008 | US20080179005 Plasma processing apparatus and control method thereof |
| 07/31/2008 | US20080178810 Gas introducing mechanism and processing apparatus for processing object to be processed |
| 07/31/2008 | US20080178809 Diptube apparatus and method for delivering vapor phase reagent to a deposition chamber |
| 07/31/2008 | US20080178808 Photovoltaic device forming a glazing |
| 07/31/2008 | US20080178807 Gas distribution uniformity improvement by baffle plate with multi-size holes for large size pecvd systems |
| 07/31/2008 | US20080178806 Plasma Source For Uniform Plasma Distribution in Plasma Chamber |
| 07/31/2008 | US20080178805 Mid-chamber gas distribution plate, tuned plasma flow control grid and electrode |
| 07/31/2008 | US20080178804 Apparatus for Manufacturing Magnetic Recording Disk, and In-Line Type Substrate Processing Apparatus |
| 07/31/2008 | US20080178796 Film forming apparatus |
| 07/31/2008 | DE19981147B4 Substrathalteanordnung zum Stützen eines Substrats in einer Substratverarbeitungsumgebung Substrate support assembly for supporting a substrate in a substrate processing environment |
| 07/30/2008 | EP1949406A1 Down-stream plasma etching with deflectable plasma beam |
| 07/30/2008 | EP1948846A1 Method for monitoring a plasma, device for carrying out this method, use of this method for depositing a film onto a pet hollow body |
| 07/30/2008 | EP1948845A1 Cvd reactor with slidingly mounted susceptor holder |
| 07/30/2008 | EP1948844A1 Arrangement in connection with ald reactor |
| 07/30/2008 | EP1948843A1 Ald reactor |
| 07/30/2008 | EP1948842A1 Metal carbonitride layer and method for the production of a metal carbonitride layer |
| 07/30/2008 | EP1948841A1 Cyclopentadienyl type hafnium and zirconium precursors and use thereof in atomic layer deposition |
| 07/30/2008 | EP1508630B1 Device for manufacturing dlc film-coated plastic container |
| 07/30/2008 | EP1422743B1 Treatment system |
| 07/30/2008 | EP1392478B1 Ultrasonic cutting tool coated by diamond cvd |
| 07/30/2008 | EP1273058B1 Method for producing a thin-film battery having an ultra-thin electrolyte |
| 07/30/2008 | EP0663963B2 Improvements in the method and apparatus of vacuum deposition |
| 07/30/2008 | CN101233792A Plasma generator and film forming method employing same |
| 07/30/2008 | CN101233621A Method for passivating a substrate surface |
| 07/30/2008 | CN101233602A Method for forming film of group iii nitride such as gallium nitride |
| 07/30/2008 | CN101233598A Plasma amplifier for plasma treatment plant |
| 07/30/2008 | CN101233262A Methods for making high-temperature coatings having Pt metal modified gamma-Ni + gamma'-Ni3Al alloy compositions and a reactive element |
| 07/30/2008 | CN101233260A Pressure control system in a photovoltaic substrate deposition |
| 07/30/2008 | CN101231952A Method for forming SrTiO3 film |
| 07/30/2008 | CN101231352A HfON/BP antireflecting protective film for infrared optical window and manufacture method thereof |
| 07/30/2008 | CN101230454A Method for preparing cubic boron nitride thin film |
| 07/30/2008 | CN101230453A Preparation of ultra-fine diamond coating adapted for cutting tools |
| 07/30/2008 | CN101230452A Thin film deposition method and thin film deposition system |
| 07/30/2008 | CN101230451A High temperature fine grain aluminum heater |
| 07/30/2008 | CN101230447A DLC film-plating process for cutting tools |
| 07/30/2008 | CN100407380C 等离子体处理设备以及设计等离子体处理设备的方法 The method of plasma processing apparatus and plasma processing apparatus designed |
| 07/30/2008 | CN100407373C 流体控制装置和热处理装置 Fluid control means and the heat treatment apparatus |
| 07/30/2008 | CN100406596C Vapour deposition in situ reaction method for preparing carbon nanotube reinforced aluminium matrix composite material |
| 07/29/2008 | US7405880 Multilayer optical filter |
| 07/29/2008 | US7405521 Multiple frequency plasma processor method and apparatus |
| 07/29/2008 | US7405454 Electronic apparatus with deposited dielectric layers |
| 07/29/2008 | US7405453 Incorporation of nitrogen into high k dielectric film |
| 07/29/2008 | US7405422 Epitaxial and polycrystalline growth of Si1-x-yGexCy and Si1-yCy alloy layers on Si by UHV-CVD |
| 07/29/2008 | US7404991 Device and control method for micro wave plasma processing |