| Patents for C23C 16 - Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition (cvd) processes (71,892) |
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| 09/02/2008 | CA2348397C Method of forming diamond film and film-forming apparatus |
| 08/28/2008 | WO2008103785A1 Manufacture of silica aerogel via vapor phase reaction |
| 08/28/2008 | WO2008103186A1 Methods and devices for coating an interior surface of a plastic container |
| 08/28/2008 | WO2008102868A1 Method for manufacturing roll-shaped resin film having a transparent conductive film and organic electroluminescence element manufactured by the method |
| 08/28/2008 | WO2008102320A2 Methods for forming a ruthenium-based film on a substrate |
| 08/28/2008 | WO2008101982A1 Device and method for selectively depositing crystalline layers using mocvd or hvpe |
| 08/28/2008 | WO2008101786A1 Method for producing a protective layer on the surface of an electronic sensor element, and an electronic sensor element having a protective layer |
| 08/28/2008 | WO2008101704A2 Plasma-deposited electrically insulating, diffusion-resistant and elastic layer system |
| 08/28/2008 | WO2008101474A1 Coating for gas turbine components, and method and device for providing a coating |
| 08/28/2008 | WO2008079741A3 Method and system for controlling a vapor delivery system |
| 08/28/2008 | WO2007117503A3 Preparing nanoparticles and carbon nanotubes |
| 08/28/2008 | US20080206970 Production Of Polycrystalline Silicon |
| 08/28/2008 | US20080206909 Composition of carbon nitride, thin film transistor with the composition of carbon nitride, display device with the thin film transistor, and manufacturing method thereof |
| 08/28/2008 | US20080206555 Metallic nanostructures |
| 08/28/2008 | US20080206552 Molybdenum or Tungsten Particles, Thin Film Formed from said Particles, and Process for Producing the Same |
| 08/28/2008 | US20080206539 Durable conformal wear-resistant carbon-doped metal oxide-comprising coating |
| 08/28/2008 | US20080206484 Graphitized Carbon Coatings for Composite Electrodes |
| 08/28/2008 | US20080206477 Processing unit equipped with an electromagnetic wave generator for activating the plasma from a precursor gas, gas inlet, injector, solenoid valve in the feed duct between the precursor gas outlet and the injector, pressure regulator flow meter |
| 08/28/2008 | US20080206464 Process chamber of a reactor housing; an area for the attack of a handling device and a bearing area upon which the substrate rests, transparent to a wavelength of light used in an optical treatment process; and a light source |
| 08/28/2008 | US20080206463 Carbon-containing gas (methane) is contacted with a porous membrane and decomposed in the presence of alumina-iron and alumina-molybdenum catalyst |
| 08/28/2008 | US20080206462 Batch deposition system using a supercritical deposition process |
| 08/28/2008 | US20080206445 Condensing a vapor phase mixture of organometallic desirable and undesirable components, controlling the temperature using a heat-transfer gas |
| 08/28/2008 | US20080206121 An alloy film having a formula of (AIN)x(SiC)(1-x) or SixGe(1-x)C, where 0<x<1 is formed directly on a substrate with no intermediate buffer layer which results in a better lattice, less defects, stress/strain relieving and noncracking; alloying; vapor deposition; crystallization; photoluminescense |
| 08/28/2008 | US20080204695 EUV Lithography System and Chuck for Releasing Reticle in a Vacuum Isolated Environment |
| 08/28/2008 | US20080202918 Phase Plate For Phase-Contrast Electron Microscope, Method For Manufacturing the Same and Phase-Contrast Electron Microscope |
| 08/28/2008 | US20080202689 Plasma processing apparatus |
| 08/28/2008 | US20080202688 Silicon Carbide Gas Distribution Plate and RF Electrode for Plasma Etch Chamber |
| 08/28/2008 | US20080202582 Process for Producing Monocrystal Thin Film and Monocrystal Thin Film Device |
| 08/28/2008 | US20080202426 Ampule tray for and method of precursor surface area |
| 08/28/2008 | US20080202425 Temperature controlled lid assembly for tungsten nitride deposition |
| 08/28/2008 | US20080202424 Device For Introducing Reaction Gases Into A Reaction Chamber And Epitaxial Reactor Which Uses Said Device |
| 08/28/2008 | US20080202423 Vacuum film-forming apparatus |
| 08/28/2008 | US20080202422 Plasma gun |
| 08/28/2008 | US20080202421 Mask and substrate alignment for solder bump process |
| 08/28/2008 | US20080202420 Semiconductor substrate processing apparatus with horizontally clustered vertical stacks |
| 08/28/2008 | US20080202418 Entry lock system, web processing installation, and method for using the same |
| 08/28/2008 | US20080202416 High temperature ALD inlet manifold |
| 08/28/2008 | US20080202385 reacting TiCl4 vapor, oxygen and aluminum chloride in a plug flow reactor to form TiO2 particles; covering the particles with a uniform layer of amorphous Al2O3 and SiO2 by introducing SiCl4 downstream of the first reaction; the SiCl4 does not influence crystal phase or pigment carbon black undertone |
| 08/28/2008 | DE102007009615A1 Vacuum coating apparatus for front surface of strip material has two process chambers containing process roller, connected by transfer chamber containing strip feed and strip winding rollers, rear surface of strip contacting all rollers |
| 08/28/2008 | DE102007009145A1 Vorrichtung zum Abscheiden kristalliner Schichten wahlweise mittels MOCVD oder HVPE Apparatus for depositing crystalline layers either by MOCVD or HVPE |
| 08/28/2008 | CA2677941A1 Coating for gas turbine components, and method and device for providing a coating |
| 08/27/2008 | EP1961838A1 Method and apparatus for comtrolling gas flow to a processing chamber |
| 08/27/2008 | EP1961837A1 Apparatus for controlling gas flow to a processing chamber |
| 08/27/2008 | EP1961836A1 Apparatus for controlling gas flow to a processing chamber |
| 08/27/2008 | EP1961835A1 Device for the modification of the surface-activity of in particular medical instruments |
| 08/27/2008 | EP1961833A1 Thermal barrier coating systems and materials |
| 08/27/2008 | EP1961755A1 Strontium silylamides, adducts thereof with Lewis bases, preparation thereof and deposition of strontium thin films |
| 08/27/2008 | EP1960566A2 High-throughput deposition system for oxide thin film growth by reactive coevaportation |
| 08/27/2008 | EP1810001A4 An apparatus for and method of sampling and collecting powders flowing in a gas stream |
| 08/27/2008 | EP1743043A4 High throughput discovery of materials through vapor phase synthesis |
| 08/27/2008 | EP1394842B1 Thin film forming apparatus cleaning method |
| 08/27/2008 | CN101253603A Method of film formation and computer-readable storage medium |
| 08/27/2008 | CN101253283A Sensor for pulsed deposition monitoring and control |
| 08/27/2008 | CN101253282A Film-forming method and film-forming apparatus |
| 08/27/2008 | CN101253101A Synthetic resin container with high barrier capability |
| 08/27/2008 | CN101253004A Coated articles |
| 08/27/2008 | CN101252186A Chromium phosphide cathode material for lithium ion battery and manufacturing method thereof |
| 08/27/2008 | CN101252087A SiCN film formation method and apparatus |
| 08/27/2008 | CN101250692A Atmosphere opening method for treatment container and storage medium |
| 08/27/2008 | CN101250691A Precursor solution collocation method for controlling MOCVD deposition PZT |
| 08/27/2008 | CN101250690A Method of purifying organosilicon compositions used as precursors in chemical vapor deposition |
| 08/27/2008 | CN101250689A Automatically tablet-loading trolleys by electromagnetic vapour deposition method |
| 08/27/2008 | CN100414674C Gas reaction system and semiconductor processing apparatus |
| 08/27/2008 | CN100413800C Self-cleaning glass of nanometer composite membrane with multifunctional two-photon |
| 08/26/2008 | US7416979 Deposition methods for barrier and tungsten materials |
| 08/26/2008 | US7416936 Capacitor with hafnium oxide and aluminum oxide alloyed dielectric layer and method for fabricating the same |
| 08/26/2008 | US7416635 Gas supply member and plasma processing apparatus |
| 08/26/2008 | US7416583 Appliance having a container including a nanostructured material for hydrogen storage |
| 08/26/2008 | US7416019 Thermal interface and switch using carbon nanotube arrays |
| 08/26/2008 | US7415940 Plasma processor |
| 08/21/2008 | WO2008100963A1 Fabrication of composite materials using atomic layer deposition |
| 08/21/2008 | WO2008100846A2 Atomic layer deposition systems and methods |
| 08/21/2008 | WO2008100691A2 Vapor deposition methods for forming a metal- containing layer on a substrate |
| 08/21/2008 | WO2008100633A1 Precursor selection method for chemical vapor deposition techniques |
| 08/21/2008 | WO2008100616A2 Atomic layer deposition of strontium oxide via n-propyltetramethyl cyclopentadienyl precursor |
| 08/21/2008 | WO2008099896A1 Induction coil, plasma generating apparatus and plasma generating method |
| 08/21/2008 | WO2008099811A1 Material for forming silicon-containing film, and silicon-containing insulating film and method for forming the same |
| 08/21/2008 | WO2008099630A1 Continuous film forming apparatus |
| 08/21/2008 | WO2008099220A2 Methods and apparatus for forming diamond-like coatings |
| 08/21/2008 | WO2008099061A1 New method for manufacturing optical products |
| 08/21/2008 | WO2008098963A2 Method of forming an oxide thin film |
| 08/21/2008 | WO2008002369A3 System and method for deposition of a material on a substrate |
| 08/21/2008 | WO2007131053B1 Batch processing chamber with diffuser plate and injector assembly |
| 08/21/2008 | WO2007102925A3 Methods and arrangement for a highly efficient gas distribution arrangement |
| 08/21/2008 | US20080200038 Heat processing method and apparatus for semiconductor process |
| 08/21/2008 | US20080199780 Electrochemical element, method for manufacturing electrode thereof, and lithiation treatment method and lithiation treatment apparatus |
| 08/21/2008 | US20080199657 Superhydrophilic or superhydrophobic product, process for producing it and use of this product |
| 08/21/2008 | US20080199614 Multistage process; controlling temperature |
| 08/21/2008 | US20080199613 Exposure a substrate to precursor; deposits on substrate; exhaustion; vacuum pump; cyclic process; reacting titanium chloride with ammonia forming titanium nitride |
| 08/21/2008 | US20080199612 Intermittent exposure of atomic hydrogen to target; high temperature process; controlling times; cooling |
| 08/21/2008 | US20080199611 Fabric with a moistureproof, dustproof, and antibacterial function |
| 08/21/2008 | US20080199610 Substrate processing apparatus, and substrate processing method |
| 08/21/2008 | US20080199609 Apparatus and method for compensating uniformity of film thickness |
| 08/21/2008 | US20080198198 Passivation of Printhead Assemblies and Components Therefor |
| 08/21/2008 | US20080196985 Wear resistant coating for brake disks with unique surface appearance and methods for coating |
| 08/21/2008 | US20080196744 In-chamber member, a cleaning method therefor and a plasma processing apparatus |
| 08/21/2008 | US20080196667 Evaporation device for evaporating vapor deposition materials |
| 08/21/2008 | US20080196666 Shower head and cvd apparatus using the same |
| 08/21/2008 | DE102008007588A1 Barrier layer creating process for microstructured component involves preparing component in plasma reactor, plasma treatment, and supplying precursor and carrier gas |
| 08/21/2008 | DE102007008278A1 Beschichtung für Gasturbinenbauteile sowie Verfahren und Vorrichtung zur Bereitstellung einer Beschichtung Coating for gas turbine components as well as method and apparatus for providing a coating |