Patents for C23C 16 - Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition (cvd) processes (71,892)
09/2008
09/18/2008US20080226271 Evaporation crucible and evaporation apparatus with adapted evaporation characteristic
09/18/2008US20080225076 Method of fabricating printhead having hydrophobic ink ejection face
09/18/2008US20080223725 Process chamber component having electroplated yttrium containing coating
09/18/2008US20080223524 Semiconductor producing device and semiconductor device producing method
09/18/2008US20080223297 Method and apparatus of forming alignment film
09/18/2008DE112006002151T5 Plasmabearbeitungsgerät Plasma processing device
09/17/2008EP1970468A1 Coating assembly and gas piping system
09/17/2008EP1970358A1 Chemical vapor deposited silicon carbide articles
09/17/2008EP1970194A1 Moistureproof cellulose ester film, polarizer-protective film, and polarizer
09/17/2008EP1969156A1 Method for coating a blade and blade of a gas turbine
09/17/2008EP1969154A1 Apparatus and method for the deposition of ruthenium containing films
09/17/2008EP1969153A2 Uniform surfaces for hybrid material substrates and methods for making and using same
09/17/2008EP1899496A4 Hydrophilic dlc on substrate with barrier discharge pyrolysis treatment
09/17/2008EP1641958B1 Methods of forming a phosphorus doped silicon dioxide layer
09/17/2008CN201116306Y Self-rotation carrier for continuous film-plating equipment
09/17/2008CN101268546A Fluid storage and dispensing system including dynamic fluid monitoring of fluid storage and dispensing vessel
09/17/2008CN101268544A Actively heated aluminum baffle component having improved particle performance and methods of use and manufacture thereof
09/17/2008CN101268538A Method and device for the plasma treatment of the interior of hollow bodies
09/17/2008CN101268213A Device and method for continuous chemical vapour deposition under atmospheric pressure and use thereof
09/17/2008CN101268212A Raw material feeding device and film formation system
09/17/2008CN101268209A Duplex surface treatment of metal objects
09/17/2008CN101267940A Clay thin-film board, clay thin-film board equipped with electrode and display device using them
09/17/2008CN101265574A Thin film deposition apparatus and thin film deposition method
09/17/2008CN101265573A Thin film deposition method
09/17/2008CN101265572A Continuously produced heating reaction furnace
09/17/2008CN101265571A Lithium ionic cell cathode silicon based compound material preparation method
09/17/2008CN101265570A High-temperature metal organic chemical gas-phase deposition reactor
09/17/2008CN100420012C Structure to improve adhesion between top cvd low-K dielectiric and dielectric capping layer
09/17/2008CN100419971C Substrate processing equipment and semiconductor device manufacturing method
09/17/2008CN100419958C Susceptor for epitaxial growth and epitaxial growth method
09/17/2008CN100419953C Substrate processing method, substrate processing program and storage medium
09/17/2008CN100419119C Superhard filming mold
09/16/2008USRE40507 Method of forming pre-metal dielectric film on a semiconductor substrate including first layer of undoped oxide of high ozone:TEOS volume ratio and second layer of low ozone doped BPSG
09/16/2008US7425689 Inline physical shape profiling for predictive temperature correction during baking of wafers in a semiconductor photolithography process
09/16/2008US7425514 Method of forming material using atomic layer deposition and method of forming capacitor of semiconductor device using the same
09/16/2008US7425350 Apparatus, precursors and deposition methods for silicon-containing materials
09/16/2008US7425349 Metallization; forming plurality of openings contiguous substrate; forming second metal layer by oblique evaporation; seeding amorphous silicon; crystallization; chemical vapor deposition; controlling grain size and distribution; reducing interfaces in channel of thin film transistors
09/16/2008US7425346 chemical vapor deposition of dielectric multilayers comprising inorganic materials such as silica or fluorinated silicon glass and organic polymers comprising fluoropolyxylylenes, on substrates for use in integrated circuits
09/12/2008WO2008108754A1 Technique for atomic layer deposition
09/12/2008WO2008108213A1 Plasma processing apparatus, plasma processing method, and storage medium
09/12/2008WO2008108128A1 Dielectric material, capacitor using dielectric material, semiconductor device using dielectric material, and method for producing dielectric material
09/12/2008WO2008106955A2 Method and devices for the application of transparent silicon dioxide layers from the gas phase
09/12/2008WO2008106812A1 Vacuum coating apparatus
09/12/2008WO2008070453A3 Vapor delivery system useful with ion sources and vaporizer for use in such system
09/11/2008US20080221346 Apparatus forming a film by obliquely evaporating a material in a vacuum state; an evaporation source having an organic-inorganic hybrid material; superior heat resistance
09/11/2008US20080220256 Methods of coating carbon/carbon composite structures
09/11/2008US20080220182 Laser-based method for growing array of carbon nanotubes
09/11/2008US20080220177 Reliant Thermal Barrier Coating System and Related Methods and Apparatus of Making the Same
09/11/2008US20080220175 Nanoparticles wtih grafted organic molecules
09/11/2008US20080220166 Heated silicon deposition reactor system: silicon particles; a vessel containing the particles;a spout nozzle, a secondary orifice laterally spaced from the spout nozzle to inject gas into the chamber as a jet that extends upwardly alongside or toward the spout
09/11/2008US20080220164 Feed device for a precursor
09/11/2008US20080220150 Microbatch deposition chamber with radiant heating
09/11/2008US20080216872 Carburetor, Method of Vaporizing Material Solution, and Method of Washing Carburetor
09/11/2008US20080216749 Evaporation tube and evaporation apparatus with adapted evaporation characteristic
09/11/2008US20080216748 Method and apparatus for forming deposited film
09/11/2008US20080216747 Coating Installation And Gas Piping
09/11/2008US20080216746 Method of manufacturing semiconductor device
09/11/2008US20080216745 Arc Suppression
09/11/2008US20080216744 Apparatus for Manufacturing Magnetic Recording Disk, and In-Line Type Substrate Processing Apparatus
09/11/2008US20080216743 Chemical precursor ampoule for vapor deposition processes
09/11/2008US20080216742 Substrate processing apparatus
09/11/2008US20080216741 Dynamic film thickness control system/method and its utilization
09/11/2008DE10258680B4 Herstellen eines Verbundmaterials mit einem biologisch abbaubaren Kunststoffsubstrat und zumindest einer Beschichtung Producing a composite material with a biodegradable plastic substrate and at least one coating
09/11/2008DE102007011589A1 Fördereinrichtung für Precursor Conveyor for precursor
09/10/2008EP1968099A1 Thin film deposited on a substrate and deposition system for such thin film
09/10/2008EP1968098A1 Suction device for plasma coating chamber
09/10/2008EP1967610A1 Handling device for precursor
09/10/2008EP1967609A2 Plasma enhanced cyclic chemical vapor deposition of silicon-containing films
09/10/2008EP1967604A1 Evaporation crucible and evaporation apparatus with directional evaporation
09/10/2008EP1967603A2 Aliphatic polyester film and gas barrier film
09/10/2008EP1966412A1 Alkylsilanes as solvents for low vapor pressure precursors
09/10/2008EP1966100A1 Deposition of ruthenium oxide coatings on a substrate
09/10/2008EP1917379A4 Eb-pvd system with automatic melt pool height control
09/10/2008EP1749117A4 Yield improvement in silicon-germanium epitaxial growth
09/10/2008EP1667850A4 Methods for cleaning a set of structures comprising yttrium oxide in a plasma processing system
09/10/2008EP1664372A4 Hollow nickel shapes by vapor deposition
09/10/2008EP1432529B1 Article having a plasmapolymer coating
09/10/2008EP1158070B1 Tungsten carbide coatings and method for producing the same
09/10/2008CN101261952A Substrate carrying bench and substrate treatment device
09/10/2008CN101260520A Flat plate silicon nitride film PECVD deposition system
09/10/2008CN101260519A Suction device for plasma coating chamber
09/10/2008CN101260518A Coating installation and gas piping
09/10/2008CN101260517A Treatment system, treatment method and computer program
09/10/2008CN101260516A Method for improving high abrasion of silicon carbide ceramic production device
09/10/2008CN100418201C Production of thin-magnetic semiconductor epitaxial-thin-film of iron-doped cadmium sulfide
09/10/2008CN100418193C Hydride gas phase extent device for manufacturing thick film nitride material
09/10/2008CN100418192C Production of iron-doped zinc sulfide growth thin film by growth
09/10/2008CN100418189C Vacuum processing apparatus and method of using the same
09/10/2008CN100418188C Refurbishment of a coated chamber component
09/10/2008CN100418187C Plasma processing device, annular element and plasma processing method
09/10/2008CN100417744C Lomposite metallic inorganic source of zirconium hafnium and titanium composited anhydrous nitrate and its synthesis method
09/10/2008CN100417656C Novel Bi compound, its prepn. method and process for prepn. of films
09/09/2008US7423939 Method for manufacturing magneto-optical recording medium
09/09/2008US7423166 Stabilized cyclosiloxanes for use as CVD precursors for low-dielectric constant thin films
09/09/2008US7422986 Deposition methods utilizing microwave excitation
09/09/2008US7422805 Cutting tool inserts for face milling of engine blocks formed from alloys of cast iron and aluminium and/or magnesium., characterized by a submicron WC- Co cemented carbide and a coating including an inner layer of TiCxNy with columnar grains followed by a layer of kappa -Al2O3 and a top layer of TIN
09/09/2008US7422803 Coating with controlled grain size and morphology for enhanced wear resistance and toughness
09/09/2008US7422774 Chemical vapor deposition; low dielectric constant (k); delivering a gas mixture comprising one or more organosilicon compounds and one or more hydrocarbon compounds having at least one cyclic group to a substrate surface at deposition conditions sufficient to deposit a non-cured film
09/09/2008US7422770 microcrystallization; transistors
09/09/2008US7422656 Dry etching method and apparatus for use in the LCD device