Patents for C23C 16 - Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition (cvd) processes (71,892) |
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09/18/2008 | US20080226271 Evaporation crucible and evaporation apparatus with adapted evaporation characteristic |
09/18/2008 | US20080225076 Method of fabricating printhead having hydrophobic ink ejection face |
09/18/2008 | US20080223725 Process chamber component having electroplated yttrium containing coating |
09/18/2008 | US20080223524 Semiconductor producing device and semiconductor device producing method |
09/18/2008 | US20080223297 Method and apparatus of forming alignment film |
09/18/2008 | DE112006002151T5 Plasmabearbeitungsgerät Plasma processing device |
09/17/2008 | EP1970468A1 Coating assembly and gas piping system |
09/17/2008 | EP1970358A1 Chemical vapor deposited silicon carbide articles |
09/17/2008 | EP1970194A1 Moistureproof cellulose ester film, polarizer-protective film, and polarizer |
09/17/2008 | EP1969156A1 Method for coating a blade and blade of a gas turbine |
09/17/2008 | EP1969154A1 Apparatus and method for the deposition of ruthenium containing films |
09/17/2008 | EP1969153A2 Uniform surfaces for hybrid material substrates and methods for making and using same |
09/17/2008 | EP1899496A4 Hydrophilic dlc on substrate with barrier discharge pyrolysis treatment |
09/17/2008 | EP1641958B1 Methods of forming a phosphorus doped silicon dioxide layer |
09/17/2008 | CN201116306Y Self-rotation carrier for continuous film-plating equipment |
09/17/2008 | CN101268546A Fluid storage and dispensing system including dynamic fluid monitoring of fluid storage and dispensing vessel |
09/17/2008 | CN101268544A Actively heated aluminum baffle component having improved particle performance and methods of use and manufacture thereof |
09/17/2008 | CN101268538A Method and device for the plasma treatment of the interior of hollow bodies |
09/17/2008 | CN101268213A Device and method for continuous chemical vapour deposition under atmospheric pressure and use thereof |
09/17/2008 | CN101268212A Raw material feeding device and film formation system |
09/17/2008 | CN101268209A Duplex surface treatment of metal objects |
09/17/2008 | CN101267940A Clay thin-film board, clay thin-film board equipped with electrode and display device using them |
09/17/2008 | CN101265574A Thin film deposition apparatus and thin film deposition method |
09/17/2008 | CN101265573A Thin film deposition method |
09/17/2008 | CN101265572A Continuously produced heating reaction furnace |
09/17/2008 | CN101265571A Lithium ionic cell cathode silicon based compound material preparation method |
09/17/2008 | CN101265570A High-temperature metal organic chemical gas-phase deposition reactor |
09/17/2008 | CN100420012C Structure to improve adhesion between top cvd low-K dielectiric and dielectric capping layer |
09/17/2008 | CN100419971C Substrate processing equipment and semiconductor device manufacturing method |
09/17/2008 | CN100419958C Susceptor for epitaxial growth and epitaxial growth method |
09/17/2008 | CN100419953C Substrate processing method, substrate processing program and storage medium |
09/17/2008 | CN100419119C Superhard filming mold |
09/16/2008 | USRE40507 Method of forming pre-metal dielectric film on a semiconductor substrate including first layer of undoped oxide of high ozone:TEOS volume ratio and second layer of low ozone doped BPSG |
09/16/2008 | US7425689 Inline physical shape profiling for predictive temperature correction during baking of wafers in a semiconductor photolithography process |
09/16/2008 | US7425514 Method of forming material using atomic layer deposition and method of forming capacitor of semiconductor device using the same |
09/16/2008 | US7425350 Apparatus, precursors and deposition methods for silicon-containing materials |
09/16/2008 | US7425349 Metallization; forming plurality of openings contiguous substrate; forming second metal layer by oblique evaporation; seeding amorphous silicon; crystallization; chemical vapor deposition; controlling grain size and distribution; reducing interfaces in channel of thin film transistors |
09/16/2008 | US7425346 chemical vapor deposition of dielectric multilayers comprising inorganic materials such as silica or fluorinated silicon glass and organic polymers comprising fluoropolyxylylenes, on substrates for use in integrated circuits |
09/12/2008 | WO2008108754A1 Technique for atomic layer deposition |
09/12/2008 | WO2008108213A1 Plasma processing apparatus, plasma processing method, and storage medium |
09/12/2008 | WO2008108128A1 Dielectric material, capacitor using dielectric material, semiconductor device using dielectric material, and method for producing dielectric material |
09/12/2008 | WO2008106955A2 Method and devices for the application of transparent silicon dioxide layers from the gas phase |
09/12/2008 | WO2008106812A1 Vacuum coating apparatus |
09/12/2008 | WO2008070453A3 Vapor delivery system useful with ion sources and vaporizer for use in such system |
09/11/2008 | US20080221346 Apparatus forming a film by obliquely evaporating a material in a vacuum state; an evaporation source having an organic-inorganic hybrid material; superior heat resistance |
09/11/2008 | US20080220256 Methods of coating carbon/carbon composite structures |
09/11/2008 | US20080220182 Laser-based method for growing array of carbon nanotubes |
09/11/2008 | US20080220177 Reliant Thermal Barrier Coating System and Related Methods and Apparatus of Making the Same |
09/11/2008 | US20080220175 Nanoparticles wtih grafted organic molecules |
09/11/2008 | US20080220166 Heated silicon deposition reactor system: silicon particles; a vessel containing the particles;a spout nozzle, a secondary orifice laterally spaced from the spout nozzle to inject gas into the chamber as a jet that extends upwardly alongside or toward the spout |
09/11/2008 | US20080220164 Feed device for a precursor |
09/11/2008 | US20080220150 Microbatch deposition chamber with radiant heating |
09/11/2008 | US20080216872 Carburetor, Method of Vaporizing Material Solution, and Method of Washing Carburetor |
09/11/2008 | US20080216749 Evaporation tube and evaporation apparatus with adapted evaporation characteristic |
09/11/2008 | US20080216748 Method and apparatus for forming deposited film |
09/11/2008 | US20080216747 Coating Installation And Gas Piping |
09/11/2008 | US20080216746 Method of manufacturing semiconductor device |
09/11/2008 | US20080216745 Arc Suppression |
09/11/2008 | US20080216744 Apparatus for Manufacturing Magnetic Recording Disk, and In-Line Type Substrate Processing Apparatus |
09/11/2008 | US20080216743 Chemical precursor ampoule for vapor deposition processes |
09/11/2008 | US20080216742 Substrate processing apparatus |
09/11/2008 | US20080216741 Dynamic film thickness control system/method and its utilization |
09/11/2008 | DE10258680B4 Herstellen eines Verbundmaterials mit einem biologisch abbaubaren Kunststoffsubstrat und zumindest einer Beschichtung Producing a composite material with a biodegradable plastic substrate and at least one coating |
09/11/2008 | DE102007011589A1 Fördereinrichtung für Precursor Conveyor for precursor |
09/10/2008 | EP1968099A1 Thin film deposited on a substrate and deposition system for such thin film |
09/10/2008 | EP1968098A1 Suction device for plasma coating chamber |
09/10/2008 | EP1967610A1 Handling device for precursor |
09/10/2008 | EP1967609A2 Plasma enhanced cyclic chemical vapor deposition of silicon-containing films |
09/10/2008 | EP1967604A1 Evaporation crucible and evaporation apparatus with directional evaporation |
09/10/2008 | EP1967603A2 Aliphatic polyester film and gas barrier film |
09/10/2008 | EP1966412A1 Alkylsilanes as solvents for low vapor pressure precursors |
09/10/2008 | EP1966100A1 Deposition of ruthenium oxide coatings on a substrate |
09/10/2008 | EP1917379A4 Eb-pvd system with automatic melt pool height control |
09/10/2008 | EP1749117A4 Yield improvement in silicon-germanium epitaxial growth |
09/10/2008 | EP1667850A4 Methods for cleaning a set of structures comprising yttrium oxide in a plasma processing system |
09/10/2008 | EP1664372A4 Hollow nickel shapes by vapor deposition |
09/10/2008 | EP1432529B1 Article having a plasmapolymer coating |
09/10/2008 | EP1158070B1 Tungsten carbide coatings and method for producing the same |
09/10/2008 | CN101261952A Substrate carrying bench and substrate treatment device |
09/10/2008 | CN101260520A Flat plate silicon nitride film PECVD deposition system |
09/10/2008 | CN101260519A Suction device for plasma coating chamber |
09/10/2008 | CN101260518A Coating installation and gas piping |
09/10/2008 | CN101260517A Treatment system, treatment method and computer program |
09/10/2008 | CN101260516A Method for improving high abrasion of silicon carbide ceramic production device |
09/10/2008 | CN100418201C Production of thin-magnetic semiconductor epitaxial-thin-film of iron-doped cadmium sulfide |
09/10/2008 | CN100418193C Hydride gas phase extent device for manufacturing thick film nitride material |
09/10/2008 | CN100418192C Production of iron-doped zinc sulfide growth thin film by growth |
09/10/2008 | CN100418189C Vacuum processing apparatus and method of using the same |
09/10/2008 | CN100418188C Refurbishment of a coated chamber component |
09/10/2008 | CN100418187C Plasma processing device, annular element and plasma processing method |
09/10/2008 | CN100417744C Lomposite metallic inorganic source of zirconium hafnium and titanium composited anhydrous nitrate and its synthesis method |
09/10/2008 | CN100417656C Novel Bi compound, its prepn. method and process for prepn. of films |
09/09/2008 | US7423939 Method for manufacturing magneto-optical recording medium |
09/09/2008 | US7423166 Stabilized cyclosiloxanes for use as CVD precursors for low-dielectric constant thin films |
09/09/2008 | US7422986 Deposition methods utilizing microwave excitation |
09/09/2008 | US7422805 Cutting tool inserts for face milling of engine blocks formed from alloys of cast iron and aluminium and/or magnesium., characterized by a submicron WC- Co cemented carbide and a coating including an inner layer of TiCxNy with columnar grains followed by a layer of kappa -Al2O3 and a top layer of TIN |
09/09/2008 | US7422803 Coating with controlled grain size and morphology for enhanced wear resistance and toughness |
09/09/2008 | US7422774 Chemical vapor deposition; low dielectric constant (k); delivering a gas mixture comprising one or more organosilicon compounds and one or more hydrocarbon compounds having at least one cyclic group to a substrate surface at deposition conditions sufficient to deposit a non-cured film |
09/09/2008 | US7422770 microcrystallization; transistors |
09/09/2008 | US7422656 Dry etching method and apparatus for use in the LCD device |