Patents
Sitemap › C23 - Coating metallic material; Coating material with metallic material; Chemical surface treatment; Diffusion treatment of metallic material; Coating by vacuum evaporation, by sputtering, by ion implantation or by chemical vapour deposition, in general; Inhibiting corrosion of metallic material or incrustation in general › C23C - Coating metallic material; Coating material with metallic material; Surface treatment of metallic material by diffusion into the surface, by chemical conversion or substitution; Coating by vacuum evaporation, by sputtering, by ion implantation or by chemical vapour deposition, in general › C23C 16 - Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition (cvd) processes
Patents for C23C 16 - Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition (cvd) processes (71,892)
10/2008
10/07/2008US7430984 Method to drive spatially separate resonant structure with spatially distinct plasma secondaries using a single generator and switching elements
10/07/2008CA2432068C Plasma generator
10/07/2008CA2426112C Method of ion beam milling a glass substrate prior to depositing a coating system thereon, and corresponding system for carrying out the same
10/07/2008CA2403236C Adhesive composite coating for diamond and diamond-containing materials and method for producing said coating
10/02/2008WO2008117905A1 Manufacturing method of low-k thin films and low-k thin films manufactured therefrom
10/02/2008WO2008117832A1 Vacuum processing apparatus
10/02/2008WO2008117781A1 Cvd film-forming apparatus
10/02/2008WO2008117742A1 Zinc oxide semiconductor manufacturing method and zinc oxide semiconductor manufacturing apparatus
10/02/2008WO2008117675A1 Filming apparatus, filming method, and storage medium
10/02/2008WO2008117605A1 Large-area transparent electroconductive film and process for producing the same
10/02/2008WO2008117590A1 Method of forming film and film forming apparatus
10/02/2008WO2008117582A1 Method for forming metal film using carbonyl material, method for forming multilayered wiring structure, method for manufacturing semiconductor device, and film forming apparatus
10/02/2008WO2008117258A2 Method for low temperature thermal cleaning
10/02/2008WO2008116238A1 Hard metal body with a coating made of cubic boron nitride
10/02/2008WO2008045972A3 Precursor delivery system
10/02/2008WO2007143301A3 Controlled zone microwave plasma system
10/02/2008WO2007136777A3 Wear resistant coating
10/02/2008WO2007121087B1 Controlling plasma processing using parameters derived through the use of a planar ion flux probing arrangement
10/02/2008WO2007081653B1 Apparatus for an optimized plasma chamber grounded electrode assembly
10/02/2008WO2006053128A3 Pallet based system for forming thin-film solar cells
10/02/2008US20080243293 Fabrication system and fabrication method
10/02/2008US20080242880 Copper borohydrides, copper compounds with cyclopentadienyl-type ligands, copper compounds with cyclopentadienyl-type and isocyanide ligands, and stabilized copper hydrides; can be utilized in solid or liquid forms that are volatilized to form precursor vapor for contacting with the substrate
10/02/2008US20080242115 Semiconductor device and method for manufacturing semiconductor device
10/02/2008US20080242111 Atomic layer deposition of strontium oxide via n-propyltetramethyl cyclopentadiendyl precursor
10/02/2008US20080242105 Semiconductor manufacturing apparatus, semiconductor wafer manufacturing method using this apparatus, and recording medium having program of this method recorded therein
10/02/2008US20080242085 Showerhead electrodes and showerhead electrode assemblies having low-particle performance for semiconductor material processing apparatuses
10/02/2008US20080242059 Atomic layer deposition (ALD) reactor process to form nickel layer on silicon substrate, wherein ALD process cycle comprises pulsing a nickel precursor into reactor, purging reactor after nickel precursor, and pulsing mixture of hydrogen and silane into reactor
10/02/2008US20080241587 Ejection of electroluminescence gas; multipipe system; evaporation; transportation gas flow
10/02/2008US20080241556 Composite structure and method for forming the same
10/02/2008US20080241523 Substrate, Such As A Glass Substrate, With A Hydrophobic Surface And Improved Durability Of Hydrophobic Properties
10/02/2008US20080241496 film comprising a nano-crystalline diamond matrix, wherein the film has less than 3 weight percent of graphite; prepared by plasma assisted chemical vapor deposition of films and coatings; low cost
10/02/2008US20080241490 Sprayable Aerogel Insulation
10/02/2008US20080241480 Diamond films and methods of making diamond films
10/02/2008US20080241421 Optoelectronic device and method of fabricating the same
10/02/2008US20080241413 Plasma tool for forming porous diamond films for semiconductor applications
10/02/2008US20080241388 Semiconductors; integrated circuits
10/02/2008US20080241387 Atomic layer deposition reactor
10/02/2008US20080241386 Atomic Layer Deposition Methods
10/02/2008US20080241385 Vapor deposition; titanium nitride thin films formed via TiCl4 gas is adsorbed on substrate and feeding NH3 gas as reactant gas in treating chamber
10/02/2008US20080241384 Lateral flow deposition apparatus and method of depositing film by using the apparatus
10/02/2008US20080241383 Method for producing hydrogen gas separation material
10/02/2008US20080241382 Strained metal nitride films and method of forming
10/02/2008US20080241381 Method for pre-conditioning a precursor vaporization system for a vapor deposition process
10/02/2008US20080241380 Method for performing a vapor deposition process
10/02/2008US20080241379 Method and apparatus for reducing substrate temperature variability
10/02/2008US20080241378 Device and Method for Treating the Surfaces of Substrates
10/02/2008US20080241377 For chemical vapor deposition of thin films on substrates; pyrolysis
10/02/2008US20080241367 Apparatus for and method of applying lubricant coatings to magnetic disks via a vapor flow path including a selectively opened and closed shutter
10/02/2008US20080241366 Condensation prevention; vaccum chambers; vaporization; diffusion
10/02/2008US20080241354 Apparatus and methods for curing a layer by monitoring gas species evolved during baking
10/02/2008US20080240876 Cutting Insert Having Ceramic Coating
10/02/2008US20080240479 Hydrophobic and oleophobic coating and method for preparing the same
10/02/2008US20080237224 Microwave Chamber
10/02/2008US20080237186 Plasma processing apparatus and method thereof
10/02/2008US20080237181 Hybrid layers for use in coatings on electronic devices or other articles
10/02/2008US20080237031 Significantly reduces time to calibrate output power of a radio frequency generator, for example, when calibrating the radio frequency generator order to compensate for a power loss caused by a transmission line, and also preventing noise effect in calibrating the radio frequency generator
10/02/2008US20080236754 Plasma processing apparatus
10/02/2008US20080236753 Plasma processing apparatus
10/02/2008US20080236752 Plasma processing apparatus
10/02/2008US20080236750 Plasma processing apparatus
10/02/2008US20080236745 Method and apparatus for fabricating or altering microstructures using local chemical alterations
10/02/2008US20080236498 Vacuum film deposition apparatus
10/02/2008US20080236497 Method and system for improving deposition uniformity in a vapor deposition system
10/02/2008US20080236495 Showerhead for chemical vapor deposition (CVD) apparatus
10/02/2008US20080236494 Plasma processing apparatus
10/02/2008US20080236493 Plasma processing apparatus
10/02/2008US20080236492 Plasma processing apparatus
10/02/2008US20080236491 Multiflow integrated icp source
10/02/2008US20080236490 Plasma reactor with an overhead inductive antenna and an overhead gas distribution showerhead
10/02/2008US20080236489 Plasma Processing Apparatus
10/02/2008US20080236488 Substrate Processing Apparatus and Manufacturing Method for a Semiconductor Device
10/02/2008US20080236487 Semiconductor Manufacturing Apparatus And Semiconductor Device Manufacturing Method
10/02/2008US20080235938 Inductance test chip for helical wrap around shield perpendicular magnetic recording
10/02/2008DE102007016029A1 Holding arrangement used in a CVD or a PVD installation comprises a holder having a section made from a dielectric material which is in contact with the substrate during a deposition process
10/02/2008DE102007016026A1 Vacuum coating apparatus, especially CVD apparatus, has HF or microwave source, especially magnetron, mounted between coating chamber and vacuum pump to treat residual gases
10/02/2008DE102007015358A1 Schichtsystem für einen Elektrolyten einer Hochtemperatur-Brennstoffzelle sowie Verfahren zur Herstellung desselben The same coating system for an electrolyte of a high temperature fuel cell and methods for preparing
10/01/2008EP1975986A1 Plasma processing equipment
10/01/2008EP1975128A1 Method for producing titanium oxide
10/01/2008EP1974356A1 Hollow sphere with a coating and method and device for the production thereof
10/01/2008EP1380050B1 Method for producing a chalcogenide-semiconductor layer of the abc2 type with optical process monitoring
10/01/2008EP1219141A4 Multi-zone resistance heater
10/01/2008EP1199380B1 Film forming device
10/01/2008CN101278076A Corrosion resistant coating based on silicon, carbon, hydrogen and nitrogen
10/01/2008CN101278073A Feedstock supply unit and vapor deposition equipment
10/01/2008CN101278072A Method of using NF3 for removing surface deposits
10/01/2008CN101276991A Method of manufacturing nitride semiconductor light-emitting device
10/01/2008CN101276777A Substrate mounting stage and substrate processing apparatus
10/01/2008CN101276775A Surface processing method for mounting stage
10/01/2008CN101276731A Semiconductor manufacturing apparatus, and semiconductor wafer manufacturing method using this apparatus
10/01/2008CN101275219A Organosilane compounds for modifying dielectrical properties of silicon oxide and silicon nitride films
10/01/2008CN101274493A Texture-hardened alpha-alumina coated tool
10/01/2008CN100423330C Ferrous selenide cathode material for lithium cell and preparing process thereof
10/01/2008CN100423195C Fluid feeding apparatus
10/01/2008CN100423194C Plasma film forming system
10/01/2008CN100423179C Transfer chamber for vacuum processing system
10/01/2008CN100422798C Display device and method for manufacturing the same
10/01/2008CN100422386C Ornament surface treating method, ornament and chronometer
10/01/2008CN100422383C Systems and methods for forming metal oxides using alcohols
10/01/2008CN100421807C Single-admission and double-area adjustable nozzle
09/2008
09/30/2008US7429718 Heating and cooling of substrate support
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